公开(公告)号：US06280527B1

公开(公告)日：2001-08-28

申请号：US09096841

申请日：1998-06-12

Applicant: Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

Inventor： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC: B08B308

CPC classification number: C23G1/14 ,  C11D7/06 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  C23G1/24 ,  G03F7/425 ,  H01L21/4864 ,  H05K1/092 ,  H05K3/1233 ,  H05K3/26 ,  H05K2203/0793 ,  H05K2203/122

Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

Abstract translation: 本发明涉及清洁与半导体印刷有关的物体，例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中，从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说，本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷（MLC）基板。

公开(公告)号：US06238741B1

公开(公告)日：2001-05-29

申请号：US09206159

申请日：1998-12-07

Applicant: James M. Blazick ,  Michael E. Cropp ,  James N. Humenik ,  Gerald H. Leino ,  Jawahar P. Nayak ,  Frank V. Ranalli ,  Deborah A. Sylvester ,  John A. Trumpetto ,  James C. Utter ,  Rao V. Vallabhaneni ,  Renee L. Weisman

Inventor： James M. Blazick ,  Michael E. Cropp ,  James N. Humenik ,  Gerald H. Leino ,  Jawahar P. Nayak ,  Frank V. Ranalli ,  Deborah A. Sylvester ,  John A. Trumpetto ,  James C. Utter ,  Rao V. Vallabhaneni ,  Renee L. Weisman

IPC: B05D500

CPC classification number: H05K3/1233 ,  H01L51/0004 ,  H05K3/245 ,  H05K2201/035 ,  H05K2203/0139

Abstract: A process of forming a multi-layer feature on a ceramic or organic article in which first and second layers of paste are sequentially screened through a screening mask wherein the screening mask has not been moved between screening steps. A structure produced by this process is also disclosed.

Abstract translation: 在陶瓷或有机制品上形成多层特征的方法，其中第一和第二层浆料通过筛选掩模被顺序地筛选，其中筛选掩模在筛选步骤之间没有移动。 还公开了通过该方法生产的结构。

公开(公告)号：US06351871B1

公开(公告)日：2002-03-05

申请号：US09335420

申请日：1999-06-17

Applicant: Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

Inventor： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC: A47L2500

CPC classification number: C23G1/14 ,  C11D7/06 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  C23G1/24 ,  G03F7/425 ,  H01L21/4864 ,  H05K1/092 ,  H05K3/1233 ,  H05K3/26 ,  H05K2203/0793 ,  H05K2203/122

Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

Abstract translation: 本发明涉及清洁与半导体印刷有关的物体，例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中，从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说，本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷（MLC）基板。

公开(公告)号：US6062135A

公开(公告)日：2000-05-16

申请号：US206158

申请日：1998-12-07

Applicant: Alvin W. Buechele ,  Karl O. Muggenburg ,  James C. Utter ,  Renee L. Weisman

Inventor： Alvin W. Buechele ,  Karl O. Muggenburg ,  James C. Utter ,  Renee L. Weisman

IPC: B41F15/46 ,  H05K3/12 ,  B41M1/12

CPC classification number: H05K3/1233 ,  B41F15/46 ,  H05K2203/0126

Abstract: A screening apparatus including a table for holding an article; and a dual reservoir dispensing assembly. The dual reservoir assembly includes first and second reservoirs for holding first and second materials to be dispensed; first and second nozzles in communication with first and second reservoirs, respectively, for dispensing first and second materials; tilting apparatus for tilting the nozzles in a first direction so that the first nozzle is tilted into position for dispensing the first material and for tilting the nozzles in a second direction so that the first nozzle is tilted out of position and the second nozzle is tilted into position for dispensing the second material; and apparatus for moving the dual reservoir dispensing assembly with respect to the table wherein, in operation, the first nozzle is tilted into position during a first movement across the article and the second nozzle is titled into position during a second movement across the article.

Abstract translation: 一种筛选装置，包括用于保持物品的台子; 和双储存器分配组件。 双储存器组件包括用于保持要分配的第一和第二材料的第一和第二储存器; 分别与第一和第二储存器连通以分配第一和第二材料的第一和第二喷嘴; 倾斜装置，用于沿第一方向倾斜喷嘴，使得第一喷嘴倾斜到用于分配第一材料的位置，并且用于沿第二方向倾斜喷嘴，使得第一喷嘴倾斜到位置之外，并且第二喷嘴倾斜到 用于分配第二材料的位置; 以及用于相对于工作台移动双储存器分配组件的装置，其中在操作中，第一喷嘴在穿过物品的第一移动期间倾斜到适当位置，并且在穿过物品的第二移动期间第二喷嘴被标题置于适当位置。

公开(公告)号：US6032683A

公开(公告)日：2000-03-07

申请号：US258970

申请日：1999-02-26

Applicant: Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

Inventor： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC: B08B3/02 ,  B41F35/00 ,  G03F1/82 ,  G03F7/12 ,  G03F7/42 ,  H01L21/00 ,  H05K3/12 ,  H05K3/26 ,  B08B3/00

CPC classification number: H01L21/67028 ,  B08B3/02 ,  B41F35/005 ,  G03F1/82 ,  G03F7/425 ,  B41P2235/26 ,  B41P2235/50 ,  G03F7/12 ,  H05K3/1216 ,  H05K3/26

Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

Abstract translation: 一种清洁方法和相关设备，用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模，随后进行干燥步骤，其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。

公开(公告)号：US5916374A

公开(公告)日：1999-06-29

申请号：US21046

申请日：1998-02-09

Applicant: Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

Inventor： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC: B08B3/02 ,  B41F35/00 ,  G03F1/82 ,  G03F7/12 ,  G03F7/42 ,  H01L21/00 ,  H05K3/12 ,  H05K3/26 ,  B08B3/04

CPC classification number: H01L21/67028 ,  B08B3/02 ,  B41F35/005 ,  G03F1/82 ,  G03F7/425 ,  B41P2235/26 ,  B41P2235/50 ,  G03F7/12 ,  H05K3/1216 ,  H05K3/26

Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

Abstract translation: 一种清洁方法和相关设备，用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模，随后进行干燥步骤，其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。