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公开(公告)号：US20090213215A1
公开(公告)日：2009-08-27
申请号：US12389962
申请日：2009-02-20
CPC分类号： G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/10152 , G06T2207/30148
摘要： In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.
摘要翻译： 在用于检查具有缺陷的电路图案的晶片的缺陷检查装置中，选择性地确定照明光线的照明方向，使得包含散射高强度的光的缺陷的区域与暗场检测的孔径一致 系统，并且使得通过由缺陷检测的噪声的图案规则反射的规则反射光与暗视场检测系统的孔径不一致。
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公开(公告)号：US20090002695A1
公开(公告)日：2009-01-01
申请号：US12141955
申请日：2008-06-19
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2021/8861 , G02B21/0032 , G02B21/0072
摘要： The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the defect existed on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.
摘要翻译： 本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法，包括：光学显微镜; 修正手段; 和扫描电子显微镜检查样品上存在的缺陷; 其中所述光学显微镜具有：光学高度检测系统，其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置，其基于由光学高度检测系统检测到的样品的上表面的垂直位置来调节光学显微镜的焦点位置。
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公开(公告)号：US06721940B2
公开(公告)日：2004-04-13
申请号：US10107934
申请日：2002-03-26
IPC分类号： G06F1750
CPC分类号： G03F7/705 , G03F7/70525 , G03F7/70558 , G03F7/706 , G03F7/70641
摘要： In lithographic (exposure) processing for semiconductor device fabrication, the task of extracting exposure parameters is performed by calculating exposure energy and focus offset using a test wafer for each exposure device, because fluctuations due to differences between exposure devices are large. For the fabrication of semiconductor devices in multiple-product small-lot production, the number of times the task of extracting exposure parameters has to be performed increases, so that the operation ratio of the exposure devices decreases, and the TAT of the semiconductor device fabrication increases. Moreover, as the miniaturization of semiconductor devices advances, differences between the exposure devices cause defects due to the exposure processing, and the yield of the semiconductor device fabrication decreases. In an improved method of exposure processing for semiconductor devices, the exposure energy and focus offset according to the illumination parameters for an exposure device and optical projection system, using information regarding the projection lens aberrations of a plurality of exposure devices, the photoresist parameters, and the circuit pattern information, as determined beforehand, are calculated using an optical development simulator, and the exposure processing is carried out using an exposure device, selected from a plurality of exposure devices, in which the process window is within a certain tolerance value.
摘要翻译： 在用于半导体器件制造的光刻（曝光）处理中，由于曝光装置之间的差异引起的波动，所以通过使用每个曝光装置的测试晶片计算曝光能量和聚焦偏移来执行提取曝光参数的任务。 对于多产品小批量生产中的半导体器件的制造，必须执行提取曝光参数的任务的次数增加，使得曝光装置的操作比降低，并且半导体器件制造的TAT 增加 此外，随着半导体器件的小型化的发展，曝光装置之间的差异导致由于曝光处理而引起的缺陷，并且半导体器件制造的成品率降低。 在半导体器件的曝光处理的改进方法中，使用关于多个曝光装置的投影透镜像差的信息，光致抗蚀剂参数以及与多个曝光装置的投影透镜像差有关的信息，根据曝光装置和光学投影系统的照明参数的曝光能量和聚焦偏移 使用光学显影模拟器计算预先确定的电路图案信息，并且使用从多个曝光装置中选择的曝光装置进行曝光处理，其中处理窗口在某一公差值内。
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公开(公告)号：US06697698B2
公开(公告)日：2004-02-24
申请号：US10198394
申请日：2002-07-17
IPC分类号： G06F1900
CPC分类号： H01L21/67253 , G03F7/70125 , G03F7/705 , G03F7/70525 , G03F7/706 , G03F7/70633
摘要： A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions and the wave aberration of an exposure lens, feeds a correction value based on the predicted difference back to an exposure device and modifies an overlay inspection data control limit.
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公开(公告)号：US06456951B1
公开(公告)日：2002-09-24
申请号：US09553944
申请日：2000-04-21
申请人： Shunji Maeda , Yasuhiro Yoshitake , Kenji Oka , Masataka Shiba , Atsushi Shimoda
发明人： Shunji Maeda , Yasuhiro Yoshitake , Kenji Oka , Masataka Shiba , Atsushi Shimoda
IPC分类号： G06F1132
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention is related to an inspection data processing method for processing inspection data composed of coordinates data and characteristic quantity data about a defect generated on a subject of inspection detected with a visual inspection apparatus. The inspection data processing method comprises the following steps: a preparation step of storing a first fatality judgment data group corresponding to the kinds of areas on the subject of inspection and a second fatality judgment data group corresponding to categories of defects beforehand; a first fatality judgment step of judging a first fatality level of a defect corresponding to the kind of an area where the defect exists; a category giving step of giving category to the defect in the inspection data; and a second fatality judgment step of judging a second fatality of the defect based on second fatality judgment data selected according to the category which are given based on the first fatality level of defects judged in the first fatality judgment step.
摘要翻译： 本发明涉及一种用于处理检查数据的检查数据处理方法，该检查数据由关于在用目视检查装置检测到的检查对象上产生的缺陷的坐标数据和特征量数据组成。 检查数据处理方法包括以下步骤：预先存储与检查对象的区域的种类对应的第一死亡判定数据组和对应于缺陷类别的第二死亡判定数据组的准备步骤; 判断与存在缺陷的区域的种类相对应的缺陷的第一死亡水平的第一死亡判定步骤; 类别给出检查数据中的缺陷类别的步骤; 以及第二死亡判定步骤，基于根据在第一死亡判定步骤中判断的缺陷的第一死亡水平给出的根据类别选择的第二死亡判定数据来判断缺陷的第二死亡。
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公开(公告)号：US4993837A
公开(公告)日：1991-02-19
申请号：US301962
申请日：1989-01-25
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
CPC分类号： G03F9/70
摘要： A method and a system for pattern detection are disclosed in which a laser beam high in directivity is emitted from a laser beam source, the laser beam emitted from the laser beam source is irradiated on an uneven pattern to be detected on an object, the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the light reflected from the object when an image of the pattern on the object is formed through an objective lens, the optical image thus formed is received by a photoelectric converting device for producing a signal waveform representing the pattern free of a signal of the frequency corresponding to the cut-off frequency, and the pattern is detected from a signal produced from the photoelectric converting device.
摘要翻译： 公开了一种用于图案检测的方法和系统，其中从激光束源发射高方向性的激光束，从激光束源发射的激光束照射在待检测物体上的不均匀图案上，光 当通过物镜形成物体上的图案的图像时，从物体反射的光中除去与物镜的截止频率相对应的频率的分量，由此形成的光学图像由光电 用于产生表示没有与截止频率相对应的频率的信号的模式的信号波形的转换装置，并且根据从光电转换装置产生的信号检测图案。
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公开(公告)号：US08416292B2
公开(公告)日：2013-04-09
申请号：US12389962
申请日：2009-02-20
IPC分类号： H04N7/18
CPC分类号： G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/10152 , G06T2207/30148
摘要： In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.
摘要翻译： 在用于检查具有缺陷的电路图案的晶片的缺陷检查装置中，选择性地确定照明光线的照明方向，使得包含散射高强度的光的缺陷的区域与暗场检测的孔径一致 系统，并且使得通过由缺陷检测的噪声的图案规则反射的规则反射光与暗视场检测系统的孔径不一致。
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公开(公告)号：US08411264B2
公开(公告)日：2013-04-02
申请号：US12504972
申请日：2009-07-17
申请人： Takeo Ueno , Hiroyuki Nakano , Yasuhiro Yoshitake
发明人： Takeo Ueno , Hiroyuki Nakano , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N2021/4792 , G01N2021/8848
摘要： An apparatus for inspecting a substrate surface is provided, which includes illumination optics for irradiating the substrate surface linearly with rectilinearly polarized light from an oblique direction, detection optics for acquiring images of the substrate surface, each of the images being formed by the light scattered from the light-irradiated substrate surface, and means for comparing an image selected as an inspection image from the plurality of substrate surface images that the detection optics has acquired to detect defects, and another image selected from the plural images of the substrate surface as a reference image different from the inspection image; the illumination optics being formed with polarization control means for controlling a polarizing direction of the light according to a particular scanning direction of the substrate or a direction orthogonal to the scanning direction.
摘要翻译： 提供了一种用于检查基板表面的装置，其包括用于从倾斜方向线性地用直线偏振光线照射基板表面的照明光学装置，用于获取基板表面的图像的检测光学装置，每个图像由从 光照射的基板表面，以及用于将从检测光学器件已经获取的多个基板表面图像中选择为检查图像的图像与检测缺陷进行比较的装置，以及从基板表面的多个图像中选择的另一图像作为参考 图像与检查图像不同; 所述照明光学元件形成有偏振控制装置，用于根据所述基板的特定扫描方向或与扫描方向正交的方向来控制所述光的偏振方向。
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公开(公告)号：US08203706B2
公开(公告)日：2012-06-19
申请号：US12423902
申请日：2009-04-15
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译： 提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。 通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽 二维数组。
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公开(公告)号：US08121398B2
公开(公告)日：2012-02-21
申请号：US12420932
申请日：2009-04-09
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译： 将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以 以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。 因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。
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