公开(公告)号：US20110068675A1

公开(公告)日：2011-03-24

申请号：US12957576

申请日：2010-12-01

Applicant: Artush A. Abgaryan ,  Eli Levi

Inventor： Artush A. Abgaryan ,  Eli Levi

IPC: H01J29/46

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. The system parameters may be calculated and created due to the CGMR conceptual method.

Abstract translation: 将静电区域中的电子束聚焦到具有均匀分布的电流密度和非常缩小的电子层流的系统包括具有与第一内部部分电绝缘的第一内部部分和第二内部部分的壳体。 第二内部部分具有无电场的空间。 电极系统设置在第一内部部分中并且包括阴极组件和至少一个阳极组件。 阴极组件产生通过每个阳极组件然后进入第二内部部分中的无电场空间的电子束。 由于CGMR概念方法，系统参数可能会被计算和创建。

公开(公告)号：US06996896B2

公开(公告)日：2006-02-14

申请号：US10817779

申请日：2004-04-02

Applicant: Sang Kuk Choi ,  Dae Yong Kim

Inventor： Sang Kuk Choi ,  Dae Yong Kim

IPC: H01R43/00

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

Abstract translation: 本发明提供一种用于微柱电子束装置的电子束透镜及其制造方法。 使用感光性玻璃基板作为基底隔离基板，通过电镀法生长金属薄膜。 在种子金属层上形成形成为孔的抗蚀剂图案并镀覆薄金属膜之后，通过剥离法形成电子束通过的孔。

公开(公告)号：US5384461A

公开(公告)日：1995-01-24

申请号：US140195

申请日：1994-02-03

Applicant: Joseph P. R. Jullien ,  Jonathan H. Batey ,  Robert Mellor

Inventor： Joseph P. R. Jullien ,  Jonathan H. Batey ,  Robert Mellor

IPC: H01J9/14 ,  H01J3/18 ,  H01J49/42

CPC classification number: H01J49/4215 ,  H01J3/18 ,  H01J49/068 ,  H01J49/4255

Abstract: The method includes the steps of assembling one or more blanks (1) in supporting means (2, 3) so that the or each blank occupies at least the space to be occupied by elongate electrodes and, without disturbing the position of the blanks relative to said supporting means, removing material from all said blanks to generate said electrodes in position in said supporting means. Preferably the material is removed by an electrode-discharge machining (EDM) process, e.g. diesinking. The method avoids time-consuming alignment of preformed electrodes in said supporting means.

Abstract translation: PCT No.PCT / GB92 / 00835 Sec。 371日期：1994年2月3日 102（e）日期1994年2月3日PCT提交1992年5月8日PCT公布。 WO92 / 21141 PCT出版物 该方法包括以下步骤：将一个或多个坯件（1）组装在支撑装置（2,3）中，使得所述或每个坯件至少占据由细长电极占据的空间，并且不受干扰 坯件相对于所述支撑装置的位置，从所有所述坯料上去除材料，以在所述支撑装置中产生所述电极就位。 优选地，通过电极放电加工（EDM）工艺，例如， 沉没 该方法避免了所述支撑装置中预成型电极的耗时对准。

公开(公告)号：US4006376A

公开(公告)日：1977-02-01

申请号：US554099

申请日：1975-02-28

Applicant: Richard Dale Faulkner ,  Robert Edwin McHose

Inventor： Richard Dale Faulkner ,  Robert Edwin McHose

IPC: H01J3/18 ,  H01J40/04 ,  H01J43/18 ,  H01J39/04 ,  H01J39/00

CPC classification number: H01J3/18 ,  H01J40/04 ,  H01J43/18

Abstract: Photoelectrons emitted from a flat photocathode are collected within an evacuated envelope by a surface of an electrode. The photoelectrons are accelerated by an electron lens system, as an electron stream, within an evacuated cavity between the photocathode and the electrode surface. The photoelectrons are accelerated through two succeeding cavity regions in which the electron trajectories associated with the electron stream are increasingly compressed. A cavity region of lessening compression of the electron trajectories associated with the electron stream is defined between the two cavity regions of increasing compression. The electrode surface is located closely proximate to the cavity region of greatest compression to collect a maximum number of the photoelectrons.

Abstract translation: 从平面光电阴极发射的光电子通过电极的表面收集在真空的外壳内。 光电子通过作为电子流的电子透镜系统在光电阴极和电极表面之间的真空腔内加速。 光电子通过两个后续的腔区加速，其中与电子流相关联的电子轨迹越来越多地被压缩。 在增加压缩的两个空腔区域之间限定与电子流相关联的电子轨迹的减小压缩的空腔区域。 电极表面紧邻最大压缩的空腔区域，以收集最大数量的光电子。