公开(公告)号：US08282272B2

公开(公告)日：2012-10-09

申请号：US12204959

申请日：2008-09-05

申请人： Roland Schanz ,  Christoph Merkl ,  Steffen Müller

发明人： Roland Schanz ,  Christoph Merkl ,  Steffen Müller

IPC分类号： G01K11/18 ,  G01K15/00 ,  F27D21/00

CPC分类号： G01K11/125 ,  G01J5/0003 ,  G01J5/0007 ,  G01J5/522 ,  G01K15/00 ,  H01L21/67248

摘要： A system and method is disclosed that reliably determines the transmissivity of a substrate. By determining the transmissivity of a calibration substrate, for instance, a temperature measuring device can be calibrated. The method and system are particularly well suited for use in thermal processing chambers that process semiconductor wafers used for forming integrated circuit chips.

摘要翻译： 公开了可靠地确定基板的透射率的系统和方法。 通过确定校准基板的透射率，例如，可以校准温度测量装置。 该方法和系统特别适用于处理用于形成集成电路芯片的半导体晶片的热处理室。

公开(公告)号：US20120031237A1

公开(公告)日：2012-02-09

申请号：US12851114

申请日：2010-08-05

申请人： Erik D. Grimm

发明人： Erik D. Grimm

IPC分类号： C22B21/02 ,  C22B1/00 ,  F27D21/00

CPC分类号： F27B14/14 ,  C22B9/006 ,  C22B21/0069 ,  C22B21/0092 ,  F27B7/12 ,  F27B7/2083 ,  F27B7/24 ,  F27B7/3205 ,  F27D1/18 ,  Y02P10/218

摘要： A tilting rotary furnace with a door assembly that seals against a furnace vessel. The seal between the door and the furnace vessel allows for regulation of the internal environment of the furnace and control over thermitting of the aluminum. As a result, aluminum recovery may be carried out without the use of salt. A portion of the door may rotate with the furnace vessel and a portion of the door may remain rotationally stationary with respect to the furnace vessel and the rotating portion of the door.

摘要翻译： 一种倾斜旋转炉，其具有密封炉膛的门组件。 门和炉容器之间的密封件允许调节炉的内部环境并控制铝的熔化。 结果，可以不使用盐进行铝的回收。 门的一部分可以与炉容器一起旋转，并且门的一部分可以相对于炉容器和门的旋转部分保持旋转静止。

公开(公告)号：US06940047B2

公开(公告)日：2005-09-06

申请号：US10713543

申请日：2003-11-14

申请人： Tom A. van Kesteren ,  Jan Zinger

发明人： Tom A. van Kesteren ,  Jan Zinger

IPC分类号： H01L21/324 ,  F27B5/14 ,  F27B17/00 ,  F27D5/00 ,  F27D19/00 ,  F27D21/00 ,  H01L21/00 ,  H01L21/26 ,  H01L21/677

CPC分类号： H01L21/67109 ,  F27B17/0025 ,  F27D19/00 ,  F27D21/0014 ,  G05D23/1931 ,  H01L21/67784

摘要： A floating substrate reactor allows heat treatment of a series of semiconductor substrates, one by one. The heat treatment occurs while flowing gas suspends a substrate between two heated surfaces of the reactor. The two heated surfaces each have multiple heating zones. The heating zones are heated to desired temperature(s) and a substrate is then loaded into the reactor for heat treatment. Upon loading, the relatively cold substrate absorbs heat and cools the process chamber. A heat spike, which can be varied, is applied to the heating zones to heat the reactor to the desired temperature again. The substrate, however, is unloaded from the reactor before the temperatures of the heating zones have reached the desired temperature. After the heating zones have reached the desired temperature, the next substrate in the series of substrates is loaded into the reactor for heat treatment. The heating rate of each heating zone is independently controlled by two nested control loops in a cascade temperature control configuration, permitting differences in the heating rates of the heating zone to be accounted for, thus allowing a uniform temperature or predetermined gradient to be established across all the heating zones. The intensity of the heat spike is recalculated after the introduction of each substrate, using the heating behavior of the previous heat spike as a calculation input, to more accurately heat the heating zones to the desired temperature. The variability of the heat spike intensity from substrate to substrate also allows the throughput of the heat treatment apparatus to be varied.

摘要翻译： 浮置基板反应器可以一个接一个地对一系列半导体基板进行热处理。 在流动气体将基板悬浮在反应器的两个加热表面之间时，发生热处理。 两个加热表面各自具有多个加热区。 将加热区加热至所需温度，然后将基底装入反应器进行热处理。 加载时，相对冷的基底吸收热量并冷却处理室。 将可以变化的热穗施加到加热区，以将反应器再次加热到所需温度。 然而，在加热区域的温度达到所需温度之前，将基板从反应器中卸载。 在加热区达到所需温度后，将一系列基板中的下一个基板装入反应器进行热处理。 每个加热区的加热速率由级联温度控制结构中的两个嵌套控制回路独立控制，允许考虑到加热区域的加热速率的差异，从而允许在所有加热区域中建立均匀的温度或预定的梯度 加热区。 在引入每个基板之后，使用先前的热尖峰的加热行为作为计算输入来重新计算热尖峰的强度，以将加热区域更准确地加热到期望的温度。 从衬底到衬底的热尖峰强度的变化性也允许热处理设备的生产量变化。

公开(公告)号：US20050185692A1

公开(公告)日：2005-08-25

申请号：US10510243

申请日：2003-04-16

申请人： Peter Jeney

发明人： Peter Jeney

IPC分类号： H05B6/36 ,  C22C27/02 ,  F27B7/24 ,  F27B7/28 ,  F27B7/36 ,  F27D1/00 ,  F27D7/06 ,  F27D11/06 ,  F27D21/00 ,  H05B6/02 ,  H05B6/24 ,  H05B6/22

CPC分类号： H05B6/24 ,  F27D11/06

摘要： An induction furnace wherein a susceptor made from an alloy comprising niobium, hafnium and titanium is positioned within the induction coil of the furnace. Such a susceptor can withstand prolonged use in an induction furnace, at high temperatures in the presence of oxygen.

摘要翻译： 一种感应炉，其中由包含铌，铪和钛的合金制成的基座位于炉的感应线圈内。 这样的感受器可以在氧气存在的高温下经受住感应炉的长时间使用。

公开(公告)号：US20050133491A1

公开(公告)日：2005-06-23

申请号：US10951422

申请日：2004-09-28

申请人： Jhy-Chain Lin ,  Ga-Lane Chen

发明人： Jhy-Chain Lin ,  Ga-Lane Chen

IPC分类号： F27B17/02 ,  F27D11/00 ,  F27D19/00 ,  F27D21/00 ,  G01N25/18 ,  H01L23/34

CPC分类号： F27B17/02 ,  F27D19/00 ,  F27D21/0014 ,  H01L23/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： A heat generator includes a cubic heat generating member for outputing heat flow. The heat generating member includes a heat flow output face and five heat flow insulation faces. Five thermoelectric coolers are attached on the five heat flow insulation faces respectively. A heat flow compensating circuit is electrically connected between each heat flow insulation face and a corresponding thermoelectric cooler. The circuit is capable of controlling heat generated by the thermoelectric cooler to cause the temperature of the heating face of the thermoelectric cooler to be equal to the temperature of the heat flow insulation face which results in the heat energy of the heat flow outputing from the heat flow output face of the heat generating member substantially equal to the heat energy of the heat generated by the heat generating member.

摘要翻译： 发热体包括用于输出热流的立方体发热体。 发热件包括热流输出面和五个热流绝缘面。 五个热电冷却器分别连接在五个热流绝缘面上。 热流补偿电路电连接在每个热流绝缘面和相应的热电冷却器之间。 该电路能够控制由热电冷却器产生的热量，使得热电冷却器的加热面的温度等于热流绝缘面的温度，导致从热量输出的热流的热能 发热构件的流量输出面基本上等于由发热构件产生的热量的热能。

公开(公告)号：US20050115945A1

公开(公告)日：2005-06-02

申请号：US10713543

申请日：2003-11-14

申请人： Tom Kesteren ,  Jan Zinger

发明人： Tom Kesteren ,  Jan Zinger

IPC分类号： H01L21/324 ,  F27B5/14 ,  F27B17/00 ,  F27D5/00 ,  F27D19/00 ,  F27D21/00 ,  H01L21/00 ,  H01L21/26 ,  H01L21/677

CPC分类号： H01L21/67109 ,  F27B17/0025 ,  F27D19/00 ,  F27D21/0014 ,  G05D23/1931 ,  H01L21/67784

摘要： A floating substrate reactor allows heat treatment of a series of semiconductor substrates, one by one. The heat treatment occurs while flowing gas suspends a substrate between two heated surfaces of the reactor. The two heated surfaces each have multiple heating zones. The heating zones are heated to desired temperature(s) and a substrate is then loaded into the reactor for heat treatment. Upon loading, the relatively cold substrate absorbs heat and cools the process chamber. A heat spike, which can be varied, is applied to the heating zones to heat the reactor to the desired temperature again. The substrate, however, is unloaded from the reactor before the temperatures of the heating zones have reached the desired temperature. After the heating zones have reached the desired temperature, the next substrate in the series of substrates is loaded into the reactor for heat treatment. The heating rate of each heating zone is independently controlled by two nested control loops in a cascade temperature control configuration, permitting differences in the heating rates of the heating zone to be accounted for, thus allowing a uniform temperature or predetermined gradient to be established across all the heating zones. The intensity of the heat spike is recalculated after the introduction of each substrate, using the heating behavior of the previous heat spike as a calculation input, to more accurately heat the heating zones to the desired temperature. The variability of the heat spike intensity from substrate to substrate also allows the throughput of the heat treatment apparatus to be varied.

摘要翻译： 浮置基板反应器可以一个接一个地对一系列半导体基板进行热处理。 在流动气体将基板悬浮在反应器的两个加热表面之间时，发生热处理。 两个加热表面各自具有多个加热区。 将加热区加热至所需温度，然后将基底装入反应器进行热处理。 加载时，相对冷的基底吸收热量并冷却处理室。 将可以变化的热穗施加到加热区，以将反应器再次加热到所需温度。 然而，在加热区域的温度达到所需温度之前，将基板从反应器中卸载。 在加热区达到所需温度后，将一系列基板中的下一个基板装入反应器进行热处理。 每个加热区的加热速率由级联温度控制结构中的两个嵌套控制回路独立控制，允许考虑到加热区域的加热速率的差异，从而允许在所有加热区域中建立均匀的温度或预定的梯度 加热区。 在引入每个基板之后，使用先前的热尖峰的加热行为作为计算输入来重新计算热尖峰的强度，以将加热区域更准确地加热到期望的温度。 从衬底到衬底的热尖峰强度的变化性也允许热处理设备的生产量变化。

公开(公告)号：US06895692B2

公开(公告)日：2005-05-24

申请号：US10764672

申请日：2004-01-26

申请人： Carl Kramer

发明人： Carl Kramer

IPC分类号： C21D9/56 ,  C21D9/63 ,  C21D9/66 ,  F27B9/04 ,  F27B9/10 ,  F27B9/20 ,  F27B9/24 ,  F27B9/40 ,  F27D19/00 ,  F27D21/00 ,  F26B13/00

CPC分类号： F27B9/20 ,  C21D9/561 ,  C21D9/565 ,  C21D9/63 ,  C21D9/66 ,  F27B9/045 ,  F27B9/10 ,  F27B9/2476 ,  F27B9/40 ,  F27D19/00 ,  F27D21/00 ,  F27D2019/0059

摘要： A device for heat treating metallic webs in-line, in particular for operation with a low-density protective gas, comprises stabilising nozzle systems which stabilise the course of the web and effect heat transfer, primarily by forced convection, in the heating portion and at least in the first portion of cooling. The web is guided in a non-contact process in the treatment portion localized by rollers. The course of the web exhibits a concave curvature (as viewed from above), at least in a partial area in the treatment portion. The area of said concave curvature can be in a fluid which is different from the fluid with which the web is blown in the heating portion and at least in the first portion of the cooling area.

摘要翻译： 用于热处理金属网的装置，特别是用于低密度保护气体的操作的装置包括稳定喷嘴系统，其稳定幅材的过程并且主要通过强制对流在加热部分和在加热部分 至少在冷却的第一部分。 在通过辊定位的处理部分中的非接触过程中引导幅材。 纤维网的过程至少在处理部分的局部区域中具有凹曲率（如上所述）。 所述凹曲率的区域可以是流体，其不同于在加热部分中和至少在冷却区域的第一部分中卷材的流体。

公开(公告)号：US06888713B2

公开(公告)日：2005-05-03

申请号：US09745575

申请日：2000-12-21

申请人： Douglas Wayne Stamps

发明人： Douglas Wayne Stamps

IPC分类号： F23N1/02 ,  F23N5/20 ,  F23N5/24 ,  F27B14/04 ,  F27B14/06 ,  F27D21/00 ,  F23Q3/00

CPC分类号： F23N1/02 ,  F23N5/20 ,  F23N5/24 ,  F23N2027/36 ,  F27B14/063 ,  F27B2014/045 ,  F27D2021/0071

摘要： A device to mitigate hydrogen explosions in a vacuum furnace includes at least one igniter, an ignition transformer, and an electrical switch. The at least one igniter includes a set of high-voltage electrodes and is connected to the ignition transformer by high-voltage wires. The electrical switch activates the ignition transformer to provide power to the at least one igniter forming a continuous electrical arc between the electrodes. The at least one igniter is located inside the vacuum furnace at an opening where air may enter the vacuum furnace, which may contain a hydrogen and steam gas mixture under accident conditions. The device consumes hydrogen by controlled combustion as flammable mixtures are formed.

摘要翻译： 减轻真空炉中氢气爆炸的装置包括至少一个点火器，点火变压器和电气开关。 至少一个点火器包括一组高压电极，并通过高压线与点火变压器连接。 电开关激活点火变压器以向至少一个点火器供电，在电极之间形成连续的电弧。 至少一个点火器位于真空炉内的空气进入真空炉的开口处，真空炉在事故条件下可能含有氢气和蒸气混合物。 当形成易燃混合物时，该装置通过受控燃烧消耗氢气。

公开(公告)号：US20050069015A1

公开(公告)日：2005-03-31

申请号：US10502485

申请日：2002-01-24

申请人： Thomas Bogdahn ,  Oliver Ganz

发明人： Thomas Bogdahn ,  Oliver Ganz

IPC分类号： H05B3/02 ,  F27B9/28 ,  F27B17/00 ,  F27D7/02 ,  F27D7/06 ,  F27D9/00 ,  F27D11/02 ,  F27D19/00 ,  F27D21/00 ,  F27D99/00 ,  H01L21/00 ,  H05B3/62

CPC分类号： H01L21/67109 ,  C03B23/043 ,  C03B37/01257 ,  F27B9/28 ,  F27B17/00 ,  F27D7/02 ,  F27D7/06 ,  F27D11/02 ,  F27D21/0014 ,  F27D99/0073 ,  F27D2009/0045 ,  F27D2019/0025 ,  F27D2099/001 ,  H05B3/62

摘要： A known resistance furnace comprises a tubular heating element having a vertically oriented longitudinal axis, which comprises a shell surface defined by an upper side and a lower side and surrounding a furnace chamber, and which is connected to at least two supply terminals by means of which heating current is introduced at power supply points into the heating element. Starting from the above, in order to provide an electric resistance furnace, in particular a high-performance resistance furnace which is characterized by small manufacturing and maintenance efforts and by a high operational reliability, and which permits the reproducible adjustment of an axially and radially homogeneous temperature profile within the furnace, it is suggested according to the invention that the supply terminals should comprise a surrounding upper annular collar (7) in the region of the upper side (11) and a surrounding lower annular collar (8) in the region of the lower side (12).

摘要翻译： 已知的电阻炉包括具有垂直取向的纵向轴线的管状加热元件，该管状加热元件包括由上侧和下侧限定的围绕炉室的壳表面，并且连接到至少两个供电端子，借助于此， 在供电点将加热电流引入加热元件。 从上述开始，为了提供一种电阻炉，特别是特征在于小型制造和维护工作以及高操作可靠性的高性能电阻炉，并且允许可重复地调节轴向和径向均匀的 炉内的温度分布，根据本发明建议，供应端子应包括在上侧（11）的区域中的周围的上环形套环（7）和围绕下侧环形套环（8）的区域 下侧（12）。

公开(公告)号：US06859766B2

公开(公告)日：2005-02-22

申请号：US10364675

申请日：2003-02-11

申请人： William A. Von Drasek ,  Victor M. Saucedo

发明人： William A. Von Drasek ,  Victor M. Saucedo

IPC分类号： C21C5/40 ,  C21C5/46 ,  F27B3/28 ,  F27D19/00 ,  F27D21/00 ,  G01N1/22 ,  G01N21/35 ,  G01N21/39 ,  F23N5/08

CPC分类号： G01N21/39 ,  C21C5/40 ,  C21C5/4673 ,  F27B3/28 ,  F27D19/00 ,  F27D21/00 ,  F27D2019/0015 ,  G01N1/2258 ,  G01N21/3504 ,  G01N2021/399 ,  Y02P10/283

摘要： A method for indirect gas species monitoring based on measurements of selected gas species is disclosed. In situ absorption measurements of combustion species are used for process control and optimization. The gas species accessible by near or mid-IR techniques are limited to species that absorb in this spectral region. The absorption strength is selected to be strong enough for the required sensitivity and is selected to be isolated from neighboring absorption transitions. By coupling the gas measurement with a software sensor gas, species not accessible from the near or mid-IR absorption measurement can be predicted.

摘要翻译： 公开了一种基于所选气体种类测量的间接气体种类监测方法。 燃烧物质的原位吸收测量用于过程控制和优化。 通过近红外或中红外技术可以获得的气体种类限于在该光谱区域吸收的物质。 吸收强度被选择为足够强以达到所需的灵敏度，并且被选择为与相邻吸收转变隔离。 通过将气体测量与软件传感器气体耦合，可以预测从近红外或中红外吸收测量不可接近的物种。