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118 条记录 (耗时 0.05 秒)

    Thermally insulating glazing
    71.
    发明授权
    Thermally insulating glazing 失效
    隔热玻璃

    公开(公告)号：US4548691A

    公开(公告)日：1985-10-22

    申请号：US584639

    申请日：1984-02-29

    申请人： Anton Dietrich ,  Klaus Hartig ,  Werner Lenz ,  Michael Scherer

    发明人： Anton Dietrich ,  Klaus Hartig ,  Werner Lenz ,  Michael Scherer

    IPC分类号： C03C17/36 ,  C03C27/12 ,  C23C14/00 ,  G02B1/11 ,  G02B5/28 ,  C23C15/00

    CPC分类号： C03C17/3618 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C23C14/0036 ,  G02B5/282

    摘要： A method of producing glass sheets having good transmission behavior in the visible spectrum range and having good reflection behavior as regards heat radiation. A transparent substrate S is coated by cathodic atomization with, successively, a first oxide layer 1 comprising indium oxide, tin oxide or mixtures thereof, a layer 2 consisting of silver in a thickness of 5 to 50 n, a metallic layer 3 selected from aluminium, titanium, tantalum, chromium, manganese and zirconium in a thickness ranging from 1 to 5 nm and applied directly to the silver layer 2 for the purpose of maintaining the condition thereof, and a final protective oxide layer 4 of indium oxide, tin oxide or mixtures thereof.

    摘要翻译： 一种制造在可见光谱范围内具有良好透射性能并具有良好的热辐射反射性能的玻璃板的方法。 通过阴极雾化，依次包含氧化铟，氧化锡或其混合物的第一氧化物层1，厚度为5-50n的银组成的层2，选自铝的金属层3， ，钛，钽，铬，锰和锆，厚度范围为1至5nm，并直接施加于银层2以保持其状态，以及最终的氧化铟保护氧化物层4，氧化锡或 其混合物。

    Solar controlled glazing and method of producing glazing
    72.
    发明授权
    Solar controlled glazing and method of producing glazing 失效
    太阳能控制玻璃和生产玻璃的方法

    公开(公告)号：US4534841A

    公开(公告)日：1985-08-13

    申请号：US592907

    申请日：1984-03-23

    申请人： Klaus Hartig ,  Anton Dietrich ,  Michael Scherer

    发明人： Klaus Hartig ,  Anton Dietrich ,  Michael Scherer

    IPC分类号： E06B9/24 ,  C03C15/00 ,  C03C17/34 ,  C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  G02B5/26 ,  G02B5/28 ,  C23C15/00

    CPC分类号： C03C17/3435 ,  C23C14/0036 ,  Y10T428/31627

    摘要： Solar-controlled glazing having a transmission of between 5 and 40% in the visible spectrum range and having heat-reflection properties is produced by applying an oxide layer having an optical thickness of between 20 and 280 nm directly to a transparent substrate by cathodic evaporation in an oxygen-containing atmosphere to form a first layer. A chromium nitride layer having a geometric thickness of between 10 and 40 nm is then applied in an atmosphere consisting of inert gas and nitrogen to provide a second layer. An optical third dielectric layer may be applied to the second layer. The oxide layer is selected from oxides of tin, titanium and aluminium.

    摘要翻译： 通过将具有20至280nm光学厚度的氧化物层直接涂覆到透明基底上，通过阴极蒸发来生产在可见光谱范围内具有5至40％透射率并具有热反射特性的太阳能控制玻璃， 含氧气氛形成第一层。 然后在由惰性气体和氮气组成的气氛中施加几何厚度为10至40nm的氮化铬层，以提供第二层。 光学第三介质层可以施加到第二层。 氧化物层选自锡，钛和铝的氧化物。

    Reactive sputter deposition processes and equipment
    75.
    发明授权
    Reactive sputter deposition processes and equipment 有权
    反应溅射沉积工艺和设备

    公开(公告)号：US08435388B2

    公开(公告)日：2013-05-07

    申请号：US11590438

    申请日：2006-10-31

    申请人： Klaus Hartig ,  Sören Berg ,  Tomas Nyberg

    发明人： Klaus Hartig ,  Sören Berg ,  Tomas Nyberg

    IPC分类号： C23C14/35

    CPC分类号： C23C14/3414 ,  C23C14/0036 ,  C23C14/0068 ,  C23C14/35 ,  H01J37/3426

    摘要： The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

    摘要翻译： 本发明是用于获得具有减小或消除的滞后行为的反应溅射工艺的方法。 这是通过使用由金属和复合材料的混合物制成的靶来实现的。 在根据本发明的方法中，化合物材料的分数足够大以消除或显着降低反应性溅射工艺的滞后性能，并能够使化合物膜的稳定沉积速度明显高于目标可能的速率 完全由复合材料制成。

    Cylindrical target with oscillating magnet for magnetron sputtering
    78.
    发明授权
    Cylindrical target with oscillating magnet for magnetron sputtering 有权
    圆柱靶用磁控溅射的振荡磁体

    公开(公告)号：US07993496B2

    公开(公告)日：2011-08-09

    申请号：US11171054

    申请日：2005-06-30

    申请人： Klaus Hartig ,  Steve E. Smith ,  John E. Madocks

    发明人： Klaus Hartig ,  Steve E. Smith ,  John E. Madocks

    IPC分类号： C23C14/00

    CPC分类号： H01J37/3455 ,  H01J37/3405 ,  H01J37/3423 ,  H01J37/3497

    摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.

    摘要翻译： 在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，该基板包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生的靶内的细长磁体 位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般 沿其长度的均匀目标利用率及其使用方法。 在一些实施例中，磁体响应于目标的旋转而振荡。

    Coater having substrate cleaning device and coating deposition methods employing such coater
    80.
    发明授权
    Coater having substrate cleaning device and coating deposition methods employing such coater 有权
    涂布机具有基板清洁装置和使用这种涂布机的涂布沉积方法

    公开(公告)号：US07695598B2

    公开(公告)日：2010-04-13

    申请号：US11750722

    申请日：2007-05-18

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/56 ,  C23F1/00

    CPC分类号： C23C14/562 ,  C03C17/002 ,  C03C23/0075 ,  C03C2218/31 ,  C23C14/022 ,  C23C14/568

    摘要： A coater having a substrate cleaning device is disclosed. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

    摘要翻译： 公开了一种具有基板清洁装置的涂布机。 衬底清洁装置包括位于衬底行进路径（例如，衬底支撑件下方）下方的离子枪（即离子源），其延伸穿过涂布机，并适于处理衬底的底部主表面。 某些实施例涉及一种向上涂层装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。 在这种性质的一些实施例中，向上涂覆装置被配置用于将光催化涂层向上沉积到基底的底部主表面上。 本发明的某些实施例涉及一种向下涂覆装置，其中基底清洗装置进一步沿着基底行程的路径而不是向下涂覆装置。 一些实施例涉及一种向上的涂覆装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。