公开(公告)号：US20100085657A1

公开(公告)日：2010-04-08

申请号：US12543845

申请日：2009-08-19

申请人： Kenya Ito ,  Takehiko Hamaguchi

发明人： Kenya Ito ,  Takehiko Hamaguchi

IPC分类号： G11B21/02

CPC分类号： G11B5/012 ,  B82Y10/00 ,  G11B5/1278 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B2005/0013

摘要： According to one embodiment, a control method for a magnetic disk device includes writing data by varying a phase of the array period of the plurality of magnetic elements or a phase of the time period of the recording signal in one section of the track from a corresponding phase in another section of the track, reading a reproduction signal from the track, and determining a phase shift between the array period of the plurality of magnetic elements and the time period of the recording signal, based on a reproduction signal read from the one section and a reproduction signal read from the other section. In another embodiment, a magnetic disk includes a track in which magnetic elements are magnetically separated and arranged in an array period, and a phase of the array period in one section is different from a phase in another section of the track.

摘要翻译： 根据一个实施例，一种用于磁盘装置的控制方法包括：通过改变多个磁性元件的阵列周期的相位或从轨道的一个部分中的记录信号的时间段的相位来写入数据 在轨道的另一部分中相位，从轨道读取再现信号，并且基于从一个部分读取的再现信号，确定多个磁性元件的阵列周期与记录信号的时间段之间的相移 以及从另一部分读取的再现信号。 在另一个实施例中，磁盘包括其中磁性元件以阵列周期被磁性地分离和布置的轨道，并且一个部分中的阵列周期的相位不同于轨道的另一部分中的相位。

公开(公告)号：US20100063222A1

公开(公告)日：2010-03-11

申请号：US12519347

申请日：2007-12-17

申请人： Hisao Oikawa ,  Koji Ohguma ,  Kenya Ito ,  Minoru Nakayama ,  Shin Koga ,  Mikio Yamahiro ,  Hiroyuki Sato

发明人： Hisao Oikawa ,  Koji Ohguma ,  Kenya Ito ,  Minoru Nakayama ,  Shin Koga ,  Mikio Yamahiro ,  Hiroyuki Sato

IPC分类号： C08L83/06 ,  C08G77/04

CPC分类号： C08F290/06 ,  C08F283/12 ,  C08F290/068 ,  C08F290/14 ,  C08F290/148 ,  C08G77/04 ,  C08G77/24 ,  C08G77/385

摘要： A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.

摘要翻译： 含有：分子内具有一个加成聚合官能团的氟代倍半硅氧烷的结构单元A的聚合物; 衍生自具有可加聚官能团的有机聚硅氧烷的结构单元B; 和由可加聚单体衍生的具有在侧链上具有可聚合不饱和键的基团的结构单元C，并且任选地含有衍生自具有一个可加聚可聚合的氟代倍半硅氧烷以外的可加聚单体的结构单元D 分子中的官能团，具有加聚性官能团的有机聚硅氧烷和具有能够引入具有聚合性不饱和键的基团的官能团的加成聚合性单体。

公开(公告)号：US07662985B2

公开(公告)日：2010-02-16

申请号：US12318736

申请日：2009-01-07

申请人： Mikio Yamahiro ,  Hisao Oikawa ,  Kenya Ito ,  Yasuhiro Yamamoto ,  Masami Tanaka ,  Nobumasa Ootake ,  Kenichi Watanabe ,  Kohji Ohno ,  Yoshinobu Tsujii ,  Takeshi Fukuda

发明人： Mikio Yamahiro ,  Hisao Oikawa ,  Kenya Ito ,  Yasuhiro Yamamoto ,  Masami Tanaka ,  Nobumasa Ootake ,  Kenichi Watanabe ,  Kohji Ohno ,  Yoshinobu Tsujii ,  Takeshi Fukuda

IPC分类号： C07F7/04

CPC分类号： C08G77/04 ,  C07F7/21 ,  C08F10/00 ,  C08F30/08 ,  C08F2500/03

摘要： A production process for a silicon compound represented by Formula (6), characterized by reacting a compound represented by Formula (4) with a compound represented by Formula (5): wherein all of the variables are defined in the specification.

摘要翻译： 一种由式（6）表示的硅化合物的制备方法，其特征在于使由式（4）表示的化合物与式（5）表示的化合物反应：其中所有变量在说明书中定义。

公开(公告)号：US20090117828A1

公开(公告)日：2009-05-07

申请号：US10581669

申请日：2005-02-23

申请人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

发明人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

IPC分类号： B24B49/04 ,  B24B1/04 ,  B24B49/12 ,  B24B9/02 ,  B24B57/02

CPC分类号： B24B37/02 ,  B24B9/065 ,  B24B21/002

摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing (3) for forming a polishing chamber (2) therein, a rotational table (1) for holding and rotating a substrate (W), a polishing tape supply mechanism (6) for supplying a polishing tape (5) into the polishing chamber (2) and supplied to the polishing chamber (2), a polishing head (35) for pressing the polishing tape (5) against a bevel portion of the substrate (W), a liquid supply (50) for supplying a liquid to a front surface and a rear surface of the substrate (W), and a regulation mechanism (16) for making an internal pressure of the polishing chamber (2) being set to be lower than an external pressure of the polishing chamber (2).

摘要翻译： 本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。 抛光装置包括用于在其中形成研磨室（2）的壳体（3），用于保持和旋转基底（W）的旋转台（1），用于供应研磨带（5）的研磨带供给机构 ）到抛光室（2）中并供给到抛光室（2），用于将抛光带（5）压靠在基板（W）的斜面部分上的抛光头（35） 将液体供给到所述基板（W）的前表面和后表面;以及调节机构（16），用于使所述研磨室（2）的内部压力被设定为低于所述研磨室 （2）。

公开(公告)号：US20060204680A1

公开(公告)日：2006-09-14

申请号：US11363175

申请日：2006-02-28

申请人： Takayuki Hattori ,  Keizo Iwatani ,  Nobuyuki Ootsuka ,  Takashi Katoh ,  Kenya Ito ,  Nobumasa Ootake ,  Kazuhiro Yoshida

发明人： Takayuki Hattori ,  Keizo Iwatani ,  Nobuyuki Ootsuka ,  Takashi Katoh ,  Kenya Ito ,  Nobumasa Ootake ,  Kazuhiro Yoshida

IPC分类号： C09K19/00

CPC分类号： G02F1/133719 ,  C09K19/56 ,  Y10T428/1014 ,  Y10T428/1045 ,  Y10T428/1068

摘要： A varnish for forming a liquid crystal alignment layer is prepared by formulating a polymer obtained by using a silsesquioxane derivative represented by the formula (1), and a solvent. In the formula (1), R independently represents an unsubstituted phenyl, cyclopentyl, cyclohexyl, or t-butyl group, and Y1 independently represents a group selected from the following formulae (a-1) to (a-6).

摘要翻译： 通过配制通过使用由式（1）表示的倍半硅氧烷衍生物获得的聚合物和溶剂来制备用于形成液晶取向层的清漆。 在式（1）中，R独立地表示未取代的苯基，环戊基，环己基或叔丁基，Y 1独立地表示选自下式（a-1）至（ a-6）。

公开(公告)号：US20060089504A1

公开(公告)日：2006-04-27

申请号：US11294364

申请日：2005-12-06

申请人： Kenya Ito ,  Mikio Yamahiro ,  Kenichi Watanabe

发明人： Kenya Ito ,  Mikio Yamahiro ,  Kenichi Watanabe

IPC分类号： C07F7/10

CPC分类号： C08G77/06 ,  C08G77/045 ,  C08G77/38

摘要： A conventional silsesquioxane derivative has the problems that the functional groups are restricted and the chemical structure is not readily controlled and that it is expensive. The present inventors have developed a process for producing a silsesquioxane derivative at a high yield by a simple process in order to solve such problems. The novel silsesquioxane derivative according to the present invention is controlled in a structure thereof and has a functional group, which is excellent in reactivity with a target compound, to be modified. The present invention relates to a production process for a silsesquioxane derivative represented by Formula (2), characterized by using a silicon compound represented by Formula (1). In Formula (1) and Formula (2), R is a group selected from hydrogen, alkyl, aryl and arylalkyl; M is a monovalent alkaline metal atom; at least one of Y is a group represented by Formula (3), and the remainder of Y is hydrogen; R1 and R2 in Formula (3) represent the same group as defined for R; and Z is a functional group or a group having a functional group.

摘要翻译： 常规的倍半硅氧烷衍生物存在官能团受限并且化学结构不容易控制并且昂贵的问题。 为了解决这些问题，本发明人通过简单的工艺开发了高产率的倍半硅氧烷衍生物的制备方法。 根据本发明的新型倍半硅氧烷衍生物在其结构中被控制，并且具有与待改性的目标化合物的反应性优异的官能团。 本发明涉及由式（2）表示的倍半硅氧烷衍生物的制备方法，其特征在于使用由式（1）表示的硅化合物。 在式（1）和式（2）中，R是选自氢，烷基，芳基和芳基烷基的基团; M是一价碱性金属原子; Y中的至少一个为由式（3）表示的基团，Y的其余部分为氢; 式（3）中的R 1和R 2代表与R所定义的相同的基团; Z为官能团或具有官能团的基团。

公开(公告)号：US20050092351A1

公开(公告)日：2005-05-05

申请号：US10695826

申请日：2003-10-30

申请人： Takayuki Saito ,  Tsukuru Suzuki ,  Kaoru Yamada ,  Kenya Ito ,  Masayuki Kamezawa ,  Kenji Yamaguchi

发明人： Takayuki Saito ,  Tsukuru Suzuki ,  Kaoru Yamada ,  Kenya Ito ,  Masayuki Kamezawa ,  Kenji Yamaguchi

IPC分类号： B08B3/02 ,  H01L21/00

CPC分类号： H01L21/6708 ,  B08B3/02 ,  Y10S134/902

摘要： The present invention provides a substrate processing apparatus and a substrate processing method suitable for use in an etching apparatus which etches a thin film formed on a peripheral portion of a substrate. The present invention also provides a substrate processing apparatus and a substrate processing method suitable for use in a cleaning apparatus which performs a cleaning process on a substrate which has been etched. The substrate processing apparatus for use in etching includes a substrate holder 11 for holding a substrate W substantially horizontally and rotating the substrate W, and a processing liquid supply unit 15 for supplying a processing liquid onto a peripheral portion of the substrate W which is being rotated in such a manner that the processing liquid is stationary with respect to the substrate W. The substrate processing apparatus for use in cleaning a substrate includes a substrate holder 54 for holding a substrate W substantially horizontally and rotating the substrate W, and a cleaning liquid supply unit 53 having a cleaning liquid outlet 53a which is oriented from a center of the substrate W toward a peripheral portion of the substrate W with an elevation angle of not more than 45° from a surface of the substrate W. The cleaning liquid supply unit 53 supplies a cleaning liquid to the surface of the substrate W at a flow velocity of not less than 0.1 m/s.

摘要翻译： 本发明提供一种适用于腐蚀形成在基板的周边部分上的薄膜的蚀刻装置中的基板处理装置和基板处理方法。 本发明还提供一种适用于在已被蚀刻的基板上进行清洗处理的清洗装置的基板处理装置和基板处理方法。 用于蚀刻的基板处理装置包括基板保持器11，用于基本上水平地保持基板W并旋转基板W;以及处理液体供应单元15，用于将处理液体供应到正在旋转的基板W的周边部分 处理液体相对于基板W是静止的。用于清洗基板的基板处理装置包括：基板保持件54，用于基本上水平地保持基板W并旋转基板W;以及清洗液供给部 单元53具有从基板W的中心朝向基板W的周边部分取向的清洗液出口53a，其与基板W的表面具有不大于45°的仰角。清洗液供给单元 53以不小于0.1m / s的流速向基板W的表面供给清洗液。

公开(公告)号：US06716516B2

公开(公告)日：2004-04-06

申请号：US10202875

申请日：2002-07-26

申请人： Masaaki Futamoto ,  Nobuyuki Inaba ,  Yoshiyuki Hirayama ,  Yukio Honda ,  Kazuetsu Yoshida ,  Kenya Ito

发明人： Masaaki Futamoto ,  Nobuyuki Inaba ,  Yoshiyuki Hirayama ,  Yukio Honda ,  Kazuetsu Yoshida ,  Kenya Ito

IPC分类号： G11B566

CPC分类号： H04B10/504 ,  G11B5/66 ,  Y10S428/90 ,  Y10T428/12465 ,  Y10T428/12861 ,  Y10T428/12875 ,  Y10T428/24942 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/26 ,  Y10T428/265

摘要： Magnetic recording medium includes at least two layers having different magnetic anisotropy constants formed on a substrate and the perpendicular magnetic anisotropy of the second magnetic film of those magnetic films, far from the substrate surface, made equal to or larger than that of the first magnetic film near to the substrate surface, thus improving the magnetic isolation.

摘要翻译： 磁记录介质包括形成于基板上的至少两层不同的磁各向异性常数，并且远离基板表面的这些磁性膜的第二磁性膜的垂直磁各向异性等于或大于第一磁性膜 靠近基板表面，从而改善磁隔离。

公开(公告)号：US06543080B1

公开(公告)日：2003-04-08

申请号：US09635848

申请日：2000-08-11

申请人： Hiroshi Tomita ,  Soichi Nadahara ,  Mitsuhiko Shirakashi ,  Kenya Ito ,  Yuki Inoue

发明人： Hiroshi Tomita ,  Soichi Nadahara ,  Mitsuhiko Shirakashi ,  Kenya Ito ,  Yuki Inoue

IPC分类号： B08B312

CPC分类号： B08B3/12

摘要： A semiconductor substrate cleaning apparatus and method are capable of efficiently removing contamination from both the obverse and reverse sides of a semiconductor substrate. A single cleaning liquid supply nozzle for supplying a cleaning liquid to both the obverse and reverse sides of a semiconductor substrate to be cleaned is placed at a distance from the outer peripheral edge of the substrate. An ultrasonic vibrator applies ultrasonic waves to both the obverse and reverse sides of the substrate. Four driving rollers are disposed in contact with the outer peripheral edge of the substrate. The driving rollers are adapte to rotate while being engaged with the outer peripheral edge of the substrate thereby drivingly rotating the substrate.

摘要翻译： 半导体衬底清洁装置和方法能够有效地去除半导体衬底的正面和反面两侧的污染物。 将待清洗的半导体衬底的正面和反面两侧的清洗液供给单个清洗液供给喷嘴设置在与衬底的外周边缘一定距离处。 超声波振动器对基板的正反面施加超声波。 四个驱动辊设置成与基板的外周边缘接触。 驱动辊适于旋转，同时与基板的外周边缘接合，从而驱动旋转基板。

公开(公告)号：US06494220B1

公开(公告)日：2002-12-17

申请号：US09584091

申请日：2000-05-31

申请人： Naoki Matsuda ,  Kenya Ito ,  Mitsuhiko Shirakashi

发明人： Naoki Matsuda ,  Kenya Ito ,  Mitsuhiko Shirakashi

IPC分类号： B08B304

CPC分类号： H01L21/67051 ,  B08B1/04 ,  B08B3/02 ,  Y10S134/902

摘要： A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation of the substrate by supplying a cleaning liquid thereto. The apparatus further comprises a cleaning vessel including a side wall encircling the substrate rotated by the holder to intercept the cleaning liquid supplied to and scattered from the rotating substrate and then finally drain the cleaning liquid. There is provided a vent duct for carrying gas from the inside of the cleaning vessel to the outside of the same. The vent duct includes an inlet provided at substantially the same level as that of the substrate for introducing the gas into the vent duct. The side wall may include an inner surface along which the cleaning liquid scattered from the substrate flows downward in a spiral manner, with the inner surface, being of a construction which impedes the spiral movement of the liquid in a circumferential or peripheral direction.

摘要翻译： 清洁装置包括用于水平地保持诸如半导体晶片的基板并且使基板围绕其中心轴旋转的保持器，同时通过向其提供清洁液体进行清洁操作。 该装置还包括一个清洁容器，该清洁容器包括围绕由保持器旋转的基板的侧壁，以拦截供应到旋转基板并从旋转基板散射的清洗液体，然后最终排出清洗液体。 设置有用于将气体从清洁容器的内部输送到其外部的通风管道。 排气管道包括与基板基本相同的水平设置的入口，用于将气体引入通风管道。 侧壁可以包括内表面，从衬底散射的清洁液体沿着内表面以螺旋方式向下流动，内表面具有阻止液体在周向或周向上的螺旋运动的结构。