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    Process for coating a dielectric substrate with copper
    1.
    发明授权
    Process for coating a dielectric substrate with copper 失效
    用铜包覆电介质基板的工艺

    公开(公告)号：US5108571A

    公开(公告)日：1992-04-28

    申请号：US770772

    申请日：1991-10-04

    申请人： Rainer Ludwig ,  Rolf Adam ,  Anton Dietrich ,  Reiner Kukla

    发明人： Rainer Ludwig ,  Rolf Adam ,  Anton Dietrich ,  Reiner Kukla

    IPC分类号： C23C14/14 ,  C23C14/02 ,  C23C14/08 ,  C23C14/18 ,  C23C14/34 ,  C23C14/35 ,  H05K3/16 ,  H05K3/38

    CPC分类号： H05K3/16 ,  C23C14/024 ,  C23C14/087 ,  C23C14/18 ,  C23C14/35 ,  H05K3/38

    摘要： In a process for coating substrates 1, 35, for example aluminum ceramic plates 1 or polyimide films 35 with copper by means of a device including a direct current source 10 which is connected to a sputtering cathode 5, 30, 31 disposed in a process chamber 15, 15a, 32 which can be evacuated and this cathode electrically interacts with a copper target 3, 33, 34 which can be sputtered and the sputtered particles are deposited on the substrate 1, 35 whereby the argon gas can be introduced into the process chamber 15, 15a, 32 which can be evacuated, an oxygen inlet 20, 39 is provided in addition to the argon inlet 21, 40, whereby the supply of oxygen can be controlled via a valve 19, 43 inserted in the feed line 23, 39 and the amount of oxygen can be metered such that during a first process phase a copper oxide layer which functions as a bonding agent forms on the substrate 1, 35 and after adjusting the argon atmosphere in the process chamber 15, 15a, 32 pure copper is deposited as an electrically conductive layer.

    摘要翻译： 在通过包括连接到设置在处理室中的溅射阴极5,30,31的直流电源10的装置来涂覆基板1，35，例如铝陶瓷板1或具有铜的聚酰亚胺膜35的工艺中 15，15a，32，其可以被抽真空，并且该阴极与可以溅射的铜靶3,33,34电相互作用，并且溅射的颗粒沉积在衬底1,35上，由此氩气可以被引入到处理室 除了氩入口21,40之外，还可以提供可以抽真空的氧气入口20,39，从而可以通过插入进料管线23,39中的阀19,43来控制供氧。 并且可以计量氧气的量，使得在第一处理阶段期间，在基板1,35上形成用作粘合剂的氧化铜层，并且在调节处理室15,15a，32纯铜中的氩气氛之后， 作为选民保存 导电层。

    Coated article with silicon oxynitride adjacent glass
    8.
    发明授权
    Coated article with silicon oxynitride adjacent glass 有权
    涂有氮氧化硅相邻玻璃的涂层制品

    公开(公告)号：US07267879B2

    公开(公告)日：2007-09-11

    申请号：US10636918

    申请日：2003-08-08

    申请人： Scott V. Thomsen ,  Anton Dietrich ,  Jose Nunez Regueiro

    发明人： Scott V. Thomsen ,  Anton Dietrich ,  Jose Nunez Regueiro

    IPC分类号： B32B17/06

    CPC分类号： C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C17/3694 ,  C03C2217/78 ,  C23C14/0015 ,  C23C14/0084 ,  C23C14/0652

    摘要： A low-E coated article is provided, in certain example embodiments, with a layer including silicon oxynitride adjacent the glass substrate in order to improve chemical and/or mechanical durability of the coated article. In certain example embodiments, the coated article may be formed so as to have a fairly high visible transmission (TY or Tvis) to sheet resistance (Rs) ratio (i.e., a ratio Tvis/Rs). The higher this ratio, the better the coated article's combined functionality of providing for both good solar performance (e.g., ability to reflect and/or absorb IR radiation) and high visible transmission. Coated articles herein may be used in the context of insulating glass (IG) window units, architectural or residential monolithic window units, vehicle window units, and/or the like.

    摘要翻译： 在某些示例性实施方案中，提供低E涂层制品，其中包含邻近玻璃基底的氮氧化硅层，以改善涂覆制品的化学和/或机械耐久性。 在某些示例性实施例中，涂覆制品可以形成为具有相当高的可见透射率（TY或T vis）与薄层电阻（R SUB）之比（即 ，比例比例）。 该比例越高，涂层制品提供良好的太阳能性能（例如，反射和/或吸收IR辐射的能力）和高可见透射率的组合功能越好。 本文中的涂层制品可用于中空玻璃（IG）窗单元，建筑或住宅单片窗单元，车窗单元等的上下文中。