公开(公告)号：US12091574B2

公开(公告)日：2024-09-17

申请号：US17628922

申请日：2020-06-18

申请人： JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.

发明人： Jian Zong ,  Bixian Kang ,  Yingjing Dai

IPC分类号： C09D5/00 ,  C03C17/32 ,  C09D133/16

CPC分类号： C09D5/00 ,  C03C17/32 ,  C09D133/16 ,  C03C2217/76 ,  C03C2218/153

摘要： The present invention provides a hydrophobic surface coating and a preparation method therefor. The hydrophobic surface coating uses one or more fluorinated alcohol compounds as a reaction gas material, and is formed on a surface of a base body by a plasma-enhanced chemical vapor deposition method, to improve the hydrophobicity, the chemical resistance, and the weatherability of the surface of the base body.

公开(公告)号：US12037248B2

公开(公告)日：2024-07-16

申请号：US18211682

申请日：2023-06-20

申请人： CORNING INCORPORATED ,  Shanghai Institute of Ceramics, Chinese Academy of Sciences

发明人： Hui Bi ,  Fuqiang Huang ,  Xinyuan Liu ,  Zhen Song ,  Yufeng Tang ,  Tongping Xiu

IPC分类号： B32B9/00 ,  C01B32/182 ,  C01B32/186 ,  C01B32/198 ,  C03C17/22 ,  C23C16/26 ,  B82Y30/00 ,  C23C16/50

CPC分类号： C01B32/198 ,  C01B32/182 ,  C01B32/186 ,  C03C17/22 ,  C23C16/26 ,  B82Y30/00 ,  C03C2217/28 ,  C03C2217/40 ,  C03C2217/70 ,  C03C2218/111 ,  C03C2218/153 ,  C23C16/50 ,  Y10T428/30

摘要： Disclosed herein are methods for forming a graphene film on a substrate, the methods comprising depositing graphene on a surface of the substrate by a first vapor deposition step to form a discontinuous graphene crystal layer; depositing a graphene oxide layer on the discontinuous graphene crystal layer to form a composite layer; and depositing graphene on the composite layer by a second vapor deposition step, wherein the graphene oxide layer is substantially reduced to a graphene layer during the second vapor deposition step. Transparent coated substrates comprising such graphene films are also disclosed herein, wherein the graphene films have a resistance of less than about 10 KΩ/sq.

公开(公告)号：US20230303888A1

公开(公告)日：2023-09-28

申请号：US18014746

申请日：2021-06-02

申请人： JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.

发明人： Jian ZONG ,  Yongqi TAO ,  Fuxing LI

IPC分类号： C09D183/04 ,  C08G77/06 ,  C23C16/505 ,  C23C16/458 ,  C23C16/02 ,  C03C17/30

CPC分类号： C09D183/04 ,  C03C17/30 ,  C08G77/06 ,  C23C16/0227 ,  C23C16/4584 ,  C23C16/505 ,  C03C2217/76 ,  C03C2218/153

摘要： A super-hydrophobic film layer, a preparation method thereof, and a product thereof are provided, the preparation method includes using a siloxane monomer as a reaction material to form a super-hydrophobic film layer on a surface of a substrate by a plasma enhanced chemical vapor deposition.

公开(公告)号：US20230150868A1

公开(公告)日：2023-05-18

申请号：US17916183

申请日：2021-04-01

申请人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein

发明人： Ralph Wilken ,  Uwe Specht ,  Thomas Lukasczyk

IPC分类号： C03C17/42 ,  C03C23/00

CPC分类号： C03C17/42 ,  C03C23/0025 ,  C03C2217/948 ,  C03C2217/732 ,  C03C2218/153

摘要： Substrate with transparent outer layer, wherein a transparent interdigital structure is disposed between the substrate and the outer layer.

公开(公告)号：US20170088461A1

公开(公告)日：2017-03-30

申请号：US15116557

申请日：2014-02-10

申请人： VIDRIO PLANO DE MEXICO, S.A. DE C.V.

发明人： José Luis TAVARES-CORTÉS ,  José Guadalupe CID-AGUILAR ,  Arturo Si Ming LAMSHING-TAI ,  Edgar VALVERDE-CHONG ,  Jorge SANCHEZ-GONZALEZ

IPC分类号： C03C17/36 ,  C23C14/08 ,  C23C14/34 ,  C23C14/00 ,  C23C14/06

CPC分类号： C03C17/366 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3642 ,  C03C17/3649 ,  C03C2218/153 ,  C03C2218/155 ,  C23C14/0036 ,  C23C14/0641 ,  C23C14/083 ,  C23C14/3407 ,  C23C28/321 ,  C23C28/34 ,  C23C28/3455

摘要： The invention relates to a glass substrate including a stack of coating layers having control properties, in which stack comprises at least one niobium metal layer located between a layer of a dielectric material selected from Si3N4 or TiOx and a layer of a protective metal material selected from TIN or Ni—Cr, conferring solar control and heat resistance properties on the glass substrate.

公开(公告)号：US09556066B2

公开(公告)日：2017-01-31

申请号：US13324267

申请日：2011-12-13

申请人： Marcus Frank ,  Brent Boyce ,  Hartmut Knoll ,  Alexander Lorenz ,  Uwe Kriltz

发明人： Marcus Frank ,  Brent Boyce ,  Hartmut Knoll ,  Alexander Lorenz ,  Uwe Kriltz

IPC分类号： E06B3/00 ,  C03C17/36 ,  B32B17/10 ,  E06B3/66 ,  E06B3/67 ,  E06B3/663

CPC分类号： E06B3/6715 ,  B32B17/10055 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/73 ,  C03C2218/153 ,  C03C2218/154 ,  C03C2218/365 ,  E06B3/66 ,  E06B3/6612 ,  E06B3/66323 ,  E06B3/67326 ,  E06B3/6775 ,  Y02B80/22 ,  Y02B80/24 ,  Y10T29/49885

摘要： Certain example embodiments of this invention relate to insulating glass (IG) units including three substantially parallel spaced apart glass substrates, wherein at least two of the surfaces include low-emissivity (low-E) coatings and at least some of the non-low E coated surfaces have antireflective (AR) coatings disposed thereon. In certain example embodiments, low-E coatings are provided on the second and fifth surfaces of the IG unit, and each internal surface of the IG unit that does not support a low-E coating does support an AR coating. Additional AR coatings may be provided on one or both of the outermost surfaces in certain example embodiments. In some cases, the center substrate need not be heat treated because of the reduced absorption enabled by providing the low-E coatings on the two outermost substrates, as well as the reduced heat accumulation in the center lite itself and in the two adjacent spacers.

摘要翻译： 本发明的某些示例性实施例涉及中空玻璃（IG）单元，其包括三个基本上平行的间隔开的玻璃基板，其中至少两个表面包括低辐射率（低E）涂层和至少一些非低E 涂覆表面上具有设置在其上的抗反射（AR）涂层。 在某些示例性实施例中，低电位涂层设置在IG单元的第二和第五表面上，并且不支持低E涂层的IG单元的每个内表面都支持AR涂层。 在某些示例性实施例中，可以在一个或两个最外表面上提供附加的AR涂层。 在一些情况下，由于通过在两个最外面的基底上提供低-E涂层而减少的吸收以及中心纤维本身和两个相邻间隔物中减少的热积聚，中心基底不需要进行热处理。

公开(公告)号：US20170009516A1

公开(公告)日：2017-01-12

申请号：US15175401

申请日：2016-06-07

申请人： Cardinal CG Company

发明人： Klaus Hartig

IPC分类号： E06B3/67 ,  E06B9/24 ,  C03C17/36

CPC分类号： E06B3/6715 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/211 ,  C03C2217/216 ,  C03C2217/78 ,  C03C2218/153 ,  C03C2218/154 ,  C23C14/568 ,  E06B9/24 ,  E06B2009/2417 ,  Y10T428/24612 ,  Y10T428/24942 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/31504

摘要： Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

摘要翻译： 对辐射高度反射的低辐射涂层。 涂层包括三个红外反射膜区域，每个红外反射膜区域可以各自包括银。

公开(公告)号：US20160326048A1

公开(公告)日：2016-11-10

申请号：US15109839

申请日：2014-12-02

申请人： KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

发明人： Myoung Woon MOON ,  Heon Ju LEE ,  Jeong Sim LEE ,  Tae Jun KO ,  Kyu Hwan OH ,  Do Hyun KIM ,  Eu Sun YU

IPC分类号： C03C17/42 ,  B81C1/00 ,  C03C15/00

CPC分类号： C03C17/42 ,  B81C1/00031 ,  B81C1/00111 ,  B81C2201/0132 ,  C03C15/00 ,  C03C2217/76 ,  C03C2218/153 ,  C03C2218/328 ,  C03C2218/33

摘要： The present invention relates to a glass having a surface with improved water-repellency or hydrophobicity and low reflectance, and a fabrication method thereof. A technology is employed, in which a thin film containing silicon or silicon oxide is formed on the glass surface, the nano-structures are formed by selective etching treatment using a reactive gas such as CF4 or the like to provide superhydrophobicity and low reflectance properties, and a material with low surface energy is coated onto the nano-structures. The fabrication method of the low-reflective and superhydrophobic or super water-repellent glass may execute deposition and etching processes for the glass having the superhydrophobicity and the low reflectance, and provide excellent superhydrophobicity and low reflectance to the surface of the glass which was difficult to be treated. Also, the method is sustainable due to non-use of a toxic etching solution during these processes. The superhydrophobic and low-reflective glass can be applied to various fields, such as high-tech smart devices, vehicles, home appliances and so forth.

摘要翻译： 本发明涉及具有改善的疏水性或疏水性和低反射率的表面的玻璃及其制造方法。 采用在玻璃表面上形成含有硅或氧化硅的薄膜的技术，通过使用CF 4等的反应性气体的选择性蚀刻处理形成纳米结构体，提供超疏水性和低反射性， 并且具有低表面能的材料被涂覆到纳米结构上。 低反射和超疏水或超疏水玻璃的制造方法可以对具有超疏水性和低反射率的玻璃进行沉积和蚀刻工艺，并且对玻璃的表面提供优异的超疏水性和低反射率，这是难以 被处理。 此外，由于在这些过程中不使用有毒蚀刻溶液，该方法是可持续的。 超疏水性低反射玻璃可以应用于高科技智能装置，车辆，家用电器等各种领域。

公开(公告)号：US08951921B2

公开(公告)日：2015-02-10

申请号：US13912199

申请日：2013-06-07

申请人： Wintek Corporation

发明人： Hieng-Hsiung Huang ,  Wen-Chun Wang ,  Heng-Yi Chang ,  Chin-Chang Liu

IPC分类号： H01L21/02 ,  H01L29/786 ,  C23C14/02 ,  C23C14/18 ,  C23C16/02 ,  C23C16/24 ,  C30B29/06 ,  H01L29/66

CPC分类号： H01L29/78672 ,  C03C2218/152 ,  C03C2218/153 ,  C03C2218/154 ,  C23C14/024 ,  C23C14/025 ,  C23C14/185 ,  C23C16/0209 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/24 ,  C30B29/06 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/0262 ,  H01L21/02658 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78675 ,  H01L29/78678

摘要： A method of forming a thin film poly silicon layer includes following steps. Firstly, a substrate is provided. A heating treatment is then performed. A thin film poly silicon layer is then directly formed on a first surface of the substrate by a silicon thin film deposition process. A method of forming a thin film transistor includes following steps. Firstly, a substrate is provided. A heating treatment is then performed. A thin film poly silicon layer is then directly formed on a first surface of the substrate by a silicon thin film deposition process. A first patterning process is performed on the thin film poly silicon layer to form a semiconductor pattern. Subsequently, a gate insulation layer, a gate electrode, a source electrode and a drain electrode are formed.

摘要翻译： 形成薄膜多晶硅层的方法包括以下步骤。 首先，提供基板。 然后进行加热处理。 然后通过硅薄膜沉积工艺在衬底的第一表面上直接形成薄膜多晶硅层。 形成薄膜晶体管的方法包括以下步骤。 首先，提供基板。 然后进行加热处理。 然后通过硅薄膜沉积工艺在衬底的第一表面上直接形成薄膜多晶硅层。 在薄膜多晶硅层上进行第一图案化处理以形成半导体图案。 随后，形成栅极绝缘层，栅电极，源电极和漏电极。

公开(公告)号：US20150023633A1

公开(公告)日：2015-01-22

申请号：US14449029

申请日：2014-07-31

申请人： The Board of Trustees of the Leland Stanford Junior University

发明人： Michel J.F. Digonnet ,  Anuranjita Tewary ,  Mark Brongersma

IPC分类号： G02F1/01

CPC分类号： G02F1/0115 ,  B82Y20/00 ,  C03B19/1055 ,  C03B19/1095 ,  C03C12/00 ,  C03C17/245 ,  C03C2217/213 ,  C03C2218/153 ,  C03C2218/32 ,  G02B6/12007 ,  G02B6/29341 ,  G02F1/0126 ,  G02F1/0147 ,  G02F2001/0113 ,  G02F2202/36 ,  G02F2203/055

摘要： An optical switch includes a microresonator comprising a silicon-rich silicon oxide layer and a plurality of silicon nanoparticles within the silicon-rich silicon oxide layer. The microresonator further includes an optical coupler optically coupled to the microresonator and configured to be optically coupled to a signal source. The microresonator is configured to receive signal light having a signal wavelength, and at least a portion of the microresonator is responsive to the signal light by undergoing a refractive index change at the signal wavelength. The optical switch further includes an optical coupler optically coupled to the microresonator and configured to be optically coupled to a signal source. The optical coupler transmits the signal light from the signal source to the microresonator.

摘要翻译： 光开关包括在富硅氧化硅层内包括富硅氧化硅层和多个硅纳米颗粒的微谐振器。 微谐振器还包括光耦合到微谐振器并被配置为光耦合到信号源的光耦合器。 微谐振器被配置为接收具有信号波长的信号光，并且微谐振器的至少一部分通过在信号波长处经历折射率变化来响应信号光。 光学开关还包括光耦合到微谐振器并被配置为光耦合到信号源的光耦合器。 光耦合器将信号光从信号源传输到微谐振器。