利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.013 秒)

    BEAM LINE FOR A SOURCE OF EXTREME ULTRAVIOLET (EUV) RADIATION
    1.
    发明申请
    BEAM LINE FOR A SOURCE OF EXTREME ULTRAVIOLET (EUV) RADIATION 审中-公开
    用于超极紫外线（EUV）辐射源的光束线

    公开(公告)号：US20130134318A1

    公开(公告)日：2013-05-30

    申请号：US13637260

    申请日：2011-03-16

    申请人： Reza Abhari ,  Andrea Giovannini ,  Franz Dieterich

    发明人： Reza Abhari ,  Andrea Giovannini ,  Franz Dieterich

    IPC分类号： G02B19/00 ,  G02B27/00 ,  G01J1/04

    CPC分类号： G02B27/0006 ,  G01J1/0411 ,  G02B19/0095 ,  G03F7/70033 ,  G03F7/70916

    摘要： The invention relates to a beam line (30) for a source of extreme ultraviolet (EUV) radiation, wherein a EUV-radiating plasma is generated by irradiating droplets of a suitable target material with a focused laser beam (5) at a plasma generation point, said beam line (30) comprising within a vacuum chamber (7): a beam delivery system (2) comprising a focusing lens and means for cooling and shielding said focusing lens; a EUV mirror collector (1), which collects and focuses the radiated EUV in a EUV beam (6) at an intermediate focus (IF); a beam dump (3) capable of damping at least a portion of the laser beam (5) without imposing a shadow on the collected and focused EUV beam (6); and an intermediate focus module (4) for blocking particles from leaving the vacuum chamber (7) with the EUV beam (6).

    摘要翻译： 本发明涉及一种用于远紫外线（EUV）辐射源的射束线（30），其中通过在等离子体产生点处照射聚焦激光束（5）的合适靶材料的液滴来产生EUV辐射等离子体 ，所述光束线（30）包括在真空室（7）内：束传送系统（2），包括聚焦透镜和用于冷却和屏蔽所述聚焦透镜的装置; EUV镜收集器（1），其在中间焦点（IF）处收集并聚焦在EUV光束（6）中的辐射EUV; 能够阻挡所述激光束（5）的至少一部分而不在所收集和聚焦的EUV光束（6）上施加阴影的光束收集器（3）; 和用于阻挡颗粒与EUV射束（6）离开真空室（7）的中间聚焦模块（4）。

    OPTICAL COLLECTOR COLLECTING EXTREME ULTRAVIOLET RADIATION, METHOD FOR OPERATING SUCH AN OPTICAL COLLECTOR, AND EUV SOURCE WITH SUCH A COLLECTOR
    2.
    发明申请
    OPTICAL COLLECTOR COLLECTING EXTREME ULTRAVIOLET RADIATION, METHOD FOR OPERATING SUCH AN OPTICAL COLLECTOR, AND EUV SOURCE WITH SUCH A COLLECTOR 有权
    收集极光紫外线辐射的光学收集器，用于操作这种光学收集器的方法和具有这种收集器的EUV源

    公开(公告)号：US20130003167A1

    公开(公告)日：2013-01-03

    申请号：US13635851

    申请日：2011-03-16

    申请人： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

    发明人： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

    IPC分类号： G02B7/195 ,  G02B5/08

    CPC分类号： G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

    摘要： An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

    摘要翻译： 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

    Method and device for determining an optimal flight trajectory followed by an aircraft
    3.
    发明授权
    Method and device for determining an optimal flight trajectory followed by an aircraft 有权
    用于确定飞机后面的最佳飞行轨迹的方法和装置

    公开(公告)号：US08825366B2

    公开(公告)日：2014-09-02

    申请号：US13309150

    申请日：2011-12-01

    申请人： Andrea Giovannini ,  Thomas Pastre

    发明人： Andrea Giovannini ,  Thomas Pastre

    IPC分类号： G08G5/00

    CPC分类号： G08G5/0039 ,  G08G5/0052 ,  G08G5/006 ,  G08G5/0082 ,  G08G5/0091

    摘要： The device includes processor elements for determining an optimal flight trajectory, which is free of collision with obstacles, which respects constraints of energy, and which links the current position of the aircraft to a target point defined by an operator. The device minimizes additional crew work required to update and validate a new trajectory when an original flight plan needs to be modified to avoid moving obstacles such as storms or other aircraft.

    摘要翻译： 该装置包括用于确定与障碍物碰撞的最佳飞行轨迹的处理器元件，该障碍物尊重能量的约束，并且将飞行器的当前位置与由操作者定义的目标点相关联。 当需要修改原始飞行计划以避免移动诸如风暴或其他飞机的障碍物时，该装置可以最大限度地减少更新和验证新航迹所需的额外船员工作。

    Extreme ultraviolet light source with a debris-mitigated and cooled collector optics
    4.
    发明授权
    Extreme ultraviolet light source with a debris-mitigated and cooled collector optics 失效
    极紫外光源具有碎片减轻和冷却的收集器光学元件

    公开(公告)号：US08723147B2

    公开(公告)日：2014-05-13

    申请号：US13262184

    申请日：2010-03-25

    申请人： Reza Abhari ,  Andrea Giovannini ,  Bob Rollinger ,  Davide Bleiner

    发明人： Reza Abhari ,  Andrea Giovannini ,  Bob Rollinger ,  Davide Bleiner

    IPC分类号： H05G2/00 ,  G21K5/00

    CPC分类号： G03F7/70916 ,  G03F7/70908 ,  G03F7/70983

    摘要： The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).

    摘要翻译： 极紫外光源包括能够在激光产生的等离子体（3）中产生极紫外辐射的生产部位和用于准直极紫外辐射的收集器光学器件（6）。 加压的气体流入在生产部位和收集器光学器件（6）之间形成气幕，以保护收集器光学元件（6）免受在生产现场产生的碎屑（4）的影响。 气体流入以其沿着收集器光学器件（6）的表面的方式引导。 通过如此屏蔽收集器光学元件（6）与碎片（4），其使用寿命得到提高。 保护气体还可用于冷却收集器光学器件（6）。

    EXTREME ULTRAVIOLET LIGHT SOURCE WITH A DEBRIS-MITIGATED AND COOLED COLLECTOR OPTICS
    6.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE WITH A DEBRIS-MITIGATED AND COOLED COLLECTOR OPTICS 失效
    极光紫外线光源，具有破碎和冷却的收集器光学

    公开(公告)号：US20120025109A1

    公开(公告)日：2012-02-02

    申请号：US13262184

    申请日：2010-03-25

    申请人： Reza Abhari ,  Andrea Giovannini ,  Bod Rollinger ,  Davide Bleiner

    发明人： Reza Abhari ,  Andrea Giovannini ,  Bod Rollinger ,  Davide Bleiner

    IPC分类号： G21K5/04

    CPC分类号： G03F7/70916 ,  G03F7/70908 ,  G03F7/70983

    摘要： The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).

    摘要翻译： 极紫外光源包括能够在激光产生的等离子体（3）中产生极紫外辐射的生产部位和用于准直极紫外辐射的收集器光学器件（6）。 加压的气体流入在生产部位和收集器光学器件（6）之间形成气幕，以保护收集器光学元件（6）免受在生产现场产生的碎屑（4）的影响。 气体流入以其沿着收集器光学器件（6）的表面的方式引导。 通过如此屏蔽收集器光学元件（6）与碎片（4），其使用寿命得到提高。 保护气体还可用于冷却收集器光学器件（6）。

    Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector
    7.
    发明授权
    Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector 有权
    用于收集极紫外辐射的光收发器，用于操作这种光收发器的方法，以及用这种收集器的EUV源

    公开(公告)号：US09513569B2

    公开(公告)日：2016-12-06

    申请号：US13635851

    申请日：2011-03-16

    申请人： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

    发明人： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

    IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06

    CPC分类号： G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

    摘要： An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

    摘要翻译： 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

    Droplet dispensing device and light source comprising such a droplet dispensing device
    9.
    发明授权
    Droplet dispensing device and light source comprising such a droplet dispensing device 有权
    液滴分配装置和包含这种液滴分配装置的光源

    公开(公告)号：US09307625B2

    公开(公告)日：2016-04-05

    申请号：US14110048

    申请日：2012-04-02

    申请人： Bob Rollinger ,  Reza Abhari ,  Andrea Giovannini ,  Ian Henderson

    发明人： Bob Rollinger ,  Reza Abhari ,  Andrea Giovannini ,  Ian Henderson

    IPC分类号： H05G2/00 ,  B05B1/02 ,  B05B17/06

    CPC分类号： H05G2/008 ,  B05B1/02 ,  B05B17/0623 ,  H05G2/005 ,  H05G2/006

    摘要： A droplet dispensing device includes a reservoir for receiving a liquid material, an outlet nozzle in fluid communication with the reservoir and a piezoelectric actuating means acting on the liquid material at the outlet nozzle to exit the outlet nozzle in a sequence of droplets. A piezoelectric actuating means that includes a piston, which is actuated by a piezoelectric actuator at one end and dips the other, free end into the liquid material is provided just upstream of the outlet nozzle.

    摘要翻译： 液滴分配装置包括用于接收液体材料的储存器，与储存器流体连通的出口喷嘴和在出口喷嘴处作用在液体材料上的压电致动装置，以一系列液滴离开出口喷嘴。 压电致动装置包括一个活塞，该活塞由一端的压电致动器致动并将另一个自由端浸入液体材料中，恰好在出口喷嘴的上游。

    Method and device for aiding the approach of an aircraft during an approach phase for the purpose of landing
    10.
    发明授权
    Method and device for aiding the approach of an aircraft during an approach phase for the purpose of landing 有权
    用于协助飞机在接近阶段进行着陆目的的方法和装置

    公开(公告)号：US08781654B2

    公开(公告)日：2014-07-15

    申请号：US13309697

    申请日：2011-12-02

    申请人： Andrea Giovannini ,  Thomas Pastre

    发明人： Andrea Giovannini ,  Thomas Pastre

    IPC分类号： G06F19/00 ,  G06G7/70 ,  G05D1/00 ,  G05D3/00 ,  G06F7/00 ,  G06F17/00 ,  G08G5/02 ,  G08G5/00

    CPC分类号： G08G5/025 ,  G05D1/0676 ,  G08G5/0021

    摘要： The device includes elements of a processing unit which determine a limit trajectory representing a flight trajectory which is compatible with the aircraft performance during the approach and which shows the limits for the flight of the aircraft. For example, a vertical profile and a horizontal trajectory are determined, with the horizontal trajectory being non-linear so that the energy of the aircraft can be sufficiently dissipated before final approach along an approach axis, while also avoiding obstacles. Thus, a flight trajectory is determined even when the aircraft has deviated from a flight plan and approach axis.

    摘要翻译： 该装置包括处理单元的元件，其确定代表飞行轨迹的极限轨迹，该飞行轨迹与进近期间的飞机性能兼容，并且显示飞行器的飞行的限制。 例如，确定垂直轮廓和水平轨迹，其中水平轨迹是非线性的，使得飞机的能量可以在沿着进近轴的最终进近之前被充分消散，同时也避免障碍物。 因此，即使当飞行器偏离飞行计划和进近轴线时，也确定飞行轨迹。