公开(公告)号：US06362372B1

公开(公告)日：2002-03-26

申请号：US09833210

申请日：2001-04-12

申请人： Satoru Narizuka ,  Takashi Kume

发明人： Satoru Narizuka ,  Takashi Kume

IPC分类号： C07C20900

摘要： The invention relates to a process for producing a trifluoromethylbenzylamine represented by the following general formula (1), where each R independently represents a halogen selected from the group consisting of fluorine, chlorine, bromine and iodine, an alkyl group having a carbon atom number of 1-4, an alkoxy group having a carbon atom number of 1-4, an amino group, a hydroxyl group or a trifluoromethyl group, and n represents an integer from 0 to 4. The process includes hydrogenating a trifluoromethylbenzonitrile by hydrogen in an organic solvent in the presence of ammonia and a catalyst containing a platinum group element. This trifluoromethylbenzonitrile is represented by the following general formula (2), where R and n are defined as above. With this process, it is possible to obtain the trifluoromethylbenzylamine at an extremely high yield.

公开(公告)号：US06331649B1

公开(公告)日：2001-12-18

申请号：US09532004

申请日：2000-03-21

申请人： Satoru Narizuka ,  Yutaka Katsuhara

发明人： Satoru Narizuka ,  Yutaka Katsuhara

IPC分类号： C07C21100

CPC分类号： C07C249/08 ,  C07C209/52 ,  C07C211/29 ,  C07C251/48

摘要： The present invention relates to a process for producing a trifluoromethylbenzylamine represented by the general formula (1). This process includes the step of reducing an oxime represented by the general formula (2), where R1 represents hydrogen atom, a halogen atom selected from the group consisting of fluorine, chlorine, bromine and iodine, or trifluoromethyl group, where R1 is defined as above, and R2 represents hydrogen atom, an alkyl group or an aralkyl group. With this process, the trifluoromethylbenzylamine can be produced with high selectivity.

摘要翻译： 本发明涉及由通式（1）表示的三氟甲基苄胺的制造方法。 该方法包括降低由通式（2）表示的肟的步骤，其中R 1表示氢原子，选自氟，氯，溴和碘的卤素原子或三氟甲基，其中R 1定义为 R2表示氢原子，烷基或芳烷基。 通过该方法，可以高选择性地制备三氟甲基苄胺。

公开(公告)号：US08592622B2

公开(公告)日：2013-11-26

申请号：US12983916

申请日：2011-01-04

申请人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka

发明人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka

IPC分类号： C07C69/54 ,  C07C69/618 ,  C07C69/653 ,  C08F20/22 ,  G03F7/004 ,  G03F7/039

CPC分类号： C07C69/54 ,  C07C69/618 ,  C07C69/653 ,  C07C69/67 ,  C08F20/22 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y02P20/55 ,  Y10S430/108 ,  Y10S430/111

摘要： A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

摘要翻译： 由式（1）表示的可聚合的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示二价 连接组。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。

公开(公告)号：US20120328985A1

公开(公告)日：2012-12-27

申请号：US13524627

申请日：2012-06-15

申请人： Misugi KATO ,  Yoshimi Isono ,  Satoru Narizuka ,  Ryozo Takihana ,  Kazunori Mori

发明人： Misugi KATO ,  Yoshimi Isono ,  Satoru Narizuka ,  Ryozo Takihana ,  Kazunori Mori

IPC分类号： C08F228/04 ,  G03F7/20 ,  C08F228/02 ,  C07D209/48 ,  C07C381/12 ,  C07D333/76 ,  C07D333/08 ,  C07D207/46 ,  G03F7/004 ,  C07C309/12

CPC分类号： C08F20/38 ,  C07C25/18 ,  C07C309/12 ,  C07C381/12 ,  C07D207/46 ,  C07D209/48 ,  C07D333/08 ,  C07D333/76 ,  C08F22/24 ,  C08F28/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397

摘要： According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

摘要翻译： 根据本发明，提供具有以下通式（A）的结构的含氟磺酸盐树脂或含氟磺酸酯树脂和具有一般重复单元的含氟N-磺酰氧基酰亚胺树脂 式（17）。 可以使用上述树脂获得抗蚀剂组合物，使得抗蚀剂组合物可以获得高分辨率，宽DOF，小LER和高灵敏度并形成良好的图案形状。

公开(公告)号：US08283106B2

公开(公告)日：2012-10-09

申请号：US12740780

申请日：2008-10-31

申请人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

发明人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C271/24 ,  C07C309/15

CPC分类号： C07C309/59 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D207/46 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

摘要翻译： 公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。 在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（ 光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

公开(公告)号：US20110098500A1

公开(公告)日：2011-04-28

申请号：US12983916

申请日：2011-01-04

申请人： Yoshimi ISONO ,  Jonathan Joachim Jodry ,  Satoru Narizuka

发明人： Yoshimi ISONO ,  Jonathan Joachim Jodry ,  Satoru Narizuka

IPC分类号： C07C69/675 ,  C07C69/73

CPC分类号： C07C69/54 ,  C07C69/618 ,  C07C69/653 ,  C07C69/67 ,  C08F20/22 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y02P20/55 ,  Y10S430/108 ,  Y10S430/111

摘要： A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

摘要翻译： 由式（1）表示的可聚合的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示二价 连接组。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。

公开(公告)号：US07629434B2

公开(公告)日：2009-12-08

申请号：US10586184

申请日：2005-10-13

申请人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： C08G63/06

CPC分类号： C07C217/90 ,  C08G73/1039

摘要： Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula, A represents a single bond, an oxygen atom, a sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, a phenyl or an alicyclic ring; a and b independently represent an integer of 0-2; and 1≦a+b≦4.) Such a fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer exhibiting water repellency, oil repellency, low water absorbency, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index, low dielectric properties and the like. Consequently, the fluorine-containing polymerizable monomer can be applied to the field of advanced polymer materials.

摘要翻译： 公开了下述式[1]表示的含氟聚合性单体。 （式中，A表示单键，氧原子，硫原子，CO，CH2，SO，SO2，C（CH3）2，NHCO，C（CF3）2，苯基或脂环族环; b独立地表示0-2的整数，1 <= a + b <= 4）。这样的含氟聚合性单体可以用作显示疏水性，拒油性，低吸水性，耐热性的有效的聚合性单体 耐候性，耐腐蚀性，透明性，光敏性，低折射率，低介电性等。 因此，含氟聚合性单体可以应用于高分子材料领域。

公开(公告)号：US20090292104A1

公开(公告)日：2009-11-26

申请号：US12533024

申请日：2009-07-31

申请人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： C08G69/08 ,  C08G73/02

CPC分类号： C07C217/90 ,  C08G73/1039

摘要： Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1≦a+b≦4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.

摘要翻译： A表示单键，氧原子，硫原子，CO，CH 2，SO，SO 2，C（CH 3）2，NHCO，C的式[1]表示的含氟聚合性单体聚合得到的高分子化合物 （CF 3）2，苯基或脂族环; “a”和“b”各自独立地表示0-2的整数，1 <= a + b <= 4。 该含氟聚合性单体可以用作有效的可聚合单体，其可以具有防水性，拒油性，低吸水性，耐热性，耐候性，耐腐蚀性，透明性，光敏性，低折射率性，低介电性 等，可用于高级聚合物材料领域。

公开(公告)号：US20080234460A1

公开(公告)日：2008-09-25

申请号：US10586184

申请日：2005-10-13

申请人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： C08G63/06 ,  C07C211/56

CPC分类号： C07C217/90 ,  C08G73/1039

摘要： Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula, A represents a single bond, an oxygen atom, a sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, a phenyl or an alicyclic ring; a and b independently represent an integer of 0-2; and 1≦a+b≦4.) Such a fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer exhibiting water repellency, oil repellency, low water absorbency, heat re-sistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index, low dielectric properties and the like. Consequently, the fluorine-containing polymeriz-able monomer can be applied to the field of advanced polymer materials.

摘要翻译： 公开了下述式[1]表示的含氟聚合性单体。 （式中，A表示单键，氧原子，硫原子，CO，CH 2，SO，SO 2，C（CH 3） 2，NCO 2，C（CF 3）2，苯基或脂环族环; a和b独立地表示 可以使用这样的含氟聚合性单体作为具有防水性，拒油性，低吸水性，耐热性，耐候性的有效的聚合性单体 电阻，耐腐蚀性，透明性，光敏性，低折射率，低介电性等。 因此，含氟可聚合单体可以应用于先进的聚合物材料领域。

公开(公告)号：US06878663B2

公开(公告)日：2005-04-12

申请号：US10116057

申请日：2002-04-05

申请人： Takashi Kume ,  Satoru Narizuka ,  Makoto Koide ,  Koichi Mikami ,  Manabu Hatano ,  Masahiro Terada

发明人： Takashi Kume ,  Satoru Narizuka ,  Makoto Koide ,  Koichi Mikami ,  Manabu Hatano ,  Masahiro Terada

IPC分类号： C07F15/00 ,  C07F17/02

CPC分类号： C07F15/006 ,  C07F15/0066

摘要： An aromatic compound represented by the general formula Ar1X is reacted with a palladium compound and a phosphine derivative, in the presence of a first basic substance, thereby producing a palladium-complex compound represented by the general formula Ar1—PdL2X. This palladium-complex compound is reacted with a benzoic acid represented by the general formula Ar2—COOH, in the presence of a second basic substance, thereby producing another palladium-complex compound represented by the following general formula. The above palladium-complex compounds are useful as catalysts and can be produced easily by the above reactions. In the above general formulas, Ar1 is an aryl group; and X is a halogen that is fluorine, chlorine, bromine or iodine, trifluoromethanesulfonate group, an alkylsulfonate group having a carbon atom number of 1-4, or a substituted or unsubstituted arylsulfonate group; each L is independently a phosphine ligand; and Ar2 is an aryl group.

摘要翻译： 在通式Ar 1 X表示的芳香族化合物与钯化合物和膦衍生物在第一碱性物质的存在下反应，由此制备由通式Ar 1〜 PdL2X。 在第二碱性物质的存在下，使该钯络合物与通式为Ar 2 -COOH表示的苯甲酸反应，由此生成由以下通式表示的另一种钯络合物。 复合化合物可用作催化剂，并且可以通过上述反应容易地制备。 在上述通式中，Ar 1是芳基; X是氟，氯，溴或碘的卤素，三氟甲磺酸酯基，碳原子数为1-4的烷基磺酸酯基或取代或未取代的芳基磺酸酯基; 每个L独立地是膦配体; Ar 2为芳基。