Method for producing indium oxide-containing layers
    2.
    发明授权
    Method for producing indium oxide-containing layers 有权
    含有氧化铟的层的制造方法

    公开(公告)号:US09293326B2

    公开(公告)日:2016-03-22

    申请号:US14407681

    申请日:2013-06-04

    Abstract: The present invention relates to a fluid phase method for producing indium oxide-containing layers, in which a composition comprising at least one indium oxo-alkoxide of the generic formula MxOy(OR)z[O(R′O)eH]aXbYc[R″OH]d with x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=1-20, d=0-25, e=0, 1, M=In, R, R′, R″=organic remainder, X═F, Cl, Br, I, and Y═—NO3, —NO2, where b+c is =1-20 and at least one solvent is applied to a substrate, optionally dried, and converted into an indium oxide-containing layer, to the indium oxo-alkoxides of the indicated generic formula, to coating compositions comprising said indium oxo-alkoxides, to layers that can be produced by means of the method according to the invention, and to the use of said layers.

    Abstract translation: 本发明涉及一种用于生产含氧化铟的层的流相方法,其中包含至少一种通式MxOy(OR)z [O(R'O)eH] aXbYc [R “OH”d,其中x = 3-25,y = 1-10,z = 3-50,a = 0-25,b = 0-20,c = 1-20,d = 0-25,e = 0 ,1,M = In,R,R',R“=有机残基,X = F,Cl,Br,I和Y = -NO 3,-NO 2,其中b + c为1-20, 将溶剂施加到基材上,任选地干燥并转化成含氧化铟的层,转化为指示的通式的氧代 - 烷氧基化物,将包含所述含氧化合物的烷氧基化物的组合物涂覆到可以通过手段产生的层 根据本发明的方法和所述层的使用。

    Process for the preparation of indium chlordialkoxides
    5.
    发明授权
    Process for the preparation of indium chlordialkoxides 有权
    铟氯代氧化物的制备方法

    公开(公告)号:US08580989B2

    公开(公告)日:2013-11-12

    申请号:US13515007

    申请日:2010-07-01

    CPC classification number: C07F5/003

    Abstract: The present invention relates to a process for the preparation of indium(III) halodialkoxides of the generic formula InX(OR)2 where X=F, Cl, Br, I and R=alkyl radical, alkoxyalkyl radical, in which a composition (A) comprising an indium trihalide InX3, where X=F, Cl, Br and/or I, and at least one alcohol of the generic formula ROH, where R=alkyl radical, alkyloxyalkyl radical, is reacted with a composition (B) comprising at least one secondary amine of the generic formula R′2NH, where R′=alkyl radical, to the indium(III) halodialkoxides which can be prepared by the process and to their use.

    Abstract translation: 本发明涉及制备通式为InX(OR)2的铟(III)卤代烷氧化物的方法,其中X = F,Cl,Br,I和R =烷基,烷氧基烷基,其中组合物(A ),其中X = F,Cl,Br和/或I,以及至少一种通式ROH的醇,其中R =烷基,烷氧基烷基基团与组合物(B)反应,所述组合物包含 至少一种通式R'2NH的仲胺,其中R'=烷基,可以通过该方法制备的铟(III)卤代烷氧化物及其用途。

    METHOD FOR THE PRODUCTION OF METAL OXIDE-CONTAINING LAYERS
    6.
    发明申请
    METHOD FOR THE PRODUCTION OF METAL OXIDE-CONTAINING LAYERS 有权
    用于生产含金属氧化物层的方法

    公开(公告)号:US20120181488A1

    公开(公告)日:2012-07-19

    申请号:US13390840

    申请日:2010-08-13

    CPC classification number: C23C18/1216 C23C18/1258

    Abstract: The invention relates to a liquid-phase method for producing metal oxide-containing layers from nonaqueous solution. In said method, an anhydrous composition containing i) at least one metal oxo-alkoxide of generic formula MxOy(OR)z[O(R′O)cH]aXb[R″OH]d, where M=In, Ga, Sn, and/or Zn, x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=0-1, d=0-25, R, R′, R″=organic group, X═F, Cl, Br, I, and ii) at least one solvent is applied to a substrate, is optionally dried, and is converted into a metal oxide-containing layer. The invention also relates to the layers that can be produced using the method of the invention and to the use thereof.

    Abstract translation: 本发明涉及一种从非水溶液中生产含金属氧化物的层的液相方法。 在所述方法中,无水组合物含有i)至少一种通式为MxOy(OR)z [O(R'O)cH] aXb [R“OH] d的金属氧代 - 醇盐,其中M = In,Ga,Sn ,和/或Zn,x = 3-25,y = 1-10,z = 3-50,a = 0-25,b = 0-20,c = 0-1,d = 0-25,R, R',R“=有机基团,X = F,Cl,Br,I和ii)将至少一种溶剂施加到基材上,任选地干燥,并转化为含金属氧化物的层。 本发明还涉及可以使用本发明的方法生产的层及其用途。

    METHOD FOR PRODUCING INDIUM OXIDE-CONTAINING LAYERS
    7.
    发明申请
    METHOD FOR PRODUCING INDIUM OXIDE-CONTAINING LAYERS 有权
    生产含氧化ING层的方法

    公开(公告)号:US20150170913A1

    公开(公告)日:2015-06-18

    申请号:US14407681

    申请日:2013-06-04

    Abstract: The present invention relates to a fluid phase method for producing indium oxide-containing layers, in which a composition comprising at least one indium oxo-alkoxide of the generic formula MxOy(OR)z[O(R′O)eH]aXbYc[R″OH]d with x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=1-20, d=0-25, e=0, 1, M=In, R, R′, R″=organic remainder, X═F, Cl, Br, I, and Y═—NO3, —NO2, where b+c is =1-20 and at least one solvent is applied to a substrate, optionally dried, and converted into an indium oxide-containing layer, to the indium oxo-alkoxides of the indicated generic formula, to coating compositions comprising said indium oxo-alkoxides, to layers that can be produced by means of the method according to the invention, and to the use of said layers.

    Abstract translation: 本发明涉及一种用于生产含氧化铟的层的流相方法,其中包含至少一种通式MxOy(OR)z [O(R'O)eH] aXbYc [R “OH”d,其中x = 3-25,y = 1-10,z = 3-50,a = 0-25,b = 0-20,c = 1-20,d = 0-25,e = 0 ,1,M = In,R,R',R“=有机残基,X = F,Cl,Br,I和Y = -NO 3,-NO 2,其中b + c为1-20, 将溶剂施加到基材上,任选地干燥并转化成含氧化铟的层,转化为指示的通式的氧代 - 烷氧基化物,将包含所述含氧化合物的烷氧基化物的组合物涂覆到可以通过手段产生的层 根据本发明的方法和所述层的使用。

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