公开(公告)号：US07767041B2

公开(公告)日：2010-08-03

申请号：US10844345

申请日：2004-05-13

申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Toshiki Sato ,  Hitoshi Matsuzaki ,  Hideo Fujii

发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Toshiki Sato ,  Hitoshi Matsuzaki ,  Hideo Fujii

IPC分类号： C22C5/06 ,  C22F1/14

CPC分类号： C22C5/06 ,  C23C14/3414

摘要： The sputtering target made of a Ag—Bi-base alloy contains Bi in solid solution with Ag. The sputtering target has an intensity of precipitated Bi of 0.01 at %−1 or less, as calculated by the following mathematical expression (1) based on analysis results of X-ray diffraction, and/or a sum of area ratios of predetermined intensities (third to sixth intensities in 8 intensities) of 89% or more, wherein the area ratios are obtained by calculating a planar distribution of characteristic X-ray intensities of Bi according to X-ray microanalysis: intensity of precipitated Bi=[IBi(102)/IAg(111)+IAg(200)+IAg(220)+IAg(311))]/[Bi]. Remarkable lowering of the yield of Bi content in resultant films can be suppressed by using the sputtering target.

摘要翻译： 由Ag-Bi基合金制成的溅射靶包含Bi的Bi与Ag的固溶体。 溅射靶的沉积Bi强度为0.01at％-1以下，根据X射线衍射的分析结果通过以下数学式（1）计算，和/或预定强度的面积比（ 8个强度的第三至第六强度）为89％以上，其中，通过根据X射线微量分析计算Bi的特征X射线强度的平面分布来获得面积比：沉淀Bi = [IBi（102） / IAg（111）+ IAg（200）+ IAg（220）+ IAg（311））] / [Bi]。 通过使用溅射靶可以抑制所得膜中Bi含量的产率的显着降低。

公开(公告)号：US20100151358A1

公开(公告)日：2010-06-17

申请号：US12441722

申请日：2007-09-25

申请人： Toshiki Sato ,  Jun Suzuki ,  Takashi Yashiki ,  Masahito Fukuda ,  Yasuko Fukuda

发明人： Toshiki Sato ,  Jun Suzuki ,  Takashi Yashiki ,  Masahito Fukuda ,  Yasuko Fukuda

IPC分类号： H01M8/02 ,  C23C14/34

CPC分类号： H01M8/0208 ,  C23C14/16 ,  C23C14/34 ,  C23C14/5806 ,  C23C14/5853 ,  H01M8/0206 ,  H01M8/0228 ,  H01M2008/1095 ,  Y02P70/56

摘要： A method for manufacturing a fuel cell separator, including: forming by a PVD method a precious metal layer on a surface of a substrate, as a fuel cell separator, made of Ti or a Ti alloy, wherein the precious metal layer includes at least one precious metal selected from Ru, Rh, Pd, Os, Ir, Pt and Au and has a thickness of 2 nm or more, and a heat treatment wherein the substrate on which the precious metal layer was formed in the precious metal layer forming is subjected to a heat treatment at a predetermined heat treatment temperature and under a predetermined oxygen partial pressure. According to the method, a fuel cell separator made of Ti or a Ti alloy having excellent corrosion resistance, good adhesion of a precious metal layer, low contact resistance, and further excellent productivity can be produced.

摘要翻译： 一种制造燃料电池隔板的方法，包括：通过PVD法在由Ti或Ti合金制成的基板的表面上形成贵金属层作为燃料电池隔板，其中所述贵金属层包括至少一个 选自Ru，Rh，Pd，Os，Ir，Pt和Au的贵金属，并且具有2nm以上的厚度，并且进行在形成贵金属层中形成贵金属层的基板的热处理 在预定的热处理温度和预定的氧分压下进行热处理。 根据该方法，可以制造具有优异的耐腐蚀性，贵金属层的良好的附着力，低接触电阻和更优异的生产率的由Ti或Ti合金制成的燃料电池隔板。

公开(公告)号：US07722942B2

公开(公告)日：2010-05-25

申请号：US11401853

申请日：2006-04-12

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： B32B3/02

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

公开(公告)号：US20100038233A1

公开(公告)日：2010-02-18

申请号：US12604858

申请日：2009-10-23

申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Toshiki Sato ,  Hitoshi Matsuzaki ,  Hideo Fujii

发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Toshiki Sato ,  Hitoshi Matsuzaki ,  Hideo Fujii

IPC分类号： C23C14/34 ,  C21D9/00

CPC分类号： C22C5/06 ,  C23C14/3414

摘要： The sputtering target made of a Ag—Bi-base alloy contains Bi in solid solution with Ag. The sputtering target has an intensity of precipitated Bi of 0.01 at %−1 or less, as calculated by the following mathematical expression (1) based on analysis results of X-ray diffraction, and/or a sum of area ratios of predetermined intensities (third to sixth intensities in 8 intensities) of 89 % or more, wherein the area ratios are obtained by calculating a planar distribution of characteristic X-ray intensities of Bi according to X-ray microanalysis: intensity of precipitated Bi=[IBi(102)/IAg(111)+IAg(200)+IAg(220)+IAg(311))]/[Bi]. Remarkable lowering of the yield of Bi content in resultant films can be suppressed by using the sputtering target.

摘要翻译： 由Ag-Bi基合金制成的溅射靶包含Bi的Bi与Ag的固溶体。 溅射靶的沉积Bi强度为0.01at％-1以下，根据X射线衍射的分析结果通过以下数学式（1）计算，和/或预定强度的面积比（ 8个强度的第三至第六强度）为89％以上，其中，通过根据X射线微量分析计算Bi的特征X射线强度的平面分布来获得面积比：沉淀Bi = [IBi（102） / IAg（111）+ IAg（200）+ IAg（220）+ IAg（311））] / [Bi]。 通过使用溅射靶可以抑制所得膜中Bi含量的产率的显着降低。

公开(公告)号：US20100035118A1

公开(公告)日：2010-02-11

申请号：US12517607

申请日：2007-12-12

申请人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Hirotaka Ito ,  Shinichi Tanifuji

发明人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Hirotaka Ito ,  Shinichi Tanifuji

IPC分类号： H01M8/02 ,  C23C14/34 ,  C22F1/00 ,  H01M2/16

CPC分类号： H01M8/0206 ,  C22C5/02 ,  C22C5/04 ,  C22C14/00 ,  C22C16/00 ,  C22C27/00 ,  C22C27/02 ,  C22F1/05 ,  C22F1/18 ,  C23C14/16 ,  C23C14/165 ,  C23C14/5806 ,  C23C14/5846 ,  C23C14/5853 ,  H01M8/0208 ,  H01M8/021 ,  H01M8/0228 ,  H01M8/0263 ,  H01M2008/1095 ,  Y02P70/56

摘要： The present invention concerns an alloy film for a metal separator for a fuel cell characterized by containing at least one noble metal element selected from Au and Pt and at least one non-noble metal element selected from the group consisting of Ti, Zr, Nb, Hf, and Ta, at a content ratio of noble metal element/non-noble metal element of 35/65 to 95/5, and having a film thickness of 2 nm or more. The present invention also relates to a manufacturing method of an alloy film for the metal separator for the fuel cell and a target material for sputtering, as well as the metal separator and the fuel sell. The alloy film for the metal separator for the fuel cell according to the invention is excellent in the corrosion resistance, has low contact resistance, can maintain the low contact resistance for a long time even in a corrosive environment, and is excellent further in the productivity.

摘要翻译： 本发明涉及一种用于燃料电池用金属隔板的合金膜，其特征在于，含有至少一种选自Au和Pt的贵金属元素和至少一种选自Ti，Zr，Nb， Hf和Ta，贵金属元素/非贵金属元素的含量比为35/65〜95/5，膜厚为2nm以上。 本发明还涉及用于燃料电池用金属隔板的合金膜和溅射用靶材以及金属隔板和燃料的制造方法。 本发明的燃料电池用金属隔板用合金膜耐腐蚀性优异，接触电阻低，即使在腐蚀性环境下也能长时间保持低接触电阻，生产率进一步提高 。

公开(公告)号：US20090035602A1

公开(公告)日：2009-02-05

申请号：US11994436

申请日：2007-01-15

申请人： Wataru Urushihara ,  Toshiki Sato ,  Nao Yoshihara

发明人： Wataru Urushihara ,  Toshiki Sato ,  Nao Yoshihara

IPC分类号： B32B15/00 ,  C22C38/18 ,  C22C38/40 ,  C22C38/42

CPC分类号： C25D9/10 ,  B21C37/04 ,  C21D6/002 ,  C21D8/005 ,  C21D9/02 ,  C21D9/32 ,  C22C38/002 ,  C22C38/02 ,  C22C38/04 ,  C22C38/22 ,  C22C38/24 ,  C22C38/28 ,  C22C38/34 ,  Y10S148/908 ,  Y10T428/1266 ,  Y10T428/12972

摘要： A high-strength steel excellent in hydrogen embrittlement resistance is provided. The high-strength steel of the present invention excellent in hydrogen embrittlement resistance has a tensile strength of 1800 N/mm2 or above, contains 0.3 to 0.7% (percent by mass) C, 0.95 to 5.0% Cr, not higher than 0.6% and higher than 0% Mn, and 0.7 to 2.5% Si, and contains at least one of Mg, Ca, Sr, Ba, Li, Na and K so as to meet the following conditions: (1) the upper limits of the Mg, the Ca, the Sr, the Ba, the Li, the Na and the K content are 0.05%, and (2) the Mg, the Ca, the Sr, the Ba, the Li, the Na and the K content meet Expression (1): Cr + Mn 4 ≤ 1000 × [ Ca + Mg + Sr + Ba 2 + Li + Na + K 8 ] ( 1 )

摘要翻译： 提供了耐氢脆性优异的高强度钢。 耐氢脆性优异的本发明的高强度钢的拉伸强度为1800N / mm 2以上，含有0.3〜0.7％（质量％）C，0.95〜5.0％Cr，不高于0.6％， 高于0％的Mn和0.7〜2.5％的Si，并且含有Mg，Ca，Sr，Ba，Li，Na和K中的至少一种，以满足以下条件：（1）Mg， Ca，Sr，Ba，Li，Na和K含量均为0.05％，（2）Mg，Ca，Sr，Ba，Li，Na和K含量均满足表达式 1）：