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78 条记录 (耗时 0.039 秒)

    Polymeric compound and resin composition for photoresist
    64.
    发明授权
    Polymeric compound and resin composition for photoresist 有权
    用于光致抗蚀剂的聚合物和树脂组合物

    公开(公告)号：US06440636B1

    公开(公告)日：2002-08-27

    申请号：US09703677

    申请日：2000-11-02

    申请人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

    发明人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

    IPC分类号： G03F7004

    CPC分类号： G03F7/0397 ,  C08F20/18 ,  C08F20/30

    摘要： A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.

    摘要翻译： 聚合化合物包括至少一种下式（I）的单体单元：其中R1是氢原子或甲基; R2和R3各自独立地为氢原子或羟基。 聚合化合物可以包括单体单元和选自下式（IIa）和（IIb）表示的单体单元的至少一种单体单元：其中R 1是氢原子或甲基; R4和R5各自为例如氢原子，羟基，氧代基或羧基，其中R4和R5不同时为氢原子; R 7和R 8各自独立地为氢原子，羟基或氧代基。 除了令人满意的透明性，碱溶性和粘合性之外，高分子化合物具有高的耐蚀刻性。

    Photosensitive composition and a pattern forming process using the same
    66.
    发明授权
    Photosensitive composition and a pattern forming process using the same 有权
    光敏组合物和使用其的图案形成方法

    公开(公告)号：US06197473B1

    公开(公告)日：2001-03-06

    申请号：US09154733

    申请日：1998-09-17

    申请人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

    发明人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

    IPC分类号： G03F7023

    CPC分类号： G03F7/0045 ,  G03F7/022 ,  Y10S430/106

    摘要： The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.

    摘要翻译： 本发明的目的是提供一种对有机溶剂以及碱性显影剂或pH11或更低的水基显影剂具有高溶解度的光敏组合物，并提供用于获得高分辨抗蚀剂图案的图案形成方法 这些目的通过光敏组合物实现，该组合物包含在室温下为玻璃状的化合物，并且具有带有三个或更多个含有酸可分解取代基的芳环的环状结构，以及图案形成方法，其中使用所述感光 组合物暴露于光图案，并用碱的水溶液或pH11或更低的水性显影剂显影。

    Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group
    67.
    发明授权
    Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group 失效
    包含碱溶性粘合剂和具有磺酰基的光致酸发生剂的光敏组合物

    公开(公告)号：US5348838A

    公开(公告)日：1994-09-20

    申请号：US921692

    申请日：1992-07-30

    申请人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

    发明人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

    IPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/004 ,  G03C1/492

    CPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/0045 ,  Y10S430/11

    摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.

    摘要翻译： 感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物 （1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在 引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基 基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。

    Method and system for removing carbon dioxide from exhaust gas by utilizing seawater
    69.
    发明授权
    Method and system for removing carbon dioxide from exhaust gas by utilizing seawater 失效
    利用海水从废气中除去二氧化碳的方法和系统

    公开(公告)号：US08486182B2

    公开(公告)日：2013-07-16

    申请号：US13208805

    申请日：2011-08-12

    申请人： Kenji Sano ,  Yukishige Maezawa ,  Toru Ushirogouchi

    发明人： Kenji Sano ,  Yukishige Maezawa ,  Toru Ushirogouchi

    IPC分类号： B01D53/14 ,  B01D53/62

    CPC分类号： B01D53/1418 ,  B01D53/1475 ,  B01D53/1493 ,  B01D53/62 ,  B01D2251/304 ,  B01D2252/102 ,  B01D2252/1035 ,  B01D2257/504 ,  Y02A50/2342 ,  Y02C10/04 ,  Y02C10/06

    摘要： According to one embodiment, a method for removing carbon dioxide in an exhaust gas utilizing seawater includes: blowing ammonia into seawater to produce ammonia-saturated seawater; contacting an exhaust gas under a state of non-heat with the ammonia-saturated seawater so that carbon dioxide in the exhaust gas is absorbed in the ammonia-saturated seawater; and splaying a solution containing sodium hydrogen carbonate and ammonium chloride which are produced through absorption of the carbon dioxide by the ammonia-saturated seawater utilizing pressure of the exhaust gas while cooling the solution utilizing heat of evaporation of a solvent of the solution so as to settle out and recover the sodium hydrogen carbonate and the ammonium chloride.

    摘要翻译： 根据一个实施例，利用海水去除废气中的二氧化碳的方法包括：将氨吹入海水中以产生氨饱和的海水; 在不加热的状态下使废气与氨饱和海水接触，使得废气中的二氧化碳被吸收在氨饱和的海水中; 并喷射含有碳酸氢钠和氯化铵的溶液，其通过利用排气的压力通过氨饱和海水吸收二氧化碳而产生，同时利用溶液的蒸发的热量冷却溶液以沉降 出来并回收碳酸氢钠和氯化铵。

    Resist resin
    70.
    发明授权
    Resist resin 有权
    抵抗树脂

    公开(公告)号：US07119156B2

    公开(公告)日：2006-10-10

    申请号：US10937313

    申请日：2004-09-10

    申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

    发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

    IPC分类号： G03F7/04

    CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

    摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。