Amorphous alloys resistant to hot corrosion
    72.
    发明授权
    Amorphous alloys resistant to hot corrosion 失效
    无定形合金耐热腐蚀

    公开(公告)号:US5718777A

    公开(公告)日:1998-02-17

    申请号:US685391

    申请日:1996-07-23

    IPC分类号: C22C45/00 C22C45/08

    CPC分类号: C22C45/00 C22C45/08

    摘要: An amorphous alloy which is resistant to hot corrosion in sulfidizing and oxidizing atmospheres at high temperatures, consisting of at least one element selected from the group of Al and Cr and at least one element selected from the refractory metals Mo, W, Nb, and Ta, a portion of the set forth refractory metals being allowed to be substituted with at least one element selected from Fe, Co, Ni and Cu. The addition of Si further improves the alloy's oxidation resistance.

    摘要翻译: 一种在高温硫化和氧化气氛中耐热腐蚀的非晶合金,由选自Al和Cr中的至少一种元素和选自难熔金属Mo,W,Nb和Ta中的至少一种元素组成 所述难熔金属的一部分被选自Fe,Co,Ni和Cu中的至少一种元素所取代。 Si的添加进一步提高了合金的抗氧化性。

    Highly corrosion-resistant amorphous alloys
    74.
    发明授权
    Highly corrosion-resistant amorphous alloys 失效
    高耐腐蚀非晶合金

    公开(公告)号:US5549797A

    公开(公告)日:1996-08-27

    申请号:US207891

    申请日:1994-03-07

    CPC分类号: C22C45/006

    摘要: Amorphous alloy comprising 30 to 75 atomic % Cr, the remainder being substantially at least one element selected from the group consisting of Ti and Zr and alloys represented by the general formula: X.sub.a Cr.sub.b M.sub.c wherein X is at least one element selected from the group consisting of Ti and Zr; M is at least one element selected from the group consisting of Mg, Al, Fe, Co, Ni, Cu, Mo and W; and a, b, and c are, in atomic percentage, a>20, 20 .ltoreq.b.ltoreq.75, 0

    摘要翻译: 包含30〜75原子%Cr的非晶合金,余量基本上为选自Ti和Zr中的至少一种元素以及由通式XaCrbMc表示的合金,其中X为选自Ti 和Zr; M是选自Mg,Al,Fe,Co,Ni,Cu,Mo和W中的至少一种元素; 并且a,b和c以原子百分数为大于20,20

    Method for manufacturing exposure mask and the exposure mask
    75.
    发明授权
    Method for manufacturing exposure mask and the exposure mask 失效
    曝光掩模和曝光掩模的制造方法

    公开(公告)号:US5543252A

    公开(公告)日:1996-08-06

    申请号:US228504

    申请日:1994-04-15

    CPC分类号: G03F1/30 G03F1/29 G03F1/34

    摘要: A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.

    摘要翻译: 一种制造曝光掩模的方法,该曝光掩模具有用于透射曝光光的基板和在基板上以规定间隔布置的移相器,用于将透过该基板的曝光光的相位与第二波长的相位相比移动一半波长 透过基板和移相器之间的开口的曝光光由以下步骤组成:制备含有移相材料的溶液,在基板上以规定的间隔配置抗蚀剂层,将基板与抗蚀剂层浸入溶液中, 通过从溶液中沉积移相器的材料,在基板上形成位于抗蚀剂层之间的相移规定厚度的移相器,以及从基板去除抗蚀剂层以形成开口。

    Amorphous alloys resistant against hot corrosion
    76.
    发明授权
    Amorphous alloys resistant against hot corrosion 失效
    耐热腐蚀的非晶态合金

    公开(公告)号:US5482577A

    公开(公告)日:1996-01-09

    申请号:US328418

    申请日:1994-10-25

    IPC分类号: C22C45/00 C22C45/08 C22C45/10

    CPC分类号: C22C45/00 C22C45/08

    摘要: An amorphous alloy which is resistant to hot corrosion in sulfidizing and oxidizing atmospheres at high temperatures, consisting of at least one element selected from the group of Al and Cr and at least one element selected from refractory metals of Mo. W, Nb and Ta, a portion of the set forth refractory metals being allowed to be substituted with at least one element selected from Ti, Zr, Fe, Co, Ni and Cu. The addition of Si further improves the alloy oxidation resistance.

    摘要翻译: 一种耐高温硫化和氧化气氛中的热腐蚀的非晶合金,由选自Al和Cr中的至少一种元素和选自Mo.W,Nb和Ta的难熔金属中的至少一种元素组成, 所述难熔金属的一部分被允许被选自Ti,Zr,Fe,Co,Ni和Cu中的至少一种元素取代。 Si的添加进一步提高了合金的抗氧化性。

    Receptacle for printed circuit board
    78.
    发明授权
    Receptacle for printed circuit board 失效
    印刷电路板插座

    公开(公告)号:US3975076A

    公开(公告)日:1976-08-17

    申请号:US403445

    申请日:1973-10-04

    摘要: A connector which has bellows type contacts of spring metal and a holder which has a bottom, a longitudinal slot for receiving a circuit panel, a cavity for housing the bellows type contact, a hollow formed at upper portion of the cavity and partition wall for separating the adjacent contacts. The bellows type contact consists of a lower end portion, an attached portion, a first bent portion, a second bent portion, a straight portion, a third bent portion and an upper end portion. The straight portion is the portion contacting the panel circuit. The contact has a spring substrate which consists of phosphor bronze, a contact metal of tin or tin-lead alloy, and a layer of copper between the substrate and the contact metal. With the improved shape and material of the contact, there is provided better contact performance even for a contact of tin or tin-lead alloy which is very cheap compared to the conventional gold contact and it is thus advantageous for use in consumer type electric equipment.

    摘要翻译: 具有弹簧金属的波纹管型触点的连接器和具有底部的保持器,用于容纳电路板的纵向槽,用于容纳波纹管型触头的空腔,形成在空腔上部的中空部分和分隔壁 相邻的接触。 波纹管型触点由下端部,安装部,第一弯曲部,第二弯曲部,直线部,第三弯曲部和上端部构成。 直线部分是接触面板电路的部分。 接触件具有由磷青铜,锡或锡铅合金的接触金属以及衬底和接触金属之间的铜层组成的弹簧衬底。 随着接触的形状和材料的改进,即使对于与常规金接触相比非常便宜的锡或锡铅合金的接触也提供了更好的接触性能,因此有利于在消费型电气设备中使用。

    Information processing apparatus and method
    79.
    发明授权
    Information processing apparatus and method 有权
    信息处理装置和方法

    公开(公告)号:US09141941B2

    公开(公告)日:2015-09-22

    申请号:US13565182

    申请日:2012-08-02

    摘要: A computer determines whether destination information is included in permission target information. The destination information indicates a destination to which a file stored in a storage device is transferred. The permission target information includes information indicating a target permitted to access the file. The computer prompts before the file is transferred, upon determining that the destination information is not included in the permission target information, a user to input whether to permit the transfer. The computer adds the destination information to the permission target information upon receiving, via an input device, a permission input for permitting the transfer. The computer transfers the file upon receiving the permission input.

    摘要翻译: 计算机确定目的地信息是否包括在许可目标信息中。 目的地信息表示存储在存储装置中的文件被传送到的目的地。 许可目标信息包括指示允许访问文件的目标的信息。 在确定目的地信息不包括在许可目标信息中之后,计算机在传送文件之前提示输入是否允许传送。 当通过输入装置接收允许传送的许可输入时,计算机将目的地信息添加到许可目标信息。 计算机在收到许可输入后传输文件。

    Semiconductor device having dummy bit lines wider than bit lines
    80.
    发明授权
    Semiconductor device having dummy bit lines wider than bit lines 有权
    具有比位线宽的虚拟位线的半导体器件

    公开(公告)号:US08705261B2

    公开(公告)日:2014-04-22

    申请号:US13560137

    申请日:2012-07-27

    IPC分类号: G11C5/06

    摘要: A method of manufacturing a semiconductor device includes forming a plurality of dummy line patterns arranged at a first pitch on an underlying region, forming first mask patterns having predetermined mask portions formed on long sides of the dummy line patterns, each of the first mask patterns having a closed-loop shape and surrounding each of the dummy line patterns, removing the dummy line patterns, forming a second mask pattern having a first pattern portion which covers end portions of the first mask patterns and inter-end portions each located between adjacent ones of the end portions, etching the underlying region using the first mask patterns and the second mask pattern as a mask to form trenches each located between adjacent ones of the predetermined mask portions, and filling the trenches with a predetermined material.

    摘要翻译: 一种制造半导体器件的方法包括在下面的区域上形成以第一间距布置的多个虚拟线图案,形成具有形成在虚拟线图案的长边上的预定掩模部分的第一掩模图案,每个第一掩模图案具有 闭环形状并且围绕每个虚拟线图案,去除虚拟线图案,形成具有第一图案部分的第二掩模图案,该第一图案部分覆盖第一掩模图案的端部和位于相邻的第一掩模图案的端部之间的端部部分 端部,使用第一掩模图案和第二掩模图案作为掩模蚀刻下面的区域,以形成各自位于相邻的预定掩模部分之间的沟槽,并且用预定的材料填充沟槽。