METHOD AND DEVICE FOR REPAIR OF DEGENERATIVE CARTILAGE
    1.
    发明申请
    METHOD AND DEVICE FOR REPAIR OF DEGENERATIVE CARTILAGE 审中-公开
    用于修复消化器官的方法和装置

    公开(公告)号:US20110166417A1

    公开(公告)日:2011-07-07

    申请号:US12863265

    申请日:2009-01-21

    Applicant: Chia-Ying Lin

    Inventor: Chia-Ying Lin

    CPC classification number: F01N13/08 F01N2290/00 F01N2470/30

    Abstract: The present invention relates, in general to methods for treating degenerative cartilage in an individual comprising administering a composition that increases bone morphogenic protein (BMP) expression directly into injured or damaged cartilage, such as in a vertebral disc or a joint, wherein the composition is in a controlled release formulation.

    Abstract translation: 本发明一般涉及用于治疗个体中退行性软骨的方法,其包括施用将骨形态发生蛋白(BMP)表达直接增加到损伤或损伤的软骨中的组合物,例如在椎间盘或关节中,其中组合物为 在控释制剂中。

    Method for forming spacers of different sizes
    2.
    发明授权
    Method for forming spacers of different sizes 有权
    用于形成不同尺寸的间隔物的方法

    公开(公告)号:US07674718B2

    公开(公告)日:2010-03-09

    申请号:US12025050

    申请日:2008-02-04

    CPC classification number: H01L21/31116 H01L21/823468

    Abstract: A method for forming spacers of different sizes includes the following steps. First a substrate is provided, which has a first element, a second element, a first material layer and a second material layer thereon. A first dry etching is performed to remove part of the second material layer to form a first spacer by the first element and to form a second side wall by the second element, so that the first material layer between the first spacer and the second side wall is exposed to become a damaged first material layer. A trimming procedure is performed to trim the damaged first material layer. A mask is used to cover the first element, the first spacer and part of the first material layer then a wet etching is performed to remove the second side wall.

    Abstract translation: 用于形成不同尺寸的间隔物的方法包括以下步骤。 首先,提供具有第一元件,第二元件,第一材料层和第二材料层的基板。 执行第一干蚀刻以去除第二材料层的一部分以通过第一元件形成第一间隔物并且由第二元件形成第二侧壁,使得第一间隔物和第二侧壁之间的第一材料层 被暴露成为损坏的第一材料层。 执行修剪程序以修整损坏的第一材料层。 掩模用于覆盖第一元件,第一间隔物和第一材料层的一部分,然后进行湿蚀刻以除去第二侧壁。

    METHOD FOR FORMING SPACERS OF DIFFERENT SIZES
    9.
    发明申请
    METHOD FOR FORMING SPACERS OF DIFFERENT SIZES 有权
    形成不同尺寸间隔的方法

    公开(公告)号:US20090197417A1

    公开(公告)日:2009-08-06

    申请号:US12025050

    申请日:2008-02-04

    CPC classification number: H01L21/31116 H01L21/823468

    Abstract: A method for forming spacers of different sizes includes the following steps. First a substrate is provided, which has a first element, a second element, a first material layer and a second material layer thereon. A first dry etching is performed to remove part of the second material layer to form a first spacer by the first element and to form a second side wall by the second element, so that the first material layer between the first spacer and the second side wall is exposed to become a damaged first material layer. A trimming procedure is performed to trim the damaged first material layer. A mask is used to cover the first element, the first spacer and part of the first material layer then a wet etching is performed to remove the second side wall.

    Abstract translation: 用于形成不同尺寸的间隔物的方法包括以下步骤。 首先,提供具有第一元件,第二元件,第一材料层和第二材料层的基板。 执行第一干蚀刻以去除第二材料层的一部分以通过第一元件形成第一间隔物并且由第二元件形成第二侧壁,使得第一间隔物和第二侧壁之间的第一材料层 被暴露成为损坏的第一材料层。 执行修剪程序以修整损坏的第一材料层。 掩模用于覆盖第一元件,第一间隔物和第一材料层的一部分,然后进行湿蚀刻以除去第二侧壁。

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