TRANSFER SYSTEM FOR WAFER CASSETTES
    3.
    发明公开

    公开(公告)号:US20240047249A1

    公开(公告)日:2024-02-08

    申请号:US17879651

    申请日:2022-08-02

    IPC分类号: H01L21/673 H01L21/677

    CPC分类号: H01L21/67333 H01L21/6773

    摘要: A transfer system for wafer cassettes includes a tray and a rail compatible with the tray. The tray includes a base plate, a through hole, a wall, and a pair of first positioning features. The through hole is disposed on a center of the base plate, in which the through hole has a first direction axis and a second direction axis perpendicular to the first direction axis. The wall extends from a surface of the base plate and surrounding the through hole, in which the wall separates the base plate into an interior region and an exterior region. The pair of first positioning features having a first level height are in the interior region and arranged parallel to the first direction axis.

    IC cartridge
    4.
    发明授权

    公开(公告)号:US09887114B2

    公开(公告)日:2018-02-06

    申请号:US14907748

    申请日:2015-08-27

    发明人: Yang Xing

    摘要: An IC cartridge is provided, which includes: a cartridge body provided with hollowed-out parts, and an ejection mechanism including a substrate and projected structures which are provided on the substrate and can be slideably extended into the hollowed-out parts for pushing out IC chips; the hollowed-out parts and the projected structures cooperate to form groove structures for accommodating the IC chips. In usage, the IC chip in the groove structure are pushed out by sliding of the projected structures of the ejection mechanism through the hollowed-out parts. Thus, removing and flipping over of the IC chips is facilitated, and the processing safety of the IC chip can be ensured.

    Semiconductor chip tray
    5.
    发明授权

    公开(公告)号:US09887113B2

    公开(公告)日:2018-02-06

    申请号:US14830213

    申请日:2015-08-19

    IPC分类号: H01L21/673 B65D1/36

    CPC分类号: H01L21/67333 B65D1/36

    摘要: A semiconductor chip tray is provided that includes a support plate, a first protruding portion, a second protruding portion and a recess. The first protruding portion forms a housing space for a semiconductor chip by being provided on a top surface of the support plate. The second protruding portion is provided on a bottom surface of the support plate, and is fitted to an outer periphery of the first protruding portion of another semiconductor chip tray when the tray is stacked so as to overlap the other tray. The recess is provided on the bottom surface of the support plate. The recess faces a part of the first protruding portion of another chip tray when the tray is stacked so as to overlap the other tray. The recess is formed extending up to an outside of the first protruding portion from the housing space formed by the first protruding portion.

    Device and method for individual support of components
    10.
    发明授权
    Device and method for individual support of components 有权
    组件单独支持的设备和方法

    公开(公告)号:US09455174B2

    公开(公告)日:2016-09-27

    申请号:US13932451

    申请日:2013-07-01

    IPC分类号: H01L21/683 H01L21/673

    摘要: A system is provided for individually supporting at least one component having opposing front and back faces, including a supporting device having a plurality of cells each delimited by a wall and having a contact zone to support the component, at least a part of the cells each receiving a component by its front face, the supporting and contact zones are configured so a surface of the front face is not in contact with the wall, the contact zone is located on a periphery of the front face and forms a closed zone around the front face, the supporting zone forms a closed zone on the wall, and the contact zone includes an edge surface set back in a thickness direction with respect to the front face, the thickness direction extending from the front to the back face perpendicular to at least one of the faces.

    摘要翻译: 提供了一种用于单独地支撑具有相对的前表面和后表面的至少一个部件的系统,包括支撑装置,所述支撑装置具有多个单元,每个单元由壁限定,并且具有用于支撑所述部件的接触区域,每个单元的至少一部分 通过其前表面接收部件,支撑和接触区域被构造成使得前表面的表面不与壁接触,接触区域位于前表面的周边上并且围绕前部形成封闭区域 所述支撑区域在所述壁上形成封闭区域,并且所述接触区域包括相对于所述前表面在厚度方向上设置的边缘表面,所述厚度方向从至少一个垂直于所述前部的背面延伸 的脸。