UV curing method and apparatus
    1.
    发明申请
    UV curing method and apparatus 失效
    UV固化方法和设备

    公开(公告)号:US20040166249A1

    公开(公告)日:2004-08-26

    申请号:US10753947

    申请日:2004-01-07

    发明人: Stephen B. Siegel

    摘要: A UV curing apparatus and method is provided for enhancing UV curing of inks, coatings and adhesives having UV photo initiators therein by subjecting the UV curable inks, coatings or adhesives to UV light at different wavelengths. Preferably, the UV LED assemblies are alternated in rows and emit light at a wavelength between 180 nm and 420 nm. A row of UV-LED assemblies which emit light in the visible spectrum can be included so a user can visually see if the apparatus is working. A cooling system can be provided for maintaining the UV-LED assemblies at a desired temperature to maintain light intensity and the UV LED assemblies are placed at a distance from the UV curable product which will provide a uniform pattern of light diverging from the UV-LED chips of at least 50% the power output of the UV-LED chips at a viewing cone angle of 2null1/2. Still further the apparatus can be combined with an ink, coating or adhesive having photo initiators that are activated by light at more than one wavelength.

    摘要翻译: 提供了UV固化装置和方法,用于通过使UV固化油墨,涂层或粘合剂经受不同波长的UV光,来增强其UV光引发剂的油墨,涂料和粘合剂的UV固化。 优选地,UV LED组件以行为交替并发射在180nm和420nm之间的波长的光。 可以包括发射可见光谱中的光的一排UV-LED组件,因此用户可以在目视上看到装置是否工作。 可以提供冷却系统,用于将UV-LED组件保持在期望的温度以保持光强度,并且将UV LED组件放置在与UV可固化产品相距一定距离处,这将提供从UV-LED发散的均匀图案 UV-LED芯片的功率输出的至少50%的芯片的观察锥角为2theta1 / 2。 此外,该装置可以与具有由多于一个波长的光激活的光引发剂的油墨,涂层或粘合剂组合。

    Process for the application of powder coatings
    2.
    发明申请
    Process for the application of powder coatings 审中-公开
    粉末涂料的应用方法

    公开(公告)号:US20040156985A1

    公开(公告)日:2004-08-12

    申请号:US10719725

    申请日:2003-11-21

    IPC分类号: B05D001/12 B05D003/06

    摘要: A process for application of powder coatings to conductive and nonconductive surfaces comprising a) covering the surface with material which absorb high-energy radiation within a wavelength in the range of 250 to 2,500 nm and having heating rates of more than 50null C. per second and b) applying a powder coating composition to the covered surface and melting and curing the applied powder coating composition with NIR radiation.

    摘要翻译: 一种在导电和非导电表面上施加粉末涂料的方法,包括:a)用在250-2,500nm波长范围内吸收高能量辐射的材料覆盖表面,并且每秒加热速率大于50℃ 和b)将粉末涂料组合物施加到覆盖的表面上,并用NIR辐射熔化和固化涂覆的粉末涂料组合物。

    Preparation of flexographic printing plates using ink jet recording
    3.
    发明申请
    Preparation of flexographic printing plates using ink jet recording 有权
    使用喷墨记录制备柔版印刷版

    公开(公告)号:US20040131778A1

    公开(公告)日:2004-07-08

    申请号:US10732072

    申请日:2003-12-10

    CPC分类号: B41C1/003

    摘要: Upon a substrate subsequent layers of elastic ink are jetted using an ink jet printing system. Each layer is immobilised by a immobilisation step before jetting the following layer. A printing relief is gradually formed to obtain a flexographic printing plate allowing accurate control over the relief and slopes of the printing plates. Use can be made of different inks or immobilisation step to obtain different layer characteristics. Inks can be immobilised using UV curing. The recorded relief of the layers can be measured and corrections can be applied using a feed-back loop. A rejuvenation process for printing plates can be constructed using the described method. An elastic base layer can be provided on the substrate to provide better plate characteristics.

    摘要翻译: 在使用喷墨打印系统喷射随后的弹性墨水层的基板上。 每个层通过固定步骤固定,然后喷射下一层。 逐渐形成印刷浮雕以获得柔性版印版,从而可以精确地控制印版的浮雕和斜面。 可以使用不同的油墨或固定步骤来获得不同的层特征。 油墨可以使用UV固化固定。 可以测量层的记录浮雕,并且可以使用反馈回路来进行校正。 可以使用所描述的方法构建印版的复原过程。 可以在基板上设置弹性基层以提供更好的板特性。

    Apparatus and method for inspecting crystal quality of a polysilicon film
    4.
    发明申请
    Apparatus and method for inspecting crystal quality of a polysilicon film 审中-公开
    用于检查多晶硅膜的晶体质量的装置和方法

    公开(公告)号:US20040115337A1

    公开(公告)日:2004-06-17

    申请号:US10607607

    申请日:2003-06-27

    IPC分类号: B05D003/06 G01J005/00

    摘要: A method for inspecting crystal quality of a polysilicon film. First, a substrate covered by a polysilicon layer is provided. Next, a probe light beam having a predetermined wavelength is irradiated through a beam splitter to separate into a first light beam and a second light beam, which is used for irradiating the polysilicon layer. Thereafter, the light intensity of the first light beam and the light intensity of the second light beam reflected from the polysilicon layer are detected to achieve a light intensity ratio. Finally, crystal quality of the polysilicon layer is monitored by the light intensity ratio. An apparatus for inspecting crystal quality of a polysilicon film and the method for controlling the same are also disclosed.

    摘要翻译: 一种用于检查多晶硅膜的晶体质量的方法。 首先,提供被多晶硅层覆盖的基板。 接下来,通过分束器照射具有预定波长的探测光束,以分离成用于照射多晶硅层的第一光束和第二光束。 此后,检测第一光束的光强度和从多晶硅层反射的第二光束的光强度以实现光强度比。 最后,通过光强比监测多晶硅层的晶体质量。 还公开了一种用于检查多晶硅膜的晶体质量的装置及其控制方法。

    Remote identification of explosives and other harmful materials
    5.
    发明申请
    Remote identification of explosives and other harmful materials 失效
    远程识别爆炸物和其他有害物质

    公开(公告)号:US20040091635A1

    公开(公告)日:2004-05-13

    申请号:US10633335

    申请日:2003-08-01

    发明人: Zvi Yaniv

    IPC分类号: B05D003/06

    摘要: The present invention is for a process of sensing chemicals with nanoparticles, particularly nanoparticles whose bandgap has been altered from that of their corresponding bulk material by reducing their particle size below their quantum confinement threshold. The photoluminescent properties of these nanoparticles can be altered as a result of interaction with their chemical environment. Thus, by carefully understanding how a particular chemical species alters the chemical environment and changes the photoluminescence of the nanoparticles, the identification ofnulland the screening fornulla wide range of chemical species can be accomplished. Furthermore, in embodiments in which the chemical species of interest is a harmful material, detection and screening of said harmful material can be carried out in a pre-emptive manner.

    摘要翻译: 本发明涉及一种用纳米颗粒感测化学品的方法,特别是纳米颗粒的带隙已经通过将它们的粒度降低到其量子限制阈值以下而与其相应的本体材料的带隙相比较。 这些纳米颗粒的光致发光性能可能因与其化学环境的相互作用而改变。 因此,通过仔细了解特定化学物质如何改变化学环境并改变纳米颗粒的光致发光,可以实现对多种化学物质的鉴定和筛选。 此外,在感兴趣的化学物质是有害物质的实施方案中,可以以优先的方式进行所述有害物质的检测和筛选。

    Low temperature UV pretreating of porous low-k materials
    6.
    发明申请
    Low temperature UV pretreating of porous low-k materials 审中-公开
    多孔低k材料的低温紫外线预处理

    公开(公告)号:US20040058090A1

    公开(公告)日:2004-03-25

    申请号:US10623712

    申请日:2003-07-21

    IPC分类号: B05D003/06

    摘要: A method of forming a coating on a substrate. A coating is formed on a substrate by depositing a solution comprising a resin molecule containing at least 2 SinullH groups, at least 2 SinullCH3 groups, or a combination thereof, and, a solvent in a manner in which at least about 5 volume % of the solvent remains in the coating after deposition, followed by exposing the coating to UV radiation at a power and wavelength spectrum sufficient to cause hydrolysis of the SinullH groups, SinullCH3 groups, or combination thereof, and at least partial condensation, and evaporating the solvent from the coating to form a porous network coating. The method enables production of low-k materials without treatment with ammonia.

    摘要翻译: 在基材上形成涂层的方法。 通过沉积包含含有至少2个Si-H基团,至少2个Si-CH 3基团或其组合的树脂分子的溶液,以及至少约5个 沉积后溶剂的体积%保留在涂层中,然后以足以引起Si-H基团,Si-CH 3基团或其组合的水解的功率和波长谱将该涂层暴露于UV辐射,并且至少部分 冷凝,并从涂层蒸发溶剂以形成多孔网状涂层。 该方法能够在不用氨处理的情况下生产低k材料。

    Method and process for powder coating molding
    9.
    发明申请
    Method and process for powder coating molding 审中-公开
    粉末涂料成型的方法和工艺

    公开(公告)号:US20030211251A1

    公开(公告)日:2003-11-13

    申请号:US10144492

    申请日:2002-05-13

    发明人: Evan R. Daniels

    摘要: A method for applying a powder coating to molding has the steps of providing molding to a coating chamber. Powder is then distributed to the coating chamber. The molding is electrostatically charged to attract the powder. The powder is cured to adhere the molding.

    摘要翻译: 将粉末涂料施加到成型的方法具有向涂布室提供成型的步骤。 然后将粉末分配到涂布室。 模制件被静电充电以吸引粉末。 将粉末固化以粘附成型品。

    Environment exchange control for material on a wafer surface

    公开(公告)号:US20030190427A1

    公开(公告)日:2003-10-09

    申请号:US09798345

    申请日:2001-03-01

    摘要: Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).