公开(公告)号：US4287969A

公开(公告)日：1981-09-08

申请号：US105930

申请日：1979-12-21

申请人： Atsushi Misumi ,  Yoshio Kimura

发明人： Atsushi Misumi ,  Yoshio Kimura

IPC分类号： F16D49/04 ,  F16D59/00 ,  F16H25/20 ,  F16H25/24 ,  F16L3/202 ,  B60T7/12

CPC分类号： F16D49/04 ,  F16D59/00 ,  F16H25/2021 ,  F16L3/202 ,  F16H2025/2463 ,  F16H25/2454 ,  Y10S248/901

摘要： A motion snubbing device in which an internal gear is fixed on a shaft rotating in accordance with relative axial movement of a pair of support members, and an inertia mass is rotated by operation of a planetary gearing mechanism with the internal gear as an input gear thereof on its own axis. When the level of drastic external force applied to the device exceeds a critical value, the planetary gearing mechanism starts revolving induced by retarded rotation of the inertia mass. An actuating lever connected to the planetary gearing mechanism applies initial force for constrictive winding to a clutch spring which is normally at a standstill, thereby causing the spring to wind automatically around a brake drum fixed on the shaft so that the shaft is prevented from rotation through the drum.

摘要翻译： 一种运动缓冲装置，其中内齿轮固定在根据一对支撑构件的相对轴向运动旋转的轴上，并且惯性质量通过行星齿轮传动机构的操作而旋转，其中内齿轮作为其输入齿轮 在自己的轴上。 当施加到设备的剧烈外力的水平超过临界值时，行星齿轮传动机构开始由惯性质量块的延迟旋转引起的旋转。 连接到行星齿轮传动装置的致动杆向通常处于停止状态的离合器弹簧施加用于收缩卷绕的初始力，从而使弹簧自动围绕固定在轴上的制动鼓卷绕，从而防止轴旋转 鼓。

公开(公告)号：US08840728B2

公开(公告)日：2014-09-23

申请号：US13378163

申请日：2010-06-21

申请人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

发明人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

IPC分类号： C23C16/00 ,  B05C21/00 ,  B05C13/02 ,  B05C13/00 ,  H01L21/687 ,  H01L21/56 ,  H01L21/673 ,  H01L21/67 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C33/58 ,  B28B7/38 ,  B65B33/00 ,  B05D3/02

CPC分类号： B05C13/00 ,  B29C33/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/566 ,  H01L21/67057 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67333 ,  H01L21/68707 ,  H01L2924/0002 ,  Y10S414/141 ,  H01L2924/00

摘要： The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.

摘要翻译： 本发明是一种模板处理装置，在模板上形成具有形成在其前表面上的转印图案的模板上的脱模剂的膜，该模板处理装置包括：处理站，在前表面形成脱模剂膜 模板; 以及能够保持多个模板并将模板搬入/离开处理站的模板搬入/出站，其中处理站包括：清洁模板的前表面的清洁单元; 涂布单元，将脱模剂施加到模板的清洁前表面上; 加热单元烘烤所施加的脱模剂; 以及将模板携带到清洁单元，涂布单元和加热单元的携带单元。

公开(公告)号：US08081327B2

公开(公告)日：2011-12-20

申请号：US11186863

申请日：2005-07-22

申请人： Masakatsu Sakurai ,  Yoshio Kimura

发明人： Masakatsu Sakurai ,  Yoshio Kimura

IPC分类号： G06K15/00

CPC分类号： G06F3/1285 ,  G06F3/1222 ,  G06F3/1238 ,  G06F3/1267 ,  G06F21/608

摘要： Print job data is generated in accordance with a printing instruction from an application. When encryption of the print job data is designated, the generated print job data is encrypted, and the generated or encrypted print job data is output. When a printing apparatus serving as an output destination to which the encrypted print job data is output does not have a decryption function of decrypting the encrypted print job data, the output destination is changed to a decryption apparatus having the decryption function. When designation to save the print job data in the printing apparatus is detected in encryption, the print job is canceled.

摘要翻译： 根据来自应用的打印指令生成打印作业数据。 当指定打印作业数据的加密时，生成的打印作业数据被加密，并且生成或加密的打印作业数据被输出。 当作为输出加密的打印作业数据的输出目的地的打印装置不具有解密加密的打印作业数据的解密功能时，将输出目的地改变为具有解密功能的解密装置。 当在加密中检测到在打印装置中保存打印作业数据的指定时，打印作业被取消。

公开(公告)号：US08034167B2

公开(公告)日：2011-10-11

申请号：US11889464

申请日：2007-08-13

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： B01D19/00 ,  B01D35/00

CPC分类号： G03F7/162 ,  G03F7/30 ,  Y10T137/86324

摘要： A buffer tank for use in a liquid treatment apparatus applying a liquid treatment to a substrate surface by supplying thereto a treating liquid from a nozzle, the buffer tank is provided in a flow path of the treating liquid from a supply tank of the liquid to the nozzle, the buffer tank including an inlet port for introducing the treating liquid supplied from the supply tank into a buffer tank body, a first accumulation region in the buffer tank body for holding the treating liquid introduced into the buffer tank, a first vent port for discharging bubbles accumulated in the first accumulation region, a filter through which the treating liquid in the first accumulation region passes, the filter filtering the treating liquid, and a supplying port for supplying the treating liquid filtered with the filter to the nozzle.

摘要翻译： 一种用于液体处理装置的缓冲罐，其通过从喷嘴向其提供处理液体而将液体处理应用于基板表面，所述缓冲罐设置在所述处理液体从所述液体的供给槽到所述液体的流路中 所述缓冲罐包括用于将从所述供应罐供给的处理液引入缓冲罐体的入口，所述缓冲罐主体中的用于保持引入到所述缓冲罐中的处理液的第一积存区域， 排出积存在第一积聚区域中的气泡，第一积聚区域中的处理液通过的过滤器，过滤器处理液体的过滤器;以及用于将经过滤器的处理液体供给到喷嘴的供给口。

公开(公告)号：US20100300353A1

公开(公告)日：2010-12-02

申请号：US12855534

申请日：2010-08-12

申请人： Masami AKIMOTO ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami AKIMOTO ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B05C9/12

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745

摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

摘要翻译： 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

公开(公告)号：US07819080B2

公开(公告)日：2010-10-26

申请号：US10585975

申请日：2004-11-11

申请人： Nobuaki Matsuoka ,  Yoshio Kimura ,  Akira Miyata

发明人： Nobuaki Matsuoka ,  Yoshio Kimura ,  Akira Miyata

IPC分类号： B05C11/00 ,  B05C11/02 ,  G03D5/00

CPC分类号： H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67754

摘要： A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

摘要翻译： 一种基板转印系统，用于通过在第一递送阶段将基底转移到可以最早进行处理的工艺块来减少总处理时间。 衬底处理设备包括相对于衬底载体传送晶片的第一传输装置和经由第一传送级在多个处理块和第一传送装置之间传送晶片的第二传送装置，以相对于 到过程块。 基于来自处理块的晶片的处理信息，确定最早期完成相关处理块内没有晶片或最后晶片的处理块的处理块，并且第一传送阶段的晶片由 第二传输设备到相关进程块。 这确保晶片平滑地转移到处理块。

公开(公告)号：US07684064B2

公开(公告)日：2010-03-23

申请号：US10975357

申请日：2004-10-29

申请人： Yoshio Kimura ,  Kazuhiko Ushiyama

发明人： Yoshio Kimura ,  Kazuhiko Ushiyama

IPC分类号： G06K15/00

CPC分类号： G06F3/1222 ,  G06F3/121 ,  G06F3/1234 ,  G06F3/1238 ,  G06F3/1267 ,  G06F3/1285 ,  G06F21/608

摘要： In order to maintain high security of a job that requires a high security level even after a print interrupt factor has been removed, and to achieve both the effect of maintaining high security of a job that requires a high security level even after the print process is interrupted, and the effect of improving the productivity of jobs other than a job of this type, when a print apparatus which can process a plurality of print jobs including a print job of a first type and that of a second type restarts a print operation of a print job, which is interrupted in the print apparatus, and when the print job is a print of the first type, the print apparatus is controlled to execute an authentication process, and then allowed to restart the print operation of the print job. When the print apparatus restarts a print operation of a print job, which is interrupted in the print apparatus, and when the print job is a print of the second type, the print apparatus is allowed to restart the print operation of the print job without executing the authentication process.

摘要翻译： 为了保持甚至在打印中断因素被去除之后需要高安全级别的作业的高安全性，并且即使在打印处理之后也能够实现要求高安全级别的作业的高安全性的效果 中断，以及提高除了这种作业以外的作业的生产率的效果，当能够处理包括第一类型的打印作业和第二类型的打印作业的多个打印作业的打印设备重新开始打印操作时 在打印装置中中断的打印作业，并且当打印作业是第一类型的打印时，控制打印装置执行认证处理，然后允许重新开始打印作业的打印操作。 当打印设备重新开始在打印设备中中断的打印作业的打印操作时，并且当打印作业是第二类型的打印时，允许打印设备重新启动打印作业的打印操作而不执行 认证过程。

公开(公告)号：US20080244405A1

公开(公告)日：2008-10-02

申请号：US12024523

申请日：2008-02-01

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： G06F3/048

CPC分类号： H04N5/44543 ,  H04N21/4135 ,  H04N21/4312 ,  H04N21/436

摘要： According to one embodiment, a recording apparatus transmits a GUI screen to an image display apparatus via a LAN. A CPU of the screen display apparatus creates a selection border. The CPU and a graphics processor blend the created selection border with the GUI screen. A video processor/output unit displays the GUI screen on a display panel. The CPU and the graphics processor newly create a selection border according to a user's operation. The CPU and the graphics processor blend the created selection border with the displayed GUI screen to generate the GUI screen after updating. The video processor/output unit displays the generated GUI screen after updating on the display panel.

摘要翻译： 根据一个实施例，记录装置经由LAN将GUI屏幕发送到图像显示装置。 屏幕显示装置的CPU创建选择边界。 CPU和图形处理器将创建的选择边框与GUI屏幕相结合。 视频处理器/输出单元在显示面板上显示GUI画面。 CPU和图形处理器根据用户的操作新创建选择边框。 CPU和图形处理器将创建的选择边框与显示的GUI屏幕相结合，以便在更新后生成GUI屏幕。 视频处理器/输出单元在显示面板上更新后显示生成的GUI屏幕。

公开(公告)号：US20080117224A1

公开(公告)日：2008-05-22

申请号：US11907047

申请日：2007-10-09

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： G09G5/39

CPC分类号： H04N21/431 ,  H04N21/42692 ,  H04N21/4432

摘要： According to one embodiment, there is provided an image display apparatus including: a memory storing data; a memory controller causing image data of an image for display at a startup time to be stored in the memory, before a power state shifts to a standby state; and a display controller reading the image data stored in the memory and causing the image for display at the startup time to be displayed, when the power state returns from the standby state.

摘要翻译： 根据一个实施例，提供了一种图像显示装置，包括：存储数据的存储器; 在电源状态转换到待机状态之前，将在启动时刻显示的图像的图像数据存储在存储器中的存储控制器; 以及显示控制器，当从待机状态返回时，读取存储在存储器中的图像数据并使得在启动时显示的图像被显示。

公开(公告)号：US07267497B2

公开(公告)日：2007-09-11

申请号：US11117552

申请日：2005-04-29

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03D5/00

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks: DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.

摘要翻译： 涂布显影系统包括：抗蚀剂膜形成单元块和抗反射膜形成单元块，其层叠以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂覆和显影系统可以应对形成防反射膜的情况和其中没有形成任何抗反射膜的情况。 成膜单元块：TCT层B 3，COT层B 4和BCT层B 5以及显影单元块DEV层B 1和B 2在处理块S2中层叠。 选择性地使用TCT层B 3，COT层B 4和BCT层B 5，其中形成防反射膜并且不形成任何抗反射膜。 涂层和显影系统由携带程序和软件控制。