EMBEDDED OPTICS IN MODULAR ASSEMBLIES
    1.
    发明申请
    EMBEDDED OPTICS IN MODULAR ASSEMBLIES 有权
    模块化组装中的嵌入式光学器件

    公开(公告)号:US20160336565A1

    公开(公告)日:2016-11-17

    申请号:US15224074

    申请日:2016-07-29

    Abstract: An enhanced multi object potting fixture for exposure to a curing modality that sets an adhesive includes a fixture housing supporting a plurality of objects, the fixture housing having a wall defining a plurality of bonding wells with each the bonding well receiving a first portion of one of the objects, each the bonding well including an aperture in the wall proximate the first portion wherein each bonding well includes a target zone for selective cure of the adhesive to inhibit the adhesive from exiting the aperture; and a fixture enhancement structure integrated into the wall concentrating the curing modality in each the target zone.

    Abstract translation: 一种用于暴露于固化模态的增强的多物体灌封装置,其设置粘合剂包括支撑多个物体的固定壳体,所述固定壳体具有限定多个结合井的壁,每个粘结井接收第一部分, 所述物体,每个所述结合井包括邻近所述第一部分的壁中的孔,其中每个结合井包括用于选择性固化所述粘合剂以抑制所述粘合剂离开所述孔的目标区域; 以及集中在每个目标区域中固化模态的壁的夹具增强结构。

    Mask manufacturing method for nanoimprinting
    4.
    发明授权
    Mask manufacturing method for nanoimprinting 有权
    面膜制造方法纳米压印

    公开(公告)号:US08658537B2

    公开(公告)日:2014-02-25

    申请号:US13768432

    申请日:2013-02-15

    Inventor: Masamitsu Itoh

    Abstract: According to one embodiment, a mask manufacturing method includes acquiring positional deviation information between an actual position of a pattern formed on a mask substrate and a design position decided at the time of designing the pattern; calculating an irradiating amount and an irradiating position of radiation to be irradiated to a predetermined area of a square on the mask substrate according to the calculated positional deviation information; and irradiating the radiation based on the calculated irradiating amount and the calculated irradiating position to form in a part of the mask substrate a heterogeneous layer of which volume is expanded more greatly than that of the surrounding mask substrate region.

    Abstract translation: 根据一个实施例,掩模制造方法包括获取在掩模基板上形成的图案的实际位置与设计图案时确定的设计位置之间的位置偏差信息; 根据计算出的位置偏差信息计算要照射到掩模基板上的正方形的预定区域的辐射的照射量和照射位置; 并且基于所计算的照射量和所计算的照射位置照射所述辐射,以在所述掩模基板的一部分中形成比所述周围掩模基板区域的体积膨胀更大的异质层。

    Mask manufacturing device
    6.
    发明授权
    Mask manufacturing device 有权
    面膜制造装置

    公开(公告)号:US08502171B2

    公开(公告)日:2013-08-06

    申请号:US13326612

    申请日:2011-12-15

    Applicant: Masamitsu Itoh

    Inventor: Masamitsu Itoh

    Abstract: A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing the pattern is calculated. A heterogeneous layer of which a volume expands more greatly than that of surrounding mask substrate region is formed in a predetermined position within the mask substrate so that volume expansion of the heterogeneous layer according to the positional deviation information is achieved.

    Abstract translation: 在掩模基板上形成图案。 计算形成在掩模基板上的图案的实际位置与设计图案时确定的设计位置之间的位置偏差信息。 在掩模基板内的预定位置形成体积比周围掩模基板区域更大地膨胀的异质层,从而实现根据位置偏差信息的异质层的体积膨胀。

    Resin forming method and resin forming apparatus
    7.
    发明授权
    Resin forming method and resin forming apparatus 有权
    树脂成形方法和树脂形成装置

    公开(公告)号:US08293165B2

    公开(公告)日:2012-10-23

    申请号:US12092828

    申请日:2006-11-15

    Abstract: A resin forming method and a resin forming apparatus for obtaining a resin formed product, by filling a cavity of a rubber-made mold with a thermoplastic resin, and cooling the thermoplastic resin. When filling the cavity with the thermoplastic resin, an electromagnetic wave generator is used, and electromagnetic waves having an intensity peak in a wavelength region of 0.78 to 2 μm are irradiated to the thermoplastic resin from the surface of the mold, and thereby the thermoplastic resin is heated selectively from the mold. The thermoplastic resin is an ABS resin which either a noncrystalline thermoplastic resin, or is a rubber modified thermoplastic resin.

    Abstract translation: 树脂形成方法和树脂形成装置,用于通过用热塑性树脂填充橡胶模具的空腔并冷却热塑性树脂来获得树脂成形产品。 当用热塑性树脂填充空腔时,使用电磁波发生器,并且从模具表面向热塑性树脂照射具有0.78至2μm波长范围内的强度峰值的电磁波,由此热塑性树脂 从模具中选择性加热。 热塑性树脂是非结晶性热塑性树脂或橡胶改性热塑性树脂的ABS树脂。

    Imprint mask manufacturing method for nanoimprinting
    9.
    发明授权
    Imprint mask manufacturing method for nanoimprinting 有权
    纳米压印印刷掩模制造方法

    公开(公告)号:US08097539B2

    公开(公告)日:2012-01-17

    申请号:US12350394

    申请日:2009-01-08

    Applicant: Masamitsu Itoh

    Inventor: Masamitsu Itoh

    Abstract: A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing the pattern is calculated. A heterogeneous layer of which a volume expands more greatly than that of surrounding mask substrate region is formed in a predetermined position within the mask substrate so that volume expansion of the heterogeneous layer according to the positional deviation information is achieved.

    Abstract translation: 在掩模基板上形成图案。 计算形成在掩模基板上的图案的实际位置与设计图案时确定的设计位置之间的位置偏差信息。 在掩模基板内的预定位置形成体积比周围掩模基板区域更大地膨胀的异质层,从而实现根据位置偏差信息的异质层的体积膨胀。

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