公开(公告)号：US5372914A

公开(公告)日：1994-12-13

申请号：US36254

申请日：1993-03-24

申请人： Takuya Naito ,  Osamu Sasaki ,  Tsukasa Tada ,  Naoko Kihara ,  Toru Ushirogouchi ,  Satoshi Saito ,  Takashi Jonai ,  Hirokazu Niki

发明人： Takuya Naito ,  Osamu Sasaki ,  Tsukasa Tada ,  Naoko Kihara ,  Toru Ushirogouchi ,  Satoshi Saito ,  Takashi Jonai ,  Hirokazu Niki

IPC分类号： G03F7/004 ,  G03F7/09 ,  G03C5/00

CPC分类号： G03F7/0045 ,  G03F7/094 ,  Y10S430/122

摘要： On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.

摘要翻译： 在基板上形成保护层，其可以抑制污染物从基板的扩散。 在形成的保护层上形成树脂层。 树脂层包含含有在酸存在下具有能够分解或交联的取代基的化合物的光敏组合物和在暴露于光时可产生酸的化合物。 将树脂层图案曝光，然后在预定温度下烘烤。 树脂层被显影，由此树脂层的暴露部分被去除或留下，从而形成包括具有预定宽度的线和间隔的图案。 图案的每条线具有既不具有倾斜轮廓也不具有底切轮廓的横截面，因此，该花纹具有改进的分辨率。

公开(公告)号：US5348838A

公开(公告)日：1994-09-20

申请号：US921692

申请日：1992-07-30

申请人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

发明人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

IPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/004 ,  G03C1/492

CPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/0045 ,  Y10S430/11

摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.

摘要翻译： 感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物 （1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在 引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基 基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。

公开(公告)号：US5332648A

公开(公告)日：1994-07-26

申请号：US813694

申请日：1991-12-27

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  G03C1/73

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可形成精细的抗蚀剂图案。 （1）其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

公开(公告)号：US06340552B1

公开(公告)日：2002-01-22

申请号：US08247356

申请日：1994-05-23

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03C1492

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种 组; X表示

公开(公告)号：US06306553B1

公开(公告)日：2001-10-23

申请号：US08473963

申请日：1995-06-07

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03C176

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种 组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

公开(公告)号：US06280897B1

公开(公告)日：2001-08-28

申请号：US08997623

申请日：1997-12-23

申请人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

发明人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03F7004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.

摘要翻译： 一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基 基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

公开(公告)号：US06190841B1

公开(公告)日：2001-02-20

申请号：US09217580

申请日：1998-12-21

申请人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

发明人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

IPC分类号： G03C556

CPC分类号： G03F7/38 ,  G03F7/0045 ,  G03F7/039

摘要： The present invention provides a pattern forming process. The process comprises the following steps. (1) A photosensitive material is prepared by coating a photosensitive composition onto the surface of a substrate. The photosensitive composition comprises the following components: (a) an acid generator which generates an acid when irradiated with actinic radiation, and (b) a compound containing carboxyl groups, which can decompose upon decarboxylation. (2) The photosensitive material is subjected to pattern-wise exposure to actinic radiation, thereby allowing the acid generator (a) to generate an acid in the exposed area. (3) The acid generated in the exposed area is neutralized with a basic compound (c). (4) The carboxyl groups in the carboxyl-group-containing compound (b) in the unexposed area are decarboxylated by applying conditions under which the basic compound (c) can catalyze decarboxylation. (5) The photosensitive material, and composition used in the above process are developed. The basic compound (c) can be introduced in advance into the photosensitive material prepared in step (1). By using such a pattern forming process or a photosensitive composition, a pattern can successfully be formed with high reproducibility without being affected by the environment.

摘要翻译： 本发明提供一种图案形成方法。 该方法包括以下步骤：（1）通过将光敏组合物涂布在基材的表面上来制备感光材料。 光敏组合物包含以下组分：（a）当用光化辐射照射时产生酸的酸产生剂，和（b）含羧基的化合物，其可在脱羧时分解;（2）感光材料经受图案 （3）暴露区域产生的酸用碱性化合物（c）中和;（4）羧基基团（A）在酸性发生剂（a） 通过施用碱性化合物（c）可以催化脱羧作用的条件，在未曝光区域的含羧基化合物（b）中脱羧。（5）显影在上述方法中使用的感光材料和组合物。 基本化合物（c）可以预先引入到步骤（1）中制备的感光材料中。 通过使用这种图案形成方法或光敏组合物，可以以不会受环境影响的方式，以高再现性成功地形成图案。

公开(公告)号：US06177229B1

公开(公告)日：2001-01-23

申请号：US09237659

申请日：1999-01-27

申请人： Satoshi Saito ,  Naoko Kihara ,  Toru Ushirogouchi

发明人： Satoshi Saito ,  Naoko Kihara ,  Toru Ushirogouchi

IPC分类号： G03C173

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/115

摘要： Disclosed is a positive photosensitive composition, comprising an alkali soluble resin having at least some or all of the alkali soluble groups protected by a substituent which can be decomposed by an acid, a compound which generates an acid upon irradiation with an actinic radiation, and a compound which generates water under action of an acid catalyst.

摘要翻译： 公开了一种正型光敏组合物，其包含碱溶性树脂，其具有至少部分或全部由可被酸分解的取代基保护的碱溶性基团，在用光化辐射照射时产生酸的化合物，以及 在酸催化剂作用下产生水的化合物。

公开(公告)号：US06197473B1

公开(公告)日：2001-03-06

申请号：US09154733

申请日：1998-09-17

申请人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

发明人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

IPC分类号： G03F7023

CPC分类号： G03F7/0045 ,  G03F7/022 ,  Y10S430/106

摘要： The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.

摘要翻译： 本发明的目的是提供一种对有机溶剂以及碱性显影剂或pH11或更低的水基显影剂具有高溶解度的光敏组合物，并提供用于获得高分辨抗蚀剂图案的图案形成方法 这些目的通过光敏组合物实现，该组合物包含在室温下为玻璃状的化合物，并且具有带有三个或更多个含有酸可分解取代基的芳环的环状结构，以及图案形成方法，其中使用所述感光 组合物暴露于光图案，并用碱的水溶液或pH11或更低的水性显影剂显影。

公开(公告)号：US20050037284A1

公开(公告)日：2005-02-17

申请号：US10937357

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。