Anti-reflection coatings and associated methods

    公开(公告)号:US20030064255A1

    公开(公告)日:2003-04-03

    申请号:US09945262

    申请日:2001-08-31

    CPC classification number: G02B1/116 G02B1/115 G02B1/16

    Abstract: An optical coating and a method of coating a substrate are provided. A first layer is deposited adjacent to a substrate. The first layer has an optical thickness of about 0.27 null0 to about 0.31 null0, where null0 is a reference wavelength corresponding to a spectral region bound by or in the visible spectrum. A second layer having an optical thickness of about 0.1 null0 to about 0.125 null0 and a refractive index from about 2.2 to about 2.6 is deposited. A third layer having a refractive index from about 1.46 to about 1.52 is deposited. The optical coating provides broadband anti-reflection performance, and the thin second layer facilitates high throughput production of the optical coating.

    Method for reducing carbon contamination of multilayer mirrors
    63.
    发明申请
    Method for reducing carbon contamination of multilayer mirrors 审中-公开
    减少多层反射镜碳污染的方法

    公开(公告)号:US20030064161A1

    公开(公告)日:2003-04-03

    申请号:US10198307

    申请日:2002-07-17

    CPC classification number: G02B27/0006 G03F7/70916 G03F7/70958

    Abstract: A method for reducing carbon contamination of surfaces and particularly the surfaces of multilayer mirrors used for extreme ultraviolet (EUV) lithography by manipulating the surface electric phase field to reduce photoemission. Manipulation of the surface electric phase field can be by depositing a film, such as Si, or other low absorber of EUV radiation, to form a capping layer whose thickness is such that the near-surface electric field is a minimum. For extreme ultraviolet applications, where a multilayer Mo/Si mirror is used as a reflective optic, a capping layer of Si in the range of about 2-4 nm, and preferably 3 nm, is used.

    Abstract translation: 通过操纵表面电相场以减少光电发射,减少用于极紫外(EUV)光刻的表面特别是多层反射镜的表面碳污染的方法。 表面电相场的操作可以是通过沉积诸如Si的膜或其它EUV辐射的低吸收剂来形成其厚度使得近表面电场最小的覆盖层。 对于使用多层Mo / Si镜作为反射光学器件的极紫外应用,使用约2-4nm,优选3nm范围内的Si覆盖层。

    Lower layer resist composition for silicon-containing two-layer resist
    66.
    发明申请
    Lower layer resist composition for silicon-containing two-layer resist 有权
    含硅双层抗蚀剂的下层抗蚀剂组合物

    公开(公告)号:US20030059552A1

    公开(公告)日:2003-03-27

    申请号:US10118896

    申请日:2002-04-10

    Abstract: To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity. A lower layer resist composition for a silicon-containing two-layer resist, comprising (a) a phenol-based polymer, (b) a compound capable of generating a sulfonic acid at a temperature of 100null C. or more, (c) a phenol-based acid crosslinking agent having two or more benzene rings and capable of crosslinking with the polymer under the action of an acid, and (d) a solvent.

    Abstract translation: 为了提供耐干蚀刻性和膜厚均匀性优异的含硅双层抗蚀剂的下层抗蚀剂组合物。 一种含硅双层抗蚀剂的下层抗蚀剂组合物,其包含(a)苯酚系聚合物,(b)在100℃以上的温度下能够产生磺酸的化合物,(c) 具有两个或更多个苯环并且能够在酸的作用下与聚合物交联的酚基酸交联剂,和(d)溶剂。

    Coated paper
    67.
    发明申请
    Coated paper 审中-公开
    铜版纸

    公开(公告)号:US20030059546A1

    公开(公告)日:2003-03-27

    申请号:US10265854

    申请日:2002-10-07

    Inventor: Dean Johnson

    CPC classification number: G03C1/775 D21H19/42 D21H19/82 D21H21/54

    Abstract: A method of making a paper suitable for photographic printing applications.

    Abstract translation: 制造适合于照相印刷应用的纸张的方法

    Process for coating
    68.
    发明申请
    Process for coating 失效
    涂层工艺

    公开(公告)号:US20030054118A1

    公开(公告)日:2003-03-20

    申请号:US09919576

    申请日:2001-07-31

    CPC classification number: C08K5/357 C09D7/48

    Abstract: A process for the preparation of a coating layer comprising the steps: (a) applying a coating layer to a substrate from a coating agent of which the resin solids comprise a binder system curable by free-radical polymerization of olefinic double bonds, and containing 0.1 to 4 wt-%, based on resin solids, of a morpholin-2-one derivative sterically hindered by 3,3,5,5-polysubstitution as a light stabilizer; and (b) thermal curing of the applied coating layer.

    Abstract translation: 一种用于制备涂层的方法,包括以下步骤:(a)将涂层涂覆到基材上,所述涂层剂的树脂固体包含可通过烯属双键的自由基聚合固化的粘合剂体系,并含有0.1 至4重量%,基于树脂固体,由作为光稳定剂的3,3,5,5-多取代基空间阻碍的吗啉-2-酮衍生物; 和(b)施加的涂层的热固化。

    Article protected by a thermal barrier coating system and its fabrication
    70.
    发明申请
    Article protected by a thermal barrier coating system and its fabrication 失效
    文章由热障涂层系统及其制造保护

    公开(公告)号:US20030044624A1

    公开(公告)日:2003-03-06

    申请号:US09944909

    申请日:2001-08-31

    Abstract: An article protected by a thermal barrier coating system is fabricated by providing an article substrate having a substrate surface, thereafter depositing a bond coat on the substrate surface, the bond coat having a bond coat surface, and thereafter processing the bond coat to flatten the bond coat surface. A thermal barrier coating is deposited overlying the bond coat surface. The thermal barrier coating is yttria-stabilized zirconia having a yttria content of from about 3 percent by weight to about 5 percent by weight of the yttria-stabilized zirconia.

    Abstract translation: 通过提供具有基材表面的制品基材,然后在基材表面上沉积粘合涂层,粘合涂层具有粘合涂层表面,然后加工粘合涂层使粘合剂平坦化,制造由热障涂层系统保护的物品 外套表面。 覆盖在粘结涂层表面上的热障涂层被沉积。 热障涂层是氧化钇稳定的氧化锆,其氧化钇含量为氧化钇稳定的氧化锆的约3重量%至约5重量%。

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