摘要:
A route guidance section compares the current position provided by a current position determination section and the route provided by a route calculation section for detecting an off-route condition. When the off-route condition is detected, a re-searching key as well as the route and current place is displayed on a display section. When the re-searching key is touched, a search is again made for a new route from the current position to the destination. Then, route guidance is again started in response to the re-searching result. When the re-searching key is not touched, the route and current place continue to be displayed while the vehicle carrying the apparatus travles off route, thereby efficiently preventing the apparatus from executing unnecessary re-searching when the driver drives the vehicle off route on purpose.
摘要:
An amorphous alloy which is resistant to hot corrosion in sulfidizing and oxidizing atmospheres at high temperatures, consisting of at least one element selected from the group of Al and Cr and at least one element selected from the refractory metals Mo, W, Nb, and Ta, a portion of the set forth refractory metals being allowed to be substituted with at least one element selected from Fe, Co, Ni and Cu. The addition of Si further improves the alloy's oxidation resistance.
摘要:
A corrosion-resistant amorphous alloy containing Ta in an amount of from 10 to 40 atomic % and Mo, Cr, W, P, B and/or Si is disclosed.This alloy can be prepared by rapidly cooling and solidifying molten alloy, shows a satisfactory corrosion resistance in high-temperature concentrated phosphoric acid, and is adapted to be used as a plant structural material or a separator for a fuel cell.
摘要:
Amorphous alloy comprising 30 to 75 atomic % Cr, the remainder being substantially at least one element selected from the group consisting of Ti and Zr and alloys represented by the general formula: X.sub.a Cr.sub.b M.sub.c wherein X is at least one element selected from the group consisting of Ti and Zr; M is at least one element selected from the group consisting of Mg, Al, Fe, Co, Ni, Cu, Mo and W; and a, b, and c are, in atomic percentage, a>20, 20 .ltoreq.b.ltoreq.75, 0
摘要:
A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.
摘要:
An amorphous alloy which is resistant to hot corrosion in sulfidizing and oxidizing atmospheres at high temperatures, consisting of at least one element selected from the group of Al and Cr and at least one element selected from refractory metals of Mo. W, Nb and Ta, a portion of the set forth refractory metals being allowed to be substituted with at least one element selected from Ti, Zr, Fe, Co, Ni and Cu. The addition of Si further improves the alloy oxidation resistance.
摘要:
A coupled capacitor substrate having thereon a plane capacitor which is integrally bonded on a dielectric resonator and a varactor which is mounted on the coupled capacitor substrate so as to couple the dielectric resonator via the plane capacitor.
摘要:
A connector which has bellows type contacts of spring metal and a holder which has a bottom, a longitudinal slot for receiving a circuit panel, a cavity for housing the bellows type contact, a hollow formed at upper portion of the cavity and partition wall for separating the adjacent contacts. The bellows type contact consists of a lower end portion, an attached portion, a first bent portion, a second bent portion, a straight portion, a third bent portion and an upper end portion. The straight portion is the portion contacting the panel circuit. The contact has a spring substrate which consists of phosphor bronze, a contact metal of tin or tin-lead alloy, and a layer of copper between the substrate and the contact metal. With the improved shape and material of the contact, there is provided better contact performance even for a contact of tin or tin-lead alloy which is very cheap compared to the conventional gold contact and it is thus advantageous for use in consumer type electric equipment.
摘要:
A computer determines whether destination information is included in permission target information. The destination information indicates a destination to which a file stored in a storage device is transferred. The permission target information includes information indicating a target permitted to access the file. The computer prompts before the file is transferred, upon determining that the destination information is not included in the permission target information, a user to input whether to permit the transfer. The computer adds the destination information to the permission target information upon receiving, via an input device, a permission input for permitting the transfer. The computer transfers the file upon receiving the permission input.
摘要:
A method of manufacturing a semiconductor device includes forming a plurality of dummy line patterns arranged at a first pitch on an underlying region, forming first mask patterns having predetermined mask portions formed on long sides of the dummy line patterns, each of the first mask patterns having a closed-loop shape and surrounding each of the dummy line patterns, removing the dummy line patterns, forming a second mask pattern having a first pattern portion which covers end portions of the first mask patterns and inter-end portions each located between adjacent ones of the end portions, etching the underlying region using the first mask patterns and the second mask pattern as a mask to form trenches each located between adjacent ones of the predetermined mask portions, and filling the trenches with a predetermined material.