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81.发明授权Large field of view protection optical system with aberration correctability for flat panel displays 有权用于平板显示器的大视场保护光学系统具有像差校正能力公开(公告)号：US07158215B2
公开(公告)日：2007-01-02
申请号：US10831210
申请日：2004-04-26
CPC分类号： G03B27/52 , G02B17/061 , G03F7/70233 , G03F7/70308 , G03F7/706 , G03F7/70791
摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括适于支撑掩模版的掩模版台。 衬底台适于支撑衬底。 反射光学系统适于将掩模版成像到基底上。 反射光学系统包括主镜，包括第一镜和第二镜以及次镜。 当通过第一反射镜，次反射镜和第二反射镜的反射将掩模版的图像投影到基板上时，反射光学系统具有足够的自由度用于三阶像差的对准和校正。
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公开(公告)号：US07158208B2
公开(公告)日：2007-01-02
申请号：US10880435
申请日：2004-06-30
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
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公开(公告)号：US07133118B2
公开(公告)日：2006-11-07
申请号：US10779811
申请日：2004-02-18
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
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84.发明申请Lithographic apparatus having an adjustable projection system and device manufacturing method 有权具有可调投影系统和装置制造方法的平版印刷装置公开(公告)号：US20060092393A1
公开(公告)日：2006-05-04
申请号：US10975086
申请日：2004-10-28
申请人： Robert Harmed , Cheng-Qun Gui , Nora-Jean Harned
发明人： Robert Harmed , Cheng-Qun Gui , Nora-Jean Harned
IPC分类号： G03B27/42
CPC分类号： G03F7/70233 , G03F7/70266 , G03F7/70591
摘要： A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of the pattern generator, the substrate, and or an optical element in the lithography system. In one example, the adjustable projection system includes two concave and one convex mirrors, while in another system the adjustable projection system also includes one or two fold mirrors. At least one of the mirrors in these two examples is an active mirror, which is used for the compensating. In this arrangement, local focus and/or magnification errors can be substantially reduced or eliminated.
摘要翻译： 一种系统和方法使用图案发生器来对使用可调投影系统投影的照明进行图案化以在基板上形成一个或多个装置。 可调节投影系统包括至少一个有源反射镜，其被调节以补偿在图案发生器，基板和光刻系统中的光学元件的表面上发现的错误。 在一个示例中，可调节投影系统包括两个凹面和一个凸面镜，而在另一个系统中，可调投影系统还包括一个或两个折叠镜。 这两个示例中的至少一个反射镜是用于补偿的主动镜。 在这种布置中，可以显着地减少或消除局部焦点和/或放大误差。
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公开(公告)号：US20060001847A1
公开(公告)日：2006-01-05
申请号：US10880435
申请日：2004-06-30
申请人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam of radiation, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate supported on a substrate table. The projection system comprises an array of lenses located at a spacing from the substrate such that each lens in the array focuses a respective part of the patterned beam onto the substrate. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus damage to the lens array as a result of for example scratching by particles carried on the substrate surface can be avoided.
摘要翻译： 一种光刻设备和方法，其中照明系统提供投影辐射束，图案化系统将光束赋予其横截面中的图案，并且投影系统将图案化的光束投影到支撑在衬底上的衬底的目标部分上 表。 投影系统包括位于与衬底间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底上。 位移系统导致透镜阵列和基底之间的相对位移。 定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。 布置一个自由的工作距离控制系统以响应于检测器检测到的颗粒而增加透镜阵列和基板之间的间距，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过 镜头阵列 因此，可以避免由于例如由承载在基板表面上的颗粒划伤而导致的透镜阵列的损坏。
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公开(公告)号：US20050243298A1
公开(公告)日：2005-11-03
申请号：US10985030
申请日：2004-11-10
申请人： Pieter de Jager , Cheng-Qun Gui
发明人： Pieter de Jager , Cheng-Qun Gui
CPC分类号： G03F7/70258 , G03F7/70275
摘要： A lithographic apparatus and method for projecting a patterned beam onto a substrate. An illumination system supplies a projection beam of radiation. A pattern is imparted to the projection beam, for example by an array of individually controllable elements. The substrate is supported on a substrate table and the patterned beam is projected onto a target portion of the substrate by a projection system. The projection system defines a pupil between the patterning system and the substrate table and a series of lens components are located between the pupil and the substrate table. The lens components comprise a beam expander, for expanding the beam from the pupil, and an array of lenses extending transversely relative to the beam such that each lens of the array focuses a respective portion of the projection beam onto a respective part of the target portion of the substrate. The position of at least one of the lens components, for example a field lens of the beam expander or the lens array, is adjusted to adjust the magnification of the projection system.
摘要翻译： 一种用于将图案化的光束投影到基底上的光刻设备和方法。 照明系统提供投影射束。 例如通过独立可控元件的阵列将投影光束赋予图案。 衬底被支撑在衬底台上，并且图案化的光束通过投影系统投射到衬底的目标部分上。 投影系统在图案化系统和衬底台之间限定瞳孔，并且一系列透镜组件位于瞳孔和衬底台之间。 透镜部件包括用于从瞳孔扩展光束的光束扩展器和相对于光束横向延伸的透镜阵列，使得阵列的每个透镜将投影光束的相应部分聚焦到目标部分的相应部分上 的基底。 调整至少一个透镜部件的位置，例如光束扩展器或透镜阵列的场透镜，以调整投影系统的放大倍率。
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公开(公告)号：US20050190353A1
公开(公告)日：2005-09-01
申请号：US10788024
申请日：2004-02-27
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/70291 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/7085
摘要： An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
摘要翻译： 一种用于调整由光引擎相对于衬底产生的图案化光束的衬底上的位置的装置。 该排列移动一组聚焦元件，每个聚焦元件相对于独立可控元件的阵列将图案化束的一部分聚焦到衬底上的一个点上，以将图案赋予图案化的束。
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公开(公告)号：US20050012916A1
公开(公告)日：2005-01-20
申请号：US10850567
申请日：2004-05-21
IPC分类号： G02B3/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70275 , G03F7/70291
摘要： A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate. A greater working distance can thereby be obtained
摘要翻译： 光刻投影装置包括用于以二维阵列产生多个源图像的微透镜阵列，具有用作源图像的快门的多个可寻址元件的可编程图案形成装置和用于投影阵列的图像的投影子系统 的源图像到基板上。 从而可以获得更大的工作距离
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