GERMANIUM BASED METAL-INSULATOR TRANSITION THIN FILM, METAL-INSULATOR TRANSITION DEVICE INCLUDING THE METAL-INSULATOR TRANSITION THIN FILM, AND METHOD OF FABRICATING THE METAL-INSULATOR TRANSITION DEVICE
    1.
    发明申请
    GERMANIUM BASED METAL-INSULATOR TRANSITION THIN FILM, METAL-INSULATOR TRANSITION DEVICE INCLUDING THE METAL-INSULATOR TRANSITION THIN FILM, AND METHOD OF FABRICATING THE METAL-INSULATOR TRANSITION DEVICE 有权
    基于金属绝缘体的金属绝缘体过渡薄膜,包括金属绝缘体过渡薄膜的金属绝缘体过渡器件,以及制造金属绝缘体过渡器件的方法

    公开(公告)号:US20110233616A1

    公开(公告)日:2011-09-29

    申请号:US12671890

    申请日:2008-06-20

    IPC分类号: H01L29/12 H01L21/20

    CPC分类号: H01L49/003

    摘要: Provided are a germanium (Ge) based metal-insulator transition (MIT) thin film which is formed of a Ge single-element material instead of a compound material of two or more elements and by which material growth may be easily performed and a problem of a second phase characteristic in accordance with a structural defect and an included impurity may be solved, an MIT device including the MIT thin film, and a method of fabricating the MIT device. The MIT device includes a substrate; a germanium (Ge) based MIT thin film which is formed of a Ge single-element material on the substrate and in which a discontinuous MIT occurs at a predetermined transition voltage; and at least two thin film electrodes contacting the Ge based MIT thin film, wherein the discontinuous MIT occurs in the Ge based MIT thin film due to a voltage or a current which is applied through the thin film electrodes.

    摘要翻译: 提供了由Ge单元素材料代替两种或更多种元素的复合材料形成的锗(Ge)基金属 - 绝缘体转变(MIT)薄膜,并且可容易地进行材料生长的问题 可以解决根据结构缺陷和所包括的杂质的第二相特性,包括MIT薄膜的MIT装置和制造MIT装置的方法。 MIT装置包括基板; 在基板上由Ge单元素材料形成的锗(Ge)基MIT薄膜,其中以预定的转变电压发生不连续的MIT; 以及与Ge基MIT薄膜接触的至少两个薄膜电极,其中由于通过薄膜电极施加的电压或电流,在Ge基MIT薄膜中发生不连续的MIT。

    OSCILLATION CIRCUIT INCLUDING MIT DEVICE AND METHOD OF ADJUSTING OSCILLATION FREQUENCY OF THE OSCILLATION CIRCUIT
    3.
    发明申请
    OSCILLATION CIRCUIT INCLUDING MIT DEVICE AND METHOD OF ADJUSTING OSCILLATION FREQUENCY OF THE OSCILLATION CIRCUIT 失效
    振荡电路包括麻省电器和调节振荡电路的振荡频率的方法

    公开(公告)号:US20100085126A1

    公开(公告)日:2010-04-08

    申请号:US12531058

    申请日:2008-03-05

    IPC分类号: H03B1/00

    CPC分类号: H01L49/003 H03B9/12

    摘要: Provided are an MIT device-based oscillation circuit including a power source, an MIT device and a variable resistor, in which a generation of an oscillation and an oscillation frequency are determined according to a voltage applied from the power source and a resistance of the variable resistor, and a method of adjusting the oscillation frequency of the oscillation circuit. The MIT device includes an MIT thin film and an electrode thin film connected to the MIT thin film, and generates a discontinuous MIT at an MIT generation voltage, the variable resistor is connected in series to the MIT device, and the power source applies a voltage or an electric current to the MIT device. The generation of an oscillation and an oscillation frequency are determined according to the voltage applied from the power source and the resistance of the variable resistor.

    摘要翻译: 提供了一种基于MIT设备的振荡电路,其包括电源,MIT设备和可变电阻器,其中根据从电源施加的电压和变量的电阻确定振荡和振荡频率的产生 电阻器和调整振荡电路的振荡频率的方法。 MIT装置包括连接到MIT薄膜的MIT薄膜和电极薄膜,并以MIT产生电压产生不连续的MIT,可变电阻器与MIT装置串联连接,并且电源施加电压 或电流到MIT设备。 根据从电源施加的电压和可变电阻器的电阻来确定振荡和振荡频率的产生。

    Circuit for preventing self-heating of metal-insulator-transition (MIT) device and method of fabricating integrated-device for the same circuit
    6.
    发明授权
    Circuit for preventing self-heating of metal-insulator-transition (MIT) device and method of fabricating integrated-device for the same circuit 有权
    用于防止金属 - 绝缘体转变(MIT)器件的自身加热的电路和用于制造用于同一电路的集成器件的方法

    公开(公告)号:US08890574B2

    公开(公告)日:2014-11-18

    申请号:US12919195

    申请日:2009-02-23

    IPC分类号: H03K19/20 H01L49/00 H01L27/06

    CPC分类号: H01L27/067 H01L49/003

    摘要: Provided are a MIT device self-heating preventive-circuit that can solve a self-heating problem of a MIT device and a method of manufacturing a MIT device self-heating preventive-circuit integrated device. The MIT device self-heating preventive-circuit includes a MIT device that generates an abrupt MIT at a temperature equal to or greater than a critical temperature and is connected to a current driving device to control the flow of current in the current driving device, a transistor that is connected to the MIT device to control the self-heating of the MIT device after generating the MIT in the MIT device, and a resistor connected to the MIT device and the transistor.

    摘要翻译: 提供了能够解决MIT装置的自发热问题的MIT装置自发热防止电路以及制造MIT装置自发热防止电路集成装置的方法。 MIT装置自发热防止电路包括MIT装置,其在等于或大于临界温度的温度下产生突然的MIT,并连接到电流驱动装置以控制当前驱动装置中的电流流动, 晶体管,其连接到MIT装置,以在MIT装置中产生MIT之后控制MIT装置的自发热,以及连接到MIT装置和晶体管的电阻器。

    Germanium based metal-insulator transition thin film, metal-insulator transition device including the metal-insulator transition thin film, and method of fabricating the metal-insulator transition device
    8.
    发明授权
    Germanium based metal-insulator transition thin film, metal-insulator transition device including the metal-insulator transition thin film, and method of fabricating the metal-insulator transition device 有权
    基于锗的金属 - 绝缘体转变薄膜,包括金属 - 绝缘体转变薄膜的金属 - 绝缘体转换装置,以及制造金属 - 绝缘体转移装置的方法

    公开(公告)号:US08330135B2

    公开(公告)日:2012-12-11

    申请号:US12671890

    申请日:2008-06-20

    IPC分类号: H01L47/00

    CPC分类号: H01L49/003

    摘要: Provided are a germanium (Ge) based metal-insulator transition (MIT) thin film which is formed of a Ge single-element material instead of a compound material of two or more elements and by which material growth may be easily performed and a problem of a second phase characteristic in accordance with a structural defect and an included impurity may be solved, an MIT device including the MIT thin film, and a method of fabricating the MIT device. The MIT device includes a substrate; a germanium (Ge) based MIT thin film which is formed of a Ge single-element material on the substrate and in which a discontinuous MIT occurs at a predetermined transition voltage; and at least two thin film electrodes contacting the Ge based MIT thin film, wherein the discontinuous MIT occurs in the Ge based MIT thin film due to a voltage or a current which is applied through the thin film electrodes.

    摘要翻译: 提供了由Ge单元素材料代替两种或更多种元素的复合材料形成的锗(Ge)基金属 - 绝缘体转变(MIT)薄膜,并且可容易地进行材料生长的问题 可以解决根据结构缺陷和所包括的杂质的第二相特性,包括MIT薄膜的MIT装置和制造MIT装置的方法。 MIT装置包括基板; 在基板上由Ge单元素材料形成的锗(Ge)基MIT薄膜,其中以预定的转变电压发生不连续的MIT; 以及与Ge基MIT薄膜接触的至少两个薄膜电极,其中由于通过薄膜电极施加的电压或电流,在Ge基MIT薄膜中发生不连续的MIT。

    Circuit for continuously measuring discontinuous metal insulator transition of MIT element and MIT sensor using the same
    9.
    发明授权
    Circuit for continuously measuring discontinuous metal insulator transition of MIT element and MIT sensor using the same 有权
    用于连续测量MIT元件和MIT传感器的不连续金属绝缘体转换的电路

    公开(公告)号:US08207750B2

    公开(公告)日:2012-06-26

    申请号:US12376668

    申请日:2007-07-05

    IPC分类号: G01R31/02

    CPC分类号: G01R31/2641

    摘要: Provided are a circuit for continuously measuring a discontinuous metal-insulator transition (MIT) of an MIT element and an MIT sensor using the circuit. The circuit comprises a to-be-measured object unit including the MIT element having a discontinuous MIT occurring at the transition voltage thereof, a power supply unit applying a predetermined pulse current or voltage signal to the to-be-measured object unit, a measurement unit measuring the discontinuous MIT of the MIT element, and a microprocessor controlling the power supply unit and the measurement unit. The discontinuous MIT measurement circuit continuously measures the discontinuous MIT of the MIT element, and thus it can be used as a sensor for sensing a variation in an external factor.

    摘要翻译: 提供了一种用于连续测量使用该电路的MIT元件和MIT传感器的不连续金属 - 绝缘体转变(MIT)的电路。 该电路包括被测量对象单元,其包括具有在其转变电压下出现的不连续MIT的MIT元件,向待测量对象单元施加预定脉冲电流或电压信号的电源单元, 测量MIT元件的不连续MIT的单元,以及控制电源单元和测量单元的微处理器。 不连续的MIT测量电路连续测量MIT元件的不连续MIT,因此它可以用作感测外部因素变化的传感器。

    Abrupt metal-insulator transition device with parallel MIT material layers
    10.
    发明授权
    Abrupt metal-insulator transition device with parallel MIT material layers 有权
    具有并联MIT材料层的突发金属 - 绝缘体转换装置

    公开(公告)号:US07989792B2

    公开(公告)日:2011-08-02

    申请号:US12162964

    申请日:2007-01-31

    IPC分类号: H01L49/00

    CPC分类号: H01L49/003

    摘要: An abrupt MIT (metal-insulator transition) device with parallel MIT material layers is provided. The abrupt MIT device includes a first electrode disposed on a certain region of a substrate, a second electrode disposed so as to be spaced a predetermined distance apart from the first electrode, and at least one MIT material layer electrically connecting the first electrode with the second electrode and having a width that allows the entire region of the MIT material layer to be transformed into a metal layer due to an MIT. Due to this configuration, deterioration of the MIT material layer, which is typically caused by current flowing through the MIT material layer, is less likely to occur.

    摘要翻译: 提供了具有平行MIT材料层的突发MIT(金属 - 绝缘体转变)器件。 突变MIT装置包括设置在基板的某个区域上的第一电极,设置成与第一电极隔开预定距离的第二电极,以及至少一个MIT材料层,电连接第一电极与第二电极 电极,并且具有允许MIT材料层的整个区域由于MIT而转变成金属层的宽度。 由于这种构造,通常由流过MIT材料层的电流引起的MIT材料层的劣化不太可能发生。