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    Underlayer composition and method of imaging underlayer
    1.
    发明授权
    Underlayer composition and method of imaging underlayer 有权
    底层组成和成像底层的方法

    公开(公告)号：US08822133B2

    公开(公告)日：2014-09-02

    申请号：US13253023

    申请日：2011-10-04

    申请人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    发明人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    IPC分类号： G03F7/26

    CPC分类号： G03F7/0388 ,  G03F7/0392 ,  G03F7/162 ,  G03F7/165 ,  G03F7/168 ,  G03F7/40

    摘要： A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.

    摘要翻译： 形成图案的方法包括将通过照射感光层的一部分产生的酸扩散到包含可酸分解基团和连接基团的酸敏感共聚物的底层中，以形成交联和/或共价键合到 衬底的表面。 扩散包括加热底层和感光层。 酸敏感基团与扩散的酸反应，形成表面形状的极性区域。 去除感光层以形成包含具有对极性区域具有亲和力的嵌段的嵌段共聚物的自组装层，以及具有比第一嵌段共聚物亲和性小的嵌段。 第一块形成与极性区对准的域，并且第二块形成与第一块对准的域。 移除第一或第二域暴露底层的一部分。

    UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER
    3.
    发明申请
    UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER 有权
    底层组合物和成像方法

    公开(公告)号：US20120088192A1

    公开(公告)日：2012-04-12

    申请号：US13253023

    申请日：2011-10-04

    申请人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    发明人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    IPC分类号： G03F7/20 ,  B29C59/16 ,  G03F7/004

    CPC分类号： G03F7/0388 ,  G03F7/0392 ,  G03F7/162 ,  G03F7/165 ,  G03F7/168 ,  G03F7/40

    摘要： A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.

    摘要翻译： 形成图案的方法包括将通过照射感光层的一部分产生的酸扩散到包含可酸分解基团和连接基团的酸敏感共聚物的底层中，以形成交联和/或共价键合到 衬底的表面。 扩散包括加热底层和感光层。 酸敏感基团与扩散的酸反应，形成表面形状的极性区域。 去除感光层以形成包含具有对极性区域具有亲和力的嵌段的嵌段共聚物的自组装层，以及具有比第一嵌段共聚物亲和性小的嵌段。 第一块形成与极性区对准的域，并且第二块形成与第一块对准的域。 移除第一或第二域暴露底层的一部分。

    Underlayer composition and method of imaging underlayer composition
    5.
    发明授权
    Underlayer composition and method of imaging underlayer composition 有权
    底层组合物和底层成分成像方法

    公开(公告)号：US08822124B2

    公开(公告)日：2014-09-02

    申请号：US13253012

    申请日：2011-10-04

    申请人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    发明人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    IPC分类号： G03C8/40

    CPC分类号： G03F7/0388 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F212/08 ,  C08F220/18 ,  C08F297/026 ,  G03F7/0002 ,  G03F7/094 ,  G03F7/11 ,  G03F7/165 ,  G03F7/26

    摘要： A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.

    摘要翻译： 形成图案的方法包括将通过照射感光层的一部分形成的酸扩散到包含具有酸可分解基团的酸敏感共聚物和共价键合到基材表面的附着基团和/或形成互聚物交联的底层 。 扩散包括加热底层和感光层。 酸敏感基团与扩散的酸反应，在底层上形成具有图案形状的极性区域。 去除感光层，形成包含具有对极性区域具有亲和力的第一嵌段的嵌段共聚物的自组装层和对极性区域具有较小亲和力的第二嵌段。 第一块形成与极性区对准的域，并且第二块形成与第一块对准的另一域。 删除任一域暴露了底层的一部分。

    UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER COMPOSITION
    7.
    发明申请
    UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER COMPOSITION 有权
    底层组合物和成像下层组合物的方法

    公开(公告)号：US20120088188A1

    公开(公告)日：2012-04-12

    申请号：US13253012

    申请日：2011-10-04

    申请人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    发明人： Peter Trefonas ,  Phillip Dene Hustad ,  Cynthia Pierre

    IPC分类号： G03F7/20 ,  C08F220/26 ,  G03F7/004

    CPC分类号： G03F7/0388 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F212/08 ,  C08F220/18 ,  C08F297/026 ,  G03F7/0002 ,  G03F7/094 ,  G03F7/11 ,  G03F7/165 ,  G03F7/26

    摘要： A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.

    摘要翻译： 形成图案的方法包括将通过照射感光层的一部分形成的酸扩散到包含具有酸可分解基团的酸敏感共聚物和共价键合到基材表面的附着基团和/或形成互聚物交联的底层 。 扩散包括加热底层和感光层。 酸敏感基团与扩散的酸反应，在底层上形成具有图案形状的极性区域。 去除感光层，形成包含具有对极性区域具有亲和力的第一嵌段的嵌段共聚物的自组装层和对极性区域具有较小亲和力的第二嵌段。 第一块形成与极性区对准的域，并且第二块形成与第一块对准的另一域。 删除任一域暴露了底层的一部分。