公开(公告)号：US06656860B2

公开(公告)日：2003-12-02

申请号：US09993564

申请日：2001-11-27

Applicant: Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

Inventor： Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

IPC: C03C306

CPC classification number: G03F7/70058 ,  C03C3/06 ,  C03C2201/21 ,  G03F7/70216 ,  G03F7/70958

Abstract: A photolithography apparatus has an exposure light source for emitting exposure light with a wavelength of 400 nm or less, a reticle with a pattern original image formed therein, an illumination optical system for illuminating the reticle with exposure light, a projection optical system for projecting the pattern image from the reticle onto a photosensitive plate and an alignment system for aligning the reticle and the photosensitive plate. At least some of the synthetic silica glass members composing the illumination optical system, the projection optical system and the reticle consist of synthetic silica glass members which, upon 1×104 pulse irradiation with an ArF excimer laser at an energy density from 0.1 &mgr;J/cm2·p to 200 mJ/cm2·p, have a loss factor no greater than 0.0050 cm−1 at 193.4 nm measured after irradiation, a hydrogen molecule concentration from 1×1016 molecules/cm3 to 2×1018 molecules/cm3 and a loss factor no greater than 0.0020 cm−1 before ultraviolet irradiation.

Abstract translation: 一种光刻设备具有用于发射波长为400nm以下的曝光光的曝光光源，形成有图案原始图像的标线片，用曝光灯照亮该掩模版的照明光学系统，投影光学系统 从掩模版到感光板的图案图像和用于对准掩模版和感光板的对准系统。 构成照明光学系统的合成二氧化硅玻璃构件中的至少一部分，投影光学系统和掩模版由合成石英玻璃构件组成，在用能量密度为0.1μJ/ cm 2的ArF准分子激光器进行1×10 4脉冲照射时， cm 2 p至200mJ / cm 2，在照射后测量的193.4nm处的损耗因子不大于0.0050cm -1，氢分子浓度为1×10 16分子/ cm 2， 3> 2×10 18分子/ cm 3，并且在紫外线照射之前的损失因子不大于0.0020cm -1。

公开(公告)号：US06622527B2

公开(公告)日：2003-09-23

申请号：US10154511

申请日：2002-05-23

Applicant: Gerhard Schötz ,  Jan Vydra

Inventor： Gerhard Schötz ,  Jan Vydra

IPC: C03B37018

CPC classification number: C03C13/045 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C25/002 ,  C03C25/607 ,  C03C2201/21 ,  C03C2201/23

Abstract: A core glass for making a preform for an optical fiber particularly useful for the transmission of ultraviolet radiation and methods for making the core glass are disclosed. The core glass is obtained by the flame hydrolysis of a silicon compound, deposition of finely granular SiO2 on a substrate with direct vitrification and formation of a synthetic quartz glass. The quartz glass has a hydrogen content of less than 1×1018 molecules/cm3.

Abstract translation: 公开了一种用于制造用于传输紫外线辐射的特别有用的光纤预制棒的芯玻璃和用于制造芯玻璃的方法。 核心玻璃通过硅化合物的火焰水解获得，通过直接玻璃化沉积细颗粒SiO 2并形成合成石英玻璃。 石英玻璃的氢含量小于1×10 18分子/ cm 3。

公开(公告)号：US20030148194A1

公开(公告)日：2003-08-07

申请号：US10342717

申请日：2003-01-13

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: G03F009/00 ,  G03C005/00 ,  C03B005/26 ,  C03B007/00 ,  B32B009/00 ,  B32B017/06

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US20030115905A1

公开(公告)日：2003-06-26

申请号：US10310349

申请日：2002-12-05

Inventor： Bodo Kuhn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Stephan Thomas ,  Steffen Kaiser ,  Jan Vydra

IPC: C03B019/00

CPC classification number: C03C4/0071 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1null1016 molecules/cm3 to 4.0null1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5null1016 molecules/cm3, a refractive index inhomogeneity, nulln, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, CH2min, CH2max, and COH, respectively, with P being the pulse number and null being the energy density (in mJ/cm2): CH2minnullmolecules/cm3nullnull1null106 null2Pnullnull(2), CH2maxnullmolecules/cm3nullnull2null1018 nullnullnull(3), COHnullwt-ppmnullnull1,700nullnullnullmJ/cm2null0.4null50nullnull(4). The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

Abstract translation: 本发明涉及用于传输波长为250nm或更短波长的紫外线辐射的光学部件的石英玻璃坯料，以及微波平版印刷中使用石英玻璃毛坯与波长为250nm的紫外线辐射或 较短 此外，本发明涉及石英玻璃坯料的制造工序。 所述类型的石英玻璃坯料应显示出很少的诱导吸收，并且在压实和分解时优化。 根据本发明的石英玻璃坯料的特征在于以下性质：基本上不含氧缺陷部位的玻璃结构，H 2含量在0.1×10 16分/ cm 3至4.0×10 16分子/ cm 3范围内，OH-含量 125重量ppm至450重量ppm的范围，小于5×10 16分/厘米3的SiH基含量，小于2ppm的折射率不均匀性，DELTAn，应力双折射小于2nm / cm 。 在根据本发明的使用中，石英玻璃空白分别符合其最小和最大氢含量和OH-含量，CH 2 min，CH 2 max和COH的尺寸规则（2），（3）和（4） ，其中P是脉冲数，εi是能量密度（mJ / cm 2）：CH 2min [分子/ cm 3] = 1×10 6 epsi 2 P（2），CH 2 max [分子/ cm 3] =2x1018εi（3） ppm] = 1,700xepsi [mJ / cm 2] 0.4±50（4）。 根据本发明的方法的特征在于，通过在均化处理过程中混合两个石英玻璃从第一和第二石英玻璃产生混合石英玻璃。

公开(公告)号：US06541168B2

公开(公告)日：2003-04-01

申请号：US09841517

申请日：2001-04-24

Applicant: John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

IPC: G03F900

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US20030051507A1

公开(公告)日：2003-03-20

申请号：US10283055

申请日：2002-10-30

Applicant: Asahi Glass Company, Limited

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03C015/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for producing a synthetic silica glass optical component which contains at least 1null1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1null1017 molecules/cm3 at a temperature of from 300 to 600null C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.

Abstract translation: 通过处理氢分子含量小于1×10 17的合成石英玻璃，制造合成石英玻璃光学组件的方法，该方法含有至少1×10 17分子/ cm 3且具有至多200ppm的OH浓度且基本上没有还原型缺陷 分子/ cm3，温度为300-600℃，在氢气气氛中，压力为2-30atm。

公开(公告)号：US20030029203A1

公开(公告)日：2003-02-13

申请号：US10186123

申请日：2002-06-28

Inventor： Nicholas F. Borrelli ,  George B. Hares ,  Charlene M. Smith

IPC: C03C023/00 ,  C03C003/091 ,  C03C004/04

CPC classification number: C03B19/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/31 ,  C03C3/064 ,  C03C3/091 ,  C03C4/0085 ,  C03C4/04 ,  C03C4/085 ,  C03C17/3411 ,  C03C23/00 ,  C03C23/002 ,  C03C2201/21 ,  C03C2203/54 ,  G02B6/02114 ,  G02B6/12007 ,  G02B6/124 ,  G02B6/125 ,  G02B2006/12147

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate and germanosilicate bulk glasses to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract translation: 本发明一般涉及UV（紫外线）感光体玻璃，特别涉及间歇可熔碱性硼硅酸铝硅酸盐和锗硅酸盐玻璃。 本发明的感光体玻璃显示出低于300nm的UV波长的光敏性。 碱性硼铝硅酸盐和锗硅酸盐体玻璃对低于300nm的紫外波长的光敏性提供了在玻璃中制备折射率图案。 在300nm以下的辐射源下，这种激光器在玻璃中形成折射率图案。 本发明的感光光学折射率图案形成块状玻璃允许在玻璃中形成图案并利用这种图案化玻璃的装置。

公开(公告)号：US20030027705A1

公开(公告)日：2003-02-06

申请号：US10076034

申请日：2002-02-13

Inventor： Hiroyuki Nishimura ,  Toru Yokota ,  Akira Fujinoki

IPC: C03C003/06

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

Abstract: In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity. The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers, which, in a method for producing a synthetic quartz glass member for excimer laser optics comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600null C. or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.

Abstract translation: 鉴于现有技术的缺点，本发明的一个目的是提供一种制造用于准分子激光器的合成石英玻璃构件的方法，该方法包括在抑制削弱激光电阻的还原性缺陷的产生的同时， 将足够量的能够实现激光辐射的高分子氢分子掺入到石英玻璃中，同时均匀地掺入氢分子以实现归因于氢分子密度分布的折射率的平坦分布。 本发明的另一个目的是提供一种通过上述制造方法获得的用于准分子激光器的合成石英玻璃构件，其产生高的抗激光辐射和均匀性。 上述问题已经通过用于制造用于准分子激光器的合成石英玻璃构件的方法得到克服，该方法在用于准分子激光光学器件的合成石英玻璃构件的制造方法中包括通过以下步骤将氢分子掺入合成石英玻璃体中： 在1atm以上但低于150atm的压力范围的气氛中在600℃以下的温度下对合成石英玻璃体进行热处理，并含有氢，所述方法包括改变含氢气体的压力 在热处理的至少一部分中连续地或逐步地。

公开(公告)号：US06473227B1

公开(公告)日：2002-10-29

申请号：US09721863

申请日：2000-11-24

Applicant: Shigeru Yamagata

Inventor： Shigeru Yamagata

IPC: G02B520

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: A silica glass optical material for projection lens to be used in vacuum ultraviolet radiation lithography using radiation from 155 to 195 nm in wavelength, wherein, said silica glass optical material is of ultrahigh purity, contains from 1 to 10 wtppm of OH groups, from 100 to 10,000 wtppm of F, and from 1×1017 to 1×1019 molecules/cm3 of H2, and has a distribution in concentration of F that is axially symmetrical to the central axis.

Abstract translation: 一种用于投影透镜的石英玻璃光学材料，用于使用波长为155至195nm的辐射的真空紫外线辐射光刻，其中所述石英玻璃光学材料具有超高纯度，含有1-10重量ppm的OH基，100 至10,000重量ppm的F和1×10 17至1×10 19分子/ cm 3的H 2，并且具有与中心轴轴对称的F的浓度分布。

公开(公告)号：US20020151425A1

公开(公告)日：2002-10-17

申请号：US10048309

申请日：2002-01-29

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

IPC: C03C003/06 ,  C03C003/112

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5null1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2null10null5 or lower.

Abstract translation: 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性 对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。 上述问题通过具有OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×1016分/ cm 3以下的F2准分子激光的合成石英玻璃光学材料来解决，a 最大和最小氟浓度在20 mol ppm内的差异，以及最大和最小折射率之间的差异为2×10-5或更低。