摘要:
Provided herein are metal detection reagents including at least one ammonium salt of Formula 1: wherein R1, R2, R3 and R4 are independently selected from the group consisting of hydrogen, C1-30 alkyl and C3-14 aryl, and X− is independently selected from the group consisting of bromide, chloride, iodide, fluoride, nitrate, phosphate and sulfate and methods of using the metal detection reagents to monitor one or more metal ion levels in a solution.
摘要:
A fuel cell power plant (10) includes a fuel cell (12) having a membrane electrode assembly (MEA) (16), disposed between an anode support plate (14) and a cathode support plate (18), the anode and/or cathode support plates include a hydrophilic substrate layer (80, 82) having a predetermined pore size. The pressure of the reactant gas streams (22, 24) is greater than the pressure of the coolant stream (26), such that a greater percentage of the pores within the hydrophilic substrate layer contain reactant gas rather than water. Any water that forms on the cathode side of the MEA will migrate through the cathode support plate and away from the MEA. Controlling the pressure also ensures that the coolant water will continually migrate from the coolant stream toward the anode side of the MEA, thereby preventing the membrane from becoming dry. Proper pore size and a pressure differential between coolant and reactants improves the electrical efficiency of the fuel cell.
摘要:
An apparatus and method for removing silicate from a phosphoric acid solution, including a treating unit, a regeneration line coupled to the treating unit, an additive solution supply member in communication with the regeneration line to decrease the temperature of the phosphoric acid solution and the concentration of the phosphoric acid therein, a filter in communication with the regeneration line to remove precipitated silicate particles, and a heating member having a heater and a vaporizing chamber to remove the additive.
摘要:
A method for adjusting a displayed image of a digital rear-projection display apparatus and a digital rear-projection display apparatus are disclosed. The method for adjusting the displayed image comprises adjusting the size of the image displayed on the digital display panel for a desired display area on the digital display panel, which is smaller than the original display area on the digital display panel, wherein the image is entirely displayed on a fixed screen after projection. The digital rear-projection display apparatus comprises a fixed screen and an image projection display module. The image projection display module including a digital display panel scales and projects the image displayed on the digital display panel to the fixed screen, wherein the digital rear-projection display apparatus further comprises an input interface for adjusting the image displayed on the digital display panel.
摘要:
The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring unit has a radiating unit, a detection unit, and a window unit. The radiating unit transmits infrared-ray in a wavenumber region where light is absorbed by the IPA vapor.
摘要:
A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要:
In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from an upper part. It also includes a transferring unit for transferring the object by moving it between the cleaning and drying chambers. Further, it includes a moveable exhaust plate disposed between the drying chamber and the cleaning chamber for dividing the two chambers and for exhausting the drying fluid supplied to the drying chamber. The drying fluid flows in a uniform laminar flow in the drying chamber.
摘要:
An apparatus and method for cleaning a wafer are provided. According to various embodiments, deionized water can be activated by forming an electric field in a supply member through which the deionized water is supplied. The activated deionized water preferably contains radicals with excellent reactivity, in addition to ions. The activated deionized water is then preferably supplied to the cleaning chamber shortly after being activated, to thereby remove contaminants from the wafer. The activated deionized water can be used instead of or in addition to a chemical solution to clean the wafer. When used instead of a chemical solution, a rinsing process for removing the chemical solution from the wafer can be avoided and the costs and time associated with the cleaning process can be reduced.
摘要:
Disclosed relates to a method for preparing unsaturated fatty acids and, more particularly, to a method for preparing unsaturated fatty acids in a high purity of at least 99% by isolating and purifying unsaturated fatty acids via a secondary nucleation mechanism using fatty acid-urea inclusion compounds.
摘要:
An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.