-
71.发明授权Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array 有权使用图案化阵列的补偿方案的光刻设备和器件制造方法公开(公告)号：US07466394B2
公开(公告)日：2008-12-16
申请号：US11312638
申请日：2005-12-21
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G02B26/0833
摘要： A lithographic apparatus comprising an array of individually controllable elements that modulates a beam of radiation and a projection system that projects the modulated beam onto the substrate. The individually controllable elements are provided with a compensation feature that is arranged to provide compensation radiation that substantially or at least partially cancels out unwanted radiation, such that the unwanted radiation is not projected by the projection system onto the substrate.
摘要翻译： 一种光刻设备，包括调制辐射束的独立可控元件阵列和将调制光束投射到衬底上的投影系统。 独立可控元件设置有补偿特征，该补偿特征被布置成提供基本上或至少部分地抵消不想要的辐射的补偿辐射，使得不需要的辐射不被投影系统投影到衬底上。
-
公开(公告)号：US20080151206A1
公开(公告)日：2008-06-26
申请号：US11642982
申请日：2006-12-21
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70075 , G03F7/70083 , G03F7/70583
摘要： A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.
摘要翻译： 公开了一种光刻方法，其包括使用光刻设备的照明系统来调节辐射束，使辐射束在其横截面上具有图案，并将图案化的辐射束作为曝光场投射到衬底上，其中 在曝光场中存在周期性干涉图案，并且在基板和照明系统中的部件之间建立相对运动，使得周期性干涉图案在不平行于周期性重复方向的方向上移位 干扰模式。
-
公开(公告)号：US20080137053A1
公开(公告)日：2008-06-12
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/70
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译： 系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。 可单独控制的元件可以改变辐射束的远心性。 将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。 或者，独立可控元件可以改变辐射束的光轴。
-
公开(公告)号：US07333175B2
公开(公告)日：2008-02-19
申请号：US11014223
申请日：2004-12-17
CPC分类号： G03F9/7076 , G03F7/706 , G03F9/7011 , G03F9/7019 , G03F9/7049 , G03F9/7065 , G03F9/7088
摘要： According to one embodiment, a method for aligning a first alignment marker with respect to a second alignment marker, a lens being positioned in between the markers, includes providing an alignment beam and imaging the first alignment marker on the second alignment marker with the alignment beam through the lens. A lens interferometer is provided as a measurement device arranged to measure a relative position of at least one of the first and second alignment markers. The method further includes measuring the relative position and aligning the position of at least one of the first and second alignment markers based on the measured relative position.
摘要翻译： 根据一个实施例，一种用于将第一对准标记相对于第二对准标记对准的方法，位于标记之间的透镜包括提供对准光束并且在第二对准标记上对准第一对准标记物， 透过镜头。 提供透镜干涉仪作为测量装置，其被布置成测量第一和第二对准标记中的至少一个的相对位置。 该方法还包括基于测量的相对位置来测量相对位置并对准第一和第二对准标记中的至少一个的位置。
-
75.发明授权Method of determining aberration of a projection system of a lithographic apparatus 有权确定光刻设备的投影系统的像差的方法公开(公告)号：US07242475B2
公开(公告)日：2007-07-10
申请号：US10808598
申请日：2004-03-25
IPC分类号： G01B11/00
CPC分类号： G03F7/706
摘要： A method of determining aberration of a projection system of a lithographic includes projecting a reference test pattern, projecting a second test pattern, measuring relative displacements between items in the resulting images of said reference test pattern and said second test pattern, and using said measurements to determine information on the aberration of the projection system, wherein a filter is used when imaging the second test pattern to select particular radiation paths though the projection system, and wherein the measuring is performed for a plurality of images of the second test pattern obtained at planes displaced along the optical axis relative to each other.
摘要翻译： 确定光刻的投影系统的像差的方法包括投影参考测试图案，投影第二测试图案，测量所述参考测试图案和所述第二测试图案的所得图像中的项目之间的相对位移，并且使用所述测量 确定关于投影系统的像差的信息，其中当对第二测试图案成像时使用滤光器以选择通过投影系统的特定辐射路径，并且其中对于在平面处获得的第二测试图案的多个图像执行测量 沿着光轴相对于彼此移位。
-
公开(公告)号：US07209275B2
公开(公告)日：2007-04-24
申请号：US11170065
申请日：2005-06-30
IPC分类号： G02B26/00
CPC分类号： G03F7/70291
摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.
-
77.发明授权Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane 有权在平面上利用微透镜阵列的平版印刷设备和器件制造方法公开(公告)号：US07180577B2
公开(公告)日：2007-02-20
申请号：US11013938
申请日：2004-12-17
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275
摘要： A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.
摘要翻译： 光刻设备包括辐射系统，图案形成装置和投影系统。 图案形成装置构图来自辐射系统的辐射束。 投影系统将图案化的光束投射到基板的目标部分上。 投影系统包括位于投影系统的光瞳平面处的光瞳和位于投影系统的像平面处的透镜阵列。 图案形成装置与透镜阵列共轭，瞳孔与基底共轭。
-
公开(公告)号：US06887625B2
公开(公告)日：2005-05-03
申请号：US09905198
申请日：2001-07-16
申请人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
发明人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
CPC分类号： G03F7/70433 , G03F1/36
摘要： In a mask pattern for a device such as a DRAM including a nearly regular array of isolated features, assist features are positioned so as to make the array more symmetric. Where the isolated features are positioned at most but not all of the points of a regular unit cell, the assist features may be positioned at the points of the unit cell not occupied by the isolated features. The isolated features may represent contact holes.
摘要翻译： 在诸如包括几乎规则的孤立特征阵列的DRAM的设备的掩模图案中，辅助特征被定位成使阵列更对称。 在隔离特征被定位在常规单位单元的最多但不是全部点处的情况下，辅助特征可以位于不被隔离特征占据的单位单元的点处。 隔离的特征可以表示接触孔。
-
79.发明授权公开(公告)号：US06777139B2
公开(公告)日：2004-08-17
申请号：US10139625
申请日：2002-05-07
IPC分类号： G03F900
CPC分类号： G03F7/70558 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F9/7076 , G03F9/7084
摘要： An alignment marker for use in calibration of a lithographic projection apparatus has focus sensitive parts and dose sensitive parts, each of which includes an area having a plurality of dots against a contrasting background forming part of a periodic line structure.
摘要翻译： 用于光刻投影设备的校准的对准标记具有焦点敏感部件和剂量敏感部件，每个部件和剂量敏感部件包括具有多个点的区域，该区域形成构成周期线结构的一部分的对比背景。
-
公开(公告)号：US20120257182A1
公开(公告)日：2012-10-11
申请号：US13438526
申请日：2012-04-03
IPC分类号： G03B27/68
CPC分类号： G03F7/706 , G03F7/70616 , G03F7/70625
摘要： A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
摘要翻译： 确定图案特征的属性的灵敏度以改变用于提供该图案特征的光刻设备的光学像差的光刻方法。 该方法包括控制光刻设备的配置以建立第一像差状态，当光刻设备处于第一像差状态时，利用该光刻设备形成图案特征的第一图像，测量图像的属性，控制配置 的光刻设备，以建立第二，不同的像差状态，当光刻设备处于第二像差状态时，与该光刻设备形成相同图案特征的图像，测量图像的相同特性，并使用测量值 确定图案特征的属性对像差状态变化的敏感度。
-
-
-
-
-
-
-
-
-
搜索结果
125 条记录 (耗时 0.044 秒)
