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109 条记录 (耗时 0.031 秒)

    Magnetic head having improved high density recording and/or reproduction characteristics
    81.
    发明授权
    Magnetic head having improved high density recording and/or reproduction characteristics 失效
    具有改善的高密度记录和/或再现特性的磁头

    公开(公告)号：US4951165A

    公开(公告)日：1990-08-21

    申请号：US295301

    申请日：1989-01-10

    申请人： Jun Makabe ,  Hedeharu Kurata ,  Hiroshi Matsunaga

    发明人： Jun Makabe ,  Hedeharu Kurata ,  Hiroshi Matsunaga

    IPC分类号： G11B5/60 ,  G11B5/10 ,  G11B5/105 ,  G11B5/187

    CPC分类号： G11B5/10 ,  G11B5/105 ,  G11B5/1871

    摘要： A magnetic head carries out at least one of a recording, reproduction and erasure of an information on and/or from a magnetic recording medium by making sliding contact with the magnetic recording medium. The magnetic head comprises a first slider having a first surface which confronts the magnetic recording medium, a second slider having a second surface which confronts the magnetic recording medium and a contact portion for making sliding contact with the recording medium, and a magnetic head part sandwiched between the first and second sliders for carrying out at least one of the recording, reproduction and erasure of the information on and/or from the recording medium. The magnetic head part has a sliding contact surface for making sliding contact with the magnetic recording medium, and this magnetic head part projects from the first and second surfaces of the first and second sliders so that the sliding contact surface approximately coincides with the contact surface of the second slider.

    摘要翻译： 磁头通过与磁记录介质的滑动接触来执行对磁记录介质上和/或上的信息的记录，再现和擦除中的至少一个。 磁头包括具有与磁记录介质相对的第一表面的第一滑块，具有与磁记录介质相对的第二表面的第二滑块和用于与记录介质滑动接触的接触部分和夹在磁记录介质上的磁头部分 在第一和第二滑块之间用于执行在记录介质上和/或从记录介质的记录，再现和擦除中的至少一个。 磁头部分具有用于与磁记录介质滑动接触的滑动接触表面，并且该磁头部分从第一和第二滑块的第一和第二表面突出，使得滑动接触表面大致与 第二个滑块。

    Light transmission device
    82.
    发明授权
    Light transmission device 失效
    光传输装置

    公开(公告)号：US4684210A

    公开(公告)日：1987-08-04

    申请号：US698562

    申请日：1985-02-06

    申请人： Hiroshi Matsunaga ,  Yoji Shimojima ,  Ichiro Tokunaga ,  Kosei Obata

    发明人： Hiroshi Matsunaga ,  Yoji Shimojima ,  Ichiro Tokunaga ,  Kosei Obata

    IPC分类号： G10H1/18 ,  G02B6/42 ,  G10H1/36 ,  G10H7/00 ,  G02B7/26

    CPC分类号： G02B6/4292

    摘要： Discloded is a light transmission device in which a plug is elastically urged toward an E-O converter element by a plug urging means provided between the plug and a receptacle of a light transfer device and in which a spacer is provided between the plug and the E-O converter element so that the end surface of the plug and the E-O converter element are separated from each other by a predetermined distance.

    摘要翻译： Discloed是一种光传输装置，其中通过设置在插头和光传输装置的插座之间的插头推动装置将插头弹性地推向EO转换器元件，并且其中在插头和EO转换器元件之间设置间隔件 使得插头和EO转换器元件的端面彼此分开预定距离。

    Optical fiber sensor having shaped ends
    83.
    发明授权
    Optical fiber sensor having shaped ends 失效
    具有成形端的光纤传感器

    公开(公告)号：US4617460A

    公开(公告)日：1986-10-14

    申请号：US599944

    申请日：1984-04-13

    申请人： Ichiro Tokunaga ,  Hiroshi Matsunaga ,  Yoji Shimojima

    发明人： Ichiro Tokunaga ,  Hiroshi Matsunaga ,  Yoji Shimojima

    IPC分类号： G02B6/00 ,  G01B11/00 ,  G01B11/02 ,  G02B6/02 ,  H01J5/10

    CPC分类号： G01B11/00 ,  G01B11/026

    摘要： In an optical fiber sensor comprising an optical fiber coupled with a light emission element and another optical fiber coupled with a light receiving element, end portions of the optical fibers other than those coupled with the aforementioned elements being arranged side by side and joined together in a closely contacting relation with the end surfaces of the optical fibers placed in opposition to a slit member to be detected such that the arranged direction of the optical fibers is aligned with a shifting direction of the slit member; the end portions of the optical fibers are formed into a flat configuration and joined together such that the flat side surfaces of the two fibers are brought into a surface contacting relation.

    摘要翻译： 在包括与光发射元件耦合的光纤和与光接收元件耦合的另一光纤的光纤传感器中，除了与上述元件耦合的光纤之外的光纤的端部被并排布置并且在一个 与被检测的狭缝部件相对配置的光纤的端面紧密接触，使得光纤的布置方向与狭缝部件的移动方向对齐; 光纤的端部形成为扁平构造并且接合在一起，使得两个光纤的平坦侧表面成为表面接触关系。

    TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID
    88.
    发明申请
    TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID 审中-公开
    用于抑制微结构中的图案皱纹的处理液和使用合适处理液的微结构制造方法

    公开(公告)号：US20130161284A1

    公开(公告)日：2013-06-27

    申请号：US13820835

    申请日：2011-07-14

    申请人： Hiroshi Matsunaga ,  Masaru Ohto

    发明人： Hiroshi Matsunaga ,  Masaru Ohto

    IPC分类号： C09K3/00

    CPC分类号： H01L21/0206 ,  B81C1/00825

    摘要： There are provided a processing liquid for suppressing pattern collapse of a microstructure formed of silicon oxide which includes at least one compound selected from the group consisting of a fluoroalkyl group-containing ammonium halide, a fluoroalkyl group-containing betaine compound and a fluoroalkyl group-containing amine oxide compound, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid.

    摘要翻译： 提供了一种用于抑制由氧化硅形成的微结构的图案塌陷的处理液，其包括选自含氟烷基的卤化铵，含氟烷基的甜菜碱化合物和含氟烷基的至少一种化合物 氧化胺化合物和水; 以及使用该处理液制造由氧化硅形成的微观结构的方法。

    Liquid for protecting copper wiring surface and method for manufacturing semiconductor circuit element
    89.
    发明授权
    Liquid for protecting copper wiring surface and method for manufacturing semiconductor circuit element 有权
    用于保护铜布线表面的液体和用于制造半导体电路元件的方法

    公开(公告)号：US08420538B2

    公开(公告)日：2013-04-16

    申请号：US13062365

    申请日：2009-09-02

    申请人： Kenji Yamada ,  Kenji Shimada ,  Hiroshi Matsunaga

    发明人： Kenji Yamada ,  Kenji Shimada ,  Hiroshi Matsunaga

    IPC分类号： H01L21/302 ,  H01L21/44 ,  C23F11/00 ,  C09K15/00

    CPC分类号： H01L21/321 ,  H01L21/02074

    摘要： A copper wiring material surface protective liquid is provided that is used in production of a semiconductor circuit device containing copper wiring, and consists of an aqueous solvent and an acetylene alcohol compound containing at least 3-phenyl-2-propyn-1-ol. A method for producing a semiconductor circuit device is provided that contains: forming an insulating film and/or a diffusion preventing film on a silicon substrate; then forming a copper film by a sputtering; then forming a copper film or a copper alloy film containing 80% by mass or more of copper thereon by a plating method; and flattening the film by a chemical mechanical polishing (CMP) method, thereby providing a semiconductor substrate containing a flattened copper wiring, in which the semiconductor substrate having an exposed surface of a copper wiring material is treated by making in contact with the copper wiring material surface protective liquid.

    摘要翻译： 提供铜线材料表面保护液，其用于生产含有铜布线的半导体电路器件，并由含水溶剂和至少含有3-苯基-2-丙炔-1-醇的乙炔醇化合物组成。 提供一种制造半导体电路器件的方法，其包括：在硅衬底上形成绝缘膜和/或防扩散膜; 然后通过溅射形成铜膜; 然后通过电镀法形成含有80质量％以上的铜的铜膜或铜合金膜; 并通过化学机械抛光（CMP）方法使膜平坦化，从而提供含有扁平铜布线的半导体基板，其中通过与铜布线材料接触来处理具有铜布线材料的暴露表面的半导体基板 表面保护液。

    LIQUID COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE USING THE SAME
    90.
    发明申请
    LIQUID COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE USING THE SAME 审中-公开
    用于清洁半导体衬底的液体组合物和使用其清洁半导体衬底的方法

    公开(公告)号：US20130045597A1

    公开(公告)日：2013-02-21

    申请号：US13695552

    申请日：2011-10-18

    申请人： Kyoko Kamada ,  Kenji Yamada ,  Hiroshi Matsunaga

    发明人： Kyoko Kamada ,  Kenji Yamada ,  Hiroshi Matsunaga

    IPC分类号： C11D17/00 ,  H01L21/304 ,  H01L21/306

    CPC分类号： H01L21/02074 ,  C11D7/06 ,  C11D7/261 ,  C11D7/36 ,  C11D11/0047

    摘要： [Problems] An object of the present invention is to provide a cleaning liquid composition which removes residual liquid and contaminants after chemical-mechanical polishing (CMP) of the surface of a semiconductor substrate in the production process of a semiconductor circuit device; and a cleaning method using the cleaning liquid composition.[Means for Solution] The cleaning liquid composition according to the present invention comprises a quaternary ammonium hydroxide, 1-ethinyl-1-cyclohexanol, a complexing agent, diethylenetriamine pentamethylene phosphonate and water and has a pH of 9 to 13. By cleaning a wiring material with the cleaning liquid composition according to the present invention, the wiring material can be protected against contamination, corrosion, oxidation and generation of foreign substance that are originated from the production process of a semiconductor circuit device or the environment, so that a clean wiring surface can be obtained.

    摘要翻译： 本发明的目的在于提供一种清洗液组合物，其在半导体电路装置的制造工序中，在半导体基板的表面的化学机械抛光（CMP）之后除去残留的液体和污染物; 以及使用该清洗液组合物的清洗方法。 [解决方案]根据本发明的清洗液组合物包含季铵氢氧化物，1-乙炔基-1-环己醇，络合剂，二亚乙基三胺五亚甲基膦酸盐和水，并且具有9至13的pH。通过清洁布线 具有根据本发明的清洁液组合物的材料，布线材料可以被保护免受来自半导体电路器件或环境的生产过程的杂质的污染，腐蚀，氧化和产生，使得干净的布线 可以得到表面。