Magnetic memory cell
    82.
    发明授权
    Magnetic memory cell 有权
    磁记忆体

    公开(公告)号:US08335105B2

    公开(公告)日:2012-12-18

    申请号:US11715097

    申请日:2007-03-07

    IPC分类号: G11C11/14

    CPC分类号: G11C11/15

    摘要: By inserting a spin polarizing layer (typically pure iron) within the free layer of a MTJ or GMR memory cell, dR/R can be improved without significantly affecting other free layer properties such as Hc. Additional performance improvements can be achieved by also inserting a surfactant layer (typically oxygen) within the free layer.

    摘要翻译: 通过在MTJ或GMR存储器单元的自由层内插入自旋偏振层(通常为纯铁),可以改善dR / R,而不显着影响其它自由层性质如Hc。 还可以通过在自由层内插入表面活性剂层(通常为氧)来实现另外的性能改进。

    CPP device with improved current confining structure and process
    83.
    发明授权
    CPP device with improved current confining structure and process 有权
    CPP器件具有改进的电流限制结构和工艺

    公开(公告)号:US08325449B2

    公开(公告)日:2012-12-04

    申请号:US11895719

    申请日:2007-08-27

    IPC分类号: G11B5/33 G11B5/127

    摘要: Plasma nitridation, in place of plasma oxidation, is used for the formation of a CCP layer. Al, Mg, Hf, etc. all form insulating nitrides under these conditions. Maintaining the structure at a temperature of at least 150° C. during plasma nitridation and/or performing post annealing at a temperature of 220° C. or higher, ensures that no copper nitride can form. Additionally, unintended oxidation by molecular oxygen of the exposed magnetic layers (mainly the pinned and free layers) is also avoided.

    摘要翻译: 等离子体氮化代替等离子体氧化,用于形成CCP层。 Al,Mg,Hf等都在这些条件下形成绝缘氮化物。 在等离子体氮化和/或在220℃以上的温度下进行后退火时,将结构维持在至少150℃的温度下,确保不会形成氮化铜。 此外,也避免了暴露的磁性层(主要是固定和自由层)的分子氧的非预期氧化。

    Assisting FGL oscillations with perpendicular anisotropy for MAMR
    84.
    发明授权
    Assisting FGL oscillations with perpendicular anisotropy for MAMR 有权
    为MAMR协助垂直各向异性的FGL振荡

    公开(公告)号:US08274811B2

    公开(公告)日:2012-09-25

    申请号:US12927699

    申请日:2010-11-22

    摘要: A spin transfer oscillator (STO) structure is disclosed that includes two assist layers with perpendicular magnetic anisotropy (PMA) to enable a field generation layer (FGL) to achieve an oscillation state at lower current density for MAMR applications. In one embodiment, the STO is formed between a main pole and write shield and the FGL has a synthetic anti-ferromagnetic structure. The STO configuration may be represented by seed layer/spin injection layer (SIL)/spacer/PMA layer 1/FGL/spacer/PMA layer 2/capping layer. The spacer may be Cu for giant magnetoresistive (GMR) devices or a metal oxide for tunneling magnetoresistive (TMR) devices. Alternatively, the FGL is a single ferromagnetic layer and the second PMA assist layer has a synthetic structure including two PMA layers with magnetic moment in opposite directions in a seed layer/SIL/spacer/PMA assist 1/FGL/spacer/PMA assist 2/capping layer configuration. SIL and PMA assist layers are laminates of (CoFe/Ni)x or the like.

    摘要翻译: 公开了一种自旋转移振荡器(STO)结构,其包括具有垂直磁各向异性(PMA)的两个辅助层,以使场产生层(FGL)能够在较低电流密度下实现用于MAMR应用的振荡状态。 在一个实施例中,STO形成在主极和写保护罩之间,并且FGL具有合成的反铁磁结构。 STO配置可以由种子层/自旋注入层(SIL)/间隔物/ PMA层1 / FGL /间隔物/ PMA层2 /覆盖层表示。 间隔物可以是用于巨磁阻(GMR)器件的Cu或用于隧道磁阻(TMR)器件的金属氧化物。 或者,FGL是单个铁磁层,并且第二PMA辅助层具有合成结构,其包括在籽晶层/ SIL /间隔物/ PMA辅助1 / FGL /间隔物/ PMA辅助2/2中具有相反方向的磁矩的两个PMA层, 覆盖层配置。 SIL和PMA辅助层是(CoFe / Ni)x等的层压体。

    TMR Device with Low Magnetorestriction Free Layer
    85.
    发明申请
    TMR Device with Low Magnetorestriction Free Layer 有权
    低磁阻自由层的TMR器件

    公开(公告)号:US20120193738A1

    公开(公告)日:2012-08-02

    申请号:US13444497

    申请日:2012-04-11

    IPC分类号: H01L29/82

    摘要: A high performance TMR sensor is fabricated by employing a free layer with a trilayer configurations represented by FeCo/CoFeB/CoB, FeCo/CoB/CoFeB, FeCo/CoFe/CoB, or FeCo/FeB/CoB may also be employed. Alternatively, CoNiFeB or CoNiFeBM formed by co-sputtering CoB with CoNiFe or CoNiFeM, respectively, where M is V, Ti, Zr, Nb, Hf, Ta, or Mo may be included in a composite free layer or as a single free layer in the case of CoNiFeBM. A 15 to 30% in improvement in TMR ratio over a conventional CoFe/NiFe free layer is achieved while maintaining low Hc and RA

    摘要翻译: 通过采用由FeCo / CoFeB / CoB,FeCo / CoB / CoFeB,FeCo / CoFe / CoB或FeCo / FeB / CoB表示的三层结构的自由层制造高性能TMR传感器。 或者,通过共溅射CoB与CoNiFe或CoNiFeM(其中M是V,Ti,Zr,Nb,Hf,Ta或Mo)分别形成的CoNiFeB或CoNiFeBM可以包括在复合自由层中或作为单个自由层 CoNiFeBM的情况。 在保持低Hc和RA <3欧姆 - um2的同时,实现了常规CoFe / NiFe自由层的TMR比提高15至30%。 在双层或三层实施例中,通过组合CoB(-λ)和一个或多个具有正λ的层来实现-5×10-6和5×10-6之间的磁致伸缩(λ)。

    Modified field generation layer for microwave assisted magnetic recording
    86.
    发明授权
    Modified field generation layer for microwave assisted magnetic recording 有权
    微波辅助磁记录修改场产生层

    公开(公告)号:US08208219B2

    公开(公告)日:2012-06-26

    申请号:US12927083

    申请日:2010-11-05

    IPC分类号: G11B5/127

    摘要: A spin torque oscillator is described in which the conventional Field Generation Layer (FGL) is replaced by a bilayer, one of whose members exhibits perpendicular magnetic anisotropy while the other exhibits conventional in-plane anisotropy. Provided the layer with the perpendicular anisotropy is the one that is closest to the spacer layer, the device is able to generate microwaves at current densities as low as 1×108 A/cm2.

    摘要翻译: 描述了一种自旋扭矩振荡器,其中常规的场产生层(FGL)由双层代替,其中一个构件呈现垂直的磁各向异性,而另一个表现出常规的面内各向异性。 如果具有垂直各向异性的层是最接近间隔层的层,该器件能够产生低至1×108A / cm 2的电流密度的微波。

    TMR DEVICE WITH IMPROVED MGO BARRIER
    87.
    发明申请
    TMR DEVICE WITH IMPROVED MGO BARRIER 有权
    具有改进的MGO障碍物的TMR装置

    公开(公告)号:US20120128870A1

    公开(公告)日:2012-05-24

    申请号:US12927698

    申请日:2010-11-22

    IPC分类号: H01F1/047

    摘要: A method of forming a high performance magnetic tunnel junction (MTJ) is disclosed wherein the tunnel barrier includes at least three metal oxide layers. The tunnel barrier stack is partially built by depositing a first metal layer, performing a natural oxidation (NOX) process, depositing a second metal layer, and performing a second NOX process to give a MOX1/MOX2 configuration. An uppermost metal layer on the MOX2 layer is not oxidized until after the MTJ stack is completely formed and an annealing process is performed to drive unreacted oxygen in the MOX1 and MOX2 layers into the uppermost metal layer. In an alternative embodiment, a plurality of metal oxide layers is formed on the MOX1 layer before the uppermost metal layer is deposited. The resulting MTJ stack has an ultralow RA around 1 ohm-μm2 and maintains a high magnetoresistive ratio characteristic of a single metal oxide tunnel barrier layer.

    摘要翻译: 公开了一种形成高性能磁隧道结(MTJ)的方法,其中隧道势垒包括至少三个金属氧化物层。 通过沉积第一金属层,执行自然氧化(NOX)工艺,沉积第二金属层以及执行第二NOX工艺以产生MOX1 / MOX2配置来部分构建隧道势垒堆叠。 在MOX2层上的最上层的金属层直到MTJ堆叠完全形成之后才被氧化,并且进行退火处理以将MOX1和MOX2层中的未反应的氧气驱入最上层的金属层。 在替代实施例中,在最上层金属层被沉积​​之前,在MOX1层上形成多个金属氧化物层。 所得到的MTJ堆叠具有约1欧姆 - μm2的超低RA,并且保持单个金属氧化物隧道势垒层的高磁阻比特性。

    Novel CPP device with an enhanced dR/R ratio
    89.
    发明申请
    Novel CPP device with an enhanced dR/R ratio 审中-公开
    具有增强的dR / R比的新型CPP装置

    公开(公告)号:US20120009337A1

    公开(公告)日:2012-01-12

    申请号:US13200013

    申请日:2011-09-15

    IPC分类号: G11B5/31 C23C14/34

    摘要: A CPP-GMR spin valve having a composite spacer layer comprised of at least one metal (M) layer and at least one semiconductor or semi-metal (S) layer is disclosed. The composite spacer may have a M/S, S/M, M/S/M, S/M/S, M/S/M/S/M, or a multilayer (M/S/M)n configuration where n is an integer≧1. The pinned layer preferably has an AP2/coupling/AP1 configuration wherein the AP2 portion is a FCC trilayer represented by CoZFe(100-Z)/FeYCo(100-Y)/CoZFe(100-Z) where y is 0 to 60 atomic %, and z is 75 to 100 atomic %. In one embodiment, M is Cu with a thickness from 0.5 to 50 Angstroms and S is ZnO with a thickness of 1 to 50 Angstroms. The S layer may be doped with one or more elements. The dR/R ratio of the spin valve is increased to 10% or greater while maintaining acceptable EM and RA performance.

    摘要翻译: 公开了具有由至少一个金属(M)层和至少一个半导体或半金属(S)层组成的复合间隔层的CPP-GMR自旋阀。 复合间隔物可以具有M / S,S / M,M / S / M,S / M / S,M / S / M / S / M或多层(M / S / M) 是整数≧1。 钉扎层优选具有AP2 /耦合/ AP1配置,其中AP2部分是由CoZFe(100-Z)/ FeYCo(100-Y)/ CoZFe(100-Z)表示的FCC三层,其中y为0至60原子% ,z为75〜100原子%。 在一个实施方案中,M是厚度为0.5至50埃的Cu,S是厚度为1至50埃的ZnO。 S层可以掺杂有一个或多个元素。 自旋阀的dR / R比提高到10%以上,同时保持可接受的EM和RA性能。

    Multilayer structure with high perpendicular anisotropy for device applications
    90.
    发明申请
    Multilayer structure with high perpendicular anisotropy for device applications 有权
    用于器件应用的具有高垂直各向异性的多层结构

    公开(公告)号:US20110293967A1

    公开(公告)日:2011-12-01

    申请号:US12802091

    申请日:2010-05-28

    IPC分类号: G11B5/66 B05D3/06

    摘要: Perpendicular magnetic anisotropy and Hc are enhanced in magnetic devices with a Ta/M1/M2 seed layer where M1 is preferably Ti, and M2 is preferably Cu, and including an overlying (Co/Ni)X multilayer (x is 5 to 50) that is deposited with ultra high Ar pressure of >100 sccm to minimize impinging energy that could damage (Co/Ni)X interfaces. In one'embodiment, the seed layer is subjected to one or both of a low power plasma treatment and natural oxidation process to form a more uniform interface with the (Co/Ni)X multilayer. Furthermore, an oxygen surfactant layer may be formed at one or more interfaces between adjoining (Co/Ni)X layers in the multilayer stack. Annealing at temperatures between 180° C. and 400° C. also increases Hc but the upper limit depends on whether the magnetic device is MAMR, MRAM, a hard bias structure, or a perpendicular magnetic medium.

    摘要翻译: 在具有Ta优选为Ti的Ta / M1 / M2种子层的磁性装置中,垂直磁各向异性和Hc增强,并且M2优选为Cu,并且包括覆盖(Co / Ni)X多层(x为5至50), 以超过100 sccm的超高Ar压力沉积,以尽量减少可能损坏(Co / Ni)X界面的冲击能量。 在一个实施例中,种子层经受低功率等离子体处理和天然氧化过程中的一种或两种以与(Co / Ni)X多层形成更均匀的界面。 此外,可以在多层叠层中的相邻(Co / Ni)X层之间的一个或多个界面处形成氧表面活性剂层。 在180°C至400°C的温度下退火也会增加Hc,但上限取决于磁性装置是MAMR,MRAM,硬偏压结构还是垂直磁介质。