摘要:
A semiconductor integrated circuit device includes a cell transistor; a bit line provided above the cell transistor; a magnetoresistive element provided above the bit line, a first end portion of the magnetoresistive element being electrically connected to the bit line; an intracell local interconnection provided above the magnetoresistive element, the intracell local interconnection coupling one of source and drain regions of the cell transistor to a second end portion of the magnetoresistive element; and a write word line provided above the intracell local interconnection, a portion between the write word line and the intracell local interconnection being filled with an insulator alone.
摘要:
A semiconductor memory device includes a plurality of MIS transistors arranged at intersections of first word lines and bit lines formed on an SOI substrate and each configuring a memory cell. Each of the plurality of MIS transistors includes a channel body formed in a semiconductor layer on an insulating film and set in an electrically floating state, a first extension region formed in contact with the channel body in the semiconductor layer and arranged in a first word line direction, a gate insulating film formed on the channel body, a gate electrode formed on the gate insulating film and electrically connected to a corresponding one of the first word lines, and source and drain regions separately formed in a bit line direction in the semiconductor layer to sandwich the channel body.
摘要:
A magnetic memory includes: a magnetoresistance effect element having a magnetic recording layer; a first writing wiring extending in a first direction on or below the magnetoresistance effect element, a center of gravity of an axial cross section of the wiring being apart from a center of thickness at the center of gravity, and the center of gravity being eccentric toward the magnetoresistance effect element; and a writing circuit configured to pass a current through the first writing wiring in order to record an information in the magnetic recording layer by a magnetic field generated by the current.
摘要:
A magnetic memory includes: a magnetoresistance effect element having a magnetic recording layer; a first writing wiring extending in a first direction on or below the magnetoresistance effect element, a center of gravity of an axial cross section of the wiring being apart from a center of thickness at the center of gravity, and the center of gravity being eccentric toward the magnetoresistance effect element; and a writing circuit configured to pass a current through the first writing wiring in order to record an information in the magnetic recording layer by a magnetic field generated by the current.
摘要:
A magnetic memory includes a magnetoresistance effect element having a magnetic recording layer, a first wiring extending in a first direction on or below the magnetoresistance effect element, a covering layer provided on at least both sides of the first wiring, and a writing circuit configured to pass a current through the first wiring in order to record information in the magnetic recording layer by a magnetic field generated by the current. The covering layer is made of magnetic material and has a uniaxial anisotropy in the first direction, along which a magnetization of the covering layer occurs.
摘要:
A read blocks are connected to a read bit line. The read block has MTJ elements connected in series or in parallel, or arranged by combining series and parallel connections between the read bit line and a ground terminal. The MTJ elements are stacked on a semiconductor substrate. The read bit line is arranged on the MTJ elements stacked. A write word line extending in the X-direction and a write bit line extending in the Y-direction are present near the MTJ elements in the read block.
摘要:
In a DRAM-logic embedded integrated circuit in which a DRAM including trench capacitors of the deep trench structure and a logic circuit are mixedly formed in a semiconductor substrate, a plurality of capacitors of the deep trench structure are provided in the logic circuit portion. The plurality of capacitors are connected in parallel by wiring portions, whereby a plurality of capacitor blocks are formed. Between the respective capacitor blocks, there are provided fuse elements which selectively connect the respective wiring portions to each other or selectively separate them from each other to thereby vary the capacitance value of the capacitance blocks. These fuse elements are selectively cut off depending on the capacitance value of the capacitors required in view of the circuit design.
摘要:
A memory includes MTJ elements. Active areas are separated to correspond to cell transistors, respectively, and extend in a first direction substantially orthogonal to an extending direction of gates of the cell transistors. The active areas are arranged in the first direction and constitute a plurality of active area columns. Two active area columns adjacent in a second direction are arranged to be half-pitch staggered in the first direction. As viewed from above surfaces of the active areas, each MTJ element is arranged to overlap with one end of each of the active areas. The first and second wirings extend while being folded back in a direction inclined with respect to the first and second directions in order to overlap with the MTJ elements alternately in the adjacent active area columns.
摘要:
A magnetoresistive element includes a first electrode layer, a first fixed layer provided on the first electrode layer and having a fixed magnetization direction, a first intermediate layer provided on the first fixed layer and made of a metal oxide, a free layer provided on the first intermediate layer and having a variable magnetization direction, and a second electrode layer provided on the free layer. At least one of the first electrode layer and the second electrode layer contains a conductive metal oxide.
摘要:
A semiconductor memory device comprising: a support substrate; an insulating film formed on the support substrate; a semiconductor film formed on the insulating film; a gate insulating film formed on the semiconductor film; a gate electrode film formed on the gate insulating film; and a source region and a drain region formed in the semiconductor film so as to sandwich the gate insulating film in a gate length direction, the source and drain regions contacting the insulating film at the bottom surface, and the semiconductor memory device storing data corresponding to the amount of charges accumulated in the semiconductor film surrounded by the insulating film, the gate insulating film, and the source and drain regions and electrically floated, wherein a border length between the source region and the gate insulating film contiguous to each other is different from a border length between the drain region and the gate insulating film to each other.