HYDROGEN GAS DETECTION DEVICE
    72.
    发明申请
    HYDROGEN GAS DETECTION DEVICE 有权
    氢气检测装置

    公开(公告)号:US20090135425A1

    公开(公告)日:2009-05-28

    申请号:US12293267

    申请日:2007-02-15

    申请人: Naoki Uchiyama

    发明人: Naoki Uchiyama

    IPC分类号: G01N21/77

    摘要: In a hydrogen gas detection device, light emitted from a light source is irradiated onto a hydrogen sensor whose reflectance (optical reflectance) varies upon contact with hydrogen gas, and the light transmitted through the hydrogen sensor or reflected by a reflective film of the hydrogen sensor is received by an optical sensor. On the basis of the signal output from the optical sensor and indicative of the amount of light received, the hydrogen gas detection device detects leakage of hydrogen gas.

    摘要翻译: 在氢气检测装置中,将从光源射出的光照射到与氢气接触时反射率(光反射率)变化的氢传感器,透过氢传感器的光或氢传感器的反射膜反射的光 被光学传感器接收。 基于从光学传感器输出的信号并指示接收的光量,氢气检测装置检测氢气的泄漏。

    Hydrogen gas visualization device
    74.
    发明申请
    Hydrogen gas visualization device 有权
    氢气可视化装置

    公开(公告)号:US20070084726A1

    公开(公告)日:2007-04-19

    申请号:US11581553

    申请日:2006-10-16

    IPC分类号: G01N27/26

    摘要: A hydrogen gas visualization device comprises a hydrogen sensor having a thin film layer formed on the surface of a substrate and a catalyst layer formed on the surface of the thin film layer which, when contacted by hydrogen gas contained in an atmosphere, hydrogenates the thin film layer and thereby changes the optical reflectance of the thin film layer, and one or more sensor faces provided with the hydrogen sensor. The hydrogen gas visualization device visualizes, on the sensor faces, the distribution of hydrogen gas contained in the atmosphere contacting the hydrogen sensor and thereby visualizes the existence and flow of the hydrogen gas.

    摘要翻译: 氢气可视化装置包括具有在基板表面上形成的薄膜层的氢传感器和形成在薄膜层表面上的催化剂层,当与大气中包含的氢气接触时,将薄膜 从而改变薄膜层的光学反射率和设置有氢传感器的一个或多个传感器面。 氢气可视化装置在传感器面上显示了与氢传感器接触的气氛中所含的氢气的分布,从而使氢气的存在和流动显现。

    Deposition-preventing part for physical vapor deposition apparatuses
    79.
    发明授权
    Deposition-preventing part for physical vapor deposition apparatuses 失效
    物理气相沉积装置的防沉积部分

    公开(公告)号:US5954929A

    公开(公告)日:1999-09-21

    申请号:US738660

    申请日:1996-10-30

    CPC分类号: C23C14/042 G11B7/26

    摘要: A deposition-preventing part, particularly a masking tool, which is used over an area to be protected from adhesion of a physical vapor deposition film, for physical vapor deposition apparatuses which are used to form physical vapor deposition films of metals, particularly noble metals, on CD-ROM, CD-R or CD-E substrates. One or more of a solder-plated Cu wire, a solder-plated Cu foil tape, an Al foil tape and a synthetic resin tape are attached, in a peelable manner, on a solder film formed on the surface of the substrate of a deposition-preventing part such as a masking tool, which has a surface roughness of 0.01-1 .mu.m when expressed as the arithmetic mean roughness defined according to JIS B 0601, a thickness of 5-100 .mu.m and a melting point of 100-450.degree. C.

    摘要翻译: 在用于形成金属,特别是贵金属的物理气相沉积膜的物理气相沉积装置中,在要被保护的物理气相沉积膜的粘附区域上使用的防沉积部分,特别是掩模工具, 在CD-ROM,CD-R或CD-E底物上。 将一个或多个焊料镀覆的Cu线,焊料镀覆的Cu箔带,Al箔带和合成树脂带以可剥离的方式附着在形成在沉积基板的表面上的焊料膜上 当表示为根据JIS B 0601定义的算术平均粗糙度时,其表面粗糙度为0.01-1μm的掩模工具,其厚度为5-100μm,熔点为100-450 DEG C.