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16 条记录 (耗时 0.017 秒)

    Silicon carbide-based thermal spray powder, method of preparation and use
    1.
    发明申请
    Silicon carbide-based thermal spray powder, method of preparation and use 审中-公开
    碳化硅基热喷粉，制备和使用方法

    公开(公告)号：US20040258916A1

    公开(公告)日：2004-12-23

    申请号：US10732833

    申请日：2003-12-10

    申请人： Centro Sviluppo Materiali S.P.A.

    发明人： Mario Tului ,  Teodoro Valente

    IPC分类号： B32B009/00

    CPC分类号： C23C4/10 ,  C01B32/956 ,  C04B35/565 ,  C04B35/62665 ,  C04B2235/3839 ,  C04B2235/3843 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/80 ,  Y10T428/2949 ,  Y10T428/2982

    摘要： A silicon carbide-based thermal spray powder contains at least one boride chosen from zirconium boride, titanium boride and hafnium boride. The powder is prepared by mixing and aggregation of powders containing the compounds in question. Said thermal spray powder is used to deposit, via the plasma spraying technique, a silicon carbide-based coating on a metallic or non-metallic substrate. The figure shows the X-ray crystallogram obtained, for a silicon carbide-based powder, according to the invention, after thermal spraying. The substantial identity of this crystallogram with the one obtained prior to thermal spraying demonstrates that the silicon carbide has been deposited on the substrate without decomposing.

    摘要翻译： 基于碳化硅的热喷涂粉末含有至少一种选自硼化锆，硼化钛和硼化铪的硼化物。 通过混合和聚集含有所述化合物的粉末制备粉末。 所述热喷雾粉末通过等离子喷涂技术沉积在金属或非金属基底上的碳化硅基涂层。 该图示出了在热喷涂之后，根据本发明的碳化硅基粉末获得的X射线晶体学图。 该晶体图与在热喷涂之前获得的晶体学基本一致表明，碳化硅已沉积在基板上而不分解。

    Process for thermal plasma spraying of doped semiconductor oxide-based coatings
    3.
    发明申请
    Process for thermal plasma spraying of doped semiconductor oxide-based coatings 审中-公开
    掺杂半导体氧化物基涂层的热等离子喷涂工艺

    公开(公告)号：US20040146658A1

    公开(公告)日：2004-07-29

    申请号：US10732187

    申请日：2003-12-10

    申请人： CENTRO SVILUPPO MATERIALI S.P.A.

    发明人： Mario Tului

    IPC分类号： C23C004/10

    CPC分类号： C23C28/00 ,  C23C4/11 ,  F24S70/225

    摘要： A process for the preparation of a composite multilayer product with selective optical properties comprises the operation of depositing, by thermal plasma spraying of powders, a coating of semiconductor oxides doped with oxides of elements chosen from the group consisting of transition metals and metals in the groups III-A and V-A of the periodic table of elements, in which the coating obtained maintains the composition and doping of the thermal plasma sprayed powders substantially unchanged. The figure shows the X-ray diffraction spectrum of a coating deposited according to the process of the present invention.

    摘要翻译： 用于制备具有选择性光学性能的复合多层产品的方法包括通过热等离子体喷涂粉末沉积掺杂有选自过渡金属和组中的金属的元素的氧化物的半导体氧化物涂层的操作 元素周期表的III-A和VA，其中获得的涂层维持热等离子体喷涂粉末的组成和掺杂基本上不变。 该图示出了根据本发明的方法沉积的涂层的X射线衍射光谱。

    Process for the preparation of articles in Titanium coated with a thick layer of anastase, articles so obtainable, and use thereof as photocatalysts
    4.
    发明申请
    Process for the preparation of articles in Titanium coated with a thick layer of anastase, articles so obtainable, and use thereof as photocatalysts 审中-公开
    制备涂有厚层阿拉斯加酶的钛制品的方法，如此获得的制品及其作为光催化剂的用途

    公开(公告)号：US20040081613A1

    公开(公告)日：2004-04-29

    申请号：US10324126

    申请日：2002-12-20

    申请人： CENTRO SVILUPPO MATERIALI S.p.A.

    发明人： Armando Giannetti ,  Mario Tului ,  Roberta Valle

    IPC分类号： C01G023/047

    CPC分类号： B01J21/063 ,  B01J35/004 ,  B01J37/348

    摘要： Process for the preparation of articles in Titanium coated with a layer of Titanium oxide is described, wherein the metallic Titanium is subjected to the following steps: optional conditioning of the surface; anodic oxidation treatment, in an electrolytic cell of which it represents the anode, in a bath made of an aqueous solution comprising sulfuric acid, hydrochloric acid and hydrofluoric acid; and forming onto the metallic surface, by effect of electrolysis, an oxide layer having a >1 nullm thickness and containing a single crystalline phase made of anatase (one of the two allotropic tetragonal shapes of Titanium oxide). Object of the invention are also the articles in Titanium coated with a thick layer of anatase so obtainable, and the use thereof as photocatalysts, under the action of an ultraviolet radiation.

    摘要翻译： 描述了用钛氧化物层涂覆的钛制品的制备方法，其中金属钛经受以下步骤：表面的任选调理; 在由包含硫酸，盐酸和氢氟酸的水溶液制成的浴中的阳极氧化处理，其在其代表阳极的电解池中; 并且通过电解，在金属表面上形成具有>1μm厚度的氧化物层，并且含有由锐钛矿（两种同素异形四方形氧化钛中的一种）制成的单晶相。 本发明的目的还是在紫外线辐射的作用下，涂覆有如此获得的锐钛矿厚层的钛制品及其作为光催化剂的用途。

    Device apt to feed powdered substances or the like and use thereof
    7.
    发明申请
    Device apt to feed powdered substances or the like and use thereof 审中-公开
    适于饲喂粉状物质等的装置及其用途

    公开(公告)号：US20040091405A1

    公开(公告)日：2004-05-13

    申请号：US10315237

    申请日：2002-12-10

    申请人： Centro Sviluppo Materiali S.p.A

    发明人： Angelo Colletta

    IPC分类号： B01J008/00

    CPC分类号： C21C5/462 ,  B01J8/004 ,  B01J8/22 ,  B01J2208/00203 ,  B01J2208/00477 ,  B01J2208/00752 ,  C21C5/4606 ,  C21C5/4613 ,  C21C2005/4626

    摘要： The present invention refers to a device (1), and to the use thereof, apt to feed powdered substances or the like onto the surface (4) of a metal-slag bath (2, 3) inside of a reactor in a particularly effective manner, comprising: means (5, 6, 7, 8) apt to feed powdered substances or the like comprising a channel (5) formed in a tubular body (6) having, at the proximal end thereof, at least one opening (7); means (9, 10, 11) for the thermal and the chemical protection of the channel (5); and means for positioning said at least one opening (7).

    摘要翻译： 本发明涉及一种装置（1）及其用途，其特征在于，在反应器内部的金属渣槽（2,3）的表面（4）上容易投入粉末状物质等 包括：易于进料粉末物质的装置（5,6,7,8），其包括形成在管状体（6）中的通道（5），所述通道在其近端处具有至少一个开口（7） ）; 用于通道（5）的热和化学保护的装置（9,10,11）。 以及用于定位所述至少一个开口（7）的装置。