-
1.发明授权Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agent 有权间隙填充剂的制备方法，使用该间隙填充剂的间隙填充剂，以及使用间隙填充剂制造半导体电容器的方法公开(公告)号：US09240443B2
公开(公告)日：2016-01-19
申请号：US14144738
申请日：2013-12-31
申请人： Jin-Hee Bae , Han-Song Lee , Taek-Soo Kwak , Go-Un Kim , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Sang-Hak Lim , Wan-Hee Lim , Seung-Hee Hong , Byeong-Gyu Hwang
发明人： Jin-Hee Bae , Han-Song Lee , Taek-Soo Kwak , Go-Un Kim , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Sang-Hak Lim , Wan-Hee Lim , Seung-Hee Hong , Byeong-Gyu Hwang
CPC分类号： H01L28/92 , C08G77/00 , C08G77/62 , C09D183/16 , H01L21/02222 , H01L21/02282 , H01L21/02326
摘要： A method of preparing a gap filler agent includes adding a halosilane to a basic solvent, and, to the basic solvent and the halosilane, adding ammonia in an amount of about 50 to about 70 parts by weight based on 100 parts by weight of the halosilane at a rate of about 1 g/hr to about 15 g/hr.
摘要翻译： 制备间隙填充剂的方法包括向碱性溶剂中加入卤代硅烷，并且向碱性溶剂和卤代硅烷中添加约50至约70重量份的氨，基于100重量份的卤代硅烷 以约1g / hr至约15g / hr的速率。
-
2.发明授权公开(公告)号：US09312122B2
公开(公告)日：2016-04-12
申请号：US14090003
申请日：2013-11-26
申请人： Jin-Hee Bae , Han-Song Lee , Wan-Hee Lim , Go-Un Kim , Taek-Soo Kwak , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Youn-Jin Cho , Kwen-Woo Han , Byeong-Gyu Hwang
发明人： Jin-Hee Bae , Han-Song Lee , Wan-Hee Lim , Go-Un Kim , Taek-Soo Kwak , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Youn-Jin Cho , Kwen-Woo Han , Byeong-Gyu Hwang
CPC分类号： H01L21/0206 , C08G77/54 , C08G77/62 , C09D183/14 , C09D183/16 , C11D7/266 , C11D7/5022 , C11D11/0047 , H01L21/02087 , H01L21/0209 , H01L21/02164 , H01L21/02214 , H01L21/02222 , H01L21/02282 , H01L21/02326 , H01L27/1085 , H01L28/40
摘要： A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
摘要翻译： 一种用于绝缘层的冲洗液，所述漂洗液包括由以下化学式1表示的溶剂：
-
3.发明申请公开(公告)号：US20140315367A1
公开(公告)日：2014-10-23
申请号：US14090003
申请日：2013-11-26
申请人： Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
发明人： Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
IPC分类号： H01L21/02 , H01L27/108
CPC分类号： H01L21/0206 , C08G77/54 , C08G77/62 , C09D183/14 , C09D183/16 , C11D7/266 , C11D7/5022 , C11D11/0047 , H01L21/02087 , H01L21/0209 , H01L21/02164 , H01L21/02214 , H01L21/02222 , H01L21/02282 , H01L21/02326 , H01L27/1085 , H01L28/40
摘要： A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
摘要翻译： 一种用于绝缘层的冲洗液，所述漂洗液包括由以下化学式1表示的溶剂：
-
4.发明申请PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARED USING SAME, AND A METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE GAP FILLER AGENT 有权制备GAP填料剂的方法，使用其制备的GAP填料剂以及使用GAP填料剂制造半导体电容器的方法公开(公告)号：US20140187017A1
公开(公告)日：2014-07-03
申请号：US14144738
申请日：2013-12-31
申请人： Jin-Hee BAE , Han-Song LEE , Taek-Soo KWAK , Go-Un KIM , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Sang-Hak LIM , Wan-Hee LIM , Seung-Hee HONG , Byeong-Gyu HWANG
发明人： Jin-Hee BAE , Han-Song LEE , Taek-Soo KWAK , Go-Un KIM , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Sang-Hak LIM , Wan-Hee LIM , Seung-Hee HONG , Byeong-Gyu HWANG
IPC分类号： H01L49/02
CPC分类号： H01L28/92 , C08G77/00 , C08G77/62 , C09D183/16 , H01L21/02222 , H01L21/02282 , H01L21/02326
摘要： A method of preparing a gap filler agent includes adding a halosilane to a basic solvent, and, to the basic solvent and the halosilane, adding ammonia in an amount of about 50 to about 70 parts by weight based on 100 parts by weight of the halosilane at a rate of about 1 g/hr to about 15 g/hr.
摘要翻译： 制备间隙填充剂的方法包括向碱性溶剂中加入卤代硅烷，并且向碱性溶剂和卤代硅烷中添加约50至约70重量份的氨，基于100重量份的卤代硅烷 以约1g / hr至约15g / hr的速率。
-
-
-
搜索结果
4 条记录 (耗时 0.013 秒)
