公开(公告)号：US07079331B2

公开(公告)日：2006-07-18

申请号：US11109316

申请日：2005-04-19

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

IPC分类号： G02B7/02 ,  G02B27/10 ,  G02B27/14 ,  G02B7/18 ,  G02F1/01

CPC分类号： G03F7/70825 ,  G02B7/008 ,  G02B7/1805 ,  G03F7/70891

摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件

公开(公告)号：US20060119750A1

公开(公告)日：2006-06-08

申请号：US11252598

申请日：2005-10-19

申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

IPC分类号： G02F1/1335

CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

公开(公告)号：US20050254773A1

公开(公告)日：2005-11-17

申请号：US11185066

申请日：2005-07-20

申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B6/00

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

公开(公告)号：US20050180023A1

公开(公告)日：2005-08-18

申请号：US11071699

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

发明人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B1/02 ,  G02B5/30 ,  G02B13/14 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966 ,  Y10S359/90

摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.

摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

公开(公告)号：US09733395B2

公开(公告)日：2017-08-15

申请号：US13112357

申请日：2011-05-20

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC分类号： G03B27/68 ,  G02B1/11 ,  G03F7/20

CPC分类号： G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

公开(公告)号：US09046787B2

公开(公告)日：2015-06-02

申请号：US13007039

申请日：2011-01-14

申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.

摘要翻译： 投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。 该装置还包括具有中间场平面和场停止的照明系统。 场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。 照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。

公开(公告)号：US08659744B2

公开(公告)日：2014-02-25

申请号：US13440226

申请日：2012-04-05

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G03B27/70 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM， 至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少 用于校正图像缺陷的一个确定的透镜表面。

公开(公告)号：US08436985B2

公开(公告)日：2013-05-07

申请号：US13479768

申请日：2012-05-24

申请人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

发明人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

IPC分类号： G03B27/72 ,  G03B27/54 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70941 ,  G02B5/005 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025

摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.

摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

公开(公告)号：US08379188B2

公开(公告)日：2013-02-19

申请号：US12782831

申请日：2010-05-19

申请人： Ralf Mueller ,  Toralf Gruner

发明人： Ralf Mueller ,  Toralf Gruner

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G03F7/70141 ,  G03F7/70191 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70566 ,  G03F7/70966

摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.

摘要翻译： 本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。 第一个子元件具有非平面的光学有效表面。 对于通过第一子元件的光，第一子元件导致极化状态的变化。 由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。 第一子元件和第二子元件具有相互互补的相互面对的表面。 光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

公开(公告)号：US08305558B2

公开(公告)日：2012-11-06

申请号：US12390676

申请日：2009-02-23

申请人： Toralf Gruner ,  Michael Totzeck

发明人： Toralf Gruner ,  Michael Totzeck

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70566 ,  B82Y10/00 ,  G03F7/70008 ,  G21K2201/061 ,  H05G2/00

摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.

摘要翻译： 用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。 照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。 照明系统还包括照明系统的照明子单元。 照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。