Abstract:
A method for forming a silicon film having a microcrystal structure is provided. The method includes following steps. A plasma-enhanced chemical vapor deposition system having a reaction chamber, a top electrode and a bottom electrode is provided. The top electrode and the bottom electrode are opposite and disposed in the reaction chamber. A substrate is disposed on the bottom electrode. A silane gas is applied into the reaction chamber. A silicon film having a microcrystal structure is formed by simultaneously irradiating the silane gas in the reaction chamber by a carbon dioxide laser and performing a plasma-enhanced chemical vapor deposition step.
Abstract:
The disclosed is a thermal interface layer disposed between a heat-generating apparatus and a thermal dissipation component. The thermal interface layer is composed of a mixture of a resin matrix and highly thermal conductive powders, wherein the resin matrix is obtained by reacting epoxy resin, diisocyanate, and amino curing agent. Tuning the ratio of the diisocyanate and the epoxy resin may modify the hardness and the viscosity of the thermal interface material. After repeated tested at high temperature for long period, the described thermal interface layer still remained viscose, soft, and thermally resistant. The filling effect of the thermal interface material in the voids between the electronic device and the sink is largely improved. The thermoplastic thermal interface material may fill the void or cavity on the surface of the electronic apparatus, thereby improving the heat spreading efficiency of the whole structure.
Abstract:
A calibration device for a nozzle suitable for calibrating a nozzle of a semiconductor apparatus is provided. The semiconductor apparatus includes a chuck with a center hole with radius R1. A cap with outer radius R3 is disposed outside the nozzle with outer radius R2. The calibration device includes a jig including an upper portion, a lower portion and a recess in the front surface of the upper portion. The recess includes an outer portion with depth D1 and radius R4 larger than R3 and an inner portion with depth D2 larger than D1 and radius R5 larger than R2. The lower portion with a radius R6 less than R1 is connected to the back surface of the upper portion for fixing the jig in the center hole. The values of (R4−R3), (R5−R2) and (R1−R6) are in the tolerable calibration inaccuracy range.
Abstract:
A press-key structure is disclosed, which comprises: a keycap; a scissors-type supporting part; a substrate; and an elastic part. In an exemplary embodiment, the scissors-type supporting part is configured with a first and a second pivot axes; the press-key structure further comprises a first clasp part formed with a guiding ramp, a second clasp part formed as an inversed L-shaped structure, and at least a guiding block formed with a ramp, all being disposed on the substrate in a manner that the ramp of the at least one guiding block is configured to lean toward the second clasp part, while connecting the first and the second pivot axes respectively to the first clasp part and the second clasp part for enabling the keycap to move up and down relative to the substrate.
Abstract:
The present invention provides an olefin/cycloolefin/alkylstyrene copolymer which is non-functionalized, functionalized, or grafted. By the functionalization of the benzylic protons of the alkylstyrene unit, the copolymer can be functionalized. The functionalized or grafted olefin/cycloolefin/alkylstyrene copolymer has good adhesion to a substrate and good compatibility with other polymers compared with the non-functionalized copolymer.
Abstract:
The present invention provides an olefin/cycloolefin/alkylstyrene copolymer which is non-functionalized, functionalized, or grafted. By the functionalization of the benzylic protons of the alkylstyrene unit, the copolymer can be functionalized. The functionalized or grafted olefin/cycloolefin/alkylstyrene copolymer has good adhesion to a substrate and good compatibility with other polymers compared with the non-functionalized copolymer.
Abstract:
The device concerns measuring the propagation and bending losses that take place in the individual mode of the multi-mode waveguide. The method applied is a new one comprising butt-couple and prism-couple together with phase-modulation method. Electrodes are made on the waveguide, and applied with voltage. The electro-optical effect is used to modulate the effective length of the waveguide in forming a Fabry-Perot etalon. From here, the contrast of the butt-couple's output and the loss can be measured. At the same time, as the prism-couple is able to separate the multiple modes individually, and measure the contrast and loss of each mode through every output mode which are then compared with the butt-couple, each mode's propagation and bending losses values of the multi-mode waveguide can be derived.
Abstract:
A novel organometallic compound is disclosed which can be used, in conjunction with a trialkyl or bialkyl aluminum cocatalyst, for catalyzing the polymerization and copolymerization of ethylene without requiring the use of either methyl aluminoxane or borate as cocatalyst. The organometallic compound is represented by the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MX.sub.a Y.sub.b ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopentadienyl group, in which n is an integer between 0 and 5, and R is C.sub.1 to C.sub.6 alkyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrobispyrazolyl borate or hydrotris(3,5-dimethylpyrazolyl) borate; (c) M is a Group IIIB, Grcup IVB, or Group VB transitional metal; (d) a and b are integers such that a+b=m-2, where m is the valance of M; and (e) X and Y, which can be the same of different from each other, are halogen atoms or ligands represented by the formula of ER.sup.1 or ER.sup.1 R.sup.2, where E is a Group VA or VIA element, and R.sup.1 and R.sup.2, which can be the same or different from each other, are C.sub.1 to C.sub.6 alkyl group or substituted aryl group. Preferably, M is a Group IVB transitional metal and a=b=1, and the organometallic compound is then represented by the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MXY.
Abstract translation:公开了一种可与三烷基或双烷基铝助催化剂结合使用的用于催化乙烯的聚合和共聚而不需要使用甲基铝氧烷或硼酸盐作为助催化剂的新型有机金属化合物。 有机金属化合物由式(C5RnH5-n)(L)MXaYb表示; 其中:(a)C5RnH5-n是取代或未取代的环戊二烯基,其中n是0和5之间的整数,R是C1-C6烷基; (b)L是四吡唑基硼酸盐,氢四唑基硼酸盐,二氢双吡唑基硼酸盐或氢化三(3,5-二甲基吡唑基)硼酸盐; (c)M是IIIB族,Grcup IVB族或VB族过渡金属; (d)a和b是整数,使得a + b = m-2,其中m是M的化合价; 和(e)可以彼此不同的X和Y是由式ER1或ER1R2表示的卤素原子或配体,其中E是VA族或VIA族,R1和R2可以 彼此相同或不同,为C1至C6烷基或取代的芳基。 优选地,M是IVB族过渡金属,a = b = 1,有机金属化合物由式(C5RnH5-n)(L)MXY表示。
Abstract:
A novel organometallic compound is disclosed which can be used, in conjunction with a trialkyl or bialkyl aluminum cocatalyst, for catalyzing the polymerization and copolymerization of ethylene without requiring the use of either methyl aluminoxane or borate as cocatalyst. The organometallic compound is represented by the formula of (CR.sub.5 R.sub.n H.sub.5-n)(L)MX.sub.a Y.sub.b ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopentadienyl group, in which n is an integer between 0 and 5, and R is C.sub.1 to C.sub.6 alkyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrobispyrazolyl borate or hydrotris(3,5-dimethylpyrazolyl) borate; (c) M is a Group IIIB, Group IVB, or Group VB transitional metal; (d) a and b are integers such that a+b=m-2, where m is the valance of M; and (e) X and Y, which can be the same of different from each other, are halogen atoms or ligands represented by the formula of ER.sup.1, where E is a Group VA or VIA element, and R.sup.1 is C.sub.1 to C.sub.6 alkyl group, aryl group or halogen-substituted aryl group. Preferably, M is a Group IVB transitional metal and a=b=1, and the organometallic compound is then represented by the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MXY.
Abstract translation:公开了一种可与三烷基或双烷基铝助催化剂结合使用的用于催化乙烯的聚合和共聚而不需要使用甲基铝氧烷或硼酸盐作为助催化剂的新型有机金属化合物。 有机金属化合物由式(CR5RnH5-n)(L)MXaYb表示; 其中:(a)C5RnH5-n是取代或未取代的环戊二烯基,其中n是0和5之间的整数,R是C1-C6烷基; (b)L是四吡唑基硼酸盐,氢四唑基硼酸盐,二氢双吡唑基硼酸盐或氢化三(3,5-二甲基吡唑基)硼酸盐; (c)M是IIIB族,IVB族或VB族过渡金属; (d)a和b是整数,使得a + b = m-2,其中m是M的化合价; 和(e)可以彼此不同的X和Y是由式ER1表示的卤素原子或配体,其中E是VA族或VIA族,R1是C1-C6烷基, 芳基或卤素取代的芳基。 优选地,M是IVB族过渡金属,a = b = 1,有机金属化合物由式(C5RnH5-n)(L)MXY表示。