公开(公告)号：US06455214B1

公开(公告)日：2002-09-24

申请号：US09523293

申请日：2000-03-10

申请人： Shinji Wakamoto ,  Yuji Imai ,  Masayoshi Yamazaki ,  Osamu Furukawa

发明人： Shinji Wakamoto ,  Yuji Imai ,  Masayoshi Yamazaki ,  Osamu Furukawa

IPC分类号： G03F900

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F9/7003

摘要： The present invention relates, to an exposure method, exposure apparatus, and the like having a configuration for effectively preventing color inconsistencies from occurring due to defocusing upon scanning exposure. In particular, the exposure method and apparatus according to the present invention control the scanning exposure according to the positional relationship between a substrate and a detection area for detecting a focus state of the substrate, the positional relationship between individual shot areas on the substrate the positional relationship between a shot area on the substrate and an edge of the substrate, or the like.

摘要翻译： 本发明涉及曝光方法，曝光装置等，其具有有效地防止因扫描曝光引起的散焦而发生颜色不一致的结构。 具体而言，根据本发明的曝光方法和装置根据基板和用于检测基板的聚焦状态的检测区域之间的位置关系，基板上的各个照射区域之间的位置关系， 基板上的照射区域和基板的边缘之间的位置关系等。

公开(公告)号：US6137561A

公开(公告)日：2000-10-24

申请号：US320282

申请日：1999-06-02

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52 ,  G01B11/00

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7026 ,  G03F9/7096

摘要： An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.

摘要翻译： 曝光装置包括用于保持包括表面的感光基板的基板保持部分，用于经由基板保持部分对感光基板进行二维定位的基板台，包括上表面的基板台，以及用于转印 通过曝光照明光将掩模图案掩模到感光基板上。 衬底保持部设置在衬底台中，使得围绕感光衬底的衬底台的上表面的部分与感光衬底的表面基本齐平。

公开(公告)号：US6117598A

公开(公告)日：2000-09-12

申请号：US196157

申请日：1998-11-20

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F7/709 ,  G03F9/7003

摘要： With a scanning type exposure apparatus of the present invention, information of a target surface for alignment of a sensitive substrate in relation to the direction of an optical axis of a projection system is adjusted in accordance with at least one of a movement mode of a mask and a movement mode of the sensitive substrate, and based on reference information stored in a storage device, and scanning exposure is performed while aligning a surface to be exposed of the sensitive substrate and the target surface. Alternatively, an image formation surface of a pattern image of the mask is adjusted and scanning exposure is performed by aligning the image formation surface of the pattern image of the mask and a surface to be exposed of the sensitive substrate, thus enabling pattern transfer to be performed at a high exposure accuracy.

摘要翻译： 利用本发明的扫描型曝光装置，根据掩模的移动模式中的至少一种来调整与感光基板相对于投影系统的光轴方向对准的目标表面的信息 以及敏感基板的移动模式，并且基于存储在存储装置中的参考信息，并且在对准要敏感的基板的暴露表面和目标表面的同时执行扫描曝光。 或者，调整掩模的图案图像的图像形成表面，并通过对准掩模的图案图像的图像形成表面和敏感基板的要暴露的表面来执行扫描曝光，从而使图案转印为 以高曝光精度进行。

公开(公告)号：US5825470A

公开(公告)日：1998-10-20

申请号：US614057

申请日：1996-03-12

申请人： Tsuneo Miyai ,  Yuji Imai

发明人： Tsuneo Miyai ,  Yuji Imai

IPC分类号： G03F7/20 ,  G03B27/58 ,  G03B27/42 ,  B65B21/02

CPC分类号： G03F7/707 ,  G03F7/7075 ,  G03F7/70866 ,  G03F7/70916 ,  Y10S414/137

摘要： Disclosed is an exposure apparatus comprising a substrate holder washing unit and a substrate holder storing unit. While a substrate holder exported from an exposure stage is washed in the washing unit, a clean holder previously stored in the storing unit is transported to an X stage by using a robot hand and a transport arm, and it is installed to the X stage by using an attaching/detaching mechanism. The holder can be always maintained in a clean state without stopping the apparatus for a long period of time, resulting in improvement in throughput. Also disclosed is an exposure apparatus comprising a mechanism for cleaning a substrate holder by transporting a whetstone onto the holder, engaging the whetstone with an engaging member, and rotating the whetstone by using a rotary driving unit. The exposure apparatus is provided with a unit for drawing dust emerged upon cleaning with the whetstone.

摘要翻译： 公开了一种曝光装置，包括基板保持器清洗单元和基板保持器存储单元。 当从曝光台输出的基板保持器在洗涤单元中洗涤时，预先存储在存储单元中的清洁保持器通过使用机器人手和输送臂被运送到X台，并且通过 使用安装/拆卸机构。 保持器可以始终保持在清洁状态，而不会长时间地停止装置，从而提高了生产量。 还公开了一种曝光装置，其包括用于通过将磨石输送到保持器上来清洁衬底保持器的机构，将磨石与接合构件接合，并且通过使用旋转驱动单元旋转砂轮。 曝光装置设置有用于在用砂轮清洁时出现灰尘的单元。

公开(公告)号：US5633698A

公开(公告)日：1997-05-27

申请号：US549118

申请日：1995-10-27

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7026 ,  G03F9/7096

摘要： An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.

摘要翻译： 曝光装置包括用于保持包括表面的感光基板的基板保持部分，用于经由基板保持部分对感光基板进行二维定位的基板台，包括上表面的基板台，以及用于转印 通过曝光照明光将掩模图案掩模到感光基板上。 衬底保持部设置在衬底台中，使得围绕感光衬底的衬底台的上表面的部分与感光衬底的表面基本齐平。

公开(公告)号：US5633101A

公开(公告)日：1997-05-27

申请号：US303667

申请日：1994-09-09

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： G03F1/40 ,  G03F1/50 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F7/70241 ,  G03F1/48 ,  G03F7/70866 ,  G03F7/70875

摘要： An exposure mask formed with a predetermined pattern for exposure on a substrate to be subjected to exposure comprises a glass substrate and a heat conductive film having a thermal conductivity higher than that of the glass substrate, wherein the heat conductive film is so formed as to cover substantially an entire surface of the glass substrate, and the pattern is so formed as to be in contact with the heat conductive film.

摘要翻译： 在曝光用基板上曝光的预定图案形成的曝光掩模包括玻璃基板和导热性比玻璃基板的热导率高的导热膜，其中导热膜形成为覆盖 基本上是玻璃基板的整个表面，并且图案形成为与导热膜接触。

公开(公告)号：US5581324A

公开(公告)日：1996-12-03

申请号：US446511

申请日：1995-05-22

申请人： Tsuneo Miyai ,  Yuji Imai ,  Tetsuo Taniguchi ,  Kousuke Suzuki

发明人： Tsuneo Miyai ,  Yuji Imai ,  Tetsuo Taniguchi ,  Kousuke Suzuki

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/70258 ,  G03F7/70866 ,  G03F7/70983

摘要： A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive substrate, and images the image of the pattern on the photosensitive substrate in a predetermined imaging state. The apparatus also includes a temperature measurement sensor for measuring a change in temperature of the mask, a control system for calculating the change amount of the imaging state caused by the change in temperature, and a correction system for correcting the change in imaging state.

摘要翻译： 投影曝光装置具有用于发射照明光的光源，用于照亮其上形成有预定图案的掩模的照明光学系统与照明光，以及用于在感光体上形成图案的图像的投影光学系统 衬底，并以预定的成像状态将图案的图像在感光衬底上成像。 该装置还包括用于测量掩模温度变化的温度测量传感器，用于计算由温度变化引起的成像状态的变化量的控制系统和用于校正成像状态变化的校正系统。

公开(公告)号：US5569930A

公开(公告)日：1996-10-29

申请号：US333291

申请日：1994-11-01

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F7/70858 ,  G03F7/70866 ,  G03F9/70

摘要： To detect the height position of a substrate, a stop-plate having a plurality of slits applies light beams of elongated cross-section to the substrate obliquely. A sensor having a plurality of sensor elements receives light beams reflected from the substrate and outputs signals for controlling the height of the substrate. Additional light beams and sensor elements may be provided to output information regarding the direction of height deviation and the amount of height deviation.

摘要翻译： 为了检测基板的高度位置，具有多个狭缝的止动板将斜长的横截面的光束倾斜地施加到基板。 具有多个传感器元件的传感器接收从基板反射的光束并输出用于控制基板的高度的信号。 可以提供附加的光束和传感器元件以输出关于高度偏差的方向和高度偏差量的信息。

公开(公告)号：US5473166A

公开(公告)日：1995-12-05

申请号：US330826

申请日：1994-10-27

申请人： Yuji Imai ,  Shinji Wakamoto

发明人： Yuji Imai ,  Shinji Wakamoto

IPC分类号： G01B11/26 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/70

摘要： An inclination detecting device has a light emitting system for emitting a parallel light flux to a substrate; a light receiving system for condensing the light reflected from the substrate, detecting the reflected light photoelectrically and outputting a photoelectric signal in accordance with the intensity of the reflected light; a stop member for changing at least one of the shape and the size of an illumination area of the parallel light flux on the substrate; an adjusting unit for changing the intensity of the photoelectric signal in accordance with the change of at least one of the shape and the size of the illumination area defined by the stop member; and a unit for detecting an inclination of the substrate with respect to a predetermined reference plane based on the photoelectric signal from the light receiving system.

摘要翻译： 倾斜检测装置具有用于向基板发射平行光通量的发光系统; 光接收系统，用于会聚从基板反射的光，根据反射光的强度检测反射光并输出光电信号; 用于改变所述基板上的平行光束的照明区域的形状和尺寸中的至少一个的停止构件; 调整单元，用于根据由停止构件限定的照明区域的形状和尺寸中的至少一个的变化来改变光电信号的强度; 以及用于基于来自光接收系统的光电信号来检测基板相对于预定参考平面的倾斜度的单元。

公开(公告)号：US5374554A

公开(公告)日：1994-12-20

申请号：US4111

申请日：1993-01-13

申请人： Saburo Komatsubara ,  Yuji Imai ,  Makoto Masuda ,  Naoki Sakurai

发明人： Saburo Komatsubara ,  Yuji Imai ,  Makoto Masuda ,  Naoki Sakurai

IPC分类号： C12N1/21 ,  C12N15/52 ,  C12P17/18 ,  C12R1/43 ,  C12N15/00

CPC分类号： C12R1/43 ,  C12N15/52 ,  C12P17/186

摘要： A microorganism derived from a host microorganism capable of producing d-biotin by introducing a recombinant plasmid being incorporated with a biotin gene cloned from a microorganism of the genus Serratia capable of producing d-biotin and further integrating an exogenous biotin gene into the chromosome, and a process for preparing d-biotin which comprises cultivating the microorganism in a culture medium so that d-biotin is formed and accumulated in the culture medium and collecting the d-biotin. The microorganism of the invention has an extremely high productivity of d-biotin, and hence, d-biotin can be produced in a large amount by cultivating the microorganism of the invention.

摘要翻译： 从能够产生d生物素的宿主微生物得到的微生物，通过引入重组质粒，该重组质粒与能够产生d生物素的沙雷杆菌属的微生物克隆的生物素基因并进一步将外源生物素基因整合到染色体中，以及 一种制备D-生物素的方法，其包括在培养基中培养微生物，使得d-生物素在培养基中形成并积聚并收集d-生物素。 本发明的微生物具有非常高的d生物素的生产率，因此通过培养本发明的微生物可以大量生产d生物素。