METAL DETECTION REAGENTS INCLUDING AN AMMONIUM SALT AND METHODS OF USING THE SAME
    81.
    发明申请
    METAL DETECTION REAGENTS INCLUDING AN AMMONIUM SALT AND METHODS OF USING THE SAME 审中-公开
    含有盐的金属检测试剂及其使用方法

    公开(公告)号:US20080145942A1

    公开(公告)日:2008-06-19

    申请号:US11955086

    申请日:2007-12-12

    IPC分类号: G01N33/20

    CPC分类号: G01N31/22 G01N2021/7783

    摘要: Provided herein are metal detection reagents including at least one ammonium salt of Formula 1: wherein R1, R2, R3 and R4 are independently selected from the group consisting of hydrogen, C1-30 alkyl and C3-14 aryl, and X− is independently selected from the group consisting of bromide, chloride, iodide, fluoride, nitrate, phosphate and sulfate and methods of using the metal detection reagents to monitor one or more metal ion levels in a solution.

    摘要翻译: 本文提供的金属检测试剂包括至少一种式1的铵盐:其中R 1,R 2,R 3和R 3 > 4 <! - SIPO - >独立地选自氢,C 1-3 - 烷基和C 3-14-14芳基,X - SUP>独立地选自溴化物,氯化物,碘化物,氟化物,硝酸盐,磷酸盐和硫酸盐,以及使用金属检测试剂监测溶液中的一种或多种金属离子水平的方法。

    Digital rear-projection display apapratus and method for adjusting a displayed image thereof
    84.
    发明申请
    Digital rear-projection display apapratus and method for adjusting a displayed image thereof 审中-公开
    数字背投显示器及其显示图像的调整方法

    公开(公告)号:US20070097326A1

    公开(公告)日:2007-05-03

    申请号:US11261165

    申请日:2005-10-28

    申请人: Jung-Yi Yang

    发明人: Jung-Yi Yang

    IPC分类号: G03B21/14 G03B21/00

    摘要: A method for adjusting a displayed image of a digital rear-projection display apparatus and a digital rear-projection display apparatus are disclosed. The method for adjusting the displayed image comprises adjusting the size of the image displayed on the digital display panel for a desired display area on the digital display panel, which is smaller than the original display area on the digital display panel, wherein the image is entirely displayed on a fixed screen after projection. The digital rear-projection display apparatus comprises a fixed screen and an image projection display module. The image projection display module including a digital display panel scales and projects the image displayed on the digital display panel to the fixed screen, wherein the digital rear-projection display apparatus further comprises an input interface for adjusting the image displayed on the digital display panel.

    摘要翻译: 公开了一种用于调整数字背投显示装置和数字背投显示装置的显示图像的方法。 用于调整所显示图像的方法包括:将数字显示面板上显示的图像的尺寸调整到数字显示面板上的数字显示面板上的所需显示区域,该尺寸小于数字显示面板上的原始显示区域,其中图像完全为 投影后显示在固定屏幕上。 数字背投显示装置包括固定屏幕和图像投影显示模块。 包括数字显示面板的图像投影显示模块将显示在数字显示面板上的图像缩放投影到固定屏幕,其中数字背投显示装置还包括用于调整显示在数字显示面板上的图像的输入接口。

    Apparatus to dry substrates
    85.
    发明授权
    Apparatus to dry substrates 有权
    干燥基材的设备

    公开(公告)号:US07191545B2

    公开(公告)日:2007-03-20

    申请号:US11142335

    申请日:2005-06-02

    申请人: Hun-Jung Yi

    发明人: Hun-Jung Yi

    IPC分类号: F26B19/00

    CPC分类号: H01L21/67253 H01L21/67034

    摘要: The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring unit has a radiating unit, a detection unit, and a window unit. The radiating unit transmits infrared-ray in a wavenumber region where light is absorbed by the IPA vapor.

    摘要翻译: 本文公开的本发明是用于干燥基底的装置。 根据本发明,该装置包括一个测量单元,用于检测处理室或管道中预定区域的IPA蒸汽的密度。 测量单元具有辐射单元,检测单元和窗口单元。 辐射单元在光被IPA蒸气吸收的波数区域中发射红外线。

    CLEANING APPARATUS AND METHOD
    87.
    发明申请
    CLEANING APPARATUS AND METHOD 审中-公开
    清洁装置和方法

    公开(公告)号:US20060237033A1

    公开(公告)日:2006-10-26

    申请号:US11380286

    申请日:2006-04-26

    IPC分类号: B08B3/00 C23G1/00

    摘要: In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from an upper part. It also includes a transferring unit for transferring the object by moving it between the cleaning and drying chambers. Further, it includes a moveable exhaust plate disposed between the drying chamber and the cleaning chamber for dividing the two chambers and for exhausting the drying fluid supplied to the drying chamber. The drying fluid flows in a uniform laminar flow in the drying chamber.

    摘要翻译: 在一个实施例中,清洁装置和方法可以防止由晶片吸收纳米尺寸的颗粒。 该装置包括用于填充用于清洁物体的清洁溶液的清洁室和设置在清洁室上方的干燥室,用于通过从上部供应干燥流体来干燥物体。 它还包括用于通过在清洁和干燥室之间移动物体来传送物体的转印单元。 此外,其包括设置在干燥室和清洁室之间的可移动排气板,用于分隔两个室并排出供应到干燥室的干燥流体。 干燥流体在干燥室中以均匀的层流流动。

    Apparatus and method for cleaning a substrate
    88.
    发明申请
    Apparatus and method for cleaning a substrate 审中-公开
    清洗基板的装置和方法

    公开(公告)号:US20060231119A1

    公开(公告)日:2006-10-19

    申请号:US11400575

    申请日:2006-04-07

    申请人: Han-Jung Yi

    发明人: Han-Jung Yi

    IPC分类号: B08B3/12 B08B6/00

    CPC分类号: B08B3/10 H01L21/67051

    摘要: An apparatus and method for cleaning a wafer are provided. According to various embodiments, deionized water can be activated by forming an electric field in a supply member through which the deionized water is supplied. The activated deionized water preferably contains radicals with excellent reactivity, in addition to ions. The activated deionized water is then preferably supplied to the cleaning chamber shortly after being activated, to thereby remove contaminants from the wafer. The activated deionized water can be used instead of or in addition to a chemical solution to clean the wafer. When used instead of a chemical solution, a rinsing process for removing the chemical solution from the wafer can be avoided and the costs and time associated with the cleaning process can be reduced.

    摘要翻译: 提供一种用于清洁晶片的设备和方法。 根据各种实施方案,可以通过在供应构件中形成电场来激活去离子水,通过其供应去离子水。 除了离子之外,活化的去离子水优选含有具有优异反应性的基团。 然后,活化的去离子水优选在被激活之后不久被提供给清洁室,从而从晶片去除污染物。 可以使用活化的去离子水代替化学溶液或除了化学溶液以除去晶片之外。 当使用代替化学溶液时,可以避免用于从晶片去除化学溶液的漂洗过程,并且可以降低与清洁过程相关联的成本和时间。

    Method for preparing unsaturated fatty acids
    89.
    发明申请
    Method for preparing unsaturated fatty acids 审中-公开
    不饱和脂肪酸的制备方法

    公开(公告)号:US20060229461A1

    公开(公告)日:2006-10-12

    申请号:US11388416

    申请日:2006-03-24

    IPC分类号: C07C51/43

    摘要: Disclosed relates to a method for preparing unsaturated fatty acids and, more particularly, to a method for preparing unsaturated fatty acids in a high purity of at least 99% by isolating and purifying unsaturated fatty acids via a secondary nucleation mechanism using fatty acid-urea inclusion compounds.

    摘要翻译: 本发明涉及一种制备不饱和脂肪酸的方法,更具体地说,涉及通过使用脂肪酸 - 脲包合物通过二次成核机理分离和纯化不饱和脂肪酸,制备高纯度至少99%的不饱和脂肪酸的方法 化合物。

    Apparatus for manufacturing integrated circuit device
    90.
    发明授权
    Apparatus for manufacturing integrated circuit device 失效
    集成电路器件制造装置

    公开(公告)号:US06905570B2

    公开(公告)日:2005-06-14

    申请号:US10627565

    申请日:2003-07-24

    摘要: An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.

    摘要翻译: 一种装置包括用于容纳流体的腔室,位于腔室中的导向器和用于将多个晶片装载和/或从该引导件卸载的传送机器人。 晶片位于导轨上。 引导件具有用于支撑晶片的支撑构件和用于防止晶片倾斜超过预定范围的止动构件。 止动构件与设置在比由支撑构件支撑的晶片边缘更高的位置处的晶片边缘接触。 晶片引导件具有阻止相邻晶片倾斜并彼此接触的止动件。 因此,可以抑制在干燥过程中晶片彼此粘附时产生的水斑(或水印)等干燥不良。