公开(公告)号：US10473599B2

公开(公告)日：2019-11-12

申请号：US15829068

申请日：2017-12-01

Applicant: Bruker AXS GmbH

Inventor： Roger D. Durst ,  Christoph Ollinger

IPC: H01J35/00 ,  G01N23/223 ,  H01J35/06 ,  H01J35/22 ,  H05G1/04 ,  H05G1/30 ,  G21K1/06 ,  H05G2/00

Abstract: An X-ray source uses excitation of a liquid metal beam of ions or ionized droplets to produce an X-ray output with higher brightness than conventional sources. The beam may be accelerated from a liquid metal source using an extraction electrode. The source may have an emitter tip, and the acceleration of the liquid metal may include field emission from a Taylor cone. An electrostatic or electromagnetic focusing electrode may be used to reduce a cross-sectional diameter of the beam. The liquid metal beam has a relatively high velocity as it does not suffer from flow turbulence, thus allowing for a more energetic excitation and a correspondingly higher brightness. A beam dump may also be used to collect the liquid metal beam after excitation, and may be concave with no direct sight lines to either an electron beam cathode or to X-ray windows of an enclosure for the source.

公开(公告)号：US10436722B2

公开(公告)日：2019-10-08

申请号：US15311879

申请日：2014-05-22

Applicant: University Of Science And Technology Of China

Inventor： Kun Gao ,  Jian Chen ,  Renfang Hu ,  Zhili Wang ,  Dajiang Wang ,  Zhiyun Pan ,  Wangsheng Chu ,  Shiqiang Wei

IPC: G02B27/00 ,  G01N23/083 ,  G02B5/18 ,  B05D1/00 ,  C23F1/00 ,  G21K1/06 ,  G02B27/44 ,  G21K7/00

Abstract: The invention provides a positive/negative phase shift bimetallic zone plate and production method thereof, wherein the positive/negative phase shift bimetallic zone plate comprises: a first metallic material having a positive phase shift; a second metallic material having a negative phase shift at a working energy point; wherein the first metallic material and the second metallic material are alternately arranged, so that the second metallic material replaces the blank portion in a cycle of a traditional zone plate.

公开(公告)号：US20190287692A1

公开(公告)日：2019-09-19

申请号：US16461360

申请日：2017-11-27

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

Inventor： Franck DELMOTTE ,  Maël DEHLINGER

IPC: G21K1/06

Abstract: A spectral selection component for XUV radiation, includes a first multilayer mirror for receiving an XUV radiation beam along an input axis located in a first plane of incidence and a second multilayer mirror for receiving, in a second plane of incidence, an XUV radiation beam reflected by the first mirror in order to transmit the radiation to an output axis of the spectral selection component. One of the first and second mirrors has a first, high-pass energy spectral response, with a flank on the low-energy side with a steepness that is greater than 0.1 eV−1 and a rejection of low energies that is greater than 20, whereas the other mirror has a second, low-pass energy spectral response, with a flank on the high-energy side with a steepness that is greater than 0.1 eV−1 and a rejection of high energies that is greater than 20. Furthermore, the first and second mirrors have an only partial overlap in their spectral energy responses.

公开(公告)号：US20190285989A1

公开(公告)日：2019-09-19

申请号：US16432303

申请日：2019-06-05

Applicant: Carl Zeiss SMT GmbH

Inventor： Hartmut ENKISCH ,  Ulrich MUELLER

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

Abstract: An optical element for an optical system that operates with working light in the wavelength spectrum of extreme ultraviolet light or soft X-ray radiation, in particular an optical system for EUV microlithography, that includes an absorber layer (12) for EUV or soft X-ray radiation. The absorber layer extends along an optically effective surface and has a thickness that is defined transversely with respect to the optically effective surface, wherein the thickness of the absorber layer varies over the optically effective surface. Also disclosed is a mirror formed by at least one roughened surface of the mirror, the roughness of which varies over the surface. In addition, an illumination system for an EUV projection exposure apparatus, and a method for producing a corresponding intensity adaptation filter are disclosed.

公开(公告)号：US10401540B2

公开(公告)日：2019-09-03

申请号：US15405012

申请日：2017-01-12

Applicant: Carl Zeiss SMT GmbH

Inventor： Boris Bittner ,  Norbert Wabra ,  Holger Schmidt ,  Ricarda Schoemer ,  Sonja Schneider

IPC: G02B5/08 ,  G02B27/00 ,  G02B7/18 ,  G03F7/20 ,  G02B5/30 ,  G21K1/06

Abstract: The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λEUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.

公开(公告)号：US20190267149A1

公开(公告)日：2019-08-29

申请号：US16281299

申请日：2019-02-21

Applicant: Siemens Healthcare GmbH

Inventor： Andrea DEUTINGER ,  Joerg ZAPF

IPC: G21K1/06 ,  B81C1/00

Abstract: A method for producing a microstructure component, a microstructure component and an x-ray device are disclosed. In the method, a plurality of punctiform injection structures are inserted in a grid in a first substrate direction and a second substrate direction, standing at right angles thereto, into a first surface of a wafer-like silicon substrate. The injection structures are lengthened into drilled holes in the depth direction of the silicon substrate in a first etching step. A second surface of the silicon substrate is then at least partly removed for rear-side opening of the drilled holes in a second etching step and in a third etching step, an etching medium acting anisotropically is poured alternately through the drilled holes from both surfaces of the silicon substrate, so that drilled holes arranged next to one another in the first substrate direction connect to form a column running in the first substrate direction.

公开(公告)号：US10394141B2

公开(公告)日：2019-08-27

申请号：US15661888

申请日：2017-07-27

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: H05G2/00 ,  G03F7/20 ,  G21K5/08 ,  G21K1/06 ,  F15D1/00

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US10371649B2

公开(公告)日：2019-08-06

申请号：US15491161

申请日：2017-04-19

Applicant: CANON KABUSHIKI KAISHA

Inventor： Nobuhiro Yasui ,  Yoshihiro Ohashi ,  Toru Den

IPC: G01N23/04 ,  G01N23/20 ,  G21K1/06

Abstract: A radiation phase change detection method includes: arranging a two-dimensional optical image pickup element, which includes a scintillator, so that, when a period of a self-image generated through a phase grating is defined as D1, and a pixel pitch of the two-dimensional optical image pickup element is defined as D2=kD1, k falls in a range of ½

公开(公告)号：US10371469B2

公开(公告)日：2019-08-06

申请号：US15857055

申请日：2017-12-28

Applicant: Gigaphoton Inc.

Inventor： Yasufumi Kawasuji ,  Masazumi Komori ,  Osamu Wakabayashi

IPC: F28F27/00 ,  F28F27/02 ,  G05D23/19 ,  H05G2/00 ,  G21K1/06

Abstract: A device for controlling the temperature of cooling water includes a three-way valve having a first inlet, a second inlet, and an outlet; a first feed pipe; a second feed pipe; and a return pipe for connecting between an outlet of the temperature-control target and an inlet of the cooling water supply unit. The device also includes a return-side bypass pipe for connecting between the return pipe and the second inlet of the three-way valve; a pump provided on the second feed pipe for circulating the cooling water between the three-way valve and the temperature-control target; and a temperature measuring unit for measuring a temperature of the cooling water flowing in the second feed pipe. In addition, the device includes a controller for controlling the three-way valve and the pump in accordance with a detection result of the temperature measuring unit.

公开(公告)号：US20190227005A1

公开(公告)日：2019-07-25

申请号：US16205801

申请日：2017-07-12

Applicant: Rigaku Corporation

Inventor： Kiyoshi Ogata ,  Kazuhiko Omote ,  Sei Yoshihara ,  Yoshiyasu Ito ,  Hiroshi Motono ,  Hideaki Takahashi ,  Takao Kinefuchi ,  Akifusa Higuchi ,  Shiro Umegaki ,  Shigematsu Asano ,  Ryotaro Yamaguchi ,  Katsutaka Horada ,  Makoto Kambe ,  Licai Jiang ,  Boris Verman

IPC: G01N23/20016 ,  G01B15/02 ,  G21K1/06 ,  G01N23/207 ,  G01N23/20025

Abstract: In an X-ray inspection device according to the present invention, an X-ray irradiation unit 40 includes a first X-ray optical element 42 for focusing characteristic X-rays in a vertical direction, and a second X-ray optical element 43 for focusing the characteristic X-rays in a horizontal direction. The first X-ray optical element 42 is constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.