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公开(公告)号:US6032683A
公开(公告)日:2000-03-07
申请号:US258970
申请日:1999-02-26
申请人: Jon A. Casey , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , John U. Knickerbocker , David C. Long , Daniel S. Mackin , Glenn A. Pomerantz , Krishna G. Sachdev , David E. Speed , Candace A. Sullivan , Robert J. Sullivan , Bruce E. Tripp , James C. Utter
发明人: Jon A. Casey , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , John U. Knickerbocker , David C. Long , Daniel S. Mackin , Glenn A. Pomerantz , Krishna G. Sachdev , David E. Speed , Candace A. Sullivan , Robert J. Sullivan , Bruce E. Tripp , James C. Utter
IPC分类号: B08B3/02 , B41F35/00 , G03F1/82 , G03F7/12 , G03F7/42 , H01L21/00 , H05K3/12 , H05K3/26 , B08B3/00
CPC分类号: H01L21/67028 , B08B3/02 , B41F35/005 , G03F1/82 , G03F7/425 , B41P2235/26 , B41P2235/50 , G03F7/12 , H05K3/1216 , H05K3/26
摘要: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
摘要翻译: 一种清洁方法和相关设备,用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模,随后进行干燥步骤,其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。
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公开(公告)号:US5916374A
公开(公告)日:1999-06-29
申请号:US21046
申请日:1998-02-09
申请人: Jon A. Casey , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , John U. Knickerbocker , David C. Long , Daniel S. Mackin , Glenn A. Pomerantz , Krishna G. Sachdev , David E. Speed , Candace A. Sullivan , Robert J. Sullivan , Bruce E. Tripp , James C. Utter
发明人: Jon A. Casey , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , John U. Knickerbocker , David C. Long , Daniel S. Mackin , Glenn A. Pomerantz , Krishna G. Sachdev , David E. Speed , Candace A. Sullivan , Robert J. Sullivan , Bruce E. Tripp , James C. Utter
IPC分类号: B08B3/02 , B41F35/00 , G03F1/82 , G03F7/12 , G03F7/42 , H01L21/00 , H05K3/12 , H05K3/26 , B08B3/04
CPC分类号: H01L21/67028 , B08B3/02 , B41F35/005 , G03F1/82 , G03F7/425 , B41P2235/26 , B41P2235/50 , G03F7/12 , H05K3/1216 , H05K3/26
摘要: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
摘要翻译: 一种清洁方法和相关设备,用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模,随后进行干燥步骤,其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。
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公开(公告)号:US20130041894A1
公开(公告)日:2013-02-14
申请号:US13206546
申请日:2011-08-10
申请人: Kathleen A. DiZio , John A. Fitzsimmons , Richard J. Melville , David E. Speed , Ernest L. Timlin, JR. , Connie-Nga T. Truong
发明人: Kathleen A. DiZio , John A. Fitzsimmons , Richard J. Melville , David E. Speed , Ernest L. Timlin, JR. , Connie-Nga T. Truong
IPC分类号: G06F17/30
摘要: A method of identifying a substitute chemical includes receiving, at a computer, a trial set of properties that describes a function in a desired chemical process of a chemical for substitution, performing a distributed search using objective similarity criteria based on the trial set of properties to identify a first set of candidate chemicals, prioritizing the first set of candidate chemicals into a second set of candidate chemicals, determining Environmental, Health, and Safety (EHS) data parameter values for each chemical of the second set of candidate chemicals, normalizing disparate EHS data parameter values into associated EHS properties, prioritizing the second set of candidate chemicals into a third set of candidate chemicals, and prioritizing the third set of candidate chemicals into a fourth set of candidate chemicals according to the risk posed by the desired chemical process.
摘要翻译: 识别替代化学品的方法包括在计算机处接收描述化学品的所需化学品的替代物的功能的试验性质的组合,使用基于试验性质的客观相似性标准进行分布式搜索 确定第一组候选化学品,将第一组候选化学品列入第二组候选化学品,确定第二组候选化学品的每种化学品的环境,健康和安全(EHS)数据参数值,将不同的EHS归一化 将数据参数值转换成相关的EHS属性,将第二组候选化学品优先排列为第三组候选化学品,并根据所需化学过程构成的风险将第三组候选化学品优先排列为第四组候选化学品。
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公开(公告)号:US20130095649A1
公开(公告)日:2013-04-18
申请号:US13274413
申请日:2011-10-17
IPC分类号: H01L21/3205 , C25D17/00
CPC分类号: C23C18/1617 , C23C18/50 , C25D21/22 , H01L21/288 , H01L21/76849
摘要: Ions depleted from a chemical bath by a reaction such as plating are continually replenished by production and moving of ions through selectively permeable membranes while isolating potential contaminant ions from the chemical bath.
摘要翻译: 通过诸如电镀的反应从化学浴中耗尽的离子通过选择性渗透膜的生产和移动而不断补充,同时从化学浴中分离潜在的污染物离子。
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5.
公开(公告)号:US06351871B1
公开(公告)日:2002-03-05
申请号:US09335420
申请日:1999-06-17
申请人: Krishna G. Sachdev , John T. Butler , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , James N. Humenik , John U. Knickerbocker , Daniel S. Mackin , Glenn A. Pomerantz , David E. Speed , Candace A. Sullivan , Bruce E. Tripp , James C. Utter
发明人: Krishna G. Sachdev , John T. Butler , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , James N. Humenik , John U. Knickerbocker , Daniel S. Mackin , Glenn A. Pomerantz , David E. Speed , Candace A. Sullivan , Bruce E. Tripp , James C. Utter
IPC分类号: A47L2500
CPC分类号: C23G1/14 , C11D7/06 , C11D7/3209 , C11D7/3218 , C11D11/0047 , C23G1/24 , G03F7/425 , H01L21/4864 , H05K1/092 , H05K3/1233 , H05K3/26 , H05K2203/0793 , H05K2203/122
摘要: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
摘要翻译: 本发明涉及清洁与半导体印刷有关的物体,例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中,从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说,本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷(MLC)基板。
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6.
公开(公告)号:US06280527B1
公开(公告)日:2001-08-28
申请号:US09096841
申请日:1998-06-12
申请人: Krishna G. Sachdev , John T. Butler , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , James N. Humenik , John U. Knickerbocker , Daniel S. Mackin , Glenn A. Pomerantz , David E. Speed , Candace A. Sullivan , Bruce E. Tripp , James C. Utter
发明人: Krishna G. Sachdev , John T. Butler , Michael E. Cropp , Donald W. DiAngelo , John F. Harmuth , James N. Humenik , John U. Knickerbocker , Daniel S. Mackin , Glenn A. Pomerantz , David E. Speed , Candace A. Sullivan , Bruce E. Tripp , James C. Utter
IPC分类号: B08B308
CPC分类号: C23G1/14 , C11D7/06 , C11D7/3209 , C11D7/3218 , C11D11/0047 , C23G1/24 , G03F7/425 , H01L21/4864 , H05K1/092 , H05K3/1233 , H05K3/26 , H05K2203/0793 , H05K2203/122
摘要: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
摘要翻译: 本发明涉及清洁与半导体印刷有关的物体,例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中,从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说,本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷(MLC)基板。
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