公开(公告)号：US4232134A

公开(公告)日：1980-11-04

申请号：US91823

申请日：1979-11-06

申请人： Manfred Schmidt ,  Eberhard Bandtel ,  Walter Traudisch ,  Georg Spott ,  Dieter Freitag

发明人： Manfred Schmidt ,  Eberhard Bandtel ,  Walter Traudisch ,  Georg Spott ,  Dieter Freitag

IPC分类号： C08G8/00 ,  B01D1/02 ,  B01D3/34 ,  C08G8/28 ,  C08G16/02 ,  C08G79/08 ,  C08L61/10 ,  C08G8/10 ,  C08G8/20

CPC分类号： C08G16/0218 ,  B01D1/02 ,  B01D3/34 ,  C08G79/08 ,  C08G8/28

摘要： Boron containing phenol/formaldehyde resins can be isolated from their reaction media by evaporating said resins in a spiral flow evaporator which has a ratio between throughput and tube cross section from 0.1 to 1.5 and a ratio between throughput and evaporation surface from 100 to 400.

摘要翻译： 含有酚/甲醛树脂的硼可以通过在螺旋流量蒸发器中蒸发所述树脂从反应介质中分离出来，该蒸发器的生产量和管横截面之间的比例为0.1至1.5，生产量和蒸发表面之间的比例为100至400。

公开(公告)号：US4209429A

公开(公告)日：1980-06-24

申请号：US937115

申请日：1978-08-28

申请人： Susumu Konii ,  Yukio Yoshimura ,  Ken Nanaumi ,  Kohei Yasuzawa ,  Takeshi Yoshida ,  Toyotaro Shinko

发明人： Susumu Konii ,  Yukio Yoshimura ,  Ken Nanaumi ,  Kohei Yasuzawa ,  Takeshi Yoshida ,  Toyotaro Shinko

IPC分类号： C08G8/28 ,  C08L61/14 ,  D21H17/48 ,  H05K1/03 ,  C08G8/10 ,  C08G8/20 ,  C08G8/32

CPC分类号： D21H17/48 ,  C08G8/28 ,  C08L61/14 ,  H05K1/0326

摘要： Internally plasticized phenolic resins suitable for use in preparing laminates and the like excellent in electrical properties, heat resistance, solvent resistance as well as punchability are produced by reacting a phenol-formaldehyde resin containing less than 4% by weight of unreacted free monohydric phenol or phenols with an epoxidized vegetable oil, and if required with formaldehyde, with heating preferably in the presence of one or more secondary and/or tertiary amines.

摘要翻译： 通过使含有少于4重量％的未反应的游离的一元酚或酚的酚醛树脂反应来制备适用于制备层压体等的电性能，耐热性，耐溶剂性和冲孔性优异的层压板的内部增塑酚醛树脂 用环氧化植物油，如果需要，使用甲醛，优选在一种或多种仲胺和/或叔胺的存在下进行加热。

公开(公告)号：US4195151A

公开(公告)日：1980-03-25

申请号：US911523

申请日：1978-06-01

申请人： Raymond A. Dunleavy ,  Anthony J. Papa

发明人： Raymond A. Dunleavy ,  Anthony J. Papa

IPC分类号： C08G18/54 ,  C08G18/65 ,  C08G8/20 ,  C08G8/28 ,  C08G14/06 ,  C08G14/12

CPC分类号： C08G18/544 ,  C08G18/6505

摘要： This invention relates to novel curative compositions for use in the production of cellular polyurethane elastomers having outstanding energy-absorbing properties. The curative compositions are composed of mixtures of organic diols and the reaction product of phenols which have at least one unsubstituted reactive position on the aromatic nucleus, aldehydes, and aromatic amines.

摘要翻译： 本发明涉及用于生产具有突出的能量吸收特性的多孔聚氨酯弹性体的新型固化剂组合物。 固化剂组合物由有机二醇和在芳族核，醛和芳族胺上具有至少一个未取代的反应性位置的酚的反应产物的混合物组成。

公开(公告)号：US4110540A

公开(公告)日：1978-08-29

申请号：US708942

申请日：1976-07-27

申请人： Dieter Freitag ,  Erhard Tresper ,  Rolf Kuchenmeister ,  Wolfgang Beer

发明人： Dieter Freitag ,  Erhard Tresper ,  Rolf Kuchenmeister ,  Wolfgang Beer

IPC分类号： C07C27/00 ,  C07C37/14 ,  C07C39/15 ,  C07C67/00 ,  C08G8/00 ,  C08G8/04 ,  C08G8/12 ,  C08G8/20 ,  C07C37/00 ,  C07C39/12 ,  C07C39/16

CPC分类号： C07C39/15 ,  C07C37/14 ,  C08G8/04 ,  C08G8/12

摘要： A process for the preparation of multinuclear phenols alkylated in the nucleus, wherein bisphenol A is reacted with a phenyl alkenyl compound in the presence of a catalytic quantity of aluminium phenolate and resols obtained from said alkylated phenols.

摘要翻译： 一种制备在核中烷基化的多核苯酚的方法，其中双酚A与苯基烯基化合物在催化量的苯酚铝和由所述烷基化酚获得的甲阶酚的存在下反应。

公开(公告)号：US20240166861A1

公开(公告)日：2024-05-23

申请号：US18551032

申请日：2022-03-25

申请人： SUMITOMO BAKELITE CO., LTD.

发明人： Taketoshi Murai

IPC分类号： C08L61/14 ,  C08G8/20 ,  C08K3/04 ,  C08K3/105 ,  C08K3/11 ,  C08K5/3477 ,  C08K11/00 ,  F16D69/02

CPC分类号： C08L61/14 ,  C08G8/20 ,  C08K3/042 ,  C08K3/105 ,  C08K3/11 ,  C08K5/3477 ,  C08K11/00 ,  F16D69/025 ,  C08L2205/03

摘要： A heat-curable resin composition for a friction material includes a lignin-modified novolac-type phenol resin having a weight average molecular weight of equal to or more than 6,000, and a curing agent.

公开(公告)号：US20220195272A1

公开(公告)日：2022-06-23

申请号：US17693140

申请日：2022-03-11

申请人： UPM-KYMMENE CORPORATION

发明人： Suvi PIETARINEN ,  Okko RINGENA ,  Kati OINONEN ,  Sanna VALKONEN

IPC分类号： C09J197/00 ,  C07G1/00 ,  C08G8/24 ,  C08H7/00 ,  C08G8/20 ,  C09J161/12 ,  C08L97/00 ,  C08L97/02

摘要： The present invention relates to a method for increasing the reactivity of lignin, wherein the method comprises the following steps: a) forming, under heating at a temperature of 30-70° C., an aqueous dispersion comprising alkali and lignin, wherein the alkali comprises a hydroxide of an alkali metal; and b) heating the dispersion formed in step a) at a temperature of 50-95° C. for producing alkalated lignin.

公开(公告)号：US11267937B2

公开(公告)日：2022-03-08

申请号：US16225275

申请日：2018-12-19

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Daisuke Kori ,  Seiichiro Tachibana ,  Tsutomu Ogihara ,  Satoru Kitano ,  Yukio Abe ,  Fumihiro Hatakeyama ,  Taiki Kobayashi

IPC分类号： C08G65/34 ,  B01D15/08 ,  B01J20/08 ,  C07C37/82 ,  C08G8/04 ,  C08G8/20 ,  G03F7/09 ,  C07C39/14 ,  C08G10/04 ,  C08L61/06

摘要： The invention provides: a dihydroxynaphthalene condensate which suppresses soft particle generation and is suitably usable for a composition excellent in filterability; and a method for producing the dihydroxynaphthalene condensate. In the method for producing a dihydroxynaphthalene condensate, dihydroxynaphthalene to be used has a sulfur element content of 100 ppm or less in terms of mass among constituent elements. The dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate.

公开(公告)号：US11254778B2

公开(公告)日：2022-02-22

申请号：US16080837

申请日：2017-03-23

申请人： DIC Corporation

发明人： Tomoyuki Imada ,  Yusuke Sato

IPC分类号： G03F7/039 ,  C08G8/20 ,  G03F7/023 ,  G03F7/20

摘要： The invention provides a novolak resin having excellent properties such as heat resistance, alkali developability, photosensitivity and resolution, a photosensitive composition including the novolak resin, a curable composition including the novolak resin, a cured product thereof, and a resist material which uses the photosensitive composition or the curable composition. The novolak resin is one obtained from a compound (A) having a tris(hydroxyaryl)methine group and an aldehyde compound (B) as essential reaction ingredients. The photosensitive composition includes the novolak resin. The curable composition includes the novolak resin, and the cured product is one obtained from such a composition. The resist material uses the photosensitive composition or the curable composition.

公开(公告)号：US11042090B2

公开(公告)日：2021-06-22

申请号：US16044015

申请日：2018-07-24

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Seiichiro Tachibana ,  Hiroko Nagai ,  Daisuke Kori ,  Tsutomu Ogihara

IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/16 ,  C08G16/02 ,  C09D161/00 ,  C08G8/22 ,  C08G8/20 ,  C08G8/04 ,  C09D161/12 ,  G03F7/075

摘要： The present invention provides a composition for forming an organic film, containing a polymer compound having one or more of repeating units shown by the general formulae (1) to (4) and an organic solvent containing one or more compounds selected from propylene glycol esters, ketones, and lactones, with a total concentration of more than 30 wt % with respect to the whole organic solvent. There can be provided a composition capable of forming an organic film that can be easily removed, together with a silicon residue modified by dry etching, in a wet manner with a removing liquid harmless to a semiconductor apparatus substrate and an organic resist underlayer film required in the patterning process, for example, an ammonia aqueous solution containing hydrogen peroxide called SC1, which is commonly used in the semiconductor manufacturing process.

公开(公告)号：US10894905B2

公开(公告)日：2021-01-19

申请号：US16323573

申请日：2017-08-23

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Ilya Gorodisher ,  Gregory P. Sorenson ,  Guy D. Joly

IPC分类号： C09K3/00 ,  C09K3/14 ,  B24D3/28 ,  C08G8/10 ,  C08G8/04 ,  C08G8/22 ,  C08G8/20 ,  C08G8/24

摘要： A catalyst for use with a phenolic resins which imparts accelerated curing at reduced temperatures. The catalyst is selected from elemental halogen or opium polyhalide compounds of the general formula: O+X(2n+1)−, where 1≤n≤4, Q is onium group, preferably selected from ammonium, sulfonium and phosphonium; and X is a halide. Each X may be the same or different and may include mixed halides such a X═Br2Cl or Cl2Br.