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108 条记录 (耗时 0.031 秒)

    Light-sensitive material containing silver halide, reducing agent and polymerizable compound
    61.
    发明授权
    Light-sensitive material containing silver halide, reducing agent and polymerizable compound 失效
    含有卤化银，还原剂和可聚合化合物的感光材料

    公开(公告)号：US4803148A

    公开(公告)日：1989-02-07

    申请号：US59991

    申请日：1987-06-09

    申请人： Toru Harada ,  Kozo Sato

    发明人： Toru Harada ,  Kozo Sato

    IPC分类号： G03F7/004 ,  G03C1/00 ,  G03C1/498 ,  G03F7/028 ,  G03F7/06 ,  G03F7/105 ,  G03C5/54 ,  G03C1/68

    CPC分类号： G03F7/0285 ,  G03F7/105

    摘要： A light-sensitive material comprising a light-sensitive layer containing silver halide, a reducing agent, a polymerizable compound and a leuco dye provided on a support, characterized in that the leuco dye is a compound having the following formula (I): ##STR1## in which A is --O-- or ##STR2## and R is a substituent having a positive substituent constant (.sigma.); one of X and Y is nitrogen and the other is carbon; each of R.sup.1 and R.sup.2 is an alkyl group, a cycloalkyl group or an aralkyl group; each of R.sup.3 and R.sup.4 is an alkyl group, an alkoxy group, a cycloalkyl group, an aralkyl group or an aryloxy group; each of l, m and n is 1 or 2.

    摘要翻译： 一种感光材料，其包含含有卤化银，还原剂，可聚合化合物和设置在载体上的无色染料的感光层，其特征在于所述无色染料是具有下式（I）的化合物：（I）其中A是-O-或，R是具有正取代基常数（sigma）的取代基; X和Y之一是氮，另一个是碳; R1和R2各自为烷基，环烷基或芳烷基; R 3和R 4各自为烷基，烷氧基，环烷基，芳烷基或芳氧基; l，m和n分别为1或2。

    Ball Screw
    69.
    发明申请
    Ball Screw 审中-公开
    滚珠丝杠

    公开(公告)号：US20130220047A1

    公开(公告)日：2013-08-29

    申请号：US13879752

    申请日：2011-03-31

    申请人： Shouji Yokoyama ,  Koji Hashimoto ,  Toru Harada ,  Shingo Saitou

    发明人： Shouji Yokoyama ,  Koji Hashimoto ,  Toru Harada ,  Shingo Saitou

    IPC分类号： F16H25/22

    CPC分类号： F16H25/2214 ,  F16H25/2223 ,  Y10T74/19772

    摘要： A ball screw having a groove-shaped ball return passage has improved durability, ball circulation performance, and working performance. The ball screw is provided with: a threaded shaft having a spiral groove at its outer circumferential surface; a nut having a spiral groove which faces the spiral groove at its inner circumferential surface; a plurality of balls rotatably loaded in a spiral raceway constituted by the two spiral grooves; and a ball circulation groove which returns and circulates the balls from an end point to a start point of the raceway. Further, the edge portions constituted by the two side surfaces of the ball circulation groove and the surfaces which continue from the side surfaces and extend in the axial direction are formed to be rounded.

    摘要翻译： 具有槽形球返回通道的滚珠丝杠具有改进的耐久性，球循环性能和工作性能。 滚珠丝杠设有：螺纹轴，其外圆周表面具有螺旋槽; 螺母，其具有在其内周面处面对螺旋槽的螺旋槽; 可旋转地装载在由两个螺旋槽构成的螺旋滚道中的多个滚珠; 以及球循环槽，其使球从端点返回到滚道的起始点。 此外，由球循环槽的两个侧面构成的边缘部分和从侧面延伸并在轴向方向上延伸的表面形成为圆形。

    Substrate processing method and substrate processing apparatus
    70.
    发明授权
    Substrate processing method and substrate processing apparatus 有权
    基板处理方法和基板处理装置

    公开(公告)号：US07972979B2

    公开(公告)日：2011-07-05

    申请号：US12857942

    申请日：2010-08-17

    申请人： Toru Harada ,  Masayoshi Minami

    发明人： Toru Harada ,  Masayoshi Minami

    IPC分类号： H01L21/469

    CPC分类号： F27B17/0025 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02323 ,  H01L21/02337 ,  H01L21/31058 ,  H01L21/3125 ,  H01L21/316 ,  H01L21/67109

    摘要： Provided is a substrate processing method comprising: loading a substrate, on which polysilazane is applied, into a substrate process chamber; maintaining an inside of the substrate process chamber, into which the substrate is loaded, in water vapor atmosphere and depressurization atmosphere at a temperature of 400° C.; performing a first heat treatment process on the substrate in a state where the inside of the substrate process chamber is maintained in the water vapor atmosphere and the depressurization atmosphere at the temperature of 400° C.; next, increasing an inner temperature of the substrate process chamber from the temperature of 400° C. in the first heat treatment process to a temperature ranging from 900° C. to 1000° C.; and performing a second heat treatment process on the substrate in a state where the inside of the substrate process chamber is maintained in water vapor atmosphere and depressurization atmosphere at the temperature ranging from 900° C. to 1000° C.

    摘要翻译： 提供了一种基板处理方法，其包括：将其上施加有聚硅氮烷的基板加载到基板处理室中; 在400℃的温度下在水蒸汽气氛和减压气氛中保持衬底处理室的内部，衬底处理室内装载衬底处理室。 在基板处理室的内部保持在水蒸气气氛和400℃的减压气氛的状态下对基板进行第一热处理工序; 接下来，在第一热处理过程中将衬底处理室的内部温度从400℃升高到900℃至1000℃的温度; 在基板处理室的内部保持在水蒸汽气氛和在900℃〜1000℃的温度下的减压气氛的状态下对基板进行第二热处理工序。