公开(公告)号：US06350675B1

公开(公告)日：2002-02-26

申请号：US09686282

申请日：2000-10-12

申请人： Simon Chooi ,  Mei-Sheng Zhou ,  Subhash Gupta ,  Yi Xu

发明人： Simon Chooi ,  Mei-Sheng Zhou ,  Subhash Gupta ,  Yi Xu

IPC分类号： H01L214763

CPC分类号： H01L21/76832 ,  H01L21/0274 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/7681 ,  H01L21/76825 ,  H01L21/76826

摘要： This invention relates to a method of fabrication used for semiconductor integrated circuit devices, and more specifically, in the formation of self-aligned dual damascene interconnects and vias, which incorporates low dielectric constant intermetal dielectrics (IMD) and utilizes silylated top surface imaging (TSI) photoresist, with a single or multi-step selective reactive ion etch (RIE) process, to form trench/via opening. The invention incorporates the use of a silylated top surface imaging (TSI) resist etch barrier layer to form the via pattern, in the first level of a dual damascene process. Two variations of using the top surface imaging (TSI) resist, with and without leaving an exposed region in place, are described in the first and second embodiment of the invention, and in addition, a thin dielectric layer is made use of just below the resist layer. Provided adhesion between the top surface imaging (TSI) photoresist and the low dielectric constant intermetal dielectric (IMD) is good, the thin dielectric layer described above can be omitted, yielding the third and fourth embodiment of the invention. Special attention in the process is given to protecting the integrity of the low dielectric constant intermetal dielectric (ILD) material, selected from the group consisting of organic based or carbon doped silicon dioxide.

摘要翻译： 本发明涉及用于半导体集成电路器件的制造方法，更具体地说，涉及形成自对准的双镶嵌互连和通孔，其结合了低介电常数金属间电介质（IMD）并利用甲硅烷基化的顶表面成像（TSI ）光致抗蚀剂，具有单步或多步选择性反应离子蚀刻（RIE）工艺，以形成沟槽/通孔。 本发明包括在双镶嵌工艺的第一水平中使用甲硅烷基化的顶表面成像（TSI）抗蚀剂蚀刻阻挡层以形成通孔图案。 在本发明的第一和第二实施例中描述了使用顶表面成像（TSI）抗蚀剂的两种变型，其具有和不具有将暴露区域保持在适当位置，此外，使用刚好低于 抗蚀剂层。 提供顶表面成像（TSI）光致抗蚀剂和低介电常数金属间电介质（IMD）之间的粘附性是好的，可以省略上述薄介电层，产生本发明的第三和第四实施例。 该方法中特别注意保护低介电常数金属间电介质（ILD）材料的完整性，该材料选自有机基或掺碳二氧化硅。

公开(公告)号：US06165891A

公开(公告)日：2000-12-26

申请号：US435434

申请日：1999-11-22

申请人： Simon Chooi ,  Yi Xu ,  Mei Sheng Zhou

发明人： Simon Chooi ,  Yi Xu ,  Mei Sheng Zhou

IPC分类号： H01L21/311 ,  H01L21/318 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L21/4763 ,  G03C5/00 ,  H01L21/302 ,  H01L23/48

CPC分类号： H01L21/76835 ,  H01L21/31122 ,  H01L21/318 ,  H01L21/76802 ,  H01L21/76807 ,  H01L21/76829 ,  H01L21/76834 ,  H01L23/5226 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method and structure for forming a damascene structure with reduced capacitance by forming one or more of: the passivation layer, the etch stop layer, and the cap layer using a low dielectric constant material comprising carbon nitride, boron nitride, or boron carbon nitride. The method begins by providing a semiconductor structure having a first conductive layer thereover. A passivation layer is formed on the first conductive layer. A first dielectric layer is formed over the passivation layer, and an etch stop layer is formed over the first dielectric layer. A second dielectric layer is formed over the etch stop layer, and an optional cap layer can be formed over the second dielectric layer. The cap layer, the second dielectric layer, the etch stop layer, and the first dielectric layer are patterned to form a via opening stopping on said passivation layer and a trench opening stopping on the first conductive layer. A carbon nitride passivation layer, etch stop layer, or cap layer can be formed by magnetron sputtering from a graphite target in a nitrogen atmosphere. A boron nitride passivation layer, etch stop layer, or cap layer can be formed by PECVD using B.sub.2 H.sub.6, ammonia, and nitrogen. A boron carbon nitride passivatation layer, etch stop layer, or cap layer can be formed by magnetron sputtering from a graphite target in a nitrogen and B.sub.2 H.sub.6 atmosphere.

摘要翻译： 通过使用包含碳氮化物，氮化硼或碳氮化硼的低介电常数材料通过形成钝化层，蚀刻停止层和盖层中的一个或多个来形成具有降低的电容的镶嵌结构的方法和结构。 该方法开始于提供其上具有第一导电层的半导体结构。 在第一导电层上形成钝化层。 第一电介质层形成在钝化层之上，并且在第一介电层上形成蚀刻停止层。 第二介电层形成在蚀刻停止层上方，并且可以在第二介电层上形成任选的盖层。 图案化盖层，第二电介质层，蚀刻停止层和第一介电层，以形成在所述钝化层上停止的通孔开口和在第一导电层上停止的沟槽开口。 碳氮化物钝化层，蚀刻停止层或盖层可以通过在氮气气氛中的石墨靶磁控溅射来形成。 可以通过使用B2H6，氨和氮的PECVD形成氮化硼钝化层，蚀刻停止层或盖层。 硼氮化物钝化层，蚀刻停止层或盖层可以通过在氮气和B2H6气氛中的石墨靶的磁控溅射形成。

公开(公告)号：US6159759A

公开(公告)日：2000-12-12

申请号：US443423

申请日：1999-11-19

申请人： Kai Shao ,  Cerdin Lee ,  Yi Xu ,  Shao-Fu Sanford Chu

发明人： Kai Shao ,  Cerdin Lee ,  Yi Xu ,  Shao-Fu Sanford Chu

IPC分类号： G02F1/1335 ,  G02F1/1362 ,  H01L21/00

CPC分类号： G02F1/133553 ,  G02F1/136277

摘要： A new method of forming liquid crystal displays has been achieved. Metal conductors are provided in an insulating layer overlying a semiconductor substrate. A first isolation layer is deposited. A first silicon nitride layer is deposited. The first silicon nitride layer is patterned to form openings for planned vias overlying the metal conductors. A second isolation layer is deposited. A second silicon nitride layer is deposited. The second silicon nitride layer is patterned to form masks overlying where dummy supports for the metal pixels are planned and to form openings to extend the planned vias. A third isolation layer is deposited. The third isolation layer is patterned to form openings for the planned metal pixels. The second isolation layer and the first isolation layer are etched through to complete the vias and the dummy supports. A metal layer is deposited filling the openings for the metal pixels, the dummy support, and the vias. The metal layer is polished down to the top surface of the third isolation layer to complete the metal pixels. A thin film passivation is deposited. A liquid crystal layer is deposited. A transparent image point electrode is formed to complete the liquid crystal display.

摘要翻译： 已经实现了一种形成液晶显示器的新方法。 金属导体设置在覆盖半​​导体衬底的绝缘层中。 沉积第一隔离层。 沉积第一氮化硅层。 图案化第一氮化硅层以形成覆盖金属导体的计划通孔的开口。 沉积第二隔离层。 沉积第二氮化硅层。 图案化第二氮化硅层以形成掩模，覆盖着金属像素的虚拟支撑被设计并形成扩展计划的通孔的开口。 沉积第三个隔离层。 图案化第三隔离层以形成用于计划的金属像素的开口。 蚀刻第二隔离层和第一隔离层以完成通孔和虚拟支撑。 沉积金属层，填充用于金属像素，虚拟支撑件和通孔的开口。 金属层被抛光到第三隔离层的顶表面以完成金属像素。 沉积薄膜钝化。 沉积液晶层。 形成透明图像点电极以完成液晶显示器。

公开(公告)号：US6117747A

公开(公告)日：2000-09-12

申请号：US435436

申请日：1999-11-22

申请人： Kai Shao ,  Yi Xu ,  Cerdin Lee ,  Shao-Fu Sanford Chu

发明人： Kai Shao ,  Yi Xu ,  Cerdin Lee ,  Shao-Fu Sanford Chu

IPC分类号： H01L21/02 ,  H01L21/768 ,  H01L21/20

CPC分类号： H01L28/40 ,  H01L21/76838 ,  H01L28/60

摘要： A method for fabricating a metal-oxide-metal capacitor using a dual damascene process is described. A dielectric layer is provided overlying a semiconductor substrate. A dual damascene opening in the dielectric layer is filled with copper to form a copper via underlying a copper line. A first metal layer is deposited overlying the copper line and patterned to form a bottom capacitor plate contacting the copper line. A capacitor dielectric layer is deposited overlying the bottom capacitor plate. A second metal layer is deposited overlying the capacitor dielectric layer and patterned to form a top capacitor plate to complete fabrication of a metal-oxide-metal capacitor.

摘要翻译： 描述了使用双镶嵌工艺制造金属氧化物 - 金属电容器的方法。 提供覆盖在半导体衬底上的电介质层。 电介质层中的双镶嵌开口填充有铜，通过铜线下方形成铜。 沉积在铜线上的第一金属层被图案化以形成接触铜线的底部电容器板。 电容器电介质层沉积在底部电容器板上。 将第二金属层沉积在电容器介电层上并被图案化以形成顶部电容器板，以完成金属氧化物 - 金属电容器的制造。

公开(公告)号：US5859508A

公开(公告)日：1999-01-12

申请号：US846029

申请日：1997-04-25

申请人： Shichao Ge ,  Xi Huang ,  Yi Xu ,  Charles S. Leung

发明人： Shichao Ge ,  Xi Huang ,  Yi Xu ,  Charles S. Leung

IPC分类号： H01J29/02 ,  H01J29/46 ,  H01J31/12 ,  G09G1/04 ,  H01J29/70

CPC分类号： H01J31/126 ,  H01J29/028 ,  H01J29/467 ,  H01J2329/863 ,  H01J2329/864

摘要： An improved cathodoluminescent device with a one piece spacer structure which is rigidly connected to two sets of grid electrodes. The spacer structure defines holes therein that spatially match pixel dots on an anode on a face plate. One set of grid electrodes comprises layers of electrically conductive material on surfaces within at least some of the holes of the spacer structure. The two sets of grid electrodes and different spacer layers may be attached together to form a one piece spacer structure integral with the two sets of grid electrodes. The display device is then simply assembled by matching each of the holes of the spacer structure with a pixel dot on the face plate, and attaching the structure to the face plate and a back plate.

摘要翻译： 一种改进的阴极发光装置，其具有刚性连接到两组栅格电极的单件间隔结构。 间隔结构在其中限定孔，其空间上匹配面板上的阳极上的像素点。 一组栅格电极在间隔结构的至少一些孔内的表面上包括导电材料层。 两组栅格电极和不同的间隔层可以附接在一起以形成与两组栅格电极成一体的一体式隔离结构。 然后通过将间隔件结构中的每个孔与面板上的像素点匹配来简单地组装显示装置，并将结构附接到面板和背板。

公开(公告)号：US20200209722A1

公开(公告)日：2020-07-02

申请号：US16261591

申请日：2019-01-30

申请人： Yi Xu

发明人： Yi Xu

IPC分类号： G03B21/16 ,  G02F1/1335 ,  H01L33/58 ,  H05K7/20 ,  G03B21/00 ,  G03B21/20

摘要： The invention discloses a novel LCD projector, comprising an imaging system with a sealed shell of the LCD projector, an illumination system with PCS function and transparent antifouling coating, and an LED light source system, wherein the sealed shell is provided with lens, optical, and first radiator assemblies. The invention is disposed in a sealed shell; a heat dissipation assembly is installed at the liquid crystal display outlet. The optical device can be positioned in a dust-free environment for the sealed shell. The useless P light for conventional LCD projector imaging is converted into the useful S light, improving light utilization and increasing projection brightness under the same power. The transparent antifouling coating is applied to the illumination section, reducing dust absorption and improving system cleanliness. A microlens is used to converge the LED light source in the LED illumination section, improving light effects and uniformity.

公开(公告)号：US20200013143A1

公开(公告)日：2020-01-09

申请号：US16492918

申请日：2017-04-19

申请人： Gordon C. WILSON ,  Yi XU ,  Kang-Huai WANG ,  Chenyu WU ,  CapsoVision, Inc.

发明人： Gordon C. Wilson ,  Yi Xu ,  Kang-Huai Wang ,  Chenyu Yu

IPC分类号： G06T3/40 ,  G06T3/00

摘要： A method and apparatus of processing and displaying images captured using an in vivo capsule camera are disclosed. One or more overlapped areas between a target image and each image in a neighboring image group are determined, which comprises at least two neighboring images around the target image. Marked pixels in the target image are then determined, where a pixel in the target image is designated as a marked pixel if the pixel is within an overlapped area between the target image and at least one neighboring image. If the total number of the marked pixels in the target image exceeds a threshold and the number of the marked pixels associated with the overlapped area(s) between the target image and any image in the neighboring image group is below the threshold, the target image is excluded from a set of images to be displayed on a display device.

公开(公告)号：US20110265773A1

公开(公告)日：2011-11-03

申请号：US12915908

申请日：2010-10-29

申请人： Yi Xu ,  Leslie R. Wolf ,  Shankar Kumar ,  Donald W. Stanton ,  Timothy R. Frazier ,  Bruce G. Bunting

发明人： Yi Xu ,  Leslie R. Wolf ,  Shankar Kumar ,  Donald W. Stanton ,  Timothy R. Frazier ,  Bruce G. Bunting

IPC分类号： F02D41/00 ,  C10L1/04 ,  F02D28/00

CPC分类号： F02D41/0025 ,  C10L1/08 ,  F02D19/061 ,  F02D19/0649 ,  F02D19/087 ,  F02M26/23 ,  F02M31/13 ,  F02M2200/95 ,  Y02T10/36

摘要： A diesel fuel composition is disclosed, as well as a method for reducing NOx and smoke emissions from a diesel engine at minimum fuel consumption which comprises adding to the diesel engine at least one diesel fuel or blending component for a diesel fuel which has a combination of a low T50 in the range of from 190° C. to 280° C., a high cetane number in the range of from 31 to 60, and optionally a high distillation curve slope in the range of from 58° C. to 140° C., which combination is effective to afford a combination of the lowest NOx and smoke emissions at the lowest fuel consumption at independent engine control values for the diesel engine that are optimum to afford production of a combination of the lowest NOx and smoke emissions at the lowest fuel consumption, whereby the NOx and smoke emissions from the diesel engine are reduced by at least 10% and 15%, respectively.

摘要翻译： 公开了一种柴油燃料组合物，以及用于以最小燃料消耗量从柴油发动机减少NOx和烟雾排放的方法，其包括向柴油发动机添加至少一种用于柴油燃料的柴油燃料或混合组分， 在190℃至280℃的范围内的低T50，在31至60范围内的高十六烷值，以及任选的在58℃至140℃范围内的高蒸馏曲线斜率 C.这种组合在柴油机的独立发动机控制值下以最低的燃料消耗提供最低的NOx和烟雾排放的组合是有效的，其最适于提供生产最低NOx和烟雾排放的组合 燃油消耗最低，柴油发动机的NOx和烟气排放量分别降低了10％和15％。

公开(公告)号：US07979814B1

公开(公告)日：2011-07-12

申请号：US12047222

申请日：2008-03-12

申请人： Yutao Ma ,  Yi Xu

发明人： Yutao Ma ,  Yi Xu

IPC分类号： G06F17/50

CPC分类号： G06F17/5036 ,  G06T17/00 ,  G06T2200/28

摘要： Model evaluation and circuit simulation/verification is performed in a graphical processing unit (GPU). A multitude of first texture data corresponding to size parameters of devices are stored. A multitude of second texture data corresponding to instance parameters of the devices are stored. A multitude of third texture data corresponding to models of the devices are stored. A multitude of fourth texture data corresponding to terminal voltages received by the device are stored. A multitude of links linking each device instance to an associated device model, size parameters and instance parameters are stored. A quad having a size defined by the multitude of links is drawn by the quad in the GPU. Each thread in the quad is assigned to a different one of the multitude of links. The computations are carried out in each thread using the linked data to perform the model evaluation.

摘要翻译： 在图形处理单元（GPU）中执行模型评估和电路仿真/验证。 存储对应于设备的大小参数的多个第一纹理数据。 存储对应于设备的实例参数的多个第二纹理数据。 存储与设备的模型相对应的多个第三纹理数据。 存储对应于由设备接收的端子电压的多个第四纹理数据。 将每个设备实例链接到相关设备模型，大小参数和实例参数的多个链接被存储。 具有由多个链接定义的大小的四边形由GPU中的四边形绘制。 四角形中的每个线程都分配给多个链接中的一个。 使用链接的数据在每个线程中执行计算以执行模型评估。

公开(公告)号：US20100246989A1

公开(公告)日：2010-09-30

申请号：US12414162

申请日：2009-03-30

申请人： Amit Agrawal ,  Yi Xu ,  Ramesh Raskar

发明人： Amit Agrawal ,  Yi Xu ,  Ramesh Raskar

IPC分类号： G06K9/40

CPC分类号： G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T2207/10016 ,  G06T2207/10148 ,  G06T2207/20201

摘要： Embodiments of the invention describe a method for reducing a blur in an image of a scene. First, we acquire a set of images of the scene, wherein each image in the set of images includes an object having a blur associated with a point spread function (PSF) forming a set of point spread functions (PSFs), wherein the set of PSFs is suitable for null-filling operation. Next, we invert jointly the set of images and the set of PSFs to produce an output image having a reduced blur.

摘要翻译： 本发明的实施例描述了一种用于减少场景图像中的模糊的方法。 首先，我们获取场景的一组图像，其中图像集合中的每个图像包括具有与形成一组点扩散函数（PSF）的点扩散函数（PSF）相关联的模糊的对象，其中， PSF适用于零填充操作。 接下来，我们共同颠倒图像集合和PSF集合以产生具有减小的模糊的输出图像。