公开(公告)号：US08705024B2

公开(公告)日：2014-04-22

申请号：US13145212

申请日：2010-01-22

申请人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

发明人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

IPC分类号： G01J1/00

CPC分类号： G01M11/0257 ,  G01M11/0207

摘要： Measurement cannot be made when trying to measure a wavefront aberration of a wide-angle lens, being wide in a field of view, comparing to a focus distance, by a Shack-Hartmann sensor, since an inclination of the wavefront exceeds an allowable value of inclination of the Shack-Hartmann sensor. The Shack-Hartmann sensor is inclined at a position of a pupil of a lens, and is controlled so that it lies within the allowable value mentioned above. Photographing is made through step & repeat while overlapping at the same position, to compose in such a manner that overlapping spots are piled up, and thereby measuring the wavefront aberration of the lens having a large pupil diameter.

摘要翻译： 当通过Shack-Hartmann传感器测量广角镜头的波前像差（与视场相比宽的焦点距离）时，不能进行测量，因为波前的倾斜度超过了允许值 Shack-Hartmann传感器的倾角。 Shack-Hartmann传感器在透镜的瞳孔的位置处倾斜，并被控制成使其位于上述容许值内。 通过步骤重复进行拍摄，同时在相同位置重叠，以这样的方式组合，使得重叠的斑点堆积，从而测量具有大瞳孔直径的透镜的波前像差。

公开(公告)号：US08416292B2

公开(公告)日：2013-04-09

申请号：US12389962

申请日：2009-02-20

申请人： Yukihiro Shibata ,  Yasuhiro Yoshitake

发明人： Yukihiro Shibata ,  Yasuhiro Yoshitake

IPC分类号： H04N7/18

CPC分类号： G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/10152 ,  G06T2207/30148

摘要： In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.

摘要翻译： 在用于检查具有缺陷的电路图案的晶片的缺陷检查装置中，选择性地确定照明光线的照明方向，使得包含散射高强度的光的缺陷的区域与暗场检测的孔径一致 系统，并且使得通过由缺陷检测的噪声的图案规则反射的规则反射光与暗视场检测系统的孔径不一致。

公开(公告)号：US08411264B2

公开(公告)日：2013-04-02

申请号：US12504972

申请日：2009-07-17

申请人： Takeo Ueno ,  Hiroyuki Nakano ,  Yasuhiro Yoshitake

发明人： Takeo Ueno ,  Hiroyuki Nakano ,  Yasuhiro Yoshitake

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N2021/4792 ,  G01N2021/8848

摘要： An apparatus for inspecting a substrate surface is provided, which includes illumination optics for irradiating the substrate surface linearly with rectilinearly polarized light from an oblique direction, detection optics for acquiring images of the substrate surface, each of the images being formed by the light scattered from the light-irradiated substrate surface, and means for comparing an image selected as an inspection image from the plurality of substrate surface images that the detection optics has acquired to detect defects, and another image selected from the plural images of the substrate surface as a reference image different from the inspection image; the illumination optics being formed with polarization control means for controlling a polarizing direction of the light according to a particular scanning direction of the substrate or a direction orthogonal to the scanning direction.

摘要翻译： 提供了一种用于检查基板表面的装置，其包括用于从倾斜方向线性地用直线偏振光线照射基板表面的照明光学装置，用于获取基板表面的图像的检测光学装置，每个图像由从 光照射的基板表面，以及用于将从检测光学器件已经获取的多个基板表面图像中选择为检查图像的图像与检测缺陷进行比较的装置，以及从基板表面的多个图像中选择的另一图像作为参考 图像与检查图像不同; 所述照明光学元件形成有偏振控制装置，用于根据所述基板的特定扫描方向或与扫描方向正交的方向来控制所述光的偏振方向。

公开(公告)号：US08279431B2

公开(公告)日：2012-10-02

申请号：US12626963

申请日：2009-11-30

申请人： Takenori Hirose ,  Minoru Yoshida ,  Hideaki Sasazawa ,  Yasuhiro Yoshitake

发明人： Takenori Hirose ,  Minoru Yoshida ,  Hideaki Sasazawa ,  Yasuhiro Yoshitake

IPC分类号： G01N21/00

CPC分类号： G01J3/02 ,  G01B2210/56 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0229 ,  G01N21/95607

摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.

摘要翻译： 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。 然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

公开(公告)号：US08203706B2

公开(公告)日：2012-06-19

申请号：US12423902

申请日：2009-04-15

申请人： Yukihiro Shibata ,  Yasuhiro Yoshitake

发明人： Yukihiro Shibata ,  Yasuhiro Yoshitake

IPC分类号： G01N21/00

CPC分类号： G01N21/95623 ,  G01N2021/9563 ,  G03F7/7065

摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.

摘要翻译： 提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。 通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽 二维数组。

公开(公告)号：US08121398B2

公开(公告)日：2012-02-21

申请号：US12420932

申请日：2009-04-09

申请人： Yasuhiro Yoshitake ,  Hiroyuki Nakano ,  Yukihiro Shibata

发明人： Yasuhiro Yoshitake ,  Hiroyuki Nakano ,  Yukihiro Shibata

IPC分类号： G06K9/00 ,  H04N5/335

CPC分类号： G06K9/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148 ,  H04N5/341 ,  H04N5/3743 ,  H04N5/378

摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.

摘要翻译： 将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以 以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。 因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

公开(公告)号：US20100014083A1

公开(公告)日：2010-01-21

申请号：US12504972

申请日：2009-07-17

申请人： Takeo UENO ,  Hiroyuki Nakano ,  Yasuhiro Yoshitake

发明人： Takeo UENO ,  Hiroyuki Nakano ,  Yasuhiro Yoshitake

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01N2021/4792 ,  G01N2021/8848

摘要： An apparatus for inspecting a substrate surface is provided, which includes illumination optics for irradiating the substrate surface linearly with rectilinearly polarized light from an oblique direction, detection optics for acquiring images of the substrate surface, each of the images being formed by the light scattered from the light-irradiated substrate surface, and means for comparing an image selected as an inspection image from the plurality of substrate surface images that the detection optics has acquired to detect defects, and another image selected from the plural images of the substrate surface as a reference image different from the inspection image; the illumination optics being formed with polarization control means for controlling a polarizing direction of the light according to a particular scanning direction of the substrate or a direction orthogonal to the scanning direction.

摘要翻译： 提供了一种用于检查基板表面的装置，其包括用于从倾斜方向线性地用直线偏振光线照射基板表面的照明光学装置，用于获取基板表面的图像的检测光学装置，每个图像由从 光照射的基板表面，以及用于将从检测光学器件已经获取的多个基板表面图像中选择为检查图像的图像与检测缺陷进行比较的装置，以及从基板表面的多个图像中选择的另一图像作为参考 图像与检查图像不同; 所述照明光学元件形成有偏振控制装置，用于根据所述基板的特定扫描方向或与扫描方向正交的方向来控制所述光的偏振方向。

公开(公告)号：US20090161244A1

公开(公告)日：2009-06-25

申请号：US12314938

申请日：2008-12-19

申请人： Takenori Hirose ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

发明人： Takenori Hirose ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

IPC分类号： G11B27/36

CPC分类号： G11B5/82 ,  B82Y10/00 ,  G01N21/55 ,  G01N21/95607 ,  G01N2021/95615 ,  G11B5/743 ,  G11B5/855 ,  G11B20/18 ,  G11B2220/2516

摘要： If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a 100 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements.According to the present invention, 100-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.

摘要翻译： 如果用于检查图案化介质的检查方法用于纳米压印过程控制，则需要测量每个图案元件的正确形状。 另一方面，如果检验方法是用于产品的质量控制，则必须以100％的价格检查产品。 然而，使用SEM或AFM的常规方法不能满足这些要求。 根据本发明，通过包括以下步骤的方法可以对产品进行100％的检查：用包括多个波长的光束照射形成有磁性材料图案的硬盘介质的表面; 以波长为基础检测来自硬盘介质的反射光束的强度; 根据所检测的反射光束的强度计算光谱反射率; 并根据计算出的光谱反射率检测形成在硬盘介质上的每个图形元素的形状。

公开(公告)号：US20080298222A1

公开(公告)日：2008-12-04

申请号：US12156338

申请日：2008-05-29

申请人： Takenori Hirose ,  Yasuhiro Yoshitake

发明人： Takenori Hirose ,  Yasuhiro Yoshitake

IPC分类号： G11B7/24 ,  G01N21/00

CPC分类号： G11B5/82 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/855

摘要： Embodiments of the invention provide patterned media in which the center and the direction of the disk can be detected. According to one embodiment, patterned media has a bit pattern including convex portions of a magnetic material on one surface or both surfaces of a nonmagnetic substrate having a central hole. A diffraction grating pattern is formed as an alignment pattern in the inner circumference (or outer circumference) of the patterned media. The diffraction grating pattern is a pattern having a repetitive configuration, and includes a pattern with a repetitive pitch different from that in other portions, or a portion having no pattern, at least one region on a circumference. The diffraction grating pattern is irradiated with detection light and diffracted light is detected, thereby a center and a direction of the disk can be detected.

摘要翻译： 本发明的实施例提供了可以检测盘的中心和方向的图案化介质。 根据一个实施例，图案化介质具有在具有中心孔的非磁性基板的一个表面或两个表面上具有包括磁性材料的凸部的位图案。 在图案化介质的内圆周（或外圆周）上形成衍射光栅图案作为对准图案。 衍射光栅图案是具有重复构造的图案，并且包括具有与其它部分不同的重复间距的图案，或者具有无图案的部分，圆周上的至少一个区域。 用检测光照射衍射光栅图案，并检测衍射光，从而可以检测光盘的中心和方向。

公开(公告)号：US20070052955A1

公开(公告)日：2007-03-08

申请号：US11593091

申请日：2006-11-06

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01N21/88 ,  G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.

摘要翻译： 检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。 照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。 检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。 处理器处理从传感器输出的信号并检测样本上的缺陷。