公开(公告)号：US06731372B2

公开(公告)日：2004-05-04

申请号：US09818163

申请日：2001-03-27

申请人： Mike Binnard ,  Douglas C. Watson

发明人： Mike Binnard ,  Douglas C. Watson

IPC分类号： G03B2742

CPC分类号： G03F7/70991 ,  F16F9/18 ,  F16F9/36 ,  F16F9/46 ,  G03F7/70833 ,  G03F7/709

摘要： A fluid mount (10) for an exposure apparatus (32) includes a first subsystem (12) and a second subsystem (14). The first subsystem (12) includes a first cylinder (18) and a first piston (20). The first piston (20) moves within the first cylinder (18) along a first axis (26). The second subsystem (14) includes a second cylinder (22) and a second piston (24). The second piston (24) moves within the second cylinder (22) along a second axis (28). Importantly, (i) the second subsystem (14) is stacked on top of the first subsystem (12), (ii) the second axis (28) is substantially coaxial with the first axis (26), and (iii) the first piston (20) is connected to the second piston (24) with a piston connector (16). The resulting fluid mount (10) has a relatively high load carrying capacity and a relatively small footprint.

摘要翻译： 用于曝光设备（32）的流体安装件（10）包括第一子系统（12）和第二子系统（14）。 第一子系统（12）包括第一气缸（18）和第一活塞（20）。 第一活塞（20）沿着第一轴线（26）在第一气缸（18）内移动。 第二子系统（14）包括第二气缸（22）和第二活塞（24）。 第二活塞（24）沿着第二轴线（28）在第二气缸（22）内移动。 重要的是，（i）第二子系统（14）堆叠在第一子系统（12）的顶部，（ii）第二轴线（28）与第一轴线（26）基本上同轴，和（iii）第一活塞 （20）通过活塞连接器（16）连接到第二活塞（24）。 所得到的流体支架（10）具有相对高的承载能力和相对较小的占地面积。

公开(公告)号：US06239924B1

公开(公告)日：2001-05-29

申请号：US09386255

申请日：1999-08-31

申请人： Douglas C. Watson ,  W. Thomas Novak

发明人： Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G02B702

CPC分类号： G03F7/70241 ,  G02B7/022 ,  G02B7/026 ,  G02B7/028 ,  G03F7/70825

摘要： A cell for mounting a lens includes a set of resilient mounting structures which can include a plurality of seats affixed to radial flexure mounts, a set of compliant soft mounts or a combination of the radial flexure mounts and soft mounts. The radial flexure mounts additionally include a pair of flexures extending at opposite ends of the flexure mount. The flexures permit the lens to radially expand and contract relative to the cell due to temperature changes. The seats are affixed to the flexure mounts to prevent torsional moments on the flexure mounts due to gravity or vibration. Additionally, there is no torsion moment on the radial flexure mounts due to radial expansion. The set of soft mounts include a spring member for distributing the gravitational load without overconstraining the lens.

摘要翻译： 用于安装透镜的单元包括一组弹性安装结构，其可以包括固定到径向弯曲安装座的多个座，一组柔性软安装座或径向挠性安装座和软座的组合。 径向弯曲安装件还包括在挠曲安装件的相对端延伸的一对挠曲件。 由于温度变化，挠曲件允许镜片相对于电池径向膨胀和收缩。 座椅固定在挠性支架上，以防止由于重力或振动引起的弯曲安装座上的扭转力矩。 另外，由于径向膨胀，径向弯曲安装座上没有扭转力矩。 该软组件包括用于分配重力载荷而不过度约束透镜的弹簧构件。

公开(公告)号：US5519223A

公开(公告)日：1996-05-21

申请号：US206386

申请日：1994-03-03

申请人： Paul Hug ,  Douglas C. Watson ,  Mark S. Fasnacht ,  Horace H. Hines ,  David A. Chan

发明人： Paul Hug ,  Douglas C. Watson ,  Mark S. Fasnacht ,  Horace H. Hines ,  David A. Chan

IPC分类号： G01T1/164 ,  G01T1/161

CPC分类号： G01T1/1648

摘要： An automatic collimator exchanger for a gamma camera system for simultaneous exchange of pairs of collimators (or a single collimator) for a dual detector head system. The present invention includes an exchange assembly having an elevator, a carriage and a bridge. The elevator includes a rack of multiple parallel and stacked trays for holding various pairs of collimators. A draw bridge unit is attached to one side of the elevator (which side faces a gantry structure) and may extend into the gantry structure. The carriage is able to support two collimators and moves from within the elevator unit onto the bridge and into the gantry structure, when the bridge is lowered, to position between two aligned detector heads of the dual head gamma camera system. When the detector heads are positioned near the aligned carriage, latch pins are released and collimators may be transferred to the carriage, if empty, or hastened to the detector heads from the carriage when installing a pair of collimators. Sliding lock plates (each having hooks and a safety latch pin) are mounted on both sides of each of the detector heads and are used to transfer the collimators between the carriage and the detector heads during the exchange (for removal and installation) and are used to secure the collimators to the detector heads during an imaging session. One collimator or a pair may be simultaneously exchanged using the present invention without operator intervention.

摘要翻译： 一种用于伽马相机系统的自动准直器交换器，用于同时交换双检测器头系统的准直器对（或单个准直仪）。 本发明包括具有电梯，托架和桥的交换组件。 电梯包括多个平行和堆叠的托架的架子，用于保持各种准直器对。 牵引桥单元连接到电梯的一侧（该侧面是龙门架结构）并且可延伸到机架结构中。 当桥接器下降时，滑架能够支撑两个准直器并从电梯单元内移动到桥架上并进入机架结构，以便位于双头伽马相机系统的两个对准的检测器头之间。 当检测器头位于对准的托架附近时，释放闩锁销，并且当安装一对准直器时，准直器可能被传送到托架（如果是空的）或者从托架移动到检测器头。 在每个检测器头的两侧都安装有滑动锁板（每个都有钩子和安全闩锁销），用于在更换（用于拆卸和安装）过程中将准直器在托架和检测器头之间传输（用于拆卸和安装） 以在成像会话期间将准直器固定到检测器头。 一个准直器或一对可以在没有操作者干预的情况下使用本发明同时交换。

公开(公告)号：US08830443B2

公开(公告)日：2014-09-09

申请号：US13067464

申请日：2011-06-02

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。

公开(公告)号：US20130155385A1

公开(公告)日：2013-06-20

申请号：US13818567

申请日：2011-08-23

申请人： Fardad Hashemi ,  Douglas C. Watson

发明人： Fardad Hashemi ,  Douglas C. Watson

IPC分类号： G03B27/64

CPC分类号： G03F1/64 ,  G03B27/64 ,  G03F1/66 ,  G03F7/70841 ,  G03F7/70908 ,  H01L21/6719

摘要： A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).

摘要翻译： 用于提供与工件（28）相邻的密封腔（40）以抵抗重力对工件（28）的影响的室组件（26）包括腔室壳体（244）和膨胀的密封组件（33） 和/或收缩以更好地密封工件（28）。 此外，腔室组件（26）可以包括一个或多个换能器组件（34），其膨胀或收缩以快速响应腔室组件（26）中的流体的泄漏或喷射，以保持腔室组件中恒定且稳定的腔室压力（ 26）。 此外，腔室组件（26）可以利用压力源（35），该压力源将较大量的流体（374）引导通过流体通道（368）以精确地保持腔室组件（26）内的压力。

公开(公告)号：US08441615B2

公开(公告)日：2013-05-14

申请号：US12548895

申请日：2009-08-27

申请人： Fardad A. Hashemi ,  Douglas C. Watson ,  Christopher Margeson

发明人： Fardad A. Hashemi ,  Douglas C. Watson ,  Christopher Margeson

IPC分类号： G03B27/58 ,  G03B27/62 ,  F16M13/00

CPC分类号： G03F7/709 ,  F16F15/06 ,  Y10T29/49826

摘要： A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.

摘要翻译： 一种用于制造基板（42）的精密组件（10）包括精密制造装置（12），基座组件（14）和悬挂系统（16）。 精密制造装置（12）制造基板（42）。 基座组件（14）支撑制造装置（12）的至少一部分。 悬挂系统（16）禁止在安装基座（20）和基座组件（14）之间的运动传递。 悬挂系统（16）可以包括（i）联接到安装基座（20）和基座组件（14）的第一起重臂（380），第一起重臂（380）可枢转地联接到至少一个 安装基座（20）和基座组件（14），以及（ii）第一弹性组件（382），其联接在安装基座（20）和第一起重臂（380）和基座组件 14）。 第一弹性组件（382）可以在弹性组件（382）的操作范围上类似于零长度弹簧起作用。 通过这种设计，在地震干扰期间，精密制造装置（12）的部件被悬挂系统（16）更好地保护。 这降低了在地震干扰期间精密制造装置（12）的部件的损坏和不对准的可能性。

公开(公告)号：US07929110B2

公开(公告)日：2011-04-19

申请号：US11819446

申请日：2007-06-27

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括具有液体收集构件的液体收集系统，该液体收集构件具有液体可渗透构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体。

公开(公告)号：US20100149513A1

公开(公告)日：2010-06-17

申请号：US12656703

申请日：2010-02-12

申请人： Douglas C. Watson ,  W. Thomas Novak

发明人： Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52 ,  G02B3/12 ,  G03B27/58

CPC分类号： G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

摘要： An immersion lithography system compensates for displacement of the final optical element of the optical assembly caused by the immersion fluid. The system includes an optical assembly to project an image defined by a reticle onto a wafer. The optical assembly includes a final optical element spaced from the wafer by a gap. An immersion element supplies an immersion fluid into the gap and recovers any immersion fluid that escapes the gap. A fluid compensation system applies a force to the final optical element of the optical assembly to compensate for pressure variations of the immersion fluid.

摘要翻译： 浸没光刻系统补偿由浸没流体引起的光学组件的最终光学元件的位移。 该系统包括光学组件，用于将由标线片限定的图像投影到晶片上。 光学组件包括通过间隙与晶片隔开的最终光学元件。 浸入元件将浸没流体供应到间隙中并且恢复逸出间隙的任何浸没流体。 流体补偿系统向光学组件的最终光学元件施加力以补偿浸没流体的压力变化。

公开(公告)号：US07717966B2

公开(公告)日：2010-05-18

申请号：US11126444

申请日：2005-05-10

申请人： Douglas C. Watson

发明人： Douglas C. Watson

IPC分类号： H01L21/00 ,  F16L11/22

CPC分类号： G03F7/70841 ,  G03F7/70808 ,  Y10T29/41

摘要： A barrier assembly (58) for sealing an assembly gap (274) between a first assembly (266) and a second assembly (268) includes a first barrier (270) that seals the assembly gap (274) and a second barrier (272) that seals the assembly gap (274). The barriers (270) (272) can be spaced apart. Further, the first barrier(270) provides a flexible pressure barrier that seals the assembly gap (274) and the second barrier (272) provides a flexible barrier that inhibits the first barrier (270) from contaminating a chamber environment within the assemblies (266) (268). Additionally, the barrier assembly (58) includes a barrier source (62) that controls a barrier environment between the barriers (270) (272).

摘要翻译： 用于密封第一组件（266）和第二组件（268）之间的组件间隙（274）的阻挡组件（58）包括密封组件间隙（274）和第二屏障（272）的第一屏障（270） 密封组件间隙（274）。 障碍物（270）（272）可以间隔开。 此外，第一屏障（270）提供密封组件间隙（274）的柔性压力屏障，并且第二屏障（272）提供柔性屏障，其阻止第一屏障（270）污染组件内的腔室环境（266） ）（268）。 另外，阻挡组件（58）包括控制屏障（270）（272）之间的屏障环境的阻挡源（62）。

公开(公告)号：US20090195762A1

公开(公告)日：2009-08-06

申请号：US12382162

申请日：2009-03-10

申请人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

摘要翻译： 浸没式光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间，从液体供应构件将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 物体的与工件不同的表面被设置成使得物体和光学元件的表面彼此相对。 在净化处理中，从液体供给部件将清洗液供给到物体的表面。