Dummy pattern performance aware analysis and implementation
    1.
    发明授权
    Dummy pattern performance aware analysis and implementation 有权
    虚拟模式性能意识分析和实现

    公开(公告)号:US09262568B2

    公开(公告)日:2016-02-16

    申请号:US12763889

    申请日:2010-04-20

    IPC分类号: G06F17/50

    摘要: Embodiments of the present invention are a system, a computer program product, and a method for implementing an integrated circuit design. The method for implementing an integrated circuit design includes accessing an original electronic representation of an integrated circuit layout from a first user file, and accessing a defined sensitivity index that characterizes an impact of the dummy pattern on the functional component. The impact of the dummy pattern on the functional component is analyzed and it is determined whether the impact is within a limit of the sensitivity index. One of a plurality of features of the dummy pattern is adjusted if the impact is not within the limit to form a generated electronic representation of a modified integrated circuit layout, and the generated electronic representation is output to a second user file. The integrated circuit layout includes a dummy pattern and a functional component.

    摘要翻译: 本发明的实施例是一种用于实现集成电路设计的系统,计算机程序产品和方法。 用于实现集成电路设计的方法包括从第一用户文件访问集成电路布局的原始电子表示,以及访问表征虚拟图案对功能组件的影响的定义的灵敏度指标。 分析虚拟模式对功能组件的影响,确定影响是否在灵敏度指标的极限之内。 如果影响不在限制内以形成经修改的集成电路布局的生成的电子表示,则调整虚拟图案的多个特征之一,并且所生成的电子表示被输出到第二用户文件。 集成电路布局包括虚拟图案和功能部件。

    DFM improvement utility with unified interface
    2.
    发明授权
    DFM improvement utility with unified interface 有权
    具有统一接口的DFM改进实用程序

    公开(公告)号:US08726208B2

    公开(公告)日:2014-05-13

    申请号:US13186241

    申请日:2011-07-19

    IPC分类号: G06F9/455 G06F17/50

    摘要: A utility includes a design-for-manufacturing (DFM) checker configured to check layout patterns of an integrated circuit, and a layout change instruction generator configured to generate a layout change instruction based on a result generated by the DFM checker. The DFM checker and the layout change instruction generator are embodied on a non-transitory storage media. The layout change instruction specifies an identifier of a layout pattern among the layout patterns, and a respective layout change to be performed on the layout pattern.

    摘要翻译: 一种实用程序包括:被配置为检查集成电路的布局图案的制造设计(DFM)检查器,以及布局改变指令生成器,其被配置为基于由DFM检验器生成的结果生成布局改变指令。 DFM检查器和布局改变指令生成器体现在非暂时性的存储介质上。 布局改变指令指定布局图案之间的布局图案的标识符以及要在布局图案上执行的各自的布局改变。

    Method and system for predicting shrinkable yield for business assessment of integrated circuit design shrink
    4.
    发明授权
    Method and system for predicting shrinkable yield for business assessment of integrated circuit design shrink 有权
    集成电路设计业务评估收缩收益预测方法与系统收缩

    公开(公告)号:US08577717B2

    公开(公告)日:2013-11-05

    申请号:US11486521

    申请日:2006-07-13

    IPC分类号: G06Q99/00 G06Q30/02 G06Q10/04

    CPC分类号: G06Q30/0283 G06Q10/04

    摘要: A method and a system for predicting shrinkable yield for business assessment of integrated circuit design shrink are provided. An assessment system is provided to determine cost benefits of a design shrink of an integrated circuit chip. A cost benefit analysis across different design shrink technologies is provided early in the process, so that business decisions regarding employment of design shrinks can be made as early as possible.

    摘要翻译: 提供了一种用于预测集成电路设计收缩业务评估的收缩收益的方法和系统。 提供评估系统来确定集成电路芯片设计收缩的成本优势。 在早期提供不同设计收缩技术的成本效益分析,以便尽可能早地制定有关就业设计缩减的业务决策。

    METHOD AND SYSTEM FOR REPLACING A PATTERN IN A LAYOUT
    5.
    发明申请
    METHOD AND SYSTEM FOR REPLACING A PATTERN IN A LAYOUT 有权
    用于在布局中替换图案的方法和系统

    公开(公告)号:US20130091476A1

    公开(公告)日:2013-04-11

    申请号:US13269757

    申请日:2011-10-10

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5077

    摘要: A received layout identifies a plurality of circuit components to be included in an integrated circuit (IC) layer for double patterning the layer using two photomasks, the layout including a plurality of first patterns to be included in the first photomask and at least one second pattern to be included in the second photomask. A selected one of the first patterns has first and second endpoints, to be replaced by a replacement pattern connecting the first endpoint to a third endpoint. At least one respective keep-out region is provided adjacent to each respective remaining first pattern except for the selected first pattern. Data are generated representing the replacement pattern, such that no part of the replacement pattern is formed in any of the keep-out regions. Data representing the remaining first patterns and the replacement pattern are output.

    摘要翻译: 接收到的布局标识要包括在集成电路(IC)层中的多个电路组件,用于使用两个光掩模对层进行双重图案化,所述布局包括要包括在第一光掩模中的多个第一图案和至少一个第二图案 被包括在第二个光掩模中。 所选择的第一模式中的一个具有第一和第二端点,被替换为将第一端点连接到第三端点的替换模式。 除了所选择的第一图案之外,至少一个相应的保留区域被设置为与每个相应的剩余第一图案相邻。 生成表示替换图案的数据,使得在任何保留区域中不形成替换图案的一部分。 输出表示剩余的第一图案和替换图案的数据。

    Cell-context aware integrated circuit design
    10.
    发明授权
    Cell-context aware integrated circuit design 有权
    电池背景感知集成电路设计

    公开(公告)号:US08677292B2

    公开(公告)日:2014-03-18

    申请号:US12708098

    申请日:2010-02-18

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5072

    摘要: A method of designing an integrated circuit includes providing a standard cell database including a plurality of standard cells; providing an index file having cell-context information indexed to the plurality of standard cells; retrieving the cell-context information of one of the plurality of standard cells from the cell-context file; and applying the index information to a design of the integrated circuit.

    摘要翻译: 设计集成电路的方法包括提供包括多个标准单元的标准单元数据库; 提供具有索引到所述多个标准单元的单元格上下文信息的索引文件; 从所述小区上下文文件中检索所述多个标准单元之一的小区上下文信息; 以及将所述索引信息应用于所述集成电路的设计。