FIBER OPTIC SENSOR EGRESS/INGRESS RUGGEDIZATION FOR FLEXIBLE WOVEN STRUCTURES

    公开(公告)号:US20240328877A1

    公开(公告)日:2024-10-03

    申请号:US18128365

    申请日:2023-03-30

    摘要: An apparatus comprises a flexible woven structure including an egress and/or ingress location at an external surface of the flexible woven structure. A fiber optic sensor is embedded in the flexible woven structure to allow the fiber optic sensor to detect one or more of strain, temperature, vibration, acoustics, 3-dimensional shape and/or pressure on the flexible woven structure. The fiber optic sensor extends out of the flexible woven structure at the egress and/or ingress location for connection to a connector or a termination. First thread stitches fasten the fiber optic sensor and any protective coatings, tubing, or conduit to the external surface of the flexible woven structure near the egress and/or ingress location. An optional reinforcement patch may cover the egress and/or ingress location and a portion of fiber optic sensor that extends out of the flexible woven structure at the egress and/or ingress location. Second thread stitches fasten the reinforcement patch to the external surface of the flexible woven structure to protect the fiber optic sensor and reduce bending and stress at the egress/ingress location.

    Distributed measurement of minimum and maximum in-situ stress in substrates

    公开(公告)号:US11022717B2

    公开(公告)日:2021-06-01

    申请号:US16114376

    申请日:2018-08-28

    摘要: A system for performing distributed measurements of in-situ stress includes an expandable element with at least one fiber optic sensor. The expandable element can be positioned at various depths in a hole in a substrate. A pressurizing device expands (and contracts) the expandable element when the expandable element is inserted in the hole in the substrate to exert pressure on the hole wall. A pressure sensor provides a sensor output indicative of a pressure applied to the hole wall by the expandable element. The fiber optic sensor and an optical interrogator measure strain along a length of the sensor in a continuous, high spatial resolution manner Based on the measured strain and pressure sensor output, the system determines various properties of the substrate such as, minimum principal stress, maximum principal stress, and/or principal stress direction associated with one or more fractures in the substrate, as well as substrate modulus.

    Method and apparatus for OFDR-based electrophoresis
    5.
    发明授权
    Method and apparatus for OFDR-based electrophoresis 有权
    用于OFDR电泳的方法和装置

    公开(公告)号:US09244011B2

    公开(公告)日:2016-01-26

    申请号:US14358951

    申请日:2012-11-05

    发明人: Mark E. Froggatt

    摘要: An optical interrogation system, e.g., an OFDR-based system, measures local changes of index of refraction of a medium contained within a light guiding tube and includes an optical interferometric interrogator, optical detection circuitry, and a data processor. The data processor initiates a sweep of the light source and guide light from an interrogating light source into a medium contained by a tube which restricts movement of particles provided into the tube, where the medium is subjected to a driving force that overcomes resistance to movement of particles through the medium in the tube. The optical interferometric interrogator provides an optical interference pattern associated with a group of particles having moved in the tube as a result of the driving force. Based on the optical interference pattern, the data processor identifies a current location of the group of particles in the tube.

    摘要翻译: 光学询问系统,例如基于OFDR的系统,测量包含在导光管内的介质的折射率的局部变化,并且包括光学干涉询问器,光学检测电路和数据处理器。 数据处理器启动光源的扫描并将光从询问光源引导到由管包含的介质中,该介质限制了设置在管中的颗粒的移动,其中介质受到驱动力,该驱动力克服 颗粒通过管中的介质。 光学干涉询问器提供与由于驱动力而在管中移动的一组颗粒相关联的光学干涉图案。 基于光学干涉图案,数据处理器识别管中的一组颗粒的当前位置。

    Compensating for time varying phase changes in interferometric measurements

    公开(公告)号:US08004686B2

    公开(公告)日:2011-08-23

    申请号:US11792082

    申请日:2005-12-13

    IPC分类号: G01B9/02

    CPC分类号: G01M11/3172 G01M11/083

    摘要: An optical device under test (DUT) is interferometrically measured. The DUT can include one or more of an optical fiber, an optical component, or an optical system. First interference pattern data for the DUT is obtained for a first path to the DUT, and second interference pattern data for the DUT is obtained for a second somewhat longer path to the DUT. Because of that longer length, the second interference pattern data is delayed in time from the first interference pattern data. A time varying component of the DUT interference pattern data is then identified from the first and second interference pattern data. The identified time varying component is used to modify the first or the second interference pattern data to compensate for the time-varying phase caused by vibrations, etc. One or more optical characteristics of the DUT may then be determined based on the modified interference pattern data.

    Compensating for time varying phase changes in interferometric measurements
    9.
    发明授权
    Compensating for time varying phase changes in interferometric measurements 有权
    补偿干涉测量中的时变相位变化

    公开(公告)号:US07948633B2

    公开(公告)日:2011-05-24

    申请号:US12805879

    申请日:2010-08-23

    IPC分类号: G01B9/02

    CPC分类号: G01M11/3172 G01M11/083

    摘要: An optical device under test (DUT) is interferometrically measured. The DUT can include one or more of an optical fiber, an optical component, or an optical system. First interference pattern data for the DUT is obtained for a first path to the DUT, and second interference pattern data for the DUT is obtained for a second somewhat longer path to the DUT. Because of that longer length, the second interference pattern data is delayed in time from the first interference pattern data. A time varying component of the DUT interference pattern data is then identified from the first and second interference pattern data. The identified time varying component is used to modify the first or the second interference pattern data to compensate for the time-varying phase caused by vibrations, etc. One or more optical characteristics of the DUT may then be determined based on the modified interference pattern data.

    摘要翻译: 对被测光学器件(DUT)进行干涉测量。 DUT可以包括光纤,光学部件或光学系统中的一个或多个。 对于DUT的第一路径获得DUT的第一干涉图案数据,并且获得用于DUT的第二干涉图案数据用于到DUT的第二更长的路径。 由于该长度较长,所以第二干涉图案数据在时间上与第一干涉图案数据相比延迟。 然后从第一和第二干涉图案数据识别DUT干涉图案数据的时变分量。 所识别的时变分量用于修改第一或第二干涉图案数据以补偿由振动等引起的时变相位。然后可以基于经修改的干涉图案数据来确定DUT的一个或多个光学特性 。