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    Black iron-based composite particles, process for producing the same, paint and rubber or resin composition containing the same
    83.
    发明授权
    Black iron-based composite particles, process for producing the same, paint and rubber or resin composition containing the same 有权
    黑色铁基复合颗粒，其制造方法，涂料和橡胶或含有它们的树脂组合物

    公开(公告)号：US06420030B1

    公开(公告)日：2002-07-16

    申请号：US09521676

    申请日：2000-03-08

    申请人： Kazuyuki Hayashi ,  Yasuyuki Tanaka ,  Hiroko Morii

    发明人： Kazuyuki Hayashi ,  Yasuyuki Tanaka ,  Hiroko Morii

    IPC分类号： B32B516

    CPC分类号： B82Y30/00 ,  C01P2004/03 ,  C01P2004/04 ,  C01P2004/10 ,  C01P2004/20 ,  C01P2004/30 ,  C01P2004/32 ,  C01P2004/41 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2004/80 ,  C01P2004/82 ,  C01P2004/86 ,  C01P2006/12 ,  C01P2006/60 ,  C01P2006/62 ,  C01P2006/80 ,  C08K3/22 ,  C08K9/06 ,  C08K9/08 ,  C09C1/0081 ,  C09C1/24 ,  C09C3/12 ,  C09D7/62 ,  C09D7/67 ,  C09D7/68 ,  Y10T428/2998

    摘要： Black iron-based composite particles of the present invention comprise: as a core particle black iron oxide particle or black iron oxide hydroxide particle having an average particle size of 0.08 to 1.0 &mgr;m; a coating layer formed on the surface of the black iron oxide particle or black iron oxide hydroxide particle, comprising at least one organosilicon compound selected from the group consisting of: (1) organosilane compounds obtained from alkoxysilane compounds, (2) polysiloxanes, or modified polysiloxanes and (3) fluoroalkyl organosilane compounds obtained from fluoroalkylsilane compounds; and carbon black coat formed on said coating comprising said organosilicon compound, in an amount of 1 to 30 parts by weight based on 100 parts by weight of said black iron oxide particles or black iron oxide hydroxide particles. Such black iron-based composite particles have an excellent dispersibility in a vehicle, or a rubber or resin composition on the basis of a small amount of the carbon black which are desorbed from the surface of the black iron-based composite particles, and a high blackness substantially identical to a blackness of carbon black fine particles used solely, even when carbon black is contained therein only in a small amount.

    摘要翻译： 本发明的黑色铁系复合粒子包含平均粒径为0.08〜1.0μm的芯粒黑色氧化铁粒子或黑色铁氧化物氢氧化物粒子，形成在黑色氧化铁粒子的表面上的被覆层 或黑铁氧化物氢氧化物颗粒，其包含至少一种选自以下的有机硅化合物：（1）由烷氧基硅烷化合物获得的有机硅烷化合物，（2）聚硅氧烷或改性聚硅氧烷，和（3）由氟烷基硅烷化合物得到的氟代烷基有机硅烷化合物; 并且在所述包含所述有机硅化合物的涂层上形成的炭黑涂层，其量为基于100重量份的所述黑色氧化铁颗粒或黑色铁氧化物氢氧化物颗粒为1至30重量份。 这种黑色铁基复合颗粒在车辆中具有优异的分散性，或者基于从黑色铁基复合颗粒的表面解吸的少量炭黑，橡胶或树脂组合物，以及高 黑色度与单独使用的炭黑细颗粒的黑度基本相同，即使仅含有少量的炭黑也是如此。

    Rubber or resin composition
    86.
    发明授权
    Rubber or resin composition 失效
    橡胶或树脂组合物

    公开(公告)号：US5693690A

    公开(公告)日：1997-12-02

    申请号：US628018

    申请日：1996-04-04

    申请人： Kazuyuki Hayashi ,  Minoru Ohsugi ,  Hiroko Morii ,  Koso Aoki

    发明人： Kazuyuki Hayashi ,  Minoru Ohsugi ,  Hiroko Morii ,  Koso Aoki

    IPC分类号： C08K3/08 ,  B32B15/02 ,  C08K3/00 ,  C08K3/18 ,  C08K3/22 ,  C08K9/02 ,  C08L21/00 ,  C09C1/22 ,  C09C1/24 ,  C09C1/34 ,  C08K9/06 ,  C08K3/36 ,  C08K9/10

    CPC分类号： C08K3/22 ,  C08K9/02 ,  C09C1/24 ,  C01P2004/03 ,  C01P2004/04 ,  C01P2004/32 ,  C01P2004/38 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/19 ,  C01P2006/60 ,  C01P2006/80 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： A rubber or resin composition comprises: 0.1 to 10.0 parts by weight of iron oxide particles composed of iron oxide core which contains 0.21 to 2.14 wt % of silicon, calculated as SiO.sub.2, and 0.01 to 10.0 wt %, calculated as SiO.sub.2, of a precipitate composed of silicon, which adheres to the surfaces of said iron oxide core, a sphere ratio, maximum diameter/minimum diameter, of said iron oxide particles being of 0.7 to 1.0, an average particle diameter of said iron oxide particles being 0.05 to 1.0 .mu.m, a geometric standard deviation .sigma.g of said iron oxide particles which shows the particle size distribution being not more than 1.40, a bulk density of said iron oxide particles being 0.80 to 1.5 g/cm.sup.3, and a surface activity of said iron oxide particles which is indicated by the number of cyclohexanone molecules adsorbed to the surfaces of the iron oxide particles, number of molecules/nm.sup.2, being not more than 1.70; and 90 to 99.9 parts by weight of rubber or thermoplastic resin.

    摘要翻译： 橡胶或树脂组合物包含：0.1至10.0重量份由氧化铁芯组成的氧化铁颗粒，其含有0.21至2.14重量％的硅，以SiO 2计，和0.01至10.0重量％，以SiO 2计，沉淀物 由氧化铁芯的表面附着的硅构成，所述氧化铁粒子的球体比，最大直径/最小直径为0.7〜1.0，所述氧化铁粒子的平均粒径为0.05〜1.0μm m，所述氧化铁颗粒的几何标准偏差σg，其显示出不大于1.40的粒度分布，所述氧化铁颗粒的堆积密度为0.80至1.5g / cm 3，所述氧化铁颗粒的表面活性 其由吸附在氧化铁颗粒表面上的环己酮分子的数目表示，分子数/ nm 2不大于1.70; 和90〜99.9重量份的橡胶或热塑性树脂。

    METHOD FOR PRODUCING AN L-AMINO ACID
    88.
    发明申请
    METHOD FOR PRODUCING AN L-AMINO ACID 审中-公开
    生产L-氨基酸的方法

    公开(公告)号：US20120040415A1

    公开(公告)日：2012-02-16

    申请号：US13170661

    申请日：2011-06-28

    申请人： Yuichi Nakahara ,  Yusuke Hagiwara ,  Yuri Nagai ,  Takuji Ueda ,  Kazuyuki Hayashi ,  Yuki Yano

    发明人： Yuichi Nakahara ,  Yusuke Hagiwara ,  Yuri Nagai ,  Takuji Ueda ,  Kazuyuki Hayashi ,  Yuki Yano

    IPC分类号： C12P13/08 ,  C12P13/04

    CPC分类号： C12P13/08 ,  C12P13/04

    摘要： A method is provided for producing an L-amino acid which includes the steps of culturing a bacterium, which belongs to the family Enterobacteriaceae and is able to produce an L-amino acid, in a medium containing glycerol as a carbon source to produce and accumulate an L-amino acid in the medium, and collecting the L-amino acid from the culture. The culture is performed as a fed-batch culture or a continuous culture, and a feed medium containing glycerol is added to the fermentation medium so that the glycerol concentration in the fermentation medium is 5 g/L or higher.

    摘要翻译： 提供了一种生产L-氨基酸的方法，其包括在含有甘油作为碳源的培养基中培养属于肠杆菌科并能够产生L-氨基酸的细菌以产生和积累的步骤 培养基中的L-氨基酸，并从培养物中收集L-氨基酸。 作为补料分批培养或连续培养进行培养，向发酵培养基中添加含有甘油的饲料培养基，发酵培养基中的甘油浓度为5g / L以上。

    Reflective mask blank for EUV lithography
    89.
    发明授权
    Reflective mask blank for EUV lithography 有权
    EUV光刻用反光罩

    公开(公告)号：US08029950B2

    公开(公告)日：2011-10-04

    申请号：US12855053

    申请日：2010-08-12

    申请人： Kazuyuki Hayashi ,  Toshiyuki Uno ,  Ken Ebihara

    发明人： Kazuyuki Hayashi ,  Toshiyuki Uno ,  Ken Ebihara

    IPC分类号： G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00

    摘要： A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled.A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at %, and the content of H is from 0.1 to 50 at %.

    摘要翻译： 提供了用于EUV光刻的反射掩模板，其具有可以容易地控制应力和晶体结构的吸收层。 一种用于EUV光刻的反射掩模板，其包括衬底，以及用于反射EUV光的至少反射层和用于吸收在衬底上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），氮 （N）和氢（H）; 在吸收层中，Ta和N的总含量为50〜99.9原子％，H的含量为0.1〜50原子％。

    REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    90.
    发明申请
    REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
    反射掩蔽空白用于EUV LITHOGRAPHY

    公开(公告)号：US20100304283A1

    公开(公告)日：2010-12-02

    申请号：US12855053

    申请日：2010-08-12

    申请人： Kazuyuki Hayashi ,  Toshiyuki Uno ,  Ken Ebihara

    发明人： Kazuyuki Hayashi ,  Toshiyuki Uno ,  Ken Ebihara

    IPC分类号： G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00

    摘要： A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled.A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at %, and the content of H is from 0.1 to 50 at %.

    摘要翻译： 提供了用于EUV光刻的反射掩模板，其具有可以容易地控制应力和晶体结构的吸收层。 一种用于EUV光刻的反射掩模板，其包括衬底，以及用于反射EUV光的至少反射层和用于吸收在衬底上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），氮 （N）和氢（H）; 在吸收层中，Ta和N的总含量为50〜99.9原子％，H的含量为0.1〜50原子％。