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公开(公告)号：US10541112B2
公开(公告)日：2020-01-21
申请号：US16176392
申请日：2018-10-31
IPC分类号： H01J37/28 , H01J37/147
摘要： A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.
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公开(公告)号：US10522327B2
公开(公告)日：2019-12-31
申请号：US16044770
申请日：2018-07-25
发明人： Gilad Erel , Michal Avinun-Kalish , Stefan Lanio
摘要： A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.
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公开(公告)号：US10460434B2
公开(公告)日：2019-10-29
申请号：US15683726
申请日：2017-08-22
发明人： Limor Martin , Elad Cohen , Eyal Neistein , Moshe Amzaleg
IPC分类号： G06T7/00 , G06T5/00 , H01L21/67 , G01N21/956 , H01L21/66
摘要： There are provided system and method of detecting defects on a specimen, the method comprising: capturing a first image from a first die and obtaining one or more second images; receiving: i) a first set of predefined first descriptors each representing a type of DOI, and ii) a second set of predefined second descriptors each representing a type of noise; generating at least one difference image based on difference between pixel values of the first image and pixel values derived from the second images; generating at least one third image, comprising: computing a value for each given pixel of at least part of the at least one difference image based on the first and second sets of predefined descriptors, and surrounding pixels centered around the given pixel; and determining presence of defect candidates based on the at least one third image and a predefined threshold.
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公开(公告)号：US10430938B2
公开(公告)日：2019-10-01
申请号：US15655796
申请日：2017-07-20
发明人： Amit Batikoff , Doron Portnoy
摘要： A method, system, and computer program product of detecting defects in an object using a processor operatively connected to a memory, the method comprising: accommodating in the memory an image group comprising a reference image and an image; generating a set of correction parameters to be applied to pixels of an image from the image group, wherein the parameters are determined to minimize a combination of a first factor indicative of variability of the set, and a second factor indicative of a difference between an image from the image group as enhanced by applying the set and another image in the image group, wherein the combination increases as any factor increases; applying the set to the image of the image group to obtain an enhanced image; generating an optimal difference image between the enhanced image and the other image; and using the optimal difference image for detecting defect candidates.
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75.发明授权公开(公告)号：US10395887B1
公开(公告)日：2019-08-27
申请号：US15900415
申请日：2018-02-20
发明人： Pieter Kruit , Ron Naftali
IPC分类号： H01J37/28 , H01J37/10 , H01J37/22 , H01J37/147
摘要： Apparatus and method for inspecting a surface of a sample. The apparatus includes a multi-beam charged particle column comprising a source for creating multiple primary beams directed towards the sample, an objective lens for focusing the primary beams on the sample, an electron-photon converter unit having an array of electron to photon converter sections, each section is located next to a primary beam within a distance equal to a pitch of the primary beams at the electro-photon converter unit, a photon transport unit for transporting light from the electron to photon converter sections to a photo detector, and an electron collection unit for guiding secondary electrons created in the sample, towards the electron-photon converter unit. The electron collection unit is arranged to project secondary electrons created in the sample by one of said primary beams to at least one of the electron to photon converter sections.
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公开(公告)号：US10386311B1
公开(公告)日：2019-08-20
申请号：US15803789
申请日：2017-11-05
发明人： Amir Shoham , Yoav Berlatzky , Haim Feldman
IPC分类号： G01B11/30 , G01N21/956
摘要： A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.
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77.发明申请公开(公告)号：US20190234887A1
公开(公告)日：2019-08-01
申请号：US16227453
申请日：2018-12-20
发明人： Idan KAIZERMAN , Mark GESHEL
摘要： Data indicative of alignment targets may be received. Each alignment target may be associated with a target location on an object. Locations of the object to be inspected may be identified. An alignment target from the alignment targets may be selected. Each of the locations may be within a determined distance from the selected alignment target. An indication may be provided to align the object relative to an examination tool for inspecting the locations within the determined distance from the selected alignment target.
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公开(公告)号：US10354376B2
公开(公告)日：2019-07-16
申请号：US15918570
申请日：2018-03-12
发明人： Yakov Weinberg , Ishai Schwarzband , Roman Kris , Itay Zauer , Ran Goldman , Olga Novak , Dhananjay Singh Rathore , Ofer Adan , Shimon Levi
IPC分类号： G06K9/00 , G06T7/00 , G06T7/194 , G06T7/10 , G06T7/30 , G06T7/11 , G06T7/12 , G06T7/143 , G06T7/33 , G06K9/52
摘要： A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.
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公开(公告)号：US10345359B2
公开(公告)日：2019-07-09
申请号：US15446745
申请日：2017-03-01
发明人： Tuvia Biber , Efim Kerner , Efraim Siman Tov
摘要： A system comprising: a first high voltage unit that is coupled via a high voltage supply cable to a second high voltage unit; a transformer that is configured to magnetically couple the high voltage supply cable to windings of a transformer; and a detection unit that is configured to monitor a windings signal developed in the windings of the transformer to detect a first high voltage unit arc formed within the first high voltage unit and to detect a second high voltage unit arc formed within the second high voltage unit.
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公开(公告)号：US10275872B2
公开(公告)日：2019-04-30
申请号：US15685995
申请日：2017-08-24
摘要： There are provided system and method of detecting repeating defects on a specimen, the specimen obtained by printing two or more mask fields thereon, each of mask field comprising multiple dies, the method comprising: scanning the specimen to capture a plurality of first images from first dies located at the same position in the mask fields, and, for each first image, capture two or more second images from dies located in different positions from the first dies; generating a plurality of third images corresponding to the plurality of first images; generating, an average third image constituted by pixels with values computed as accumulated pixel values of corresponding pixels in the plurality of third images divided by the number of the two or more mask fields; and determining presence of repeating defects on the specimen based on the average third image and a predefined defect threshold.
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