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148 条记录 (耗时 0.037 秒)

    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures
    71.
    发明授权
    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures 失效

    公开(公告)号：US07235166B2

    公开(公告)日：2007-06-26

    申请号：US10677498

    申请日：2003-10-01

    申请人： Adam L. Cohen ,  Dennis R. Smalley ,  Gang Zhang

    发明人： Adam L. Cohen ,  Dennis R. Smalley ,  Gang Zhang

    IPC分类号： C25D5/02

    CPC分类号： C25D5/022 ,  B33Y10/00 ,  C25D1/08 ,  C25D5/10

    摘要： Multilayer structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. Selectivity of deposition is obtained via a multi-cell controllable mask. Alternatively, net selective deposition is obtained via a blanket deposition and a selective removal of material via a multi-cell mask. Individual cells of the mask may contain electrodes comprising depositable material or electrodes capable of receiving etched material from a substrate. Alternatively, individual cells may include passages that allow or inhibit ion flow between a substrate and an external electrode and that include electrodes or other control elements that can be used to selectively allow or inhibit ion flow and thus inhibit significant deposition or etching. Single cell masks having a cell size that is smaller or equal to the desired deposition resolution may also be used to form structures.

    Micro-scale and meso-scale hydraulic and pneumatic tools, methods for using, and methods for making
    73.
    发明授权
    Micro-scale and meso-scale hydraulic and pneumatic tools, methods for using, and methods for making 有权
    微尺度和中尺度液压和气动工具，使用方法和制造方法

    公开(公告)号：US08241228B1

    公开(公告)日：2012-08-14

    申请号：US12139445

    申请日：2008-06-13

    申请人： Adam L. Cohen ,  Chris R. Folk ,  Richard T. Chen ,  Dennis R. Smalley

    发明人： Adam L. Cohen ,  Chris R. Folk ,  Richard T. Chen ,  Dennis R. Smalley

    IPC分类号： A61B5/00

    CPC分类号： A61B17/3201 ,  A61B2017/00345 ,  A61B2017/00526 ,  A61B2017/00539 ,  A61B2017/00544 ,  Y10T403/7011

    摘要： Embodiments are directed to micro-scale or meso-scale hydraulically or pneumatically actuated devices, methods for forming such devices using multi-layer, multi-material electrochemical fabrication methods and particularly fabricating (i.e. building up) a plurality of components of devices that are moveable relative to one another in pre-assembled configurations wherein special features are designed into the devices (e.g. wide gaps in fabrication positions and narrowed gaps in working regions of component movement, mechanisms that inhibit the return of device components to fabrication positions after being moved into working regions, used of cylindrical interference and/or checkerboard bushings, etching holes in selected locations to allow removal of sacrificial material) to allow such fabrication to occur without violating intra-layer minimum feature size constraints while still obtaining effective gaps between components that are smaller than the minimum features size limits. Particular applications of such devices involve medical applications and in particular minimally invasive procedures where devices would be moved into a desired working area within a body of a patient via a lumen and then actuated while at the working location.

    摘要翻译： 实施例涉及微尺度或中尺度液压或气动致动装置，使用多层多材料电化学制造方法形成这种装置的方法，并且特别地制造（即，建立）可移动的装置的多个部件 相对于彼此的预组装配置，其中将特殊特征设计到装置中（例如，制造位置中的宽间隙和部件移动的工作区域中的狭窄间隙，阻止装置部件移动到加工后的制造位置的机构 区域，使用圆柱形干涉和/或棋盘衬套，在选定位置蚀刻孔以允许去除牺牲材料），以允许这种制造发生而不违反层内最小特征尺寸约束，同时仍获得小于 最小特征尺寸限制。 这种装置的具体应用涉及医疗应用，特别是微创手术，其中装置将通过内腔移动到患者身体内的期望工作区域中，然后在工作位置被致动。

    ELECTROCHEMICALLY FABRICATED MICROPROBES
    74.
    发明申请
    ELECTROCHEMICALLY FABRICATED MICROPROBES 审中-公开
    电化学微孔

    公开(公告)号：US20090066351A1

    公开(公告)日：2009-03-12

    申请号：US12203102

    申请日：2008-09-02

    申请人： Vacit Arat ,  Adam L. Cohen ,  Dennis R. Smalley ,  Ezekiel J. J. Kruglick ,  Richard T. Chen ,  Kieun Kim

    发明人： Vacit Arat ,  Adam L. Cohen ,  Dennis R. Smalley ,  Ezekiel J. J. Kruglick ,  Richard T. Chen ,  Kieun Kim

    IPC分类号： G01R1/067 ,  G01R31/02

    CPC分类号： G01R1/06711 ,  G01R1/06716 ,  G01R1/06733 ,  G01R1/06744 ,  G01R3/00

    摘要： Multilayer test probe structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. In some embodiments each probe structure may include a plurality of contact arms or contact tips that are used for contacting a specific pad or plurality of pads wherein the arms and/or tips are configured in such away so as to provide a scrubbing motion (e.g. a motion perpendicular to a primary relative movement motion between a probe carrier and the IC) as the probe element or array is made to contact an IC, or the like, and particularly when the motion between the probe or probes and the IC occurs primarily in a direction that is perpendicular to a plane of a surface of the IC. In some embodiments arrays of multiple probes are provided and even formed in desired relative position simultaneously.

    摘要翻译： 多层测试探针结构通过在多个覆盖层和粘附层中的一种或多种材料的沉积进行电化学制造。 在一些实施例中，每个探针结构可以包括用于接触特定垫或多个垫的多个接触臂或接触尖端，其中臂和/或尖端被配置成如此远离以提供擦洗运动（例如， 当探针元件或阵列与探针载体和IC之间的初级相对移动运动垂直的运动）与IC等接触时，特别是当探针或探针与IC之间的运动主要发生在 方向垂直于IC的表面的平面。 在一些实施例中，多个探针的阵列被提供并且甚至同时形成在期望的相对位置。

    Non-conformable masks and methods and apparatus for forming three-dimensional structures
    75.
    发明授权
    Non-conformable masks and methods and apparatus for forming three-dimensional structures 有权
    用于形成三维结构的不合格掩模和方法和装置

    公开(公告)号：US07368044B2

    公开(公告)日：2008-05-06

    申请号：US10724513

    申请日：2003-11-26

    申请人： Adam L. Cohen ,  Dennis R. Smalley

    发明人： Adam L. Cohen ,  Dennis R. Smalley

    IPC分类号： C25D5/02 ,  B23H3/00

    CPC分类号： B81C1/00182 ,  B33Y10/00

    摘要： Electrochemical Fabrication techniques are used to modify substrates or to form multilayer structures (e.g. components or devices) from a plurality of overlaying and adhered layers. Masks are used to selectively etch or deposit material. Some masks may be of the contact type and may be formed of multiple materials some of which may be support materials, some of which may be mating materials for contacting a substrate and some may be intermediate materials. In some embodiments the contact masks may have conformable contact surfaces (i.e. surfaces with sufficient flexibility or deformability that they can substantially conform to surface of the substrate to form a seal with it) or they may have semi-rigid or even rigid surfaces. In embodiments where masks are used for selective deposition operations, etching operations may be performed after deposition to remove flash deposits (thin undesired deposits from areas that were intended to be masked).

    摘要翻译： 电化学制造技术用于修饰衬底或从多个覆盖和粘附层形成多层结构（例如组件或器件）。 掩模用于选择性地蚀刻或沉积材料。 一些掩模可以是接触型并且可以由多种材料形成，其中一些可以是支撑材料，其中一些可以是用于接触基底的配合材料，一些可以是中间材料。 在一些实施例中，接触掩模可以具有适形的接触表面（即具有足够的柔性或可变形性的表面，使得它们可以基本上符合基底的表面以与其形成密封），或者它们可以具有半刚性或甚至刚性的表面。 在掩模用于选择性沉积操作的实施例中，可以在沉积之后执行蚀刻操作以去除闪蒸沉积物（来自旨在被掩蔽的区域的不希望的沉积物）。

    Electrochemical Fabrication Method and Application for Producing Three-Dimensional Structures Having Improved Surface Finish
    78.
    发明申请
    Electrochemical Fabrication Method and Application for Producing Three-Dimensional Structures Having Improved Surface Finish 审中-公开
    电化学制造方法及应用于生产具有改进表面光洁度的三维结构

    公开(公告)号：US20090084756A1

    公开(公告)日：2009-04-02

    申请号：US12242802

    申请日：2008-09-30

    申请人： Adam L. Cohen ,  Dennis R. Smalley

    发明人： Adam L. Cohen ,  Dennis R. Smalley

    IPC分类号： C23F1/00 ,  C25D5/02

    CPC分类号： C25D5/02 ,  B81C1/00373 ,  B81C2201/019 ,  C23F1/00 ,  C25D1/003 ,  H01P11/003

    摘要： An electrochemical fabrication process produces three-dimensional structures (e.g. components or devices) from a plurality of layers of deposited materials wherein the formation of at least some portions of some layers are produced by operations that remove material or condition selected surfaces of a deposited material. In some embodiments, removal or conditioning operations are varied between layers or between different portions of a layer such that different surface qualities are obtained. In other embodiments varying surface quality may be obtained without varying removal or conditioning operations but instead by relying on differential interaction between removal or conditioning operations and different materials encountered by these operations.

    摘要翻译： 电化学制造工艺从多个沉积材料层产生三维结构（例如组件或器件），其中通过去除沉积材料的选定表面的材料或条件的操作产生一些层的至少一些部分的形成。 在一些实施例中，去除或调节操作在层之间或层的不同部分之间变化，使得获得不同的表面质量。 在其它实施例中，可以在不改变去除或调节操作的情况下获得变化的表面质量，而是通过依赖于去除或调节操作与这些操作遇到的不同材料之间的差异相互作用。

    Electrochemically fabricated microprobes
    79.
    发明授权
    Electrochemically fabricated microprobes 有权
    电化学制造的微型纺织品

    公开(公告)号：US07504840B2

    公开(公告)日：2009-03-17

    申请号：US11244817

    申请日：2005-10-06

    申请人： Vacit Arat ,  Adam L. Cohen ,  Dennis R. Smalley ,  Ezekiel J. J. Kruglick ,  Richard T. Chen ,  Kieun Kim

    发明人： Vacit Arat ,  Adam L. Cohen ,  Dennis R. Smalley ,  Ezekiel J. J. Kruglick ,  Richard T. Chen ,  Kieun Kim

    IPC分类号： G01R31/02

    CPC分类号： G01R1/06711 ,  G01R1/06716 ,  G01R1/06733 ,  G01R1/06744 ,  G01R3/00

    摘要： Multilayer test probe structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. In some embodiments each probe structure may include a plurality of contact arms or contact tips that are used for contacting a specific pad or plurality of pads wherein the arms and/or tips are configured in such away so as to provide a scrubbing motion (e.g. a motion perpendicular to a primary relative movement motion between a probe carrier and the IC) as the probe element or array is made to contact an IC, or the like, and particularly when the motion between the probe or probes and the IC occurs primarily in a direction that is perpendicular to a plane of a surface of the IC. In some embodiments arrays of multiple probes are provided and even formed in desired relative position simultaneously.

    摘要翻译： 多层测试探针结构通过在多个覆盖层和粘附层中的一种或多种材料的沉积进行电化学制造。 在一些实施例中，每个探针结构可以包括用于接触特定垫或多个垫的多个接触臂或接触尖端，其中臂和/或尖端被配置成如此远离以提供擦洗运动（例如， 当探针元件或阵列与探针载体和IC之间的初级相对移动运动垂直的运动）与IC等接触时，特别是当探针或探针与IC之间的运动主要发生在 方向垂直于IC的表面的平面。 在一些实施例中，多个探针的阵列被提供并且甚至同时形成在期望的相对位置。

    Non-Conformable Masks and Methods and Apparatus for Forming Three-Dimensional Structures
    80.
    发明申请
    Non-Conformable Masks and Methods and Apparatus for Forming Three-Dimensional Structures 审中-公开
    不适合的面罩和形成三维结构的方法和装置

    公开(公告)号：US20080230392A1

    公开(公告)日：2008-09-25

    申请号：US12055188

    申请日：2008-03-25

    申请人： Adam L. Cohen ,  Dennis R. Smalley

    发明人： Adam L. Cohen ,  Dennis R. Smalley

    IPC分类号： C25D5/02

    CPC分类号： B81C1/00182 ,  B33Y10/00

    摘要： Electrochemical Fabrication techniques are used to modify substrates or to form multilayer structures (e.g. components or devices) from a plurality of overlaying and adhered layers. Masks are used to selectively etch or deposit material. Some masks may be of the contact type and may be formed of multiple materials some of which may be support materials, some of which may be mating materials for contacting a substrate and some may be intermediate materials. In some embodiments the contact masks may have conformable contact surfaces (i.e. surfaces with sufficient flexibility or deformability that they can substantially conform to surface of the substrate to form a seal with it) or they may have semi-rigid or even rigid surfaces. In embodiments where masks are used for selective deposition operations, etching operations may be performed after deposition to remove flash deposits (thin undesired deposits from areas that were intended to be masked).

    摘要翻译： 电化学制造技术用于修饰衬底或从多个覆盖和粘附层形成多层结构（例如组件或器件）。 掩模用于选择性地蚀刻或沉积材料。 一些掩模可以是接触型并且可以由多种材料形成，其中一些可以是支撑材料，其中一些可以是用于接触基底的配合材料，一些可以是中间材料。 在一些实施例中，接触掩模可以具有适形的接触表面（即具有足够的柔性或可变形性的表面，使得它们可以基本上符合基底的表面以与其形成密封），或者它们可以具有半刚性或甚至刚性的表面。 在掩模用于选择性沉积操作的实施例中，可以在沉积之后执行蚀刻操作以去除闪蒸沉积物（来自旨在被掩蔽的区域的不希望的沉积物）。