OSCILLATION CIRCUIT INCLUDING MIT DEVICE AND METHOD OF ADJUSTING OSCILLATION FREQUENCY OF THE OSCILLATION CIRCUIT
    2.
    发明申请
    OSCILLATION CIRCUIT INCLUDING MIT DEVICE AND METHOD OF ADJUSTING OSCILLATION FREQUENCY OF THE OSCILLATION CIRCUIT 失效
    振荡电路包括麻省电器和调节振荡电路的振荡频率的方法

    公开(公告)号:US20100085126A1

    公开(公告)日:2010-04-08

    申请号:US12531058

    申请日:2008-03-05

    IPC分类号: H03B1/00

    CPC分类号: H01L49/003 H03B9/12

    摘要: Provided are an MIT device-based oscillation circuit including a power source, an MIT device and a variable resistor, in which a generation of an oscillation and an oscillation frequency are determined according to a voltage applied from the power source and a resistance of the variable resistor, and a method of adjusting the oscillation frequency of the oscillation circuit. The MIT device includes an MIT thin film and an electrode thin film connected to the MIT thin film, and generates a discontinuous MIT at an MIT generation voltage, the variable resistor is connected in series to the MIT device, and the power source applies a voltage or an electric current to the MIT device. The generation of an oscillation and an oscillation frequency are determined according to the voltage applied from the power source and the resistance of the variable resistor.

    摘要翻译: 提供了一种基于MIT设备的振荡电路,其包括电源,MIT设备和可变电阻器,其中根据从电源施加的电压和变量的电阻确定振荡和振荡频率的产生 电阻器和调整振荡电路的振荡频率的方法。 MIT装置包括连接到MIT薄膜的MIT薄膜和电极薄膜,并以MIT产生电压产生不连续的MIT,可变电阻器与MIT装置串联连接,并且电源施加电压 或电流到MIT设备。 根据从电源施加的电压和可变电阻器的电阻来确定振荡和振荡频率的产生。

    Adaptive Front Light System Having High Heat-Dissipation Efficiency
    3.
    发明申请
    Adaptive Front Light System Having High Heat-Dissipation Efficiency 有权
    具有高散热效率的自适应前照灯系统

    公开(公告)号:US20090278461A1

    公开(公告)日:2009-11-12

    申请号:US12274184

    申请日:2008-11-19

    IPC分类号: H01J7/24

    摘要: An adaptive front lighting system (AFLS) having a high heat-dissipation efficiency increases heat-dissipation efficiency of a light emitting diode (LED) to improve durability in headlamps which use LEDs as a light source and have a variable illumination angle according to conditions. The AFLS includes a lamp housing, a reflector installed in the lamp housing and rotatable around a rotational axle formed at the lamp housing, a light source installed in the reflector to emit light, an external heat sink installed at an external surface of the lamp housing so as to dissipate heat towards outside of the lamp housing, and/or a heat conduction member connecting the light source and the external heat sink so as to transfer the heat of the light source to the external heat sink. The heat conduction member is flexibly transformed in response to a movement of the reflector and the light source.

    摘要翻译: 具有高散热效率的自适应前照明系统(AFLS)提高了发光二极管(LED)的散热效率,以提高使用LED作为光源并根据条件具有可变照明角度的前照灯的耐用性。 AFLS包括灯壳体,安装在灯壳体中的反射器,可围绕形成在灯壳体上的旋转轴线旋转,安装在反射器中以发光的光源;安装在灯壳外表面的外部散热器 以便向灯壳外部散热,和/或连接光源和外部散热器的热传导构件,以将光源的热传递到外部散热器。 响应于反射器和光源的移动,热传导构件被灵活地变形。

    Oscillation circuit including MIT device and method of adjusting oscillation frequency of the oscillation circuit
    4.
    发明授权
    Oscillation circuit including MIT device and method of adjusting oscillation frequency of the oscillation circuit 失效
    包括MIT装置的振荡电路和调整振荡电路的振荡频率的方法

    公开(公告)号:US08031022B2

    公开(公告)日:2011-10-04

    申请号:US12531058

    申请日:2008-03-05

    IPC分类号: H03B11/00

    CPC分类号: H01L49/003 H03B9/12

    摘要: Provided are an MIT device-based oscillation circuit including a power source, an MIT device and a variable resistor, in which a generation of an oscillation and an oscillation frequency are determined according to a voltage applied from the power source and a resistance of the variable resistor, and a method of adjusting the oscillation frequency of the oscillation circuit. The MIT device includes an MIT thin film and an electrode thin film connected to the MIT thin film, and generates a discontinuous MIT at an MIT generation voltage, the variable resistor is connected in series to the MIT device, and the power source applies a voltage or an electric current to the MIT device. The generation of an oscillation and an oscillation frequency are determined according to the voltage applied from the power source and the resistance of the variable resistor.

    摘要翻译: 提供了一种基于MIT设备的振荡电路,其包括电源,MIT设备和可变电阻器,其中根据从电源施加的电压和变量的电阻确定振荡和振荡频率的产生 电阻器和调整振荡电路的振荡频率的方法。 MIT装置包括连接到MIT薄膜的MIT薄膜和电极薄膜,并以MIT产生电压产生不连续的MIT,可变电阻器与MIT装置串联连接,并且电源施加电压 或电流到MIT设备。 根据从电源施加的电压和可变电阻器的电阻来确定振荡和振荡频率的产生。

    Method of Manufacturing Vanadium Oxide Thin Film
    6.
    发明申请
    Method of Manufacturing Vanadium Oxide Thin Film 审中-公开
    制造氧化钒薄膜的方法

    公开(公告)号:US20090011145A1

    公开(公告)日:2009-01-08

    申请号:US12064807

    申请日:2006-08-23

    IPC分类号: C23C16/513 C23C16/00

    摘要: Provided is a method of manufacturing a large-sized vanadium oxide thin film having a uniform surface, uniform film thickness and stable composition. According to the method, a vanadium-organometallic compound gas is injected into a chamber to form adsorption layer where molecules of the vanadium-organometallic compound are adsorbed on the surface of a substrate. After that, an oxygen precursor is injected into the chamber and thus allowed to accomplish surface-saturation reaction with the adsorbed materials to fabricate a vanadium oxide thin film.

    摘要翻译: 提供一种具有均匀的表面,均匀的膜厚度和稳定的组成的大型氧化钒薄膜的制造方法。 根据该方法,将钒有机金属化合物气体注入室内以形成其中有机金属化合物分子被吸附在基材表面上的吸附层。 之后,向室内注入氧前体,由此与吸附材料进行表面饱和反应,制作氧化钒薄膜。

    Method for forming gate dielectric layer
    7.
    发明申请
    Method for forming gate dielectric layer 失效
    形成栅介质层的方法

    公开(公告)号:US20050142712A1

    公开(公告)日:2005-06-30

    申请号:US10909339

    申请日:2004-08-03

    摘要: Provided is a method for forming a gate dielectric layer, in which a plasma oxide layer is finely formed by plasma at a temperature of 200° C. or below, and an atomic layer deposition (ALD) oxide layer is deposited. Further, the gate dielectric layer according to the present invention can be applied to a display device comprising a substrate such as a plastic substrate vulnerable to heat, have good interfacial characteristic, and allow a high dielectric layer to be applied thereto.

    摘要翻译: 提供了一种用于形成栅介电层的方法,其中在200℃或更低的温度下通过等离子体精细地形成等离子体氧化物层,并沉积原子层沉积(ALD)氧化物层。 此外,根据本发明的栅介质层可以应用于包括易受热的塑料基板等基板的显示装置,具有良好的界面特性,并且可以向其施加高介电层。

    Method for forming nitrogen-containing oxide thin film using plasma enhanced atomic layer deposition
    8.
    发明授权
    Method for forming nitrogen-containing oxide thin film using plasma enhanced atomic layer deposition 失效
    使用等离子体增强原子层沉积形成含氮氧化物薄膜的方法

    公开(公告)号:US06723642B1

    公开(公告)日:2004-04-20

    申请号:US10377471

    申请日:2003-02-27

    IPC分类号: H01L2144

    摘要: A method for forming a nitrogen-containing oxide thin film by using plasma enhanced atomic layer deposition is provided. In the method, the nitrogen-containing oxide thin film is deposited by supplying a metal source compound and oxygen gas into a reactor in a cyclic fashion with sequential alternating pulses of the metal source compound and the oxygen gas, wherein the oxygen gas is activated into plasma in synchronization of the pulsing thereof, and a nitrogen source gas is further sequentially pulsed into the reactor and activated into plasma over the substrate in synchronization with the pulsing thereof. According to the method, a dense nitrogen-containing oxide thin film can be deposited at a high rate, and a trace of nitrogen atoms can be incorporated in situ into the nitrogen-containing oxide thin film, thereby increasing the breakdown voltage of the film.

    摘要翻译: 提供了通过使用等离子体增强原子层沉积来形成含氮氧化物薄膜的方法。 在该方法中,通过以金属源化合物和氧气的顺序交替脉冲的循环方式将金属源化合物和氧气供给到反应器中来沉积含氮氧化物薄膜,其中氧气被激活成 其脉冲同步的等离子体和氮源气体进一步顺序地脉冲进入反应器并与其脉冲同步地激活到衬底上的等离子体中。 根据该方法,可以以高速率沉积致密的含氮氧化物薄膜,并且可以将微量的氮原子并入到含氮氧化物薄膜中,从而增加膜的击穿电压。

    THIN FILM TYPE VARISTOR AND A METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    THIN FILM TYPE VARISTOR AND A METHOD OF MANUFACTURING THE SAME 失效
    薄膜型变压器及其制造方法

    公开(公告)号:US20100259357A1

    公开(公告)日:2010-10-14

    申请号:US12740624

    申请日:2008-08-20

    IPC分类号: H01C7/10 H01C17/06

    摘要: A thin film type varistor and a method of manufacturing the same are provided. The method includes: a depositing a first zinc oxide thin film at a low temperature through a sputtering method; and a forming a zinc oxide thin film for a varistor by treating the first zinc oxide thin film with heat at a low temperature in an environment in which an inert gas and oxygen are injected. Accordingly, it is possible to lower a processing temperature and simplify a manufacturing process while maintaining a varistor characteristic so as to be applied to a highly integrated circuit.

    摘要翻译: 提供薄膜型压敏电阻及其制造方法。 该方法包括:通过溅射法在低温下沉积第一氧化锌薄膜; 以及通过在注入惰性气体和氧气的环境中在低温下处理第一氧化锌薄膜来形成用于变阻器的氧化锌薄膜。 因此,可以在保持压敏电阻特性的同时降低加工温度并简化制造工艺,从而应用于高度集成的电路。

    Method for forming gate dielectric layer
    10.
    发明授权
    Method for forming gate dielectric layer 失效
    形成栅介质层的方法

    公开(公告)号:US07662683B2

    公开(公告)日:2010-02-16

    申请号:US10909339

    申请日:2004-08-03

    摘要: Provided is a method for forming a gate dielectric layer, in which a plasma oxide layer is finely formed by plasma at a temperature of 200° C. or below, and an atomic layer deposition (ALD) oxide layer is deposited. Further, the gate dielectric layer according to the present invention can be applied to a display device comprising a substrate such as a plastic substrate vulnerable to heat, have good interfacial characteristic, and allow a high dielectric layer to be applied thereto.

    摘要翻译: 提供了一种用于形成栅介电层的方法,其中在200℃或更低的温度下通过等离子体精细地形成等离子体氧化物层,并沉积原子层沉积(ALD)氧化物层。 此外,根据本发明的栅介质层可以应用于包括易受热的塑料基板等基板的显示装置,具有良好的界面特性,并且可以向其施加高介电层。