摘要:
The invention provides a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness; the colored photosensitive curing composition including, as its colorant, a dipyrromethene-based metal complex compound or a interconvertible isomer thereof, obtained from a metal or metal compound and a dipyrromethene-based compound represented by Formula (III): wherein R2 to R5, R7 represent a hydrogen atom or a substituent group; Ma represents a metal or metal compound; X3 represents NR, a nitrogen, oxygen or sulfur atom; X4 represents NR, an oxygen or sulfur atom; Y1 represents NR, a nitrogen or carbon atom; Y2 represents a nitrogen or carbon atom; R8 and R9 represent a substituent group; X5 represents a group that can bond to Ma; and a is 0, 1, or 2.
摘要:
A colorant-containing curable composition containing a tetraazaporphyrin compound represented by formula (1), wherein rings A1, A2, A3, and A4 each independently represent a benzene ring or a pyridine ring, at least one of the rings A1, A2, A3, and A4 represents a pyridine ring, R1 and R2 each independently represent a hydrogen atom or an alkyl group provided that R1 and R2 are not hydrogen atoms at the same time, m represents an integer of 1 to 8, and n is an integer of 1 to 4.
摘要:
The present invention provides a negative dye-containing curable composition comprising at least (A) an alkali-soluble binder, (B) an organic solvent-soluble dye, (C) a photopolymerization initiator, (D) a radical-polymerizable monomer and (E) an organic solvent, wherein the organic solvent-soluble dye (B) comprises at least one kind of azomethine-type dye represented by the following formula (I) and at least one kind of tetraazaporphyrin-type dye represented by the following formula (A), and the photopolymerization initiator (C) is an oxime-type compound, wherein R1 represents a hydrogen atom or a substituent group; R2 to R5 each represent a hydrogen atom or a substituent group, R6 to R7 each represent an alkyl group, alkenyl group, aryl group or heterocyclic group, Za and Zb each represent —N═ or —C(R8)═; R8 represents a hydrogen atom, alkyl group, aryl group or heterocyclic group; M1 represents a metal, and Z1 to Z4 each represent an atomic group forming a 6-membered ring composed of atoms selected from carbon and nitrogen.
摘要:
The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.
摘要:
The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination with (C-2) another radical polymerizable compound other than (C-1).
摘要:
A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.
摘要:
A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.
摘要:
A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.
摘要:
A negative dye-containing curable composition, comprising: (A) an organic solvent-soluble dye, (B) a photopolymerization initiator, (C) a radical-polymerizable monomer, and (D) an organic solvent, wherein the composition contains further comprises (X) an inorganic metal salt that is different from the organic solvent-soluble dye (A), and the content of the inorganic metal salt (X) is 0.1 mass % or less with respect to the total solid content of the composition is provided.
摘要:
A positive resist composition is disclosed, comprising (A) a resin containing at least one repeating unit represented by the following formula (I) and at least one repeating unit represented by formula (VII), which decomposes under the action of an acid to increase the solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.